452results about How to "Reduce roughness" patented technology

The invention discloses a roughness optimization method and system for ultrasonic vibration assisted magneto-rheological deterministic polishing, and the method comprises the steps: placing an ultrasonic vibration table on a workpiece rotating shaft of a magneto-rheological machine tool, and connecting and fixing a workpiece to be machined with a clamp of the ultrasonic vibration table; the position posture of the workpiece to be machined is adjusted through a leveling mechanism and a center adjusting mechanism of the magneto-rheological machine tool, and it is ensured that the press-in position and the press-in depth of a magneto-rheological polishing ribbon formed on a polishing wheel in the magneto-rheological machining process are consistent; the viscosity and the flow of the magnetorheological polishing liquid are kept stable; detecting surface shape error data of the workpiece to be processed by the wave surface interferometer and generating a processing code; and the obtained machining code is input into a magneto-rheological machine tool, so that the magneto-rheological polishing ribbon conducts deterministic polishing on the detected workpiece to be machined based on the fixed press-in position and the press-in depth. The ultrasonic vibration assisted magneto-rheological deterministic polishing roughness optimization method aims at achieving ultrasonic vibration assisted magneto-rheological deterministic polishing roughness optimization, material removal uniformity is promoted, and the roughness of a workpiece is effectively reduced.

The invention discloses a laser processing device, a silicon carbide crystal ingot cutting method and a laser processing system. The laser processing device comprises a laser used for emitting Gaussian beams with preset laser parameters; the beam shaping element is used for shaping the Gaussian beam into a linear beam; and the scanning mechanism is used for focusing the linear light beam and cutting the silicon carbide crystal ingot by utilizing the focused linear light beam according to a preset cutting path and a preset cutting speed. Compared with the focused Gaussian beam, the focused linear beam has a small spot size in the direction of the optical axis, which means that the action depth of the focused linear beam in the silicon carbide crystal ingot is shallower, so that the length of the growth area of the microcracks generated in the direction of the optical axis in the machining process is reduced, and the machining precision is improved. And therefore, the roughness generated on the surface of the silicon carbide wafer is reduced, and the quality of the silicon carbide wafer is improved.

The invention relates to the technical field of semiconductors, in particular to a nanoscale silicon through hole and a preparation method thereof, and the method comprises the following steps: providing a semiconductor substrate; preparing a nano-scale groove on the surface of the semiconductor substrate by adopting a Bosch process; etching the side wall of the nanoscale groove by adopting an atomic layer etching process to form a smooth side wall; depositing a dielectric layer by adopting an atomic layer deposition process; depositing a barrier layer by adopting an atomic layer deposition process; and depositing a metal layer by adopting an atomic layer deposition process. According to the invention, a Bosch process is combined with an accurate and controllable atomic layer etching (ALE) technology and an atomic layer deposition (ALD) technology. The surface roughness of the side wall is reduced through the ALE technology, scale generated by the Bosch technology is eliminated, so that the smooth side wall is obtained, then the dielectric layer and the metal layer are completely filled through the ALD technology, and finally the back power supply network with excellent performance is constructed. According to the method, the problem of uniform filling of scale and nano-TSV (Through Silicon Via) caused by the Bosch process is effectively solved.

The invention relates to the technical field of pipeline cutting, and particularly discloses cutting equipment for gas engineering pipeline installation, which comprises an equipment base, servo motors are symmetrically and fixedly connected to the outer side of the equipment base, a driving assembly is arranged at the top of the equipment base, and a clamping assembly and a supporting assembly are symmetrically arranged in the equipment base. A laser cutting head is arranged between the two clamping assemblies, the driving assembly comprises a first driving mechanism and a second driving mechanism, and each clamping assembly comprises a limiting mechanism, a positioning mechanism, a first clamping mechanism, a second clamping mechanism and a transmission mechanism. Through separation operation of the first clamping mechanism and the second clamping mechanism, the pipeline can be placed on the top of the bottom positioning mechanism, then the first clamping mechanism and the second clamping mechanism are combined, a second double-shaft motor is started to drive a first half gear ring and a second half gear ring which are in butt joint, the first half gear ring and the second half gear ring push a driven wheel to rotate, and then the pipeline is clamped. And the driven wheel drives the clamping block to position and clamp the steel pipe, so that the steel pipe is conveniently and quickly positioned, the cutting stability of the steel pipe is ensured, and the cutting quality is improved.

