1542 results about "Particle beam" patented technology

The invention relates to the technical field of radiation therapy, in particular to a boron neutron capture therapy beam shaping device and a boron neutron capture therapy system. The beam shaping device for boron neutron capture therapy is used for beam shaping of a DT neutron tube generator. The interior of the beam shaping device is provided with a particle beam channel, and the particle beam channel is used for generating an initial neutron source through an incident proton beam. The beam shaping device comprises a value-added layer, a moderator, a filter layer, a reflecting layer, a collimator and a shielding layer, wherein the value-added layer, the moderator, the filter layer and the collimator are sequentially arranged from a target material to an outlet. And the axes of the particle beam channel, the value-added layer, the moderator and the collimator coincide. According to the beam shaping device, 14Mev high-energy neutrons from the DT neutron tube generator are shaped into hot / slow neutron beams meeting the BNCT treatment requirements, and impurities of fast neutrons and gamma rays are reduced to the maximum extent, so that the dosage precision and biological selectivity of treatment are effectively improved.

The invention provides an adaptive weight multi-particle beam flow transmission simulation method and device, and the method belongs to the technical field of particle accelerators, and specifically comprises the steps: dividing a to-be-processed macro particle beam to form a plurality of groups of macro particles; configuring a relative weight for each group of macro particles according to the density distribution characteristics of the macro particle beams; sampling each group of macro particles in combination with the relative weight of each group of macro particles to obtain a corresponding sampling result; determining the weight of each macro particle in each sampling result in combination with the relative weight of each macro particle in each sampling result; determining similarities of a candidate beam bunch and a macro particle beam bunch in different dimensions, wherein the candidate beam bunch is formed by collecting sampling results configured with weights of macro particles; under the condition that the similarity meets a beam dynamics simulation condition, determining the candidate beam bunch as a new macro particle beam bunch; the new macro particle beam is used for replacing the macro particle beam to carry out multi-particle beam flow dynamic simulation, and the evolution process of beam transmission in the accelerator is described.

Provided is a charged particle beam device capable of shortening the acquisition time of a feature image. In this charged particle beam device, an image acquisition unit acquires a plurality of feature images by repeating: a process for selecting one mode from a plurality of modes for acquiring the feature images on the basis of the proportion of a region of a feature object in an acquired sample image in the field of view; and a process for acquiring a feature image in the selected mode, the plurality of modes including: a first mode in which a sample image is captured by scanning the sample at a first scanning speed, and the captured sample image is cut to acquire the feature image; and a second mode in which a sample image is captured by scanning the sample at a second scanning speed faster than the first scanning speed, and a feature image is captured by scanning a region of the feature object in the captured sample image at a third scanning speed slower than the second scanning speed.

The invention discloses a particle accelerator multi-particle dynamics efficient simulation method, system and device and a medium. The method comprises the steps that a small number of macro particles are sampled from an initial macro particle beam to form a new macro particle beam; performing multi-particle beam flow dynamics simulation on the new macro particle beams by adopting a PIC algorithm, and projecting the new macro particle beams to four two-dimensional phase spaces in a distributed manner to generate low-resolution phase diagrams of the four two-dimensional phase spaces; obtaining beam physical parameters based on the new macro particle beam; and inputting the low-resolution phase diagram and the beam physical parameters into a beam halo super-resolution network, and outputting a high-resolution phase diagram of each phase space to realize multi-particle beam flow dynamics simulation. Therefore, by combining a traditional numerical calculation method and an artificial intelligence technology, the problem that an existing artificial intelligence algorithm is weak in generalization ability in the field of beam dynamics simulation is solved, rapid and high-precision simulation of the large-scale multi-particle beam flow dynamics process is achieved, and the method is applied to the field of particle accelerator beam dynamics simulation.

The subject invention is a device for mounting a cassette (4) with a lamellae holder (5) and a charged particle beam device comprising a cassette (4) mounting device with a lamellae holder (5). The device with the cassette (4) with a lamellae holder (5) uses an arm (3) pivotally connected to the body (1 ), the end of which, when the arm (3) is rotated away from the body (1 ) is adapted to hold the cassette (4) with the lamellae holder (5).

