184 results about "Actinic Rays" patented technology

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a solubility in an alkali developer that increases through decomposition by an action of an acid and (B) a compound that generates an acid upon irradiation with actinic rays or radiation and is represented by a specific structure; an actinic ray-sensitive or radiation-sensitive film using the composition; a pattern forming method; a method for manufacturing an electronic device; and a compound.

According to an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (C) represented by a formula (Q1) below and an acid-decomposable resin (A),in the formula (Q1), Ar1 represents an aromatic group, W1 represents an organic group, X1 represents a linking group including at least one selected from the group consisting of —O—, —S—, —C(═O)—, —S(═O)—, and —S(═O)2—, Y1 represents an electron-withdrawing group, Z1 represents a halogen atom, M+ represents a cation, each of k1 and k2 represents an integer of 1 or more, and the group represented by —X1—W1— does not include *1—O—C(═O)—*2, *1 and *2 represent bonding sites, and *1 is a bonding site to Ar1, formation of a pattern excellent in CDU in ultrafine pattern formation even after a lapse of time from the preparation is enabled.

A method for forming a pattern including: a step for forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin having a dispersion degree of less than 1.20, a compound generating an acid by irradiation with an actinic ray or radiation, and a solvent; a step for exposing the film; and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having 9 to 12 carbon atoms. Also provided are the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device including the pattern forming method.

An object of the present invention is to provide a treatment liquid for patterning a resist film and a pattern forming method, each of which can simultaneously suppress the occurrence of pattern collapse in a resist L / S pattern and the occurrence of omission failure in a resist C / H pattern.The treatment liquid of the present invention is a treatment liquid for patterning a resist film, which is used for subjecting a resist film obtained from an actinic ray-sensitive or radiation-sensitive resin composition to at least one of development or washing, and contains an organic solvent, in which the treatment liquid contains a first organic solvent having an SP value of 16.3 MPa1 / 2 or less and a second organic solvent having an SP value of 17.1 MPa1 / 2 or more.

To provide a pattern forming method capable of obtaining a pattern excellent in in-plane uniformity of line width.SOLUTION: A pattern forming method including (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) that decomposes by the action of an acid to increase polarity and a compound (B) that generates an acid upon irradiation with actinic rays or radiation, (2) a step of exposing the film, and (3) a step of subjecting the exposed film to at least one of development or rinsing with an organic treatment liquid containing butyl acetate and a hydrocarbon having 11 or more carbon atoms, in which a content of the hydrocarbon having 11 or more carbon atoms in the organic treatment liquid is 1% by mass or more and 35% by mass or less.SELECTED DRAWING: None

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin (A) that includes a repeating unit having a group that is decomposed by the action of an acid and in which polarity is increased, and a compound (B) that has a specific structure; an actinic ray-sensitive or radiation-sensitive film that uses the actinic ray-sensitive or radiation-sensitive composition; a pattern formation method; and a method for manufacturing an electronic device.

The present invention aims to provide an actinic ray- or radiation-sensitive resin composition capable of forming a pattern with excellent LWR performance even after long-term storage. Furthermore, the present invention aims to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device using the actinic ray- or radiation-sensitive resin composition. The actinic ray- or radiation-sensitive resin composition of the present invention comprises a resin that decomposes to increase its polarity by the action of an acid and a compound that generates an acid upon irradiation with actinic rays or radiation, wherein the compound that generates an acid upon irradiation with actinic rays or radiation comprises one or more compounds selected from compounds (I) and (III).

To provide an active energy radiation-hardenable inkjet ink which has excellent internal curability of the ink and which can be suppressed in yellowing during image formation, and to provide an image forming method.SOLUTION: Active energy radiation-hardenable inkjet ink is provided, containing a polymerizable compound, a polymerization initiator, and a gelling agent. The active energy radiation-hardenable inkjet ink includes at least one trifunctional monomer as the polymerizable compound, the content of the trifunctional monomer is more than 20 mass% relative to the active energy radiation-hardenable inkjet ink, and the active energy radiation-hardenable inkjet ink includes at least a thioxanthone-modified acrylate as the polymerization initiator.SELECTED DRAWING: Figure 1

