Product
Patsnap Eureka
For R&D, Patsnap Eureka makes reading and utilizing patents & technical documents easy.
Patsnap Eureka AIR
Designed for self-driven R&D workflows. Generate viable solutions, solve complex R&D challenges, empower your innovation with AI.
Patsnap Eureka Materials
Designed for material experts only. Revolutionize your material R&D, from search, analyze, to developing new materials.
Feature
TechResearch
Generate reliable direction feasibility study reports for your R&D in just a few steps.
TechSeek
Discover and master advanced knowledge NOW. Basics, ideas, possibilities, all at once.
TechMind
As an expert in R&D Theories, TechMind can generates customized viable solutions instantly.
TechRisk
Analyze your overall solution with one click, know your potential R&D risks in advance.
TechMonitor
Get weekly tech updates, stay abreast of the latest tech innovations and key insights.
Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
706 results about "Actinic Rays" patented technology
Efficacy Topic
Property
Owner
Technical Advancement
Application Domain
Technology Topic
Technology Field Word
Patent Country/Region
Patent Type
Patent Status
Application Year
Inventor
Actinic Rays. The rays of light at the violet end of the spectrum; also the invisible rays beyond such end, or the ether waves of short periods which most strongly induce chemical change.
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
ActiveUS20080187860A1Improve accuracyMolding stabilityPhotosensitive materialsLayered productsActinic RaysPhotochemistry
A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
Owner:FUJIFILM CORP
Positive resist composition and pattern-forming method
ActiveUS20080248425A1Suppress generationPhotosensitive materialsRadiation applicationsPolymer scienceActinic Rays
A positive resist composition comprises: (A) a resin that has a repeating unit represented by general formula (a1) and increases its solubility in an alkali developer by action of an acid; (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation; and (C) a resin that has at least one of a fluorine atom and a silicon atom and has a group selected from the group consisting of (x), (y) and (z); and (D) a solvent:(x) an alkali-soluble group;(y) a group capable that decomposes by action of an alkali developer to undergo an increase in a solubility of the resin (C) in an alkali developer; and(z) a group that decomposes by action of an acid,wherein R represents a hydrogen atom or a methyl group, Rxa represents an alkyl group or a cycloalkyl group, and n represents an integer of 1 to 8.
Owner:FUJIFILM CORP
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
ActiveUS20060008736A1Inhibition formationLess leachingOrganic chemistryRadiation applicationsActinic RaysPositive type
A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
Owner:FUJIFILM HLDG CORP +1
Method of forming patterns
ActiveUS20090042147A1Development defect can be reducedReduced line edge roughnessPhotosensitive materialsPhoto-taking processesActinic RaysChemistry
A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
Owner:FUJIFILM CORP
Positive photosensitive composition
InactiveUS20030077540A1High sensitivityBroad defocus latitudePhotosensitive materialsRadiation applicationsActinic RaysFluence
A positive photosensitive composition comprising (A) a specific acid generator that generates an acid upon irradiation of an actinic ray or radiation, and (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution.
Owner:FUJIFILM CORP +1
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
ActiveUS20080261150A1Improve accuracyMolding stabilityPhotosensitive materialsPhotoprinting processesActinic RaysPhotochemistry
A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
Owner:FUJIFILM CORP
Method of forming patterns
ActiveUS20110020755A1Improve solubilityPhotosensitive materialsPhotomechanical exposure apparatusActinic RaysRadiation exposure
A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
Owner:FUJIFILM CORP
Photosensitive composition and pattern forming method using the same
ActiveUS20050095532A1Increase photosensitivityWide exposure marginRadiation applicationsOriginals for photomechanical treatmentActinic RaysMaterials science
A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same.
