307 results about "Cyclic siloxane" patented technology

A method of manufacturing a semiconductor device includes forming a first insulating film over an underlying film by plasma polymerization of cyclic siloxane, and forming a second insulating film on the first insulating film by plasma polymerization of the cyclic siloxane continuously, after forming the first insulating film. The deposition rate of the first insulating film is slower than the deposition rate of the second insulating film.

Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state 29Si, 19F, and 13C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF2 groups as repeat units.

Methods for cleaning an article comprise contacting the article with a cleaning composition comprising a linear or branched volatile siloxane. In one embodiment, the method for cleaning the article comprises contacting the article with a cleaning composition comprising, based upon 100 pbw of the cleaning composition, 80 pbw to 99.99 pbw of a linear or branched volatile siloxane. In another embodiment, the method for cleaning the article comprises contacting the article with a cleaning composition comprising, based upon 100 pbw of the cleaning composition, 50.1 pbw to 99 pbw of a linear or branched volatile siloxane and a cyclic siloxane.

A method for fabricating a thermally stable ultralow dielectric constant film comprising Si, C, O and H atoms in a parallel plate chemical vapor deposition process utilizing plasma enhanced chemical vapor deposition ("PECVD") process is disclosed. To enable the fabrication of thermally stable ultralow dielectric constant film, specific precursor materials are used, such as, cyclic siloxanes and organic molecules containing ring structures, for instance, tetramethylcycloterasiloxane and cyclopentene oxide. To stabilize plasma in the PECVD reactor and thereby improve uniformity of the deposited film, CO2 is added to TMCTS as a carrier gas, or CO2 or a mixture of CO2 and O2 are added to the PECVD reactor.

A lithium secondary battery comprising: a positive electrode and a negative electrode which each has a specific composition and specific properties; and a nonaqueous electrolyte which contains a cyclic siloxane compound represented by general formula (1), fluorosilane compound represented by general formula (2), compound represented by general formula (3), compound having an S-F bond in the molecule, nitric acid salt, nitrous acid salt, monofluorophosphoric acid salt, difluorophosphoric acid salt, acetic acid salt, or propionic acid salt in an amount of 10 ppm or more of the whole nonaqueous electrolyte. This lithium secondary battery has a high capacity, long life, and high output. [In general formula (1), R1 and R2 are an organic group having 1-12 carbon atoms and n is an integer of 3-10. In general formula (2), R3 to R5 are an organic group having 1-12 carbon atoms; x is an integer of 1-3; and p, q, and r each are an integer of 0-3, provided that 1<=p+q+r<=3. In general formula (3), R6 to R8 are an organic group having 1-12 carbon atoms and symbol A is a group constituted of H, C, N, O, F, S, Si, and / or P.

Organopolysiloxane / polyurea / polyurethane block copolymer elastomers exhibiting improved physical properties are prepared by reacting diisocyanates with aminoalkyl-functional organopolysiloxanes containing substantially no cyclic siloxanes, prepared by reacting a cyclic silazane with a bis(hydroxy)-organopolysiloxane. Traditional hydroxyl and amino-functional chain extenders may be reacted as well, to produce a wide range of block copolymer elastomers.

A method for fabricating a thermally stable ultralow dielectric constant film comprising Si, C, O and H atoms in a parallel plate chemical vapor deposition process utilizing plasma enhanced chemical vapor deposition ("PECVD") process is disclosed. To enable the fabrication of thermally stable ultralow dielectric constant film, specific precursor materials are used, such as, cyclic siloxanes and organic molecules containing ring structures, for instance, tetramethylcycloterasiloxane and cyclopentene oxide. To stabilize plasma in the PECVD reactor and thereby improve uniformity of the deposited film, CO2 is added to TMCTS as a carrier gas, or CO2 or a mixture of CO2 and O2 are added to the PECVD reactor.

This invention is a composition comprising a cyclic siloxane, a silicone occlusive fluid, a silicone occlusive gel, and a silicone resin powder. The composition is useful for wound healing.

The present invention relates to a composition for a thermosetting silicone resin, the composition including: (A) an organohydrogenpolysiloxane; (B) an alkenyl group-containing epoxy compound; (C) an alkenyl group-containing cyclic siloxane; and (D) a hydrosilylation catalyst, a thermosetting silicone resin composition obtained by reacting the composition and a production method thereof, a photosemiconductor element-encapsulating material including the thermosetting silicone resin composition, and a photosemiconductor device including a photosemiconductor element encapsulated with the resin composition or the photosemiconductor element-encapsulating material.