A first object of the invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can maintain the ability to form a pattern having a good shape profile even after long-term storage. A second object of the invention is to provide a resist film, a pattern forming method, and an electronic device production method that use the actinic ray-sensitive or radiation-sensitive resin composition described above.The actinic ray-sensitive or radiation-sensitive resin composition of the invention includes an onium salt represented by formula (1), an acid-decomposable resin, and a solvent.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can obtain a pattern with excellent LWR performance even under long-term storage. In addition, a resist film, a pattern forming method and a method for manufacturing an electronic device related to the above-mentioned actinic ray-sensitive or radiation-sensitive resin composition are provided. The actinic ray-sensitive or radiation-sensitive resin composition comprises a compound represented by the general formula (I) and an acid-decomposable resin. M1 + A ‑ ‑L‑B ‑ M2 + (I)

Provided are: an actinic ray–sensitive or radiation-sensitive resin composition containing a resin (A) having an acid-decomposable group and a salt compound (B) that generates a Lewis acid capable of decomposing the acid-decomposable group when irradiated with actinic rays or radiation; a resist film using the actinic ray–sensitive or radiation-sensitive resin composition; a pattern-forming method; and an electronic device manufacturing method comprising the pattern-forming method.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

The present invention provides a photosensitive radiation-curable or radiation-sensitive resin composition, a photosensitive radiation-curable or radiation-sensitive film using the above photosensitive radiation-curable or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device. In the photosensitive radiation-curable or radiation-sensitive resin composition, there are contained (A) an acid-decomposable resin, (B) a compound represented by the general formula (b1), and (C) a compound represented by the general formula (c1), and the proportion of the content of the compound (C) relative to the content of the compound (B) is 0.01% by mass or more and 10% by mass or less. L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxyl group, or a carboxyl group. Among them, at least one B represents a hydroxyl group or a carboxyl group. n represents an integer of 1 to 5. X represents an (n + 1)-valent linking group. M + represents a sulfonium ion or an iodonium ion.

The present disclosure provides a method for curing vinyl ester resin, which comprises: (a) providing a first composition comprising a vinyl ester monomer; (b) adding a photosensitizer and a peroxide as a co-initiator to the first composition to form a second composition; and (c) irradiating the second composition with an actinic ray to cure the second composition.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin, a photoacid generator, and acid diffusion control agents, wherein at least one of the acid diffusion control agents contains a compound having a specific structure. Also provided are an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern formation method, and a method for manufacturing an electronic device.

Provided is a pattern forming method including: a step for forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) and a solvent (D), the resin (A) containing a repeating unit represented by any one of general formulae (P1) to (P3) described in the specification, the polarity of the resin (A) increasing due to the action of an acid; a step for exposing the film to light; and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having 9 to 12 carbon atoms. Also provided are the actinic ray-sensitive or radiation-sensitive resin composition and an electronic device manufacturing method including the pattern forming method.

The present invention addresses the problem of providing an actinic-ray-curable ink composition for inkjet printing which has high adhesiveness to adherends and high stretchability, the ink composition being capable of forming ink films that are odorless and are less apt to be tacky. The ink composition for inkjet printing comprises a polymerizable component (A) represented by structural formula (X), a monofunctional polymerizable component (B) comprising a (meth)acrylamide compound and / or an N-vinyl compound, and a polyfunctional polymerizable component (C) comprising an amine-modified oligomer and a polyfunctional (meth)acrylate monomer having a molecular weight of 500 or less, wherein the weight ratio of the polymerizable component (A) content to the monofunctional polymerizable component (B) content, (A) / (B), is in the range of 0.2-2.0 and the proportion of the polyfunctional polymerizable component (C) to the sum of all the polymerizable components is less than 18 mass%.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin, a photo-acid generator, and an acid diffusion control agent, wherein at least one of the photo-acid generator and the acid diffusion control agent has a group including a specific structure; an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method; and an electronic device manufacturing method.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

A first problem to be addressed by the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having little dependence on heating temperature after exposure and before development. A second problem to be addressed by the present invention is to provide a resist film, a pattern formation method, and an electronic device production method, which relate to the actinic ray-sensitive or radiation-sensitive resin composition.　An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention contains a resin, a photo-acid-generating agent, and an acid diffusion control agent, wherein at least one of the photo-acid-generating agent and the acid diffusion control agent is a compound represented by formula (1).

