87 results about "Actinic Rays" patented technology

A method for forming a pattern including: a step for forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin having a dispersion degree of less than 1.20, a compound generating an acid by irradiation with an actinic ray or radiation, and a solvent; a step for exposing the film; and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having 9 to 12 carbon atoms. Also provided are the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device including the pattern forming method.

To provide a pattern forming method capable of obtaining a pattern excellent in in-plane uniformity of line width.SOLUTION: A pattern forming method including (1) a step of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) that decomposes by the action of an acid to increase polarity and a compound (B) that generates an acid upon irradiation with actinic rays or radiation, (2) a step of exposing the film, and (3) a step of subjecting the exposed film to at least one of development or rinsing with an organic treatment liquid containing butyl acetate and a hydrocarbon having 11 or more carbon atoms, in which a content of the hydrocarbon having 11 or more carbon atoms in the organic treatment liquid is 1% by mass or more and 35% by mass or less.SELECTED DRAWING: None

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition that contains a resin (A) that includes a repeating unit having a group that is decomposed by the action of an acid and in which polarity is increased, and a compound (B) that has a specific structure; an actinic ray-sensitive or radiation-sensitive film that uses the actinic ray-sensitive or radiation-sensitive composition; a pattern formation method; and a method for manufacturing an electronic device.

To provide an active energy radiation-hardenable inkjet ink which has excellent internal curability of the ink and which can be suppressed in yellowing during image formation, and to provide an image forming method.SOLUTION: Active energy radiation-hardenable inkjet ink is provided, containing a polymerizable compound, a polymerization initiator, and a gelling agent. The active energy radiation-hardenable inkjet ink includes at least one trifunctional monomer as the polymerizable compound, the content of the trifunctional monomer is more than 20 mass% relative to the active energy radiation-hardenable inkjet ink, and the active energy radiation-hardenable inkjet ink includes at least a thioxanthone-modified acrylate as the polymerization initiator.SELECTED DRAWING: Figure 1

A first object of the invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can maintain the ability to form a pattern having a good shape profile even after long-term storage. A second object of the invention is to provide a resist film, a pattern forming method, and an electronic device production method that use the actinic ray-sensitive or radiation-sensitive resin composition described above.The actinic ray-sensitive or radiation-sensitive resin composition of the invention includes an onium salt represented by formula (1), an acid-decomposable resin, and a solvent.

Provided are: an actinic ray–sensitive or radiation-sensitive resin composition containing a resin (A) having an acid-decomposable group and a salt compound (B) that generates a Lewis acid capable of decomposing the acid-decomposable group when irradiated with actinic rays or radiation; a resist film using the actinic ray–sensitive or radiation-sensitive resin composition; a pattern-forming method; and an electronic device manufacturing method comprising the pattern-forming method.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin, a photoacid generator, and acid diffusion control agents, wherein at least one of the acid diffusion control agents contains a compound having a specific structure. Also provided are an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern formation method, and a method for manufacturing an electronic device.

Provided is a pattern forming method including: a step for forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) and a solvent (D), the resin (A) containing a repeating unit represented by any one of general formulae (P1) to (P3) described in the specification, the polarity of the resin (A) increasing due to the action of an acid; a step for exposing the film to light; and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having 9 to 12 carbon atoms. Also provided are the actinic ray-sensitive or radiation-sensitive resin composition and an electronic device manufacturing method including the pattern forming method.

