3228 results about "Repeat unit" patented technology

To provide a chemically amplified positive resist composition that can form a resist film capable of forming a pattern which has extremely high resolution, small LER, and excellent rectangularity and in which the influence of development loading and development residue defects are suppressed, and to provide a resist pattern forming method using the chemically amplified positive resist composition.SOLUTION: The chemically amplified positive resist composition contains: (A) a photoacid generator of a specific structure which generates an acid by the action of high-energy rays; and (B) a base polymer containing a polymer which increases its solubility in an alkaline aqueous solution by the action of an acid and contains a repeating unit represented by the following formula (B1).SELECTED DRAWING: None

A coating composition comprises: a fluoro-aliphatic group-containing copolymer comprising a repeating unit A corresponding to a fluoro-aliphatic group-containing monomer, and a repeating unit B corresponding to at least one monomer, wherein each of the I / O values of said at least one monomer constituting the repeating unit B is 1.0 or less.

The invention belongs to the field of biological materials, and particularly relates to recombinant V-type humanized collagen and application thereof. The invention provides a recombinant V-type humanized collagen, the amino acid sequence of the recombinant V-type humanized collagen comprises (repetitive unit) n, and the repetitive unit comprises a sequence as shown in SEQ ID NO.1; each repeating unit is directly linked and the number n of repeating units is 10. The recombinant V-type humanized collagen can comprehensively resist skin aging.

A polyester polycarbonate polyol having a repeating unit represented by specific formula (1) and a repeating unit represented by specific formula (2), having a hydroxyl value of 35 to 85 mgKOH / g, having a hydroxyl group at a terminal, and being in the form of a liquid at ordinary temperature.

The present invention generally relates to a powder comprising a PEEK-PEoEK copolymer, wherein the PEEK-PEoEK copolymer having RPEEK and RPEoEK repeat units in a molar ratio RPEEK / RPEoEK ranging from 95 / 5 to 5 / 95. The present invention also relates to a method of preparing a three-dimensional (3D) object by sintering layers of the powder.

To provide a coated seed capable of contributing to dispersion of work periods by advancing a sowing period to autumn or winter from a conventional cultivation system of sowing in spring.SOLUTION: There is provided a coated seed that makes it possible to suppress germination until an appropriate time while maintaining seed viability by coating the seed with a coating material that can inhibit water absorption, which triggers seed germination, until a temperature is suitable for germination and can be peeled off from the seed at a temperature that allows for growth (for example, a hydrophobic coating material containing a vinyl ether copolymer consisting of repeating units of the following formula (1), where R1 represents an alkyl group having 3 to 10 carbon atoms, and R2 represents a cyclic hydrocarbon group whose basic skeleton is an alicyclic group having 10 to 15 carbon atoms).SELECTED DRAWING: None

Provided are: a resist underlayer film-forming composition that is capable of forming a resist underlayer film that can impart excellent pattern rectangularity to a resist pattern; and a method for producing a semiconductor substrate. The method for producing a semiconductor substrate comprises: a step for directly or indirectly coating a substrate with a resist underlayer film-forming composition; a step for forming a resist film on the resist underlayer film formed by the aforementioned step for coating a resist underlayer film-forming composition; a step for exposing the resist film to radiation; and a step for developing at least the exposed resist film. The resist underlayer film-forming composition contains a polymer and a solvent. The polymer contains a repeating unit (1) having an organosulfonate anion moiety and an onium cation moiety, a repeating unit (2) represented by formula (2), and a repeating unit (3) represented by formula (3). (In formula (2), R4 is a group selected from the group consisting of groups represented by any of formulas (2-1) to (2-8).) (In formula (3), R6 is a group that contains a substructure represented by formula (3-1) or (3-2).) (In formulas (3-1) and (3-2), X1 and X2 are each independently an oxygen atom, a sulfur atom, or a nitrogen atom. A formula in which a solid line and a broken line are combined indicates a single bond or a double bond each independently.)

A treatment liquid for a semiconductor device contains water, a removing agent, and a copolymer. The copolymer has a first repeating unit having at least one group selected from a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit. A substrate treatment method using the treatment liquid is also provided.

