304 results about "Repeat unit" patented technology

A coating composition comprises: a fluoro-aliphatic group-containing copolymer comprising a repeating unit A corresponding to a fluoro-aliphatic group-containing monomer, and a repeating unit B corresponding to at least one monomer, wherein each of the I / O values of said at least one monomer constituting the repeating unit B is 1.0 or less.

A liquid crystal composition contains a side chain type polymer liquid crystalline compound which can form a light absorption anisotropic film having a high alignment degree and has excellent solubility in a general-purpose solvent, a light absorption anisotropic film obtained using the composition, a laminate, and an image display device. The composition includes: a side chain type polymer liquid crystalline compound; and a dichroic substance, in which the compound is a copolymer having a repeating unit (1) containing a mesogenic group with a molecular weight of greater than 280 and a repeating unit (2) with a molecular weight of 280 or less, a content of the repeating unit (2) is less than 14% by mass with respect to a total mass of the compound, and a content of the dichroic substance is greater than 2% by mass with respect to a total solid content of the composition.

This application discloses a crown ether modified perfluorosulfonic acid resin, its preparation method, its application, and an ion exchange membrane. The main chain of the crown ether modified perfluorosulfonic acid resin is a perfluorocarbon chain. The crown ether modified perfluorosulfonic acid resin includes repeating unit A, which is shown in formula (1): Formula (1); In formula (1), R0 is a crown ether group, a is a positive integer from 0 to 6, and b is a positive integer from 2 to 5. This application can effectively improve the persistence of the ion exchange membrane's free radical quenching effect, while also improving the oxygen resistance of the ion exchange membrane.

This application relates to a polyaryletherketone copolymer and a method for preparing the same. The polyaryletherketone copolymer is basically composed of repeating units of Formula I and repeating units of Formula II: O-Ph-O-Ph-CO-Ph Formula I; O-Ph-Ph-O-Ph-CO-Ph Formula II; wherein the molar ratio of the repeating units of Formula I to the repeating units of Formula II is 50:50 to 95:5, preferably 60:40 to 90:10, more preferably 70:30 to 85:15; and the polydispersity index (PDI) of the polyaryletherketone copolymer is at most 3.0, preferably at most 2.9, more preferably at most 2.8, and most preferably at most 2.7.

A composite separator for a lithium secondary battery according to aspects of this disclosure comprises: a porous organic polymer substrate; a porous inorganic heat-resistant layer coated on at least one surface of the organic polymer substrate, the porous inorganic heat-resistant layer comprising inorganic particles and an organic binder polymer holding the inorganic particles together; and an organic polymer adhesive layer coated on the outer surface of the porous inorganic heat-resistant layer, the organic polymer adhesive layer comprising a vinylidene fluoride-based polymer, wherein the organic polymer adhesive layer further comprises a compound having ethylene oxide repeating units and double bonds at the ends.

This invention discloses a water-washable via-plugging resin composition and its preparation method, as well as a circuit board and its processing method. The water-washable via-plugging resin composition comprises a polymeric resin and an inorganic filler. The polymeric resin includes a structural resin and a reinforcing resin. The structural resin comprises a polymer having repeating units derived from at least one of vinyl alcohol and vinylpyrrolidone. The reinforcing resin comprises an alkali-soluble resin. The surface of the inorganic filler is modified with at least one functional group selected from the group consisting of aniline, alkyl, nitrogen-containing functional groups on the main chain or branches, and double-bonded functional groups. This invention achieves rigid protection of the circuit and via edges during the machining stage, effectively preventing burrs and circuit lifting defects, while ensuring rapid, gentle, and zero-residue peeling during the film removal stage.

The present invention provides a curable resin composition containing a vinyl polymer having a reactive silyl group, which exhibits excellent weather resistance and good extensibility. [Solution] A curable resin composition comprising a vinyl polymer (A), wherein the vinyl polymer (A) has a main chain having repeating units of polymerizable vinyl monomers and reactive silyl groups bonded to the vinyl polymer main chain via a urethane structure, and the vinyl polymer (A) is a polymer obtained by silylation of the plurality of hydroxyl groups of a vinyl polymer (a) having a plurality of hydroxyl groups and a weight-average molecular weight / hydroxyl value of more than 4,000.