The present invention belongs to the technical field of electrolytic copper foil. The present invention provides an electrolyte for ultra-thin electrolytic copper foil, in which the mass concentration of copper sulfate is 175-260 g / L, the mass concentration of inorganic acid is 80-100 g / L, the mass concentration of additive is 1-5 g / L, the mass concentration of complexing agent is 3-8 g / L, the mass concentration of conductive polymer is 0.5-3 g / L, and the mass concentration of hydrolyzed collagen is 0.1-0.5 g / L. The present invention also provides an ultra-thin electrolytic copper foil and a preparation method thereof. The present invention significantly reduces the thickness and roughness of the copper foil by controlling the components of the electrolyte and their concentrations and the electrodeposition process parameters, while improving the mechanical properties, antioxidant properties and electrochemical properties of the copper foil. The ultra-thin copper foil of the present invention can be produced continuously without tearing, achieving a double breakthrough in the ultra-thin thickness and mechanical properties of the copper foil.

The invention provides a fluorine-containing aromatic acid ligand modified zirconium metal oxide nano-cluster photoresist material as well as a preparation method and application thereof. The preparation method of the fluorine-containing aromatic acid ligand modified zirconium metal oxide nano-cluster photoresist material comprises the following steps: mixing a Zr6O4 (OH) 4 (MAA) 12 solution and a fluorine-containing aromatic acid ligand compound solution, and carrying out reaction, rotary evaporation and drying to obtain the fluorine-containing aromatic acid ligand modified zirconium metal oxide nano-cluster photoresist material. The preparation method is simple, cheap and easily available in raw materials, low in cost and suitable for industrial production. The fluorine-containing aromatic acid ligand modified zirconium metal oxide nano-cluster photoresist material can be suitable for ultraviolet lithography, electron beam lithography and extreme ultraviolet lithography, and the formed photoetched pattern has the advantages of low line edge roughness, high resolution and the like, and has wide application prospects.

The invention belongs to the technical field of mechanical part surface finishing machining, and aims to solve the problem that traditional barreling finishing machining is difficult to meet the requirements for high precision and uniformity of a large wind power gear ring. The vertical local forced excitation polishing and grinding method for the large wind power gear ring comprises the following steps that a to-be-polished and ground section of the to-be-polished and ground large gear ring is placed in a polishing and grinding container filled with a machining medium; and a vibration excitation element in the machining medium is driven to perform combined motion of radial intermittent feeding motion, axial intermittent feeding motion and reciprocating linear motion, and is matched with circumferential intermittent rotary motion of the large gear ring, so that a locally forced particle flow field is formed in the machining medium, and gear surface finishing machining is performed on the large gear ring to be polished and ground. According to the large gear ring polishing and grinding device, intense exciting force can be applied to a certain specific tooth surface part of a large gear ring in a targeted mode, local polishing and grinding are conducted in a centralized mode, consistent polishing and grinding of different parts of the tooth surface of the large gear ring can be achieved in an all-around mode at a time, and the surface roughness of the large gear ring can be reduced.

The invention discloses a buccal nicotine product and a preparation method thereof, the buccal nicotine product comprises a nicotine composition and a permeation bag, the nicotine composition is packaged in the permeation bag, the permeation bag comprises a bag body and a moisturizing medium, and the moisturizing medium is used for keeping the humidity of the nicotine composition in the bag body. In the buccal nicotine product of the present application, the nicotine composition has a reduced risk of caking.