This actinic ray-sensitive or radiation-sensitive resin composition comprises: a resin (A) including a repeating unit having a phenolic hydroxyl group and a repeating unit having an acid-decomposable group, wherein the content of the repeating unit having a phenolic hydroxyl group is 30 mol% or more relative to the total repeating units in the resin; and a compound (B) having a specific structure. Further provided are an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern formation method, and a method for manufacturing an electronic device.

Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin including a specific repeating unit represented by formula (1) and a specific repeating unit represented by formula (2), at least one of the repeating unit represented by formula (1) or the repeating unit represented by formula (2) having a group derived from at least one metal compound selected from the group consisting of a metal complex, an organometallic salt, an inorganic metal compound, and an organometallic compound, a resist film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method that uses the actinic ray-sensitive or radiation-sensitive resin composition, and a method for producing an electronic device.

The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent resolution can be formed; a resist film; a pattern forming method; and a method for producing an electronic device. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention comprises a resin having a repeating unit A1 represented by general formula (I) and a repeating unit A2 represented by general formula (II).

An actinic ray-sensitive or radiation-sensitive resin composition including: a resin (A) including a repeating unit (i) of a formula (N-0) below, a repeating unit (ii) having a cyano group and a lactone structure, and a repeating unit (iii) having a phenolic hydroxy group, wherein a content of a repeating unit having an acid-decomposable group in the resin (A) relative to all repeating units in the resin (A) is 35 mol % or more,in the formula (N-0), each of XN1, RN1 to RN3, RN4 and RN5 represent a specific atom or a specific group; k represents 0 or 1; RN4 and RN5, as well as any two among RN1 to RN3 may be bonded together to form a ring; when multiple RN1 to RN4 are present, RN1 to RN4 may be individually the same or different; and each of t1 and t2 represents a specific integer.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition that can obtain a pattern with excellent LWR performance. In addition, a resist film, a pattern forming method, and a method for manufacturing an electronic device related to the above-mentioned actinic ray-sensitive or radiation-sensitive resin composition are provided. The actinic ray-sensitive or radiation-sensitive resin composition comprises: a photoacid generator A, which generates an acid represented by general formula (I) and having a pKa of 1.00 or more; a photoacid generator B selected from the group consisting of an acid having a pKa greater than 1.00 or more than the acid generated by the photoacid generator A, and a nitrogen-containing compound C having a pKa greater than 1.00 or more than the acid generated by the photoacid generator A; and an acid-decomposable resin, in the case of a photoacid generator D that generates an acid having a pKa less than 1.00, the ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D is 1.0 or more.

To provide an actinic ray-sensitive or radiation-sensitive resin composition that is capable of giving a pattern having excellent LWR performance even if the composition has been stored for a long period of time, and to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each employing the actinic ray-sensitive or radiation-sensitive resin composition.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition includes one or more specific compounds selected from the group consisting of a compound represented by general formula (1), a compound represented by general formula (2), and a compound represented by general formula (3), and an acid-decomposable resin.SELECTED DRAWING: None

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) including a repeating unit represented by general formula (1) or general formula (2) set forth in the description, and a repeating unit represented by general formula (3) set forth in the description and having no silicon atom, and a resin (A) different from the resin (P) and having a polarity that increases due to the action of an acid; an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method; and an electronic device manufacturing method.

Provided are: a pattern forming method comprising a step for forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a photoacid generator, a solvent, and a resin (A) which includes a repeating unit (a) having an iodine atom and a repeating unit (b) having a specific structure and which has a polarity that increases under the action of an acid, a step for exposing the film to light, and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having from 9 to 12 carbon atoms; the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device that includes the pattern forming method.

Provided are: an actinic-ray-sensitive or radiation-sensitive resin composition containing 20% by mass or more, based on total solid content, of a resin (A) that includes repeating units having a specific structure; an actinic-ray-sensitive or radiation-sensitive film in which the aforementioned actinic-ray-sensitive or radiation-sensitive resin composition is used; a pattern formation method; and an electronic device manufacturing method.