A method for fabricating a thermally stable ultralow dielectric constant film comprising Si, C, O and H atoms in a parallel plate chemical vapor deposition process utilizing plasma enhanced chemical vapor deposition ("PECVD") process is disclosed. Electronic devices containing insulating layers of thermally stable ultralow dielectric constant materials that are prepared by the method are further disclosed. To enable the fabrication of thermally stable ultralow dielectric constant film, specific precursor materials are used, such as, cyclic siloxanes and organic molecules containing ring structures, for instance, tetramethylcycloterasiloxane and cyclopentene oxide.

A silicon-containing curable composition, comprising:a prepolymer (A) containing two or more Si—H groups per molecule obtained by hydrosilylation reaction of one kind or more selected from each of components (α) and components (β) described below;a cyclic siloxane compound (B) containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups; and a hydrosilylation catalyst (C);wherein the component (α) is a cyclic siloxane compound represented by formula (1) and contains two or more Si—H groups per molecule,wherein R1, R2 and R3 each are an alkyl group having 1 to 6 carbon atoms or a phenyl group, may be the same or different, a is any number of 2 to 10, b is any number of 0 to 8, and a+b≧2, andwherein the component (β) is a compound containing per molecule two or more carbon-carbon double bonds that have reactivity to the Si—H groups.

Transparent polycarbonate compositions are made from polycarbonate produced in a base-catalyzed melt polymerization reaction to which an acidic quencher has been added in a 1 to 30-fold molar ratio with respect to the amount of initial basic catalyst; and a potassium perfluoralkane sulfonate and cyclic siloxane containing flame-retardant component. In the composition these components work in combination such that the composition achieves a V0 UL flammability rating at a thickness of 2.0 mm, preferably 1.6 mm, and has a haze of no more than 1%.

Provided are a photoreceptor of an electophotographic system satisfactorily high in resistance to contamination with a developer or corona products and durability to a contact electrification unit or a cleaning blade and capable of preventing occurrence of film defects in the production, and a process cartridge and an image forming apparatus in which a good image quality can be obtained over a long period of time. The photoreceptor includes a conductive substrate and a silicon compound-containing layer located on the substrate and containing a cyclic siloxane compound and / or derivatives thereof. The cyclic siloxane compound has a cyclic structure containing a repeating unit represented by formula (1) wherein A<1 >and A<2>, which may be the same or different, each represent a monovalent organic group.

A method for forming porous insulating film using cyclic siloxane raw material monomer is provided, which method suppresses detachment of hydrocarbon and is able to form a low-density film.In a method where at least cyclic organosiloxane raw material 101 is supplied to a reaction chamber and an insulating film is formed by plasma vapor deposition method, above-mentioned problem is solved by a method for a forming porous insulating film using the mixed gas of a cyclic organosiloxane raw material 101 and a compound raw material 103 including a part of chemical structure comprising the cyclic organosiloxane raw material 101. The compound raw material 103 is preferably a compound including a part of side chain of the cyclic organosiloxane raw material 101.

The invention discloses a process for preparing organosilicon oil which contains hydrogen, in particular to a process for preparing organosilicon oil which contains hydrogen and methyl-phenyl silica chain link. The invention utilizes dimethyl silicone cyclic siloxane(Dn), polymethyl hydrogen cyclic siloxane(DmH), hybrid ring body of methyl and phenyl (DpPh), hydrolysis hybrid ring body of methyl and phenyl (D'qPh) to be polymerization reaction monomer, the process comprises adding the polymerization reaction monomer and blocking agent into organic solvent under the protection of N2 gas, controlling the reaction temperature and the reaction time, reacting under the function of catalyst, distilling to remove dissolvent in ordinary pressure after reacting, decompressing to withdraw low-boiling residue to get target product, purifying the product with activated carbon, and then the degree of purity of the product is high. The invention has the advantages of low cost, moderate contiditon, simple technology, simple and convenient operation and no pollution, and raw material are easily obtained, and the invention is suitable for industrialization. Products which are prepared by the invention have an excellent effect in the process of sealing and packing of LED.