The invention provides a preparation method and application of a corrosion-resistant micro-arc oxidation film layer. The method comprises the following steps: pretreating valve metal and / or an alloy matrix thereof; and the pretreated valve metal and / or an alloy matrix of the valve metal are / is immersed in electrolyte of a bipolar superaudio frequency pulse micro-arc oxidation system, micro-arc oxidation parameters are set as follows: the voltage ranges from-50 V to 600 V, the power output pulse frequency ranges from 1 kHz to 150 kHz, the duty ratio ranges from 0.1 to 0.5, micro-arc oxidation is conducted for a preset duration, and the metal matrix with the corrosion-resistant micro-arc oxidation film layer is obtained. According to the method, the high-corrosion-resistance micro-arc oxidation film layer can be obtained.

The invention discloses a preparation method of a battery aluminum foil and the battery aluminum foil. The preparation method comprises the following steps that S1, a raw material formula is prepared according to the following components in percentage by mass, and a casting process adopts a water-cooling semi-continuous casting method to prepare a cast ingot from the raw material formula; s2, the cast ingot is subjected to saw cutting and surface milling treatment; s3, the cast ingot subjected to saw cutting and surface milling treatment is put into a heating furnace to be subjected to homogenizing heat treatment; s4, the cast ingot is subjected to hot continuous rolling treatment; a hot-rolled coiled material is obtained; s5, the hot-rolled coiled material is subjected to cold rolling and intermediate annealing, and a cold-rolled blank is obtained; s6, the cold-rolled blank is cleaned, and a cold-rolled blank is obtained; and S7, the cold-rolled blank is subjected to foil rolling, and the battery aluminum foil with the thickness ranging from 0.01 mm to 0.015 mm is obtained. The prepared battery aluminum foil is excellent in comprehensive mechanical property, good in surface quality, low in pinhole density and low in belt breaking frequency.

The invention relates to a surface treatment method of rolled copper foil. The surface treatment method comprises the steps of degreasing, electrochemical corrosion and roughening. In the electrochemical step, the rolled copper foil serves as an anode, electrochemical corrosion treatment is conducted on the copper foil in an acid pretreatment solution, the defects of surface rolling lines, peeling and the like are removed, and the copper foil surface which is flat macroscopically and rough microcosmically is obtained. In the coarsening step, an additive is added into a coarsening solution, and fine copper particles are electroplated on the surface of the copper foil, so that the performance requirements of low roughness and high stripping resistance of the copper foil are met, and the use requirements of the high-frequency circuit board are met.

The invention belongs to the technical field of grinding, and particularly relates to a metallic bond diamond grinding wheel, a preparation method of the metallic bond diamond grinding wheel and a thinning method. The diamond grinding block comprises a porous diamond grinding material, a metal binding agent and a pore forming agent. The porous diamond abrasive is prepared by carrying out a thermochemical corrosion method on diamond; the metal bonding agent comprises copper-tin alloy powder, graphite powder, nano Al2O3, cadmium powder and polyimide resin. Compared with the prior art, the problem that in the prior art, the thinning technological parameters of the grinding wheel are not suitable for the novel grinding wheel with the fine granularity is solved. According to the scheme, the novel grinding wheel with the fine granularity is provided, the thinning parameters are researched on the basis of the novel grinding wheel, and therefore better machining efficiency and silicon wafer surface quality can be obtained under the grinding wheel and the thinning process parameters.

The invention discloses a processing method of a spinneret plate, which comprises the following steps: acquiring a plate material, and pretreating the plate material to obtain a blank of the spinneret plate; the blank is installed on an automatic punching machine tool, punching is conducted on the same position of the blank for at least three times, modification treatment is conducted after punching of the blank is completed every time, and the spinneret plate is obtained. The invention further discloses the lyocell spinneret plate. According to the spinneret plate, the same position in the spinneret plate blank is subjected to multiple times of punching and other operations, spinneret orifices formed through multiple times of punching are low in roughness and higher in size precision, meanwhile, the strength of materials in the orifices is enhanced, and the problems that in spinning production, yarn breaking and doubling are likely to happen, adhesion is likely to happen, and the plate replacement cleaning difficulty is large can be solved.

