6623 results about "Repeat unit" patented technology

Disclosed herein is an article that includes a first plurality of spaced features. The spaced features are arranged in a plurality of groupings; the groupings of features include repeat units; the spaced features within a grouping are spaced apart at an average distance of about 1 nanometer to about 500 micrometers; each feature having a surface that is substantially parallel to a surface on a neighboring feature; each feature being separated from its neighboring feature; the groupings of features being arranged with respect to one another so as to define a tortuous pathway. The plurality of spaced features provide the article with an engineered roughness index of about 5 to about 20.

A composition includes at least one kind polymer, each of which includes a repeating unit(s) derived from at least one compound selected from the group consisting of compounds represented by the following formulas (I) to (IV):

R₄Si  (I)

R₃Si—(X—SiR₂)_m—X—Si—R₃  (II)

*—(X—SiR₂)_n—*  (III)

m.RSi(O_0.5)₃  (IV)

wherein the symbols in the formulas are defined in the specification.

A positive resist composition comprises: (A) a resin that has a repeating unit represented by general formula (a1) and increases its solubility in an alkali developer by action of an acid; (B) a compound which generates an acid upon irradiation with an actinic ray or a radiation; and (C) a resin that has at least one of a fluorine atom and a silicon atom and has a group selected from the group consisting of (x), (y) and (z); and (D) a solvent:

• • (x) an alkali-soluble group;
  • (y) a group capable that decomposes by action of an alkali developer to undergo an increase in a solubility of the resin (C) in an alkali developer; and
  • (z) a group that decomposes by action of an acid,

wherein R represents a hydrogen atom or a methyl group, Rxa represents an alkyl group or a cycloalkyl group, and n represents an integer of 1 to 8.

An organic polymeric phosphorescent compound that is stable and emits very highly efficient phosphorescence, used as a material of an organic light-emitting device is provided. Also, an organic light-emitting device employing the organic polymeric phosphorescent compound's provided. The phosphorescent compound according to the present invention is a neutral organic polymeric phosphorescent compound emitting phosphorescence and used in an organic light-emitting device, characterized in that a phosphorescent unit being a repeat unit for emitting phosphorescence and a carrier transporting unit being a repeat unit for transporting a carrier are included.

A color display device for displaying an n-primary color image wherein n is greater than three, the device including an array of sub-pixel (801) configured to have at least one repeating unit having one sub-pixel representing each of the n primary colors, wherein repeating unit (906) is configured to optimize at least one of the n-primary color image.

The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

A resist composition comprises a polymer comprising recurring units having formula (1) wherein R¹, R⁴, R⁷, and R¹⁴ are H or methyl, R², R³, R¹⁵, and R¹⁶ are H, alkyl or fluoroalkyl, R is F or H, R⁵ is alkylene, R⁶ is fluorinated alkyl, R⁸ is a single bond or alkylene, R¹⁰ and R¹¹ are H, F, methyl or trifluoromethyl, R¹² and R¹³ are a single bond, —O— or —CR¹⁸R¹⁹—, R⁹, R¹⁸, and R¹⁹ are H, F, methyl or trifluoromethyl, R¹⁷ is alkylene, X¹, X² and X³ are —C(═O)—O—, —O—, or —C(═O)—R²⁰—C(═O)—O— wherein R²⁰ is alkylene, 0≦(a-1)<1, 0≦(a-2)<1, 0≦(a-3)<1, 0<(a-1)+(a-2)+(a-3)<1, 0<b<1, and 0<(a-1)+(a-2)+(a-3)+b≦1.

There is disclosed a resist composition that remarkably improves the resolution of photolithography using a high energy beam such as ArF excimer laser light as a light source, and exhibits excellent resistance to surface roughness and side lobe under use of a halftone phase shift mask; and a patterning process using the resist composition. The positive resist composition at least comprises (A) a resin component comprising a repeating unit represented by the following general formula (1); (B) a photoacid generator generating sulfonic acid represented by the following general formula (2) upon exposure to a high energy beam; and (C) an onium salt where a cation is sulfonium represented by the following general formula (3), or ammonium represented by the following general formula (4); and an anion is represented by any one of the following general formulae (5) to (7).

A first electrophoretic medium comprises an electrically charged particle suspended in a suspending fluid, the particle having a polymeric shell having repeating units derived from at least one monomer the homopolymer of which is incompatible with the suspending fluid. A second, similar electrophoretic medium comprises a suspending fluid, and first and second types of electrically charged particle suspended in the suspending fluid, the two types of particle having differing optical characteristics but both having polymeric shells. The polymeric shells are arranged such that homoaggregation of the two types of particles is thermodynamically favored over heteroaggregation.

A method for making an article comprising a core material and a coating thereon, the method comprising the steps of:

(a) providing the core material;

(b) applying one or more layers of a crosslinkable polycationic material, wherein the polycationic material is a reaction product of:

(i) an epoxide of formula (I)

wherein X equals bromo, chloro, iodo, or cyano, and R¹, R², R³, R⁴, independently of one another, are selected from the group consisting of hydrogen, linear or branched C₁-C₆-alkyl, and linear or branched C₁-C₆-alkyl which is substituted with halogen, and

(ii) a polymer having repeating units comprising one or more secondary or tertiary amine group(s);

(c) applying one or more layers of a polyanionic material; and

(d) cross-linking the layers of polyelectrolytes formed by steps (b) and (c).