Owner:FUJIFILM CORP +1
Positive resist composition and method of pattern formation with the same
ActiveUS20070178405A1Improved in pattern profile patternImproved in pattern pattern fallingPhotosensitive materialsSemiconductor/solid-state device manufacturingActinic RaysCompound (substance)
A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
Owner:FUJIFILM HLDG CORP +1
Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
ActiveUS20100323305A1Improve accuracyMolding stabilityPhotomechanical exposure apparatusMicrolithography exposure apparatusChemistryActinic Rays
A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
Owner:FUJIFILM CORP
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
ActiveUS20060040203A1Less apt to suffer pattern fallingReduce roughnessOrganic chemistryRadiation applicationsActinic RaysRadiation exposure
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
Owner:FUJIFILM HLDG CORP +1
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
ActiveUS8017304B2Molding stabilityReduce roughnessPhotosensitive materialsPhotoprinting processesDispersityActinic Rays
Owner:FUJIFILM CORP
Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
ActiveUS20080081290A1Improve line edge roughnessAvoid it happening againPhotosensitive materialsRadiation applicationsActinic RaysCompound (substance)
A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×104 or less.
Owner:FUJIFILM CORP
Actinic-ray-sensitive or radiation-sensitive resin composition, actinic-ray-sensitive or radiation-sensitive film, and pattern forming method
InactiveUS20120135348A1Pattern in good shapePhotosensitive materialsPhotomechanical exposure apparatusActinic RaysOrganic chemistry
Provided are an actinic-ray-sensitive or radiation-sensitive resin composition which has improved development defect and is capable of forming a good pattern shape, an actinic-ray-sensitive or radiation-sensitive film formed using the composition, and a pattern forming method using the composition.The actinic-ray-sensitive or radiation-sensitive resin composition includes (A) a compound which generates an acid represented by the following general formula (I) or (I′) upon irradiation with an actinic-ray or a radiation, and (B) a resin which decomposes by an action of an acid to increase a solubility of the resin in an alkaline developer [each of the symbols in the general formulae (I) and (I′) indicates the meaning described in Claims].
Owner:FUJIFILM CORP
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
InactiveUS20100040971A1Reduced line edge roughnessGood size uniformityPhotosensitive materialsPhotomechanical exposure apparatusDispersityActinic Rays
A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
Owner:FUJIFILM CORP
Positive photosensitive composition and pattern-forming method using the same
ActiveUS20060204890A1Simple compositionImprove line edge roughnessRadiation applicationsPhotomechanical apparatusActinic RaysSide chain
A positive photosensitive composition comprising: (A) a resin having at least one repeating unit having a specific lactone structure at a side chain and being capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a specific acid upon irradiation with an actinic ray or a radiation, and a pattern-forming method using the positive photosensitive composition, are provided.
Owner:FUJIFILM HLDG CORP +1
Lithographic printing plate precursor and lithographic printing method
ActiveUS20050069811A1Excellent developabilityProlong lifeRadiation applicationsSemiconductor/solid-state device manufacturingActinic RaysImage recording
A lithographic printing plate precursor comprising: a support; an image recording layer comprising (A) an actinic ray absorber, (B) a polymerization initiator, and (C) a polymerizable compound, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution; and an overcoat layer comprising an inorganic laminar compound. And a lithographic printing method comprising: mounting a lithographic printing plate precursor on a printing press; imagewise exposing the lithographic printing plate precursor with laser beams; and feeding at least one of a printing ink and a fountain solution to the lithographic printing plate precursor to remove a laser beams non-exposed area in an image recording layer; and performing printing.
Owner:FUJIFILM CORP
Pattern forming method
ActiveUS20110250543A1Increase exposurePhotomechanical exposure apparatusMicrolithography exposure apparatusActinic RaysRadiation exposure
A pattern forming method, includes: (i) a step of applying a resist composition whose solubility in a positive tone developer increases and solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation, the resist composition containing a resin capable of increasing a polarity by the action of an acid; (ii) an exposure step; (iii) a step of performing development by using a negative tone developer to form a resist pattern; and (iv) a step of causing a crosslinked layer-forming material to act on the resist pattern to crosslink the resin constituting the resist pattern and the crosslinked layer-forming material, thereby forming a crosslinked layer. According to the present invention, a method for forming a pattern having an effectively micro-dimensioned trench or hole pattern without generation of a scum is provided.
Owner:FUJIFILM CORP
Positive resist composition and pattern formation method using the same
InactiveUS20070224540A1Improve performanceHigh sensitivityPhotosensitive materialsRadiation applicationsActinic RaysSulfonium
A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.