The invention provides a particle dose determination method and device, electronic equipment and a storage medium, and relates to the field of physics and computers, in particular to application of physics and computer technologies in the field of radiation medical treatment. The particle dose determination method comprises the following steps: respectively guiding a particle beam to move through M groups of scanning parameters to obtain a plurality of transverse radiation field dose distribution data; wherein each group of scanning parameters corresponds to a plurality of transverse radiation field dose distribution data, and M is a positive integer; according to the plurality of transverse radiation field dose distribution data, calculating to obtain a plurality of first radiation field dose distribution data corresponding to each group of scanning parameters; wherein the dimension of the first radiation field dose distribution data is higher than that of the transverse radiation field dose distribution data; based on scanning parameters and the first radiation field dose distribution data, obtaining a target model used for determining radiation field center dose distribution; and inputting the target scanning parameter into the target model, and determining the delivery dose according to the target radiation field center dose distribution output by the target model.

The invention relates to the technical field of axial focusing enhancement of a cyclotron, and provides an axial focusing enhancement method and system for a medical cyclotron, and the method comprises the steps: collecting vibration data, a beam intensity value, temperature data, the positions of all particles in a particle beam, the average magnetic field intensity, the magnetic field intensity difference, and the current; the divergence angle and energy of the particle beam are measured; determining an axial focusing effect evaluation value at the current sampling moment; determining the particle beam stability at the current sampling moment, and determining the magnetic field uniformity at the current sampling moment by combining the average magnetic field intensity and the magnetic field intensity difference at the current sampling moment; and the axial focusing effect evaluation value, the average magnetic field intensity and the current at the current sampling moment are combined to realize the axial focusing enhancement of the medical cyclotron. According to the invention, the focusing precision of axial focusing enhancement of the medical cyclotron and the stability of the focusing effect can be improved.

A method for imaging of semiconductor samples with reduced charging effects and a multi-beam charged particle beam system configured for imaging of semiconductor samples with reduced charging effects comprises adjusting the kinetic energy of primary charged particles to a low energy transition energy, where charging of a material composition is minimized. The system and method include for example a monitoring system and optimization of the kinetic energy to minimize charging effects.

The present disclosure proposes a charged particle beam device, wherein, in order to reduce a field-of-view deviation amount when stage rotation is performed in each of θx, θy, and θz axial directions with respect to a discretionary stage rotation center: (i) the discretionary rotation center is controlled using motor thrust in a translation direction and a rotation direction of a stage device; (ii) a deviation amount from the center of the field of view in an observation image, or the trajectory of the deviation amount, is obtained on the basis of position information indicating the distance in at least one of an X-axis direction, a Y-axis direction, and a Z-axis direction between rotation center coordinates of the stage device and sample observation coordinates, and on the basis of the rotation angles of a θx axis, a θy axis, and a θz axis, during the rotation operation; and (iii) the deviation amount, or the trajectory of the deviation amount, is added to the position information pertaining to the stage when the stage device is moved, whereby the deviation amount from the center of the field of view in the observation image is corrected (see fig. 4).

The embodiment of the invention provides a particle source assembly and particle beam equipment, relates to the technical field of charged particle beam processing and detection equipment, and is used for improving the degree of freedom of beam state adjustment of charged particle beams. The particle source assembly comprises a particle source, an adjustable diaphragm and a collimating lens device which are arranged along a first direction. Wherein the particle source is used for generating a charged particle beam which is emitted towards the adjustable diaphragm along a first direction; the adjustable diaphragm is positioned in a transmission path of the charged particle beam, and the size of a diaphragm hole is adjustable, so that the beam size of the charged particle beam is adjusted; the collimating lens device is used for collimating the charged particle beam emitted from the adjustable diaphragm, and the position of the collimating main plane in the first direction is adjustable. The particle source assembly can be applied to particle beam equipment.

A telecentric charged particle beam, which can be an electron beam, is directed through an array of apertures to divide the telecentric charged particle beam to a plurality of telecentric illumination beamlets. The telecentric illumination beamlets through an imaging lens, a field lens at an intermediate image plane, and a transfer lens. The telecentric illumination beamlets are scanned as the telecentric illumination beamlets are directed through an upper scan deflector and a lower scan deflector and directed onto a workpiece on a stage.

