7 results about "Actinic Rays" patented technology

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing an onium salt compound (I) that includes an organic anion and a cation having a specific structure, an onium salt compound (II) that includes an onium cation and an anion having a specific structure, an acid-decomposable resin, and a solvent; and a resist film, a pattern formation method, and an electronic device manufacturing method that use the actinic ray-sensitive or radiation-sensitive resin composition.

Provided is a method for producing a radiation-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more, the method including: Step 1, in which at least a resin whose polarity is increased by the action of an acid, a photoacid generator, and a solvent are fed as raw materials into a stirring tank; and Step 2, in which the raw materials are stirred in the stirring tank.

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin which provides increased polarity by action of an acid, an onium salt (A) including a sulfonate anion and not including a fluorine atom, and an onium salt (B) including a specified structure and not including a fluorine atom, a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for producing an electronic device.

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin that is subjected to action of an acid to undergo an increase in polarity, an onium salt (B) represented by a formula (1) described in the Specification, and a resin (C) satisfying specified conditions, a resist film, a pattern forming method, and a method for producing an electronic device that use the actinic ray-sensitive or radiation-sensitive resin composition.

An actinic ray-sensitive or radiation-sensitive resin composition has an excellent resolution and is capable of forming a pattern having suppressed defects. A resist film, a pattern forming method, and a method for manufacturing an electronic device employing the actinic ray- or radiation-sensitive resin composition are provided. The actinic ray- or radiation-sensitive resin composition includes a resin whose polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin whose polarity increases through decomposition by an action of an acid includes one or more selected from repeating units represented by Formulae (1) to (5), and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more of a compound (I) or a compound (II).

An environmentally friendly pigment dispersant composition having a significantly reduced content of a volatile component despite of including a pigment dispersant that contains a constituent unit derived from a vinyl-based monomer, is provided. The composition can provide a pigment dispersion and an ink having excellent pigment dispersability. This pigment dispersant composition contains a polyglycol component and a polymer component having a constituent unit (1) derived from a macromonomer represented by formula (1), and a constituent unit (2) derived from a functional group-containing vinyl-based monomer, where the polyglycol component is a polyalkylene glycol or the like and has a content of an organic compound having a boiling point of 250° C. or lower of 1% by mass or less:

A first object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that provides a narrow space width at which bridge defects start to occur when an L / S pattern is formed. A second object of the present invention is to provide a resist film, a pattern forming method, and a method for producing an electronic device that are related to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin having a group that is decomposed by an action of an acid to generate a polar group, a photoacid generator, and a boron-containing compound and satisfies a requirement 1. Requirement 1: A value A determined by an equation (1) is 0.120 or more.