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22766 results about "Organosilicon" patented technology
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Organosilicon compounds are organometallic compounds containing carbon–silicon bonds. Organosilicon chemistry is the corresponding science of their preparation and properties. Most organosilicon compounds are similar to the ordinary organic compounds, being colourless, flammable, hydrophobic, and stable to air. Silicon carbide is an inorganic compound.
Silicone composition for biocompatible membrane
InactiveUS20080045824A1Prevent penetrationMicrobiological testing/measurementSynthetic resin layered productsSensor materialsBiosensor
Owner:DEXCOM INC
Silicone based membranes for use in implantable glucose sensors
Owner:DEXCOM INC
Organosilicon compounds
InactiveUS6849754B2Improve bindingAvoid large quantitiesSilicon organic compoundsOrganic chemistry methodsAlcoholSilanes
Owner:EVONIK DEGUSSA GMBH
Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound
InactiveUS6413583B1Semiconductor/solid-state device detailsSolid-state devicesSilicon oxideSilicon dioxide
A method for depositing silicon oxide layers having a low dielectric constant by reaction of an organosilicon compound and a hydroxyl forming compound at a substrate temperature less than about 400° C. The low dielectric constant films contain residual carbon and are useful for gap fill layers, pre-metal dielectric layers, inter-metal dielectric layers, and shallow trench isolation dielectric layers in sub-micron devices. The hydroxyl compound can be prepared prior to deposition from water or an organic compound. The silicon oxide layers are preferably deposited at a substrate temperature less than about 40° C. onto a liner layer produced from the organosilicon compound to provide gap fill layers having a dielectric constant less than about 3.0.
Owner:APPLIED MATERIALS INC
Method of making low kappa dielectric inorganic/organic hybrid films
InactiveUS6068884AImprove thermal stabilityLow dielectric constantLayered productsSemiconductor/solid-state device detailsThermal chemical vapor depositionSemiconductor
A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and / or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si-O-Si or Si-N-Si groups with organic side groups attached to the backbone.
Owner:APPLIED MATERIALS INC
Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making
ActiveUS7307178B2Few stepsHigh yieldSilicon organic compoundsPreparation from carboxylic acid esters/lactonesCarboxyl radicalPerylene derivatives
Owner:SHIN ETSU CHEM CO LTD
Processes of making gamma,delta-unsaturated carboxylic acid and silyl ester thereof, carboxyl group-containing organosilicon compound and process of making
ActiveUS20050070729A1High yieldFew stepsSilicon organic compoundsPreparation from carboxylic acid esters/lactonesCarboxyl radicalPerylene derivatives
A γ,δ-unsaturated carboxylic acid silyl ester is prepared by reacting an α,β-unsaturated carboxylic acid ester with a hydrosilane or hydrosiloxane in the presence of tris(pentafluorophenyl)borane. γ,δ-Unsaturated carboxylic acid derivatives are readily prepared through fewer steps and in high yields.
Owner:SHIN ETSU CHEM IND CO LTD
In-situ low-k capping to improve integration damage resistance
InactiveUS20120156890A1Solid-state devicesSemiconductor/solid-state device manufacturingProcess regionOxygen
A method and apparatus for forming low-k dielectric layers that include air gaps is provided. In one embodiment, a method of processing a substrate is provided. The method comprises disposing a substrate within a processing region, reacting an organosilicon compound, with an oxidizing gas, and a porogen providing precursor in the presence of a plasma to deposit a porogen containing low-k dielectric layer comprising silicon, oxygen, and carbon on the substrate, depositing a porous dielectric capping layer comprising silicon, oxygen and carbon on the porogen containing low-k dielectric layer, and ultraviolet (UV) curing the porogen containing low-k dielectric layer and the porous dielectric capping layer to remove at least a portion of the porogen from the porogen containing low-k dielectric layer through the porous dielectric capping layer to convert the porogen containing low-k dielectric layer to a porous low-k dielectric layer having air gaps.
Owner:APPLIED MATERIALS INC
Cosmetic composition and production thereof
InactiveUS20060018867A1Efficient use ofReduce the amount requiredCosmetic preparationsHair cosmeticsEpsilon-PolylysineEmulsion
It has been desired to develop a highly preservative and antibacterial cosmetic composition that can easily be applied to both emulsion and non-emulsion type cosmetics. It has also been desired to develop a method of improving a preservative and / or antibacterial effect(s) of a cosmetic composition comprising polyorganosiloxane-containing epsilon-polylysine and thereby reducing the amount of antibacterial preservative agent to be used. There is provided a cosmetic composition comprising one or a combination of two or more of polyorganosiloxane-containing epsilon-polylysine compounds obtained by reacting epsilon-polylysine with polyorganosiloxane or a physiologically acceptable salt thereof, and polyhydric alcohol.