The invention provides a button type signal feed-through for a beam position detector. The button type signal feed-through comprises a shell, a composite unit and an insulator. The composite unit comprises a button electrode and an inner conductor, and the button electrode is suitable for sensing an electromagnetic field signal generated by charged particle beams in the vacuum cavity; the inner conductor vertically and integrally extends from the center of the button electrode, a flange is arranged near one end, close to the button electrode, of the inner conductor, and the inner conductor is suitable for transmitting beam electromagnetic field signals. The insulator is sleeved on the inner conductor and comprises a first section cylinder and a second section cylinder, and the front end face of the first section cylinder is welded and fixed with the flange of the inner conductor; the second section of cylinder body extends outwards in the radial direction from the rear end of the first section of cylinder body, the circumferential outer surface of the second section of cylinder body is welded and fixed with the shell, and the insulator is suitable for fixed support and electrical insulation, so that smooth transition of transmission impedance and vacuum sealing are realized. The invention further provides a preparation method of the charged particle beam position detector and a charged particle beam position detector structure.

The invention relates to the field of medical resource scheduling, in particular to a multi-chamber particle therapy method, system and device, a storage medium and a computer storage medium, and the system comprises an irradiation source which is used for generating a particle beam; the plurality of particle treatment rooms are used for sending beam requests and receiving the particle beams; the beam transport device is used for transmitting the particle beam from the irradiation source to the particle treatment room; and the control device is used for receiving the beam requests of the particle treatment room, calculating the priority for each beam request according to the reserved irradiation time, the tumor type and the patient condition included in each beam request, and controlling the beam transport device to transport the particle beams according to the priorities. According to the method, the utilization efficiency of beam resources can be remarkably improved, the urgency degree and clinical importance of treatment are fully considered, and the demand intensity of different requests for the beam resources can be quantitatively reflected.

Method for particle beam-induced etching of a defect (D1) of a photomask (100) for microlithography, comprising the steps: a) Providing (S1) an activating particle beam (114) and a first gaseous component (116) activatable by the particle beam (114) at a surface (118) of the photomask (100) in a region (120) of the defect (D1) for etching the defect (D1), and subsequently b) Providing (S2) a spontaneously oxidizing oxygen-containing second gaseous component (126) at the surface (118) of the photomask (100) in a passivation area (122) encompassing the area (120) of the defect (D1) for passivation of the surface (118).

The invention relates to the technical field of vacuum equipment, and discloses an ion lens assembly, an ion source, a mass spectrometer and a mass spectrometry system. The ion lens assembly includes a deflection lens assembly and a return lens assembly. The deflection lens assembly is used for focusing an ion beam in the incident particle beam and enabling the ion beam to deflect towards a first direction. And the axis-returning lens assembly is used for receiving the ion beam from the deflection lens assembly, and the axis-returning lens assembly is used for focusing the received ion beam and enabling the ion beam to deflect towards a second direction.

The invention relates to a separation method suitable for At-211 produced by a linear accelerator, which comprises the following steps: performing gradient pressing on bismuth powder and a pore forming agent, and sintering on a porous silicon carbide substrate to form a gradient pore bismuth-silicon carbide composite target material; bombarding the gradient pore bismuth-silicon carbide composite target material through a high-energy particle beam generated by a linear accelerator, and carrying out nuclear reaction on bismuth atoms in the target material to generate At-211; the bombarded target material is pretreated through argon plasma; distilling the pretreated target material under pulse carrier gas to realize volatilization separation of At-211, wherein the carrier gas comprises inert gas, reducing gas and organic acid steam; the distilled gas is subjected to gradient condensation through the micro-channel condenser; and adding an extracting agent into the micro-channel condenser, and dissolving the At-211 in the extracting agent to obtain an At-211 solution. The high-flux separation method of At-211 suitable for linear accelerator production, provided by the invention, is stable, efficient and rapid.

Method for analyzing and / or processing a lithography mask (100) for a lithography system (1), the method comprising: providing (S1) a reference structure (124) on the lithography mask (100) such that the reference structure (124) is not imaged when the lithography mask (100) is imaged on a wafer (13) using the lithography system (1); generating (S2) an image of the reference structure (124) using a particle beam (202); and controlling (S3) the particle beam (202) for analyzing and / or processing the lithography mask (100) depending on the generated image of the reference structure (124).