The invention discloses a polyurethane-based solid electrolyte as well as a preparation method and application thereof. The polyurethane-based solid electrolyte comprises a metal organic framework three-dimensional skeleton film and a composite polyurethane layer attached to the surface of the metal organic framework three-dimensional skeleton film, the metal organic framework three-dimensional framework film is metal organic framework modified glass fiber cloth; the composite polyurethane layer comprises polyurethane and metal organic framework particles embedded in a macromolecular network of the polyurethane in situ; a carbamate group of polyurethane and a three-dimensional skeleton of the metal organic framework form a hydrogen-bond interaction, so that the ion transmission performance and the mechanical performance are synergistically improved. The polyurethane-based solid electrolyte provided by the invention can promote lithium salt dissociation, inhibit anion migration, improve the ionic conductivity and the ionic transference number, and improve the charge-discharge stability; a large number of repetitive unit carbamate groups in polyurethane and a three-dimensional skeleton form hydrogen-bond interaction to synergistically promote rapid transmission of lithium ions, so that the transference number of the polymer electrolyte is increased, and the ion transmission performance and the mechanical performance are improved.

To provide polyimide as an insulation material for preparing a printed circuit board.SOLUTION: Polyimide includes one or a plurality of repeating units derived from dianhydride, and one or a plurality of repeating units derived from diamine. Infrared absorption spectrum of the polyimide obtained through Fourier transform infrared spectroscopy (FTIR) using attenuated total reflection (ATR) has a characteristic peak A of 1,753 cm-1 to 1,803 cm-1, a characteristic peak B of 1,635 cm-1 to 1,752 cm-1, and a characteristic peak C of 1,160 cm-1 to 1,170 cm-1, the characteristic peak A has a characteristic peak area a, the characteristic peak B has a characteristic peak area b, the characteristic peak C has a characteristic peak area c, b / a is 25.00 or less, and c / b is 0.3000 or more.SELECTED DRAWING: None

The resist composition exhibits a high contrast, improved maximum resolution, and satisfactory sensitivity and line width roughness (LWR) when processed by lithography using high-energy radiation, especially electron beam (EB) and EUV, and a pattern forming process using the resist composition. The resist composition comprising (A) a base polymer containing a polymer comprising repeat units having an acid labile group and repeat units having a carboxy group, (B) an organic solvent, and (C) a hypervalent iodine compound having formula (1):

A chemically amplified positive resist composition is provided comprising a polymer comprising repeat units having a phenolic hydroxy group protected with a tertiary ether type acid labile group and an acid generator capable of generating a fluorinated aromatic sulfonic acid. A resist pattern with a high resolution, reduced LER, rectangularity, minimized influence of develop loading, and few development residue defects can be formed.

The invention relates to a modeling method in the field of molecular dynamics, in particular to an automatic polymer full-atom molecular dynamics modeling method, and the polymer modeling process is divided into three core steps: firstly, converting SMILES of a repetitive unit into SMILES of a polymer; secondly, constructing a single-chain structure; and finally, constructing a multi-chain amorphous system. The link of cross-linking reaction needs to be additionally added to the cross-linked polymer. According to the invention, through the built-in DREIDING force field parameters, an input file required by the Lammps molecular dynamics can be directly operated and generated.

The present invention relates to a binder composition for a positive electrode comprising a polymer P1 containing repeating units derived from vinylidene fluoride and a hydrophilic polymer P2 containing repeating units derived from at least one monomer of formula R1R2C = C (R3) C (O) R (I) wherein R1, R2 and R3 are independently selected from H and C1-C5 alkyl; r is selected from-NHC (CH3) 2CH2C (O) CH3,-NR 'R "or-OR', where R 'and R" are independently selected from H and C1-C18 alkyl optionally substituted by one or more hydroxyl, thiol or amino functional groups or five to six membered heterocycles comprising at least one nitrogen atom in the ring, characterized in that the hydrophilic polymer P2 has a weight average molecular weight greater than 30000 g / mol, advantageously greater than 50000 g / mol, preferably greater than 65000 g / mol, more preferably greater than 80000 g / mol.

A POD resin material, a POD resin film and a preparation method therefor, a graphite film and an electronic device. The POD resin film comprises a repeating unit A, a repeating unit B and a repeating unit C, and the structures of the repeating unit A, the repeating unit B and the repeating unit C are as follows: formula (1), formula (2), formula (3). The use of the POD resin material can improve the thermal conductivity of artificial graphite and reduce the particle fall-off amount of artificial graphite.