A method for depositing a low dielectric constant film having a dielectric constant of about 3.5 or less is provided by blending one or more cyclic organosilicon compounds, one or more aliphatic organosilicon compounds, and one or more low molecular weight aliphatic hydrocarbon compounds. In one aspect, a gas mixture comprising one or more cyclic organosilicon compounds, one or more aliphatic organosilicon compounds, one or more aliphatic hydrocarbon compounds, one or more oxidizing gases, and a carrier gas is reacted at conditions sufficient to deposit a low dielectric constant film on a substrate surface.

The invention discloses polyether block polysiloxane diol and a method for preparing the same. The method is characterized by comprising the following steps: performing ring-opening polymerization through cyclic siloxane and dihydro terminated disiloxane first to obtain dihydro terminated polysiloxane, and then performing hydrosilylation reaction with mono-vinyl terminated polyether oligomer to form the polyether block polysiloxane diol the structural formula of which is shown in the graph, wherein R1 and R2 are CH3 and CH2CH3 and / or CH2CH2CH3 respectively, R3 is H or CH3, n is an integer between 1 and 1, 000, and p and q are integers between 1 and 100. The polyether block polysiloxane diol prepared by the method has the advantages of better hydrolysis resistance and storage stability, and high reactivity; in addition, the polyether block polysiloxane diol improves the problem of the unsatisfactory mechanical property of the prior siloxane diol in modifying copolymers.

The invention relates to a method for making hydrogen-containing silicone oil, in particular to a method for making methyl phenyl hydrogen-containing silicone oil for the encapsulation of LEDs. The method is characterized in that the methyl-phenyl cyclic siloxane (Dn<Me, Ph>), the tetramethyl tetraethyl cyclic tetra-siloxane (D4<Me, Et>) and hydrocyclotetrasiloxane (D4<H>) are taken as monomers; under the protection of N2, right amount of an end capping agent is added into the monomer mixture to be copolymerized under the action of a catalyst, after the polymerization, the catalyst is filtered and recycled, the low molecular compound of the obtained clear solution is removed in decompression and high temperature conditions, the clear solution without low molecular compound is cooled to the room temperature, and the target product is obtained. The method has the advantages of available raw materials, low cost, moderate conditions, simple technique, simple operation, environmental protection and convenient industrialization. The product made by the method can be widely applied to the enterprises which manufacture and use the LEDs, etc.

A moisture curable composition capable of cure to an elastomeric body, the composition comprising (a) an organopolysiloxane having not less than two silicon-bonded hydroxyl or hydrolysable groups; (b) a silane of the general formula G2-Si—R12, wherein each group is reactable with the hydroxyl or hydrolysable groups in (a), and each R1 group is an alkyl group having from 1 to 10 carbon atoms, an alkenyl group, an alkynyl group an aryl group or a fluorinated alkyl group; (c) one or more fillers and (d) a photocatalyst. Preferably at least one R1 group is unsaturated, but in the absence of this there is provided an additional component in the form of (e) an unsaturated compound selected from the group of an unsaturated short chain siloxane, an unsaturated cyclic siloxane, an unsaturated fatty acid an unsaturated fatty alcohol or an unsaturated fatty acid ester. The cured product is generally used as a sealant, which avoids dirt pick-up after cure and has a protective layer on the sealant interface with air.

Provided are a solid electrolytic capacitor including an anode having a dielectric coating film on a surface thereof and a solid electrolyte layer including a conductive polymer, the solid electrolyte layer containing a cyclic siloxane and a chelating agent, and a method of manufacturing the same.

A process for reducing the level(s) of water and / or other impurities from cyclosiloxanes by either azeotropic distillation, or by contacting the cyclosiloxane compositions with an adsorbent bed material. The purified cyclosiloxane material is useful for forming low-dielectric constant thin films having dielectric constants of less than 3.0, more preferably 2.8 to 2.0.

A monomer composition for polymerizing a branch-type silsesquioxane polymer is disclosed. The monomer composition includes hydroxy-substituted cyclic siloxane in a solvent, and the hydroxy-substituted cyclic siloxane includes stereoisomers of cyclic siloxane of cis, trans, random and twist structures at controlled ratios. Also disclosed are a branch-type silsesquioxane polymer synthesized by polymerizing the monomer composition for polymerizing a branch-type silsesquioxane polymer, and a method for synthesizing the same. In accordance with the disclosure, the isomers can be isolated stably at desired ratios. The isolated isomers may be polymerized into polymers of various types. Since the polymers exhibit low dielectric property, they may be utilized as low dielectric materials.