The present invention relates to a recycled polyester resin and an article manufactured therefrom, wherein the recycled polyester resin comprises repeat unit A derived from a recycled raw material, and the recycled raw material comprises at least one of a recycled diol component and a recycled acid component. The recycled polyester resin can exhibit eco-friendliness while being excellent in quality such as heat resistance and color.

Provided are: a polyimide resin composition from which a polyimide film excellent in terms of transparency, light resistance and adhesion to a substrate can be obtained; and a polyimide film excellent in terms of transparency, light resistance and adhesion to a substrate.　A polyimide resin composition contains: a polyimide resin (I) including a repeating unit represented by formula (1); at least one compound (S) selected from the group consisting of a silsesquioxane compound (S1) and a phenylalkoxysilane (S2); and an organic solvent, wherein the content of the compound (S) relative to 100 parts by mass of the polyimide resin (I) is 1-45 parts by mass. (X represents a C4-39 tetravalent aliphatic group or aromatic group; Y represents a C4-39 divalent aromatic group; and Y includes at least one selected from the group consisting of a divalent group represented by formula (2) and a divalent group represented by formula (3). Z is a C1-8 aliphatic group, and n is 0-2.)

The present invention provides a chemically amplified negative resist composition and a resist pattern formation method that improve resolution during pattern formation and enable the creation of resist patterns with good LER and pattern fidelity. [Solution] (A) A chemically amplified negative resist composition comprising a photoacid generator consisting of an onium salt represented by the following formula (A), and a base polymer containing a polymer with repeating units of a specific structure. TIFF2026090781000379.tif29102

The invention relates to a composition comprising at least one thermoplastic polyamide, wherein the average carbon content of the repeating units of said at least one thermoplastic polyamide is greater than or equal to 7; from 0.1 to 6.0 % by weight of expandable microspheres, based on the total weight of the composition; and optionally at least one additional thermoplastic polymer; wherein the composition has a melt flow index lower than or equal to 150 g / 10 min. The invention also relates to a method for preparing such a composition, to an expanded composition obtainable from such a composition and to a method for producing said expanded composition.

A unit cell includes a separator and an electrode, which are alternately laminated by a predetermined number. The unit cell is configured such that: the unit cell is laminated in the order of a lower separator, any one electrode of an anode or a cathode, an upper separator, and the other one electrode of the anode or the cathode, wherein at least one surface of the electrode and the separator is applied with an adhesive to adhere the electrode and the separator or the lower separator and the upper separator. The adhesive contains an adhesive composition comprising a copolymer and a rosin ester-based additive, the copolymer contains 60.1 to 79.9% by weight of two or more kinds of alkyl (meth)acrylate-based repeating units (A), and 20.1 to 39.9% by weight of (meth)acrylate-based repeating unit (B) having a hydroxyl group at its end.

A water-repellent composition capable of imparting both favorable water-repellency and favorable slip resistance to a textile product is provided by A water-repellent composition comprising a non-fluorine copolymer (A) comprising a repeating unit derived from a hydrophobic monomer (a1) having a hydrocarbon group having 2 to 40 carbon atoms, and a repeating unit derived from at least one chloride monomer (a2) selected from the group consisting of vinyl chloride and vinylidene chloride, wherein in the non-fluorine copolymer (A), an amount of repeating units derived from the monomer (a2) is 1 to 9% by weight based on a sum of an amount of repeating units derived from the monomer (a1) and the amount of repeating units derived from the monomer (a2).

A water-repellent composition including: a non-fluorine copolymer (A) having a repeating unit derived from a hydrophobic monomer (a1) having a hydrocarbon group having 2 to 40 carbon atoms, and a repeating unit derived from at least one chloride monomer (a2) selected from the group consisting of vinyl chloride and vinylidene chloride; and an isocyanate derivative (B), where, in the non-fluorine copolymer (A), an amount of repeating units derived from the monomer (a2) is 1 to 15% by weight based on a sum of an amount of repeating units derived from the monomer (a1) and the amount of repeating units derived from the monomer (a2).