To provide a thickening composition which simultaneously achieves both a refreshing tactile when applied to the skin and a thickening effect and a cosmetic composition containing the same.SOLUTION: There is provided a thickening composition comprising a component (a) and a component (b). The component (a) is a polyamino acid derivative containing a repeating unit represented by the following general formula (1) and the component (b) is a compound having a hydrophobic group. (In the formula, R1 contains at least a hydrocarbon group having 3 to 22 carbon atoms, and R2 contains at least a hydrocarbon group having 1 to 20 carbon atoms which may contain a heteroatom. n and m represent the number of moles of α- or β-polyaspartic acid monomer units A-U and B-U in the molecule, respectively. In the polyamino acid derivative, the bonding form of the monomer unit A-U and the monomer unit B-U may be any of a random form, a blocked form or a tapered form.)SELECTED DRAWING: None

The invention belongs to the technical field of hydrogen bond organic framework materials, and relates to a three-component hydrogen bond organic framework material as well as a preparation method and application thereof, the chemical formula is {C26H21O12P4. (CH6N3). (C10H12N4). (H2O)} n, and n is a positive integer. A structural unit belongs to a triclinic system, a space group is P-1, a molecular formula is C37H41N7O13P4, and each repeating unit comprises a water molecule, a G < + > cation, a DBpy < 2 + > cation and a H5TPE < 3-> molecule; amino groups on G < + > cations, amino groups on DBpy < 2 + > cations, deprotonated HPO3-groups in H5TPE < 3-> molecules and unprotonated phosphonic acid groups have a synergistic effect, and water molecules form a two-dimensional hydrogen bond network. According to the three-component strategy, the chemical and structural diversity of HOFs is greatly expanded, and the material performance is remarkably improved.

A blowing agent for obtaining a polyurea resin foam including a polyurea having a repeating unit represented by the following general formula (I), the blowing agent including a reaction product (a2) of a cyclic amine compound (a1) and carbon dioxide. (In the formula I, R1 is a divalent hydrocarbon group having a cyclic structure optionally having a substituent, and R2 is a divalent hydrocarbon group optionally having a substituent.)

The present invention relates to a poly (arylpiperidinium) copolymer ionomer which does not have an aryl ester bond in a polymer backbone and has a branched piperidinium group introduced into a repeating unit, thereby having excellent chemical stability, excellent mechanical properties, and excellent mechanical properties. And meanwhile, the polymer has the advantages of high molecular weight, low swelling ratio, high dimensional stability, high ionic conductivity and limited phenyl adsorption effect. Furthermore, the anion exchange membrane prepared from the branched poly (arylpiperidinium) copolymer ionomer can be operated under low humidity conditions and is excellent in water management, and thus can be applied to membranes and binders for alkaline fuel cells, water electrolysis devices, carbon dioxide reduction, vanadium redox flow batteries, or metal-air batteries.

The present invention addresses the problem of providing a processing liquid for a semiconductor device, said processing liquid having excellent corrosion resistance with respect to a metal-containing layer, excellent removability of an object to be removed, and excellent solubility in a post-processing liquid. The present invention also addresses the problem of providing a method for processing a substrate using the processing liquid. This processing liquid for a semiconductor device contains water, a remover, and a copolymer, the copolymer having a first repeating unit having at least one group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium cation, and a second repeating unit different from the first repeating unit.

To provide a resist underlayer film-forming composition capable of forming a resist underlayer film which exhibits excellent processing resistance and excellent gas permeability.SOLUTION: The resist underlayer film-forming composition contains: (A) a polyether compound containing a repeating unit represented by the following general formula (I); and (B) an organic solvent. (Ar1 represents a substituted or unsubstituted C6-30 aryl group or the like; R1 represents a substituted or unsubstituted C1-20 linear, branched or cyclic saturated or unsaturated divalent hydrocarbon group or a substituted or unsubstituted C1-20 linear, branched or cyclic heteroalkylene group; and n and m represent integers of 0 or more.)SELECTED DRAWING: None

The embodiment of the invention provides a polymer binder, a preparation method thereof and an all-solid-state sulfide lithium battery. The polymer binder is a modified polyvinylidene fluoride-trifluorochlor oethylene copolymer, and chlorine in the modified polyvinylidene fluoride-trifluorochlor oethylene copolymer is partially or completely substituted by bromine and / or iodine; in the modified polyvinylidene fluoride-trifluorochlor oethylene copolymer, the molar ratio of a corresponding repeating unit of polyvinylidene fluoride to a corresponding repeating unit of trifluorochlor oethylene is (1-9): (9-1); in the modified polyvinylidene fluoride-trifluorochlor oethylene copolymer, the weight of chlorine is a, the weight of bromine and / or iodine is b, and b / (a + b) * 100% is equal to 1%-100%. The technical effect of improving the cycling stability and safety of the battery is achieved, and then the technical problems that when a traditional binder is applied to the all-solid-state sulfide lithium battery, the interface is unstable, the binding power is insufficient, and the traditional binder reacts with electrolyte are solved.