Disclosed are an ophthalmic lens, a cell or organ culture substrate, a container for a biological material and a transparent gel which have excellent wetting and sticking properties and do not require any surface treatment. An ophthalmic lens, cell or organ culture substrate, container for a biological material or transparent gel produced by polymerizing a cyclic siloxane compound represented by the formula (A): (A) wherein Ra are Rb independently represent a hydrogen or a monovalent hydrocarbon group which may be substituted by a fluorine; Rc represents an alkyl group having 1 to 6 carbon atoms or a phenyl group; X represents an organic group having an aliphatic unsaturated bond therein; and n is an integer of 1 to 10.

A multi-functional cyclic siloxane compound (A), a siloxane-based (co)polymer prepared from the compound (A), or compound (A) and at least one of a Si monomer having organic bridges(B), an acyclic alkoxy silane monomer(C), and a linear siloxane monomer (D); and a process for preparing a dielectric film using the polymer. The siloxane compound of the present invention is highly reactive, so the polymer prepared from the compound is excellent in mechanical properties, thermal stability and crack resistance, and has a low dielectric constant resulting from compatibility with conventional pore-generating materials. Furthermore, a low content of carbon and high content of SiO2 enhance its applicability to the process of producing a semiconductor, wherein it finds great use as a dielectric film.

Methods for treating fibers are disclosed with aqueous silicone emulsions comprising: A) an aminofunctional organopolysiloxane, B) a quaternary ammonium surfactant having a formula R1R2R3R4N+ X−, where R1 is an organofunctional group containing at least 10 carbon atoms, R2 is R1 or a hydrocarbyl containing 1 to 12 carbon atoms, R3 is R1, R2, or an alcohol group containing 2 to 10 carbon atoms, R4 is R1, R2, or R3, X″ is a halide, sulfate, sulfonate, methosulfate, or ethosulfate, C) a nonionic surfactant, where the aqueous silicone emulsion contains less than 0.2 weight % of D4 and D5 cyclic siloxanes.

Provided is a silicon-containing curable composition which includes a prepolymer (A) containing two or more Si—H groups in one molecule, which is obtained by subjecting one or more kinds of a cyclic siloxane compound (α) represented the following formula (1) and one or more kinds of a compound (β) represented by the following formula (2), to a hydrosilylation reaction; a cyclic siloxane compound (B) containing, in one molecule, two or more carbon-carbon double bonds that are reactive with Si—H groups; a polysiloxane compound (C) which is different from the prepolymer (A) and the cyclic siloxane compound (B); and a hydrosilylation catalyst (D). In formula (1), R1 to R3 each represent an alkyl group having 1 to 6 carbon atoms, or a phenyl group; a represents a number from 2 to 10; and b represents a number from 0 to 8. In formula (2), n represents the number 1 or 2.

A silicon-containing curing composition including a specific amount of a silicon-containing polymer having an Mw of 300 to 100,000 obtained by hydrolysis and condensation of an organosilane mixture containing specific amounts of organosiloxanes of formulae (1-1) through (1-5); a specific amount of a prepolymer containing at least two Si—H groups per molecule obtained by hydrosilylation between a cyclic siloxane compound of formula (2) and a compound of formula (3-1), (3-2), or (3-3); a specific amount of a linear siloxane compound containing more than one carbon-carbon double bond reactive with Si—H or Si—CH3 per molecule; specific amounts of an organic peroxide and a metal catalyst; and a specific amount of a filler. The details for the formulae (1-1) to (1-5), (2), (3-1) to (3-3) are as described in the specification.

A curable composition includes: 100 parts by mass of a silicon-containing polymer having a Mw of 3,000 to 100,000 obtainable by hydrolysis-condensation of an organosilane mixture including R1SiX3, R2SiX3, R3R4SiX2 and R5SiX3, the total of R2SiX3 and R3R4SiX2 being 5 to 60 mol %, optionally a prepolymer, optionally a cyclic siloxane compound, 0.0001 to 10 parts by mass of an organic peroxide and optionally a metal catalyst, and 10 to 1,500 parts by mass of a filler, wherein R1 is a C2-6 alkenyl group, R2 is a C1-6 alkyl group, R3 and R4 are each a C1-6 alkyl group, R5 is a phenyl group optionally substituted with a C1-6 alkyl group, and X is a C1-6 alkoxy group, one or more of R2 to R4 is a methyl group, f represents a number of 2 to 10, g represents a number of 0 to 8, and n represents 1 or 2.