Device (100) for analyzing and / or processing a sample (102) with a particle beam (116), wherein the sample (102) has an electrically conductive layer (142), comprising: a particle beam delivery unit (114) for delivering the particle beam (116) onto a surface (118) of the sample (102), at least one electrode (148) which is arranged to be spaced apart from the surface (118) of the sample (102) and together with at least one section (150) of the electrically conductive layer (142) of the sample (102) to form at least one capacitor (152) with a pre-determined capacitance (C), and at least one potential source (154, 254) which is electrically connected to the at least one electrode (148) in order to set the at least one electrode (148) to a pre-determined electrical potential (U1, U2), wherein the pre-determined capacitance (C) is determined based on the pre-determined electrical potential (U1, U2) of the at least one electrode (148) and a pre-determined charge accumulation (Q) on the surface (118) of the sample (102) due to the provided particle beam (116).

Displacement in a positional relationship between a focal point and a sample is performed with high accuracy and high speed. A transmission charged particle beam device is an device that acquires a Ronchigram of a sample 59 and performs aberration correction. The device includes a piezoelectric element 65 that displaces the sample by expanding and contracting, a position detection element 72 that detects a position of the sample 59, a control unit 35 that controls an amount of expansion or contraction of the piezoelectric element 65 on the basis of the position of the sample 59 detected by the position detection element 72 such that the sample 59 is displaced and the sample 59 is stopped, and an imaging unit 20 that images one or a plurality of single Ronchigrams without changing a focal position of the beam with which the sample 59 is irradiated in a state where the sample 59 is stopped.

A method for operating a multi-particle beam system is disclosed, in which an incipient ring collapse process at the front facet of the cathode tip of the beam generation device of the multi-particle beam system can be detected based on beam current measurements and / or beam current uniformity measurements. This detection triggers a targeted material build-up process at the front facet of the cathode tip. Specific process steps for the material build-up process are described. Furthermore, various methods for beam current measurement and / or beam current uniformity measurement are described. These measurements can be performed, in particular, during the normal operation of the multi-particle beam system.

The invention provides a beam loss front-end electronics system, a beam loss monitoring method and a beam loss monitoring system, and relates to the technical field of beam diagnosis, the system comprises at least two beam loss monitoring channels which are mutually independent, and each beam loss monitoring channel comprises a signal acquisition assembly and a signal output assembly, wherein the signal acquisition assembly is used for receiving a beam loss signal sent by a beam loss detector; the signal output assembly is used for determining a threshold voltage corresponding to the beam loss monitoring channel based on a preset beam loss parameter, and outputting a beam loss output signal based on the beam loss signal and the threshold voltage; the beam loss output signal comprises an original signal, an electric pulse signal and an optical pulse signal; the preset beam loss parameters are used for representing monitoring indexes of particle beams corresponding to different types of particle accelerators. According to the invention, the application range can be greatly expanded, and the applicability and the monitoring sensitivity are greatly improved.

A method for determining the image sharpness of a particle-optical image using an improved image sharpness criterion is disclosed. For this purpose, intensity gradients in different directions are evaluated for an image data set. For the gradient images generated in different directions, a variance Vi is calculated for each gradient image, with averaging of a plurality of direction-related variance values ​​being performed internally for each gradient image. The minimum variance Vmin, which represents a measure of the image sharpness, is determined from the variance values ​​calculated for each gradient image. This image sharpness criterion can also be used for automated adjustment of imaging particle beam systems.

To provide a magnetic field measurement device of an accelerator and a particle beam therapy system capable of measuring a magnetic field in a magnetic channel having a curved part.SOLUTION: A magnetic field measurement device 2000 for measuring a magnetic field in a predetermined region 1019 of an accelerator 1004 includes a magnetic sensor and at least one sensor head 2400 for supporting the magnetic sensor on the tip side. The sensor head has a curved shape corresponding to the predetermined region.SELECTED DRAWING: Figure 1

One aspect concerns a method for influencing the charge state of a lithographic mask. This method involves selecting a region of the mask based on the material distribution within that region. The method further includes directing a particle beam onto that region of the mask to influence its charge state.