A polycarbonate composition includes particular amounts of a bisphenol A homopolycarbonate, a polycarbonate including repeating units derived from a substituted or unsubstituted cyclohexylidene-bridged bisphenol, and a polyester-carbonate. The composition can exhibit a combination of desirable properties, including low haze and good scratch resistance. Methods for the manufacture of the composition and articles including the composition are also disclosed.

To provide a liquid crystal composition capable of forming a light-absorbing anisotropic film in which planar irregularity is suppressed and orientation is excellent, a light-absorbing anisotropic film, a laminate, and an image display device. The liquid crystal composition of the present invention contains: a liquid crystal compound; a dichroic substance; a polymer 1 having a repeating unit A containing a structure represented by formula (A); and a polymer 2 having a repeating unit A containing a structure represented by formula (A) and being different from the polymer 1, in the liquid crystal composition, in a case where a content of silicon atoms contained in the polymer 1 is set to X1 parts by mass with respect to 100 parts by mass of total solid content of the liquid crystal composition, and a content of silicon atoms contained in the polymer 2 is set to X2 parts by mass, a ratio represented by X1 / X2 is 1 or more. In formula (A), X represents a substituent containing one or more structures represented by formula (a).

One embodiment of the present invention relates to an eco-friendly polyimide-based film containing no perfluoroalkyl group, and provides a polyimide-based film comprising an imide repeating unit and / or an amide repeating unit, wherein the imide repeating unit is formed by a reaction of a diamine compound and a dianhydride compound, the amide repeating unit is formed by a reaction of a diamine compound and a dicarbonyl compound, the dianhydride compound comprises a dianhydride compound containing a methyl group and / or a dianhydride compound containing no methyl group, and the polyimide-based film has a static folding value of 110° or less on the basis of a thickness of 50 μm.

The invention relates to a method for improving the processability of a cementitious composition comprising calcinated clay, said method comprising the step of intergrinding and / or intermixing at least one additive selected from the group consisting of polyvinylimidazoles, amides of sugar acids and polymers consisting of repeating units derived from ethylenically unsaturated polyethers with at least one ingredient of said cementitious composition. The invention further relates to a cementitious composition comprising calcinated clay and at least one additive selected from the group consisting of polyvinylimidazoles, amides of sugar acids and polymers consisting of repeating units derived from ethylenically unsaturated polyethers.

This is a halomethylated polyphenylene ether containing a specific amount of repeating units represented by structural formulas (I), (II), and (III) (wherein X is chlorine or bromine). This halomethylated polyphenylene ether is considered particularly suitable for subsequent quaternization. The use of the described material in applications such as ion exchange membranes is also discussed. JPEG2026520833000067.jpg27170(I) JPEG2026520833000068.jpg34170(II) JPEG2026520833000069.jpg26170(III)

Embodiments provide a polymer composition for preparing a hard mask and a method of manufacturing a semiconductor device by etching a semiconductor substrate using the same, and a method of preparing a polymer composition for preparing a hard mask, the polymer composition comprising a polymer including a repeating unit represented by Chemical Formula 1.

The present invention provides a polymer, a positive photoresist composition, and a method of forming a patterned photoresist layer. The polymer comprises a first repeating unit and a second repeating unit. The first repeating unit has a structure represented by Formula (I) and the second repeating unit has a structure represented by Formula (II), wherein R 1 , R 2 , R 3 , R 4 , Ar, n, and m are as defined in the specification.

The present invention provides a compound that can impart both leveling and recoatability to the cured coating film. [Solution] The present invention relates to a copolymer containing a silicone-based unit derived from a silicone compound and a hydrophilic unit derived from a hydrophilic azo compound (excluding the aforementioned silicone-based unit) as repeating units.

The object of the present invention is to provide a resin composition that is heat-curable or photocurable, alkali-soluble, has a low dielectric constant and dielectric loss tangent of the cured product, and exhibits high adhesion and glass transition temperature, as well as excellent insulation reliability. [Solution] A resin composition is used that contains a compound represented by the following formula (1) and a compound containing one or more epoxy groups in one molecule. TIFF2026103975000012.tif29170 (In formula (1), each X independently represents a residue of an aromatic or aliphatic tetracarboxylic anhydride with the carboxyl group removed. Y represents a divalent residue of a diol with the hydroxyl group removed. Each Z independently represents a residue of a functional group containing a radically polymerizable double bond. n is the average number of repeating units and is a real number between 0.1 and 20.)