The invention relates to an RP phase perovskite nanocrystal modified three-dimensional perovskite solar cell. The basic structure of the solar cell device comprises a transparent conductive substrate, an electron transport layer, a three-dimensional perovskite light absorption layer, an RP phase perovskite nanocrystalline layer, a hole transport layer and an electrode. The structural formula of the RP-phase perovskite nanocrystal is Cs2PbX4, wherein X is one or more of halide ions I <->, Br <-> and Cl <->; and the thickness of the film is 0.1-100nm. According to the method, the RP-phase perovskite nanocrystals can be synthesized in the air, the preparation process is simple, the synthesis cost is low, the quality of the RP-phase nanocrystal modified three-dimensional perovskite thin film is improved, the defect state density is reduced, the carrier recombination is reduced, and the photoelectric conversion efficiency of a solar cell device is remarkably improved.

The invention discloses a device and a method for manufacturing a laser three-dimensional body with a complex structure, and solves the problems of low processing precision and low processing efficiency of the existing femtosecond laser processing technology. The light beam position presetting unit, the dispersion compensation unit, the acousto-optic modulation unit, the optical relay compensation unit and the microscopic focusing unit are sequentially arranged on a light path where the processing laser is located in the emitting direction of the processing laser. The light beam position presetting unit is used for adjusting the optical axis space position of the processing laser; the dispersion compensation unit is used for performing dispersion compensation on the processing laser after the optical axis spatial position adjustment; the acousto-optic modulation unit is used for dividing the processing laser subjected to dispersion compensation into a plurality of sub-beams through amplitude modulation of electric signals with different and / or the same frequency, and adjusting the spatial position of each sub-beam; the optical relay compensation unit is used for adjusting the optical path of each sub-beam; and the microscopic focusing unit is used for focusing the sub-beams after the optical path adjustment.

The invention relates to a method for generating a perovskite in-situ film through assistance of an interface protonation reaction, and the method comprises the following steps: S1, spin coating: carrying out the spin coating of a perovskite precursor solution on an acidic substrate, and forming a complex intermediate phase; the perovskite precursor solution comprises a tin halide, a monovalent cation halide, thiocyanate and an ethylenediamine derivative; s2, annealing: heating and annealing the intermediate phase of the complex on a heating stage, and inducing conversion of the intermediate phase of the complex to the tin-based perovskite thin film through a protonation reaction between the acidic substrate and the ethylenediamine derivative; the chemical structure of the tin-based perovskite is ASnX3. According to the method, the protonation reaction of the acidic substrate and the perovskite interface is utilized to assist in generating high-quality perovskite, the morphology of the thin film is effectively improved, and a high-brightness PeLED device is further prepared.

The invention belongs to the technical field of metal additive manufacturing, and particularly relates to a gas turbine compressor blade additive manufacturing device which comprises a machine body, and a workbench is arranged in the machine body; the bottom of the box body is rotationally connected with a rotating plate; the powder spreading mechanism is used for bidirectional powder spreading; the grinding mechanism is used for grinding sintered and accumulated powder in the blade material adding process; the powder scraping mechanism is used for removing powder attached to the grinding mechanism; and the powder collecting mechanism is used for collecting powder. The grinding mechanism can rotate along with work of the powder laying mechanism and grind sintered and accumulated powder in two directions, the roughness of a blade cooling channel is reduced in the additive manufacturing process, the communicating state of powder outlet plates on the two sides of a grinding roller can be switched through rotation of a rotating plate on the box body, the interlayer retention time of additive manufacturing is shortened, and the efficiency of additive manufacturing is improved. And therefore, the heat dissipation efficiency of the blade cooling channel after additive manufacturing is improved.