Owner:FUJIFILM CORP
Positive photosensitive composition and method of forming resist pattern
ActiveUS20050019690A1High sensitivityImproved profileRadiation applicationsPhotosensitive material auxillary/base layersActinic RaysChemical compound
A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-containing resin having a group that increases a solubility of the resin in an alkaline developer by the action of an acid.
Owner:FUJIFILM HLDG CORP +1
Pattern forming method
ActiveUS7985534B2Increase exposureSemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusActinic RaysFluence
Owner:FUJIFILM CORP
Method of forming patterns
ActiveUS20080318171A1Enhanced in-plane uniformity of line widthReduced line edge roughnessPhotosensitive materialsPhoto-taking processesActinic RaysRadiation exposure
A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.
Owner:FUJIFILM CORP
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method
ActiveUS20100040972A1Reduced line edge roughnessGood size uniformityPhotosensitive materialsPhotoprinting processesDispersityActinic Rays
A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
Owner:FUJIFILM CORP
Ink composition for inkjet-recording and method for inkjet-recording
InactiveUS20080131618A1Improving desired propertyStable ink-ejecting propertyInksCoatingsPliabilityIrradiation
An ink composition for inkjet-recording, which shows a high sensitivity to irradiation with actinic radiation and is able to form an image with superior curability, permitting the image formed after curing to have sufficient adhesiveness to a recording medium, as well as to have excellent flexibility in the formed image portion, and an inkjet-recording method using the same is provided:wherein the ink composition for inkjet-recording comprises (A) a compound having a polymerizable unsaturated bond and a cyclic amine structure in the molecule, (B) a compound having a polymerizable unsaturated bond and an alicyclic structure in the molecule, and (C) a radical polymerization initiator.
Owner:FUJIFILM CORP
Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method
ActiveUS20110229832A1Improve accuracyEasy to integrateOrganic compound preparationSurface-active detergent compositionsActinic RaysOrganic solvent
A pattern forming method, includes: (i) a step of forming a resist film from a resist composition for organic solvent-based development, the resist composition containing (A) a resin capable of increasing a polarity by an action of an acid to decrease a solubility in an organic solvent-containing developer and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) an exposure step; (iii) a development step using an organic solvent-containing developer; and (iv) a washing step using a rinsing solution, wherein in the step (iv), a rinsing solution containing at least either the solvent S1 or S2 as defined in the specification is used.
Owner:FUJIFILM CORP
Actinic ray curable ink-jet ink composition, image formation method employing the same, and ink-jet recording apparatus
ActiveUS20050113483A1Stable formImprove accuracyLiquid surface applicatorsOrganic chemistryBenzeneCompound a
Disclosed is an actinic ray curable ink-jet ink composition containing a photopolymerizable compound, a sulfonium salt (compound A) as a photoinitiator, which does not release benzene on actinic ray exposure, and a compound (compound B) as a sensitizing agent selected from the group consisting of (i) a polycyclic aromatic compound having a hydroxyl group, a substituted or unsubstituted aralkyloxy group or a substituted or unsubstituted alkoxy group, (ii) a carbazole derivative, and (iii) a thioxanthone derivative.
Owner:KONICA MINOLTA MEDICAL & GRAPHICS INC
Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
ActiveUS20070134588A1FollowabilityGood followabilityOrganic chemistryPhotosensitive materialsActinic RaysCompound (substance)
A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.
Owner:FUJIFILM CORP
Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film
ActiveUS20150309408A1Excels in resolutionPhotosensitive materialsSemiconductor/solid-state device manufacturingActinic RaysChemical compound
Owner:FUJIFILM CORP
Resist composition for negative tone development and pattern forming method using the same
InactiveUS7851140B2Enhance the imageImprove in-plane uniformityPhotosensitive materialsRadiation applicationsIn planeActinic Rays
Owner:FUJIFILM CORP
Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays
ActiveUS20110300485A1Improve performanceHigh sensitivityElectric discharge tubesSemiconductor/solid-state device manufacturingActinic RaysOrganic solvent
Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
Owner:FUJIFILM CORP
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Patsnap Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com