The invention provides a particle radiotherapy beam blocking system and method, and the system comprises a particle beam generation device, and also comprises a blocking device which is disposed on a beam transmission path of the particle beam generation device and is used for blocking the beam transmission path of the particle beam; the dose monitoring device is arranged behind the blocking device and is used for monitoring the beam dose in real time and generating a beam dose signal; the control module is used for receiving the beam dose signal of the dose monitoring device, judging whether the beam dose is greater than or equal to a preset beam dose, and judging whether to send an instruction of stopping beam output to the particle beam generation device and / or send an instruction of blocking a beam transmission path to the blocking device according to a judgment result; according to the invention, the beam dose is monitored in real time, and beam outgoing is stopped and the beam is blocked in time when the preset beam dose is reached, so that the safety and accuracy of particle radiotherapy are further improved, and the injury to a patient caused by excessive irradiation is avoided.

A method for selecting a repair parameter set for particle beam-based repair of a defect in an object for lithography, in particular a lithography mask, comprises obtaining measured contour data of the object in a neighborhood of the defect, determining at least one repair parameter set for repairing the defect, obtaining at least one simulated aerial image of the object at least partially based on the contour data and the at least one repair parameter set, and selecting at least one first repair parameter set from the at least one repair parameter set for carrying out the repair at least partially based on the simulated aerial image and at least one predetermined target value.

Provided in the present invention are a magnetic resonance guided charged particle beam radiotherapy apparatus and an electromagnetic navigation parameter debugging method for target point coordinates, belonging to the technical field of radiotherapy apparatuses. The present invention comprises a charged particle beam electromagnetic navigation apparatus. The charged particle beam electromagnetic navigation apparatus comprises a multi-stage electromagnetic navigation coil, a charged particle beam sequentially passing through the multi-stage electromagnetic navigation coil to generate a parallel charged particle beam with a direction consistent with the direction of a magnetic resonance main magnetic field; and an MR imaging apparatus, comprising an MR main magnetic field coil upper group and an MR main magnetic field coil lower group, an imaging therapy area being formed therebetween. The electromagnetic navigation parameter debugging method of the present invention comprises constructing a target cost function, optimizing electromagnetic navigation parameters based on a gradient information-free optimization algorithm, and determining and outputting optimal navigation parameters. According to the present invention, the charged particle beam parallel to the MR main magnetic field can be generated, thereby greatly reducing the influence of Lorentz force on the charged particle beam, enabling to reduce the positioning difficulty of the charged particle beam on a tumor target area under MR guidance, and improving the therapeutic accuracy.

The invention provides a charged particle beam deflection electrostatic lens and a charged particle beam deflection method. The charged particle beam deflection electrostatic lens comprises at least one on-axis electrode, an off-axis electrode and a power distribution module, through holes are formed in the on-axis electrode and the off-axis electrode, and charged particle beams pass through the through holes; the off-axis electrode is parallel to the on-axis electrode, the central axis of the off-axis electrode is not coaxial with a preset incident optical axis, and the central axis of the on-axis electrode is coaxial with the preset incident optical axis; the power distribution module is electrically connected with the on-axis electrode, the power distribution module is electrically connected with the off-axis electrode, and the power distribution module is used for configuring different potentials for the on-axis electrode and the off-axis electrode so as to form a non-axisymmetric electric field to enable the charged particle beam to deflect. The problems that in the prior art, the structure is complex, and charged particle beams cannot be deflected and focused at the same time are solved. According to the invention, the charged particle beams are deflected and focused simultaneously by adopting a simple structure.

A method for producing a micro-optic system for a multi-particle beam system is disclosed, comprising the following steps: (a) providing a first plate of the micro-optic system that is electrically conductive; (b) providing a second plate of the micro-optic system that is electrically conductive; (c) producing a plate stack comprising stacking the first plate of the micro-optic system and the second plate of the micro-optic system on top of one another, wherein the first plate of the micro-optic system and the second plate of the micro-optic system are fixed relative to one another in the plate stack and are electrically insulated from one another; and (d) drilling through the entire produced plate stack with at least the first plate and the second plate of the micro-optic system, thereby producing both a first plurality of apertures in the first plate of the micro-optic system and a second plurality of apertures in the second plate of the micro-optic system.

The present disclosure relates to a system and a non-transitory computer-readable medium for estimating the height of foreign matter, etc. adhering to a sample. In order to achieve the abovementioned purpose, proposed is a system, etc. in which data acquired by a charged particle beam device or features extracted from the data are input to a learning model, which is provided with, in an intermediate layer thereof, a parameter learned using teacher data having data acquired by the charged particle beam device or features extracted from the data as inputs and having the heights or depths of the structures of samples or of foreign matter on the samples as outputs, and height or depth information is output.