The invention provides a grinding, spraying and rolling composite surface machining method for a gear tooth surface, which comprises the following steps of: determining the overall maximum elastic deformation of a gear to obtain a modified theoretical involute gear tooth profile; by means of the micro-line-segment theory, a micro-line-segment type involute gear tooth profile is obtained; by means of non-linear smooth fitting, a final modified involute gear tooth profile is obtained, and an initial gear is obtained through machining; on the basis of the initial gear, a gear shot blasting impact model is built, and a shot blasting gear is obtained; and on the basis of the shot blasting gear, a gear finishing and grinding model under gear tumbling finishing machining is built, and a finished gear is obtained. Grinding, shot blasting and barreling finishing are combined, through process coupling design, the overall performance of the gear is improved, higher manufacturing precision is achieved, the failure risk is reduced, the service life of the gear is prolonged, and the gear has the practical application value.

The invention provides a wafer, a wafer roughness improving method, a wafer roughness improving device, wafer roughness improving equipment and a medium. The method comprises the following steps: detecting the roughness of a bare wafer subjected to a wire cutting process in a target wavelength range; when the roughness is larger than or equal to a set roughness threshold value, according to the priority of the cutting process parameters indicated by a fitting function between the multiple cutting process parameters and the roughness in the target wavelength range, the roughness in the target wavelength range is obtained; and selecting the cutting process parameters needing to be adjusted to reduce the roughness of the bare wafer obtained in the subsequent wire cutting process in the target wavelength range.

The utility model discloses a guide bar assembly for drawing multiple cotton yarns. The guide bar assembly comprises a guide frame and a guide structure, a top frame is arranged at the top of the guide frame, and three sets of symmetrical cross rods are arranged on the two sides of the top frame. The guide structure is located at the tops of the three sets of transverse rods and comprises two sets of side plates, a pre-drawing table and a cotton sliver can, the two sets of side plates are arranged at the tops of the transverse rods, a pressing wheel and a yarn guide wheel are arranged between the two sets of side plates, the yarn guide wheel is located below the pressing wheel, and the pre-drawing table is located at one end of the guide frame. Through the structure, a plurality of cotton slivers can sequentially penetrate through the corresponding guide structures, the cotton slivers at different positions can be dispersed and guided to the corresponding positions, and after the cotton slivers penetrate through the corresponding guide holes, the positions of the cotton slivers can be limited in parallel, so that the different cotton slivers can be uniformly dispersed and conveyed before being drawn; and the quality of the drawn cotton threads after entering the drawing frame is improved.

The invention relates to a terahertz transparent electrode based on a nickel tellurium compound and a preparation method and application thereof, and belongs to the technical field of terahertz electrodes. In order to solve the problem that an existing terahertz transparent electrode cannot have high transmittance and good conductivity in the terahertz wave propagation direction at the same time, the invention provides a terahertz transparent electrode based on a nickel-tellurium compound, which comprises a substrate and a nickel-tellurium compound film. The nickel-tellurium compound films with different nickel-tellurium ratios are prepared by setting the target materials with different nickel-tellurium areas, so that the conductivity, transmittance and thickness of the terahertz transparent electrode are adjusted, and the relatively high transmittance and high conductivity of the terahertz wave band of the terahertz transparent electrode are balanced; the transmittance of the obtained terahertz transparent electrode based on the nickel tellurium compound in the terahertz wave band is higher than 80%, the conductivity is larger than 1000 S / cm, and the qualified standard of a transparent conductive film is met. The preparation method is low in requirement and suitable for practical batch production of the terahertz transparent electrode.

The invention discloses membrane electrode catalyst layer slurry, a preparation method thereof and application of the membrane electrode catalyst layer slurry in preparation of a proton exchange membrane fuel cell, and relates to a membrane electrode material. The catalyst layer slurry comprises a resin dispersion liquid and a catalyst pre-dispersion suspension liquid; the resin dispersion liquid comprises alkali metal ions and a perfluorinated sulfonic acid resin film solution, the molar ratio of-SO3H in the alkali metal ions and perfluorinated sulfonic acid resin powder is larger than or equal to 0.05 and smaller than 0.3, and the alkali metal ions are Cs < + > and / or Rb < + >. A small amount of alkali metal ions with large ion radius are added into the catalyst layer slurry, so that self-agglomeration among perfluorosulfonic acid resin molecules is effectively blocked, more catalyst-perfluorosulfonic acid resin interfaces are generated, the particle size of the catalyst slurry is effectively reduced, the content of free perfluorosulfonic acid resin is reduced, and the service life of the catalyst slurry is prolonged. The uniformity of the catalyst slurry is remarkably improved, and on a catalyst layer of the CCM, the roughness is reduced, large particles on the surface are reduced, and the performance of a membrane electrode is improved.