The articles obtainable by the method of the invention have desirable characteristics regarding adherence to the core material, durability, hydrophilicity, and wettability and are thus useful for the manufacture of medical articles such as ophthalmic devices.

Multilayer thin film reflectors, such as mirrors and reflective polarizers, are described in which form birefringent optical layers are incorporated into a plurality of optical repeat units in the film. The form birefringent layers exhibit birefringence as a result of microscopic structures that have a dimension that is small compared to the wavelength of light but large compared to molecular distances. The optical layers within the optical repeat units have out-of-plane indices of refraction that are tailored to produce desired effects as a function of incidence angle for p-polarized light. The multilayer reflectors can be made by conventional vacuum deposition techniques using known inorganic optical materials, but can also be made entirely with polymeric materials by co-extrusion or other processes.

A method of treating a subterranean formation penetrated by a well bore including:

• • (a) preparing a fracturing fluid containing a mixture resulting from:
    • (I) providing a water-in-oil emulsion composition that includes:
      • (i) 5% to 99% by weight of a water-in-oil emulsion polymer comprising a polymer or copolymer containing repeat units from an acrylamide monomer;
      • (ii) 0.5% to 90% by weight of a carrier solvent; and
      • (iii) 0 to 90% by weight of a fluidizing agent; and adding
      • (iv) 0.1% to 10% by weight of one or more inorganic microparticles, where the total of all components is 100% by weight; and
    • (II) adding the water-in-oil emulsion composition to water; and
  • (b) contacting the subterranean formation with the fracturing fluid.

A conjugated polymer has a repeated unit having the structure of formula (I)

wherein A1, A2, R1 and R2 are independently selected from the group consisting of a proton, an alkyl group comprising up to 18 carbon atoms, an alkoxy group comprising up to 18 carbon atoms, cyano, nitro, aryls and substituted aryls, and wherein Ar is selected from the group consisting of ethenylene, ethynylene, monocyclic arylene, bicyclic arylene, polycyclic arylene, monocyclic heteroarylene, bicyclic heteroarylene, polycyclic heteroarylene, and one to five such groups one of fused or linked.

The present invention relates to compositions comprising rigid-rod polymers and carbon nanotubes. The compositions comprise dispersed carbon nanotubes aligned with rigid-rod polymers. The alignment of the nanotubes and polymers can be liquid crystalline. The rigid-rod polymers of this invention include, but are not limited to, polymers and copolymers comprising benzobisazole, pyridobisimidazole and benzamidazobenzo-phenanthroline repeat units. Dispersion of carbon nanotubes is achieved by in-situ polymerization in the presence of the carbon nanotubes, which may be either single-wall or multi-wall or a combination of both. The polymer compositions comprising carbon nanotubes may be spun into fibers or formed into films. The strength of the resulting fibers of the present invention is significantly greater than that of fibers without carbon nanotubes.

There is disclosed a resist composition comprising, at least, a polymer including repeating units represented by the following general formula (1). There can-be provided a resist composition that has a good barrier property against water, prevents resist components from leaching to water, has high receding contact angle against water, does not require a protective film, has an excellent process applicability, suitable for the liquid immersion lithography and makes it possible to form micropatterns with high precision.

A polymer containing a triazine ring-containing repeating unit structure represented by, for example, formula (23) or (24), which alone can achieve high heat resistance, high transparency, high refraction index, high solubility and low volume shrinkage, without adding a metal oxide.

High-molecular compounds comprising repeating units represented by the general formula (1) or (2) and having number-average molecular weights of 10³ to 10⁸ in terms of polystyrene: (1) [wherein Ar¹ and Ar² are each independently a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group; and X¹ and X² are each independently O, S, C(═O), S(═O), SO₂, C(R¹)(R²), Si(R³)(R⁴), N(R⁵), B(R⁶), P(R⁷), or P(═O)(R⁸), with the provisos that X¹ and X² must not be the same and that X¹ and Ar² are bonded respectively to the adjacent carbon atoms constituting the aromatic ring of Ar¹, and X² and Ar¹ are bonded respectively to the adjacent carbon atoms constituting the aromatic ring of Ar²] (2) [wherein Ar³ and Ar⁴ are each independently a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group; and X³ and X⁴ are each independently N, B, P, C(R⁹), or Si(R¹⁰), with the provisos that X³ and X⁴ must not be the same and that X³ and Ar⁴ are bonded respectively to the adjacent carbon atoms constituting the aromatic ring of Ar³, and X⁴ and Ar³ are bonded respectively to the adjacent carbon atoms constituting the aromatic ring of Ar⁴].

Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state ²⁹Si, ¹⁹F, and ¹³C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF₂ groups as repeat units.