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843 results about "Particle beam" patented technology

A particle beam is a stream of charged or neutral particles, in many cases moving at near the speed of light. There is a difference between the creation and control of charged particle beams and neutral particle beams, as only the first type can be manipulated to a sufficient extent by devices based on electromagnetism. The manipulation and diagnostics of charged particle beams at high kinetic energies using particle accelerators are main topics of accelerator physics.

Powder feeder for material deposition systems

A method and apparatus for embedding features and controlling material composition in a three-dimensional structure (130) is disclosed. The invention enables the control of material characteristics, within a structure (130) made from a plurality of materials, directly from computer renderings of solid models of the components. The method uses stereolithography and solid model computer file formats to control a multi-axis head (480) in a directed material deposition process (123). Material feedstock (126, 127) is deposited onto a pre-heated substrate (19). Depositions (15) in a layer-by-layer pattern, defined by solid models (141, 146), create a three-dimensional article having complex geometric details. Thermal management of finished solid articles (250-302), not available through conventional processing techniques, is enabled by embedded voids (152) and/or composite materials (126, 127), which include dissimilar metals (210, 216). Finished articles control pressure drop and produce uniform coolant flow and pressure characteristics. High-efficiency heat transfer is engineered within a solid structure by incorporating other solid materials with diverse indexes. Embedding multi-material structures (132, 134) within a normally solid component (141) produces articles with diverse mechanical properties. Laser and powder delivery systems (420, 170) are integrated in a multi-axis deposition head (480) having a focused particle beam (502) to reduce material waste.
Owner:OPTOMEC DESIGN CO

Arrangement for the Illumination of a Substrate with a Plurality of Individually Shaped Particle Beams for High-Resolution Lithography of Structure Patterns

ActiveUS20100148087A1High substrate throughputIncrease structural flexibilityThermometer detailsStability-of-path spectrometersParticle beamLight beam
The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate (91) with a plurality of individually shaped, controllable particle beamlets (118) which permits a high-resolution structuring of substrates with a high substrate throughput without limiting the flexibility of the applicable structure patterns or limiting the high substrate throughput due to a required flexibility. According to the invention, this object is met in that a first aperture diaphragm array and a second aperture diaphragm array are constructed as multiple-format diaphragm arrays (41, 42) for generating particle beamlets (118) with different beam cross sections, and at least three multibeam deflector arrays (51, 52, 53) for individual deflection of the particle beamlets (118) are associated with the first multiple-format diaphragm array (41) and with the second multiple-format diaphragm array (42), wherein at least one multibeam deflector array (51) is arranged between the first multiple-format diaphragm array (41) and the second multiple-format diaphragm array (42) in order to generate different cross sections of the particle beamlets (118), at least a second multibeam deflector array (52) is arranged in the vicinity of the second multiple-format diaphragm array (42) in order to blank or deflect individual particle beamlets (118) into individual crossovers, and at least a third multibeam deflector array (53) is arranged downstream of the second multiple-format diaphragm array (42) at a distance of 10-20% of the distance to the next crossover (112) in order to generate different positions of the particle beamlets (118) on the substrate (91).
Owner:VISTEC ELECTRON BEAM

Aerated solids particle laser analyzer

The invention provides an aerosol particle laser analyzer which online and continuously detects the aerodynamic diameter and particle quantity of the aerosol particles in the air one by one in real-time and identifies whether the particles are biological particles; the aerosol particle laser analyzer comprises a particle beam queuing acceleration sampling system wrapped by shell flows, a dual-peak laser aerodynamic diameter measurement system, a biological particle fluorescent detection system induced by ultraviolet laser, an ineffective and superposed particle identification circuit, data processing, displaying and memorizing software, and a communication module. The aerosol particle laser analyzer can not only detect the physical parameters such as aerodynamic diameter, particle quantity and the like of the aerosol particles, but also can judge whether the particles are active biological particles or not according to the natural characteristic that the active biological particle emits bioluminescence when being induced and can measure the parameters of the active biological particles such as the quantity, the concentration and the like; the aerosol particle laser analyzer has exact detection results and can be used conveniently and fast for detection; and the parts have long service life and the volume of the aerosol particle laser analyzer is small, thus being convenient for movable usage.
Owner:MICROBE EPIDEMIC DISEASE INST OF PLA MILITARY MEDICAL ACAD OF SCI +1
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