The invention provides a thick photoresist photoetching method for smooth forming of a side wall of a deep mesa structure. The thick photoresist photoetching method comprises the following steps: coating a layer of uniform and compact positive photoresist on the surface of a chip by using spin coating equipment; pre-baking: placing the chip coated with the photoresist in a first temperature environment for baking; placing the pre-baked chip on a sample table of a contact type photoetching machine, placing a mask plate, adjusting WEC to a proper position, and then performing exposure; post-baking: placing the exposed chip in a first temperature environment for baking; developing: preparing a proper developing solution, and placing the post-baked chip in the developing solution to remove the photosensitive part so as to complete the forming of the mesa mask; and carrying out hardening process treatment on the developed chip by adopting a gradient heating mode. According to the invention, the quality of the side wall can be improved, the roughness of the side wall can be reduced, the adhesion quality of the passivation layer can be improved, and the performance of the infrared detector can be improved.

The invention belongs to the technical field of high-pressure hydrogen storage containers in the hydrogen energy storage and transportation equipment industry, and particularly relates to a self-reinforced high-pressure hydrogen storage container with an inner steel cylinder and an outer winding steel wire and a manufacturing method thereof. A self-enhancement high-pressure hydrogen storage container with an inner steel cylinder and an outer winding steel wire comprises a lining steel cylinder, a gas inlet and a gas outlet are formed in the two ends of the lining steel cylinder respectively, an enhancement layer is arranged on the outer side of a cylindrical cylinder in the middle of the lining steel cylinder, and annular anti-skid tables are arranged at the junctions of the arc tops of end openings of the outer walls of the lining steel cylinder at the two ends of the enhancement layer and the cylindrical cylinder respectively. And the reinforcing layer is formed by annularly winding a high-strength steel wire prepreg tape and curing the high-strength steel wire prepreg tape through epoxy resin. By means of the structure of the lining seamless steel cylinder and the winding steel wire reinforcing layer, the pressure bearing capacity of the container is effectively improved, the water volume of the hydrogen storage container of 103 MPa or above for the 70 MPa hydrogen refueling station is further increased, meanwhile, due to the fact that the price of high-strength steel wires is far lower than that of carbon fibers, the product manufacturing cost is reduced, and meanwhile the problem that non-metal wire winding materials are prone to aging is solved.

The energy-saving efficient pellet material drying, preheating and roasting production line comprises a chain grate machine, a rotary kiln and an annular cooler, a kiln head bin of the rotary kiln is connected with one end of an annular cooling bin of the annular cooler in a sealed mode, and an inclined sliding plate is arranged in the kiln head bin; high-temperature pellets in the rotary kiln fall onto the cooling conveying plate chain through the inclined sliding plate, a roundabout fresh air heat exchange channel is arranged in the inclined sliding plate, and fresh air enters the fresh air heat exchange channel through the fresh air guide-in pipe under the power of the fresh air conveying fan and then enters the cooling conveying plate chain through the fresh air guide-in pipe. Fresh air exchanges heat with the high-temperature pellets on the inclined sliding plate in the fresh air heat exchange channel, and after heat exchange, the fresh air is guided into the heat exchange fresh air drying section of the chain grate through the hot air conveying pipe to dry the green pellets. The inclined sliding plate is additionally arranged in the kiln head bin of the rotary kiln, has a material guiding function and can effectively prevent generation of hydrogen chloride gas in the chain grate; and more importantly, the drying efficiency of the chain grate machine is also improved.