The present invention addresses the problem of providing an actinic-ray-curable ink composition for inkjet printing which has high adhesiveness to adherends and high stretchability, the ink composition being capable of forming ink films that are odorless and are less apt to be tacky. The ink composition for inkjet printing comprises a polymerizable component (A) represented by structural formula (X), a monofunctional polymerizable component (B) comprising a (meth)acrylamide compound and / or an N-vinyl compound, and a polyfunctional polymerizable component (C) comprising an amine-modified oligomer and a polyfunctional (meth)acrylate monomer having a molecular weight of 500 or less, wherein the weight ratio of the polymerizable component (A) content to the monofunctional polymerizable component (B) content, (A) / (B), is in the range of 0.2-2.0 and the proportion of the polyfunctional polymerizable component (C) to the sum of all the polymerizable components is less than 18 mass%.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin in which the polarity increases by the action of an acid, and an onium salt having a specific structure; a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

A first problem to be addressed by the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having little dependence on heating temperature after exposure and before development. A second problem to be addressed by the present invention is to provide a resist film, a pattern formation method, and an electronic device production method, which relate to the actinic ray-sensitive or radiation-sensitive resin composition.　An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention contains a resin, a photo-acid-generating agent, and an acid diffusion control agent, wherein at least one of the photo-acid-generating agent and the acid diffusion control agent is a compound represented by formula (1).

The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition with which a pattern having excellent resolution can be formed; a resist film; a pattern forming method; and a method for producing an electronic device. An actinic ray-sensitive or radiation-sensitive resin composition according to the present invention comprises a resin having a repeating unit A1 represented by general formula (I) and a repeating unit A2 represented by general formula (II).

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) including a repeating unit represented by general formula (1) or general formula (2) set forth in the description, and a repeating unit represented by general formula (3) set forth in the description and having no silicon atom, and a resin (A) different from the resin (P) and having a polarity that increases due to the action of an acid; an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method; and an electronic device manufacturing method.

Provided are: a pattern forming method comprising a step for forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a photoacid generator, a solvent, and a resin (A) which includes a repeating unit (a) having an iodine atom and a repeating unit (b) having a specific structure and which has a polarity that increases under the action of an acid, a step for exposing the film to light, and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having from 9 to 12 carbon atoms; the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device that includes the pattern forming method.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit having a silicon atom, and a repeating unit having a group that decomposes due to the action of an alkali developing solution and increases in solubility in the alkali developing solution, and having a weight average molecular weight of 8000 or more, and a resin (A) that is different from the resin (P) and increases in polarity due to the action of an acid; an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method using the actinic ray-sensitive or radiation-sensitive resin composition; and an electronic device manufacturing method.

An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) and a resin (B) which include a repeating unit having an acid-decomposable group, and the acid-decomposable group in the resin (A) and the acid-decomposable group in the resin (B) have the same structures. Regarding the resin (A) and the resin (B), |GA−GB| is from 5% by mole to 20% by mole, SA / SB is 10 / 90 to 90 / 10, |MwA−MwB| is from 100 to 5,000, and |MwA / MnA−MwB / MnB| is 0.05 or more.

Provided are: a method for producing a resin, the method having (i) a step for polymerizing raw material monomers including specific monomers described in the description, in the presence of a nitroxide radical or a dithioester-based compound, wherein in step (i), a reaction solution containing a solvent, an initiator at a quantity of 80 mass% or more of the total initiator amount and a nitroxide radical or a dithioester-based compound at a quantity of 90 mass% or more of the total nitroxide radical or dithioester-based compound amount is charged in a reaction vessel, and at least some of the raw material monomers are added dropwise to the reaction solution at a temperature that is not lower than the decomposition temperature of the initiator; a method for producing an active light ray-sensitive or radiation-sensitive resin composition, which includes the method for producing a resin; an active light ray-sensitive or radiation-sensitive resin composition; an active light ray-sensitive or radiation-sensitive resin film obtained using the active light ray-sensitive or radiation-sensitive resin composition; a pattern formation method; and a method for manufacturing an electronic device.

An actinic ray-sensitive or radiation-sensitive resin composition containing a resin which provides increased polarity by action of an acid, an onium salt (A) including a sulfonate anion and not including a fluorine atom and a specified structure, and an onium salt (B) including the specified structure and not including a fluorine atom, a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for producing an electronic device.