The present invention aims to provide a polyphenylene ether having excellent solubility in a general-purpose ketone-based solvent and a production method thereof. It also aims to provide a thermosetting composition, a prepreg, and a laminate each using the polyphenylene ether. The polyphenylene ether of the present invention is characterized by containing 5 to 85 mol% of repeating units derived from a phenol of formula (1) and 15 to 95 mol% of repeating units derived from a phenol of formula (2) relative to 100 mol% of the total of the repeating units derived from the phenol of formula (1) and the repeating units derived from the phenol of formula (2), and having a specific viscosity (ηsp / c) of 0.03 to 0.30 dL / g measured in a 0.5 g / dL concentration chloroform solution at 30°C.

A resin composition containing a copolymer (A) containing a repeating unit (A1) derived from a (meth)acrylic acid ester and a repeating unit (A2) derived from (meth)acrylic acid, a fatty acid metal salt, and a benzotriazole-based ultraviolet absorber.

This invention provides a covalent organic material for adsorbing zearalenones (ZENs), its preparation, and its application. The covalent organic material comprises: a matrix layer formed of melamine sponge; and an adsorption layer covering at least a portion of the surface of the matrix layer, the adsorption layer being composed of a covalent organic framework structure having repeating units as shown in Formula I. This covalent organic material can efficiently and specifically adsorb zearalenones and exhibits good hydrophobicity and thermal stability, making it suitable for the rapid and accurate enrichment and detection of ZENs in complex matrix foods.

A resin composition containing a copolymer (A) containing a repeating unit (A1) derived from a (meth)acrylic acid ester and a repeating unit (A2) derived from (meth)acrylic acid, a fatty acid metal salt, and a benzotriazole-based ultraviolet absorber.

An electrode useful in energy storage devices comprises a current collector and an active layer on the current collector, wherein the active layer comprises electrode active particles, electrically conducting material and a binder wherein the binder comprises a copolymer that comprises a first repeat unit and a second repeat unit; where the first repeat unit is derived from the polymerization of a first monomer which is ethylenically unsaturated monomer having a hydrophilic pendant group and the second repeat unit is derived from the polymerization of a second monomer having ethylenic unsaturation.

This invention relates to the field of biotechnology, specifically disclosing a novel polypeptide, recombinant XIX type humanized collagen, and their applications. This invention provides a novel polypeptide with good cell adhesion activity and the ability to promote cell proliferation. The amino acid sequence of the polypeptide comprises n repeating units; each repeating unit comprises any one of the following (1)-(3) amino acid sequences or their variants: (1) the amino acid sequence shown in SEQ ID NO.1; (2) an amino acid sequence having at least 50%, 60%, 70%, 75%, 80%, 85%, 90%, 95%, 96%, 97%, 98%, or 99% sequence identity with the amino acid sequence shown in SEQ ID NO.1; (3) a variant sequence obtained by mutating one or more amino acid residues of the amino acid sequence shown in SEQ ID NO.1; wherein n ≥ 1 and is an integer. The polypeptide of this invention can be used in various fields such as promoting skin barrier repair, wound healing, and epidermal renewal.

The present invention aims to provide a polyphenylene ether melt-extrusion molded body which is excellent in solubility in a solvent, solubility stability, and heat resistance, and a method for producing a polyphenylene ether melt-extrusion molded body. The present invention relates to a polyphenylene ether melt-extrusion molded body characterized by comprising a polyphenylene ether component, the polyphenylene ether component being a polyphenylene ether component having a dislocation structure connected by an ortho linkage in a repeating unit continuous by a para linkage, the amount of the dislocation structure being 1.2 mol% or more relative to all polyphenylene ether structural units in the polyphenylene ether component, and the weight average absolute molecular weight Mw of the polyphenylene ether component being 40,000 g / mol or more.