The invention relates to a high-formability anodizing 6xxx aluminum alloy plate and a preparation method thereof. The aluminum material is composed of the following components in percentage by mass: 0.2-0.6% of Si; 0.6%-1.1% of Mg; 0.01% to 0.04% of Ti; according to the preparation method disclosed by the invention, by regulating and controlling semi-continuous casting, hot rolling and cold rolling processes, the grain size of the finished aluminum alloy plate is uniform and fine, the average grain size is 20-60 microns, the surface roughness of the plate strip is 0.25-0.45 microns, the glossiness is 350-420 GU, the tensile strength is 70-90 MPa, the yield strength is 30-50 MPa, the elongation is 30-45%, and the hardness HV is 25-45; and after the plate is subjected to subsequent room-temperature stamping forming, the surface quality is excellent, the defects of scratches, orange peels, cracks and the like are avoided, and the technical requirements of high-end products on appearance decoration surfaces are met.

The invention discloses a manganese dioxide grinding liquid, a preparation method and a grinding method. The preparation method comprises the following steps: stirring and dissolving a surfactant in deionized water to obtain a dispersion liquid; manganese dioxide powder and the dispersion liquid are mixed, and manganese dioxide slurry is obtained through high-energy ball milling process treatment; adding a wetting agent and a pH buffering agent into the manganese dioxide slurry; filtering to remove large particles to obtain manganese dioxide slurry with high monodispersity; mixing an oxidizing agent with the manganese dioxide slurry obtained in the previous step, and adjusting the pH value to obtain a manganese dioxide grinding liquid; the manganese dioxide grinding fluid comprises the following components in percentage by weight: 10-20% of manganese dioxide powder, 0.2-5% of an oxidizing agent, 2-5% of a dispersing agent, 0.2-8% of a wetting agent, 0.2-2% of a pH regulator and the balance of deionized water. When the grinding fluid is used for CMP, the processing loss of a SiC substrate is reduced, and the Si surface of the SiC substrate meets the processing requirements of low roughness and no scratch under the condition of high material removal rate.

The invention discloses a roughness optimization method and device, and the method comprises the following steps: providing a mask plate, depositing a protection layer on the mask plate, and enabling the protection layer to cover a light-transmitting region of the mask plate; a shading material with a first preset thickness is deposited on the side wall of a shading layer of the mask plate through atomic layer deposition, so that pits in the side wall of the shading layer are at least partially filled, and the roughness of the side wall of the shading layer is reduced; etching a shading material with a second preset thickness on the side wall of the shading layer of the mask plate through atomic layer etching so as to at least partially remove the bulges on the shading layer and reduce the roughness of the side wall of the shading layer; the roughness of the surface of the shading pattern is detected, and the detected roughness is compared with a preset roughness set value; and when the detected roughness of the surface of the shading pattern reaches a roughness set value, the protection layer is removed. According to the invention, the line edge roughness of the mask plate can be effectively reduced.

The invention belongs to the technical field of semiconductors, and particularly relates to a polishing composition and a preparation method and application thereof. The polishing composition comprises grinding particles, an oxidizing agent, an organic dispersing agent, an inorganic dispersing agent, a pH buffering agent, a pH adjusting agent and water. Wherein the oxidizing agent comprises permanganate, the organic dispersing agent forms an organic coating layer on the surface of the grinding particles, and the inorganic dispersing agent forms an inorganic coating layer on the surface of the organic coating layer. Through the steric hindrance of the organic dispersing agent and the static stable synergistic effect of the inorganic dispersing agent, the grinding particles obtain a good dispersing effect. Meanwhile, the outer surface of the organic coating layer is coated with the inorganic coating layer, so that oxidative damage of a strong oxidant to organic dispersant molecules of the organic coating layer can be prevented, and the dispersion stability and the polishing stability of the polishing composition are improved. Therefore, the polishing composition containing the grinding particles can continuously obtain low-defect and low-roughness surfaces when processing third-generation semiconductor materials.

The invention relates to the field of biological medicines and cosmetics, in particular to a composition which takes tetrapeptide and bisabolol as core components and has anti-inflammatory and anti-aging activity.