The present invention provides a treatment liquid which is excellent in resolution, excellent in film thickness reduction inhibition, and excellent in residue inhibition when used for at least one of development and cleaning of a resist film. Also, a pattern forming method relating to the above treatment liquid is provided. The treatment liquid of the present invention is a treatment liquid for at least one of development and cleaning of a resist film obtained from a photosensitive radiation or a radiation-sensitive composition, and containing an organic solvent, the treatment liquid containing a first organic solvent satisfying a prescribed condition, and a second organic solvent satisfying a prescribed condition.

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing an onium salt compound (I) that includes an organic anion and a cation having a specific structure, an onium salt compound (II) that includes an onium cation and an anion having a specific structure, an acid-decomposable resin, and a solvent; and a resist film, a pattern formation method, and an electronic device manufacturing method that use the actinic ray-sensitive or radiation-sensitive resin composition.

An actinic ray- or radiation-sensitive resin composition forms a pattern having excellent LWR performance. A resist film, pattern forming method, and method for manufacturing an electronic device employ the composition. The composition includes an acid-decomposable resin including a repeating unit having an acid-decomposable group in which an acid group having a pKa of 13 or less is protected by an acid labile leaving group, and one or more compounds (PAGs) that generate an acid upon irradiation with actinic rays or radiation, selected from a compound (I) and a compound (II). The content of the acid-decomposable resin is 10% by mass or more and that of the PAGs is 10% by mass or more with respect to the total solids content. The acid-decomposable resin has a halogen atom in a repeating unit other than a repeating unit having a group that generates an acid upon irradiation with actinic rays or radiation.

There are provided an actinic ray-sensitive or radiation-sensitive resin composition, a resist film using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern formation method, and an electronic device production method, the actinic ray-sensitive or radiation-sensitive resin composition comprising: a resin (A) having an acid-labile group and containing repeating units derived from a compound represented by general formula (1-1) or general formula (1-2) described in the specification, and repeating units derived from a compound represented by general formula (2) described in the specification; and a compound (B) that generates an acid upon exposure to actinic rays or radiation.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.

An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General Formula (c1), in which a ratio of a content of the compound (C) to a content of the compound (B) is from 0.01% by mass to 10% by mass. In the formulae, L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxy group, or a carboxy group. It should be noted that at least one B represents the hydroxy group or the carboxy group. n represents an integer from 1 to 5. X represents an (n+1)-valent linking group. M+ represents a sulfonium ion or an iodonium ion.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) that has an acid-decomposable group and includes a repeating unit derived from a compound having a styrene skeleton in which the positive charge area of radical cation bodies is less than 150 Å2; an onium salt compound (B) that includes an anion and a cation having at least one fluorine atom, and that generates an acid when being irradiated with actinic rays or radiation; and a boron-containing compound (C).

Provided are: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P), which does not include a fluorine atom and has a group that is decomposed by the action of an acid to generate an alcoholic hydroxyl group, and a resin (A), which differs from the resin (P) and the polarity of which is increased by the action of an acid; an actinic ray-sensitive or radiation-sensitive film using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern formation method; and an electronic device production method.

Provided is a method for producing a radiation-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more, the method including: Step 1, in which at least a resin whose polarity is increased by the action of an acid, a photoacid generator, and a solvent are fed as raw materials into a stirring tank; and Step 2, in which the raw materials are stirred in the stirring tank.

A pattern forming method including a pre-wetting step of coating a substrate with a chemical liquid so as to obtain a pre-wetted substrate; a resist film forming step of forming a resist film on the pre-wetted substrate by using an actinic ray-sensitive or radiation-sensitive resin composition; an exposure step of exposing the resist film; and a development step of developing the exposed resist film by using a developer, wherein the chemical liquid of the present invention contains a mixture of two or more kinds of designated organic solvents, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains a resin including at least one kind of repeating unit selected from the group consisting of a repeating unit represented by Formula (a), a repeating unit represented by Formula (b), a repeating unit represented by Formula (c), a repeating unit represented by Formula (d), and a repeating unit represented by Formula (e).