The present invention relates to: a binder for an all-solid-state battery, the binder comprising a main chain crosslinked by a compound including at least two thiol functional groups, wherein the main chain comprises an aromatic vinyl monomer-derived repeating unit and a conjugated diene-based monomer-derived repeating unit; a positive electrode for an all-solid-state battery, the positive electrode comprising the binder for a positive electrode for an all-solid-state battery, a conductive material, a positive electrode active material, and a solid electrolyte; and an all-solid-state battery comprising a positive electrode, a negative electrode, and a solid electrolyte layer disposed between the positive electrode and the negative electrode, wherein the positive electrode includes the positive electrode for an all-solid-state battery.

To provide a chemically amplified negative resist composition which improves resolution in pattern formation and can give a resist pattern having good LER and pattern fidelity, and to provide a resist pattern forming method.SOLUTION: The chemically amplified negative resist composition contains: a photoacid generator comprising an onium salt represented by the following formula (A); and a base polymer which contains a polymer containing a repeating unit represented by a specific formula.SELECTED DRAWING: None

An adhesive composition (100) comprises: a polyester resin (A) that includes an ester bond which bonds repeating units together and one or more functional groups selected from the group consisting of carboxy groups and carboxylic acid anhydride structures; an epoxy compound (B) in the amount of 1-50 parts by mass with respect to 100 parts by mass of the polyester resin (A); and a cyclic carbodiimide (C) in the amount of 0.1-20 parts by mass with respect to 100 parts by mass of the polyester resin (A).

To provide a resist underlayer film formation method capable of forming a resist underlayer film exhibiting excellent dry etching resistance.SOLUTION: A resist underlayer film formation method for forming a resist under layer film on a substrate includes a step (i) of coating a composition for resist underlayer film formation containing a polymer (A) and an organic solvent onto the substrate and obtaining a coating film, and subjecting the coating film to heat treatment at a temperature of 100°C or higher and 800°C or lower from 10 seconds to 7,200 seconds and curing the coating film, to form an underlayer film precursor film, and a step (ii) of curing the underlayer film precursor film by plasma irradiation, to form a resist underlayer film, wherein as the polymer (A), an aromatic ring-containing resin containing no hydroxyl group and organic group represented by the following general formula (1) in a repeating unit constituting the polymer is used.SELECTED DRAWING: Figure 1

A flame retardant synergist including a repeating unit including a backbone represented by a formula of:where moiety A is derived from a substituted triazine having at least two amino groups, and where moiety B is derived from a dialdehyde having a terminal aldehyde. Furthermore, moiety A and moiety B are bonded via a —C—N— linkage formed from having one of the at least two amino groups reacted with the terminal aldehyde, where n ranges from 5 to 1000. Additionally, one or more side units extend from the backbone, where the one or more side units are derived from 9,10-dihydro-9-oxa-10-phosphaphenanthrene 10-oxide or a derivative thereof. Furthermore, a flame retardant polymer composite that includes a polymer, the flame retardant synergist, and a flame retardant additive, is disclosed herein. Methods of forming the flame retardant synergist and the flame retardant polymer composite are further disclosed herein.

To provide a resin composition which comprises a polyphenylene ether having excellent solvent solubility and has excellent electrical properties, copper foil peeling strength and solvent resistance.SOLUTION: There is provided a resin composition which comprises (A) a polyphenylene ether A containing a repeating unit derived from the following phenol and having a molecular weight distribution (Mw / Mn) determined by gel permeation chromatography (GPC) of 2.0 to 6.0 and a number of OH groups per molecule of 0.8 to 3.0 pieces / molecule, (B) a polyphenylene ether B containing a repeating unit derived from the following phenol and at least one partial structure of the following structures in the molecular skeleton (excluding those corresponding to the polyphenylene ether A), (C) a triallyl isocyanurate and / or a triallyl cyanurate and a crosslinking agent other than (C') a triallyl isocyanurate and a triallyl cyanurate as optional components and (D) an organic peroxide.SELECTED DRAWING: None

This application provides cross-linked block copolymers comprising at least one block comprising repeating units derived from monomers comprising lactam and acryloyl moieties. The application further provides compositions comprising the block copolymers and applications thereof in various industrial areas including personal care. The application furthermore provides Pickering emulsion compositions comprising the block copolymers.

The invention relates to a hydrocarbon resin polymer, a manufacturing method thereof and a substrate structure. The hydrocarbon resin polymer comprises a repeating unit (A) derived from dicyclopentadiene (D CPD). The hydrocarbon resin polymer has a fluorine substituent group, and the content of the fluorine substituent group is 100-4500 ppm based on the total weight of the hydrocarbon resin polymer.