Owner:CHISSO CORP
Two-layer film for next generation damascene barrier application with good oxidation resistance
InactiveUS7749563B2Low dielectric constantLiquid surface applicatorsSemiconductor/solid-state device manufacturingOxygenPhenyl group
A method is provided for processing a substrate including providing a processing gas comprising an organosilicon compound comprising a phenyl group to the processing chamber, and reacting the processing gas to deposit a low k silicon carbide barrier layer useful as a barrier layer in damascene or dual damascene applications with low k dielectric materials. A method is provided for depositing a silicon carbide cap layer that has substantially no phenyl groups attached to silicon atoms from a processing gas comprising an oxygen-free organosilicon compound on a low k silicon carbide barrier layer.
Owner:APPLIED MATERIALS INC
Method of depositing dielectric materials in damascene applications
InactiveUS20030129827A1Semiconductor/solid-state device detailsSolid-state devicesMetallurgyProduct gas
Methods are provided for depositing an oxygen-doped dielectric layer. The oxygen-doped dielectric layer may be used for a barrier layer or a hardmask. In one aspect, a method is provided for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas comprising an oxygen-containing organosilicon compound, carbon dioxide, or combinations thereof, and an oxygen-free organosilicon compound to the processing chamber, and reacting the processing gas to deposit an oxygen-doped dielectric material on the substrate, wherein the dielectric material has an oxygen content of about 15 atomic percent or less. The oxygen-doped dielectric material may be used as a barrier layer in damascene or dual damascene applications.
Owner:APPLIED MATERIALS INC
Silicone hydrogel lens with a crosslinked hydrophilic coating
ActiveUS20120026457A1Increased durabilityPicture framesSpecial ornamental structuresSilicone hydrogelWater soluble
Owner:ALCON INC
Prepolymers with dangling polysiloxane-containing polymer chains
The invention provide a new class of silicone-containing prepolymers containing dangling polysiloxane-containing polymer chains. This class of silicone-containing prepolymer is capable of being actinically crosslinked to form a silicone hydrogel material with a relatively high oxygen permeability, a reduced elastic modulus, and a relatively high ion permeability. The present invention is also related to silicone hydrogel contact lenses made from this class of silicone-containing prepolymers and to methods for making the silicone hydrogel contact lenses.
Owner:ALCON INC
Method of forming conformal silicon carbide film by cyclic CVD
ActiveUS20200118815A1Electric discharge tubesSemiconductor/solid-state device manufacturingCarbide siliconSilanes
A method of forming, on a substrate having a recess pattern, a silicon carbide film having a reflective index of 2.3 or higher as measured at 633 nm, includes (i) supplying an organosilane precursor in a pulse to a reaction space where the substrate is placed, which precursor has a formula of RSiH3 wherein R is a hydrocarbon-containing moiety including at least one unsaturated bond; (ii) continuously supplying a plasma-generating gas to the reaction space, which plasma-generating gas is selected from the group consisting of inert gases and hydride gases; (iii) continuously applying RF power to the reaction space to generate a plasma which excites the precursor; and (iv) repeating steps (i) through (iii), thereby forming a silicon carbide film on the substrate, which silicon carbide film has a reflective index of 2.3 or higher as measured at 633 nm.
Owner:ASM IP HLDG BV
Silicone resin composition for LED devices
Silicone resin compositions comprising (A) a silicone resin having at least two alkenyl groups bonded to silicon atoms in a molecule, (B) an organohydrogensilane and / or organohydrogenpolysiloxane having at least two hydrogen atoms bonded to silicon atoms in a molecule, and (C) an addition reaction catalyst cure into transparent products having heat resistance and discoloration resistance and are used with LED devices for the purposes of protection, encapsulation, bonding, wavelength alteration or adjustment, and lens formation of LED devices.
Owner:SHIN ETSU CHEM IND CO LTD
Perfumed liquid laundry detergent compositions with functionalized silicone fabric care agents
InactiveUS20060003913A1Organic detergent compounding agentsNon-surface-active detergent compositionsLiquid laundry detergentNitrogen
The invention is directed to aqueous liquid laundry detergent compositions for cleaning and imparting fabric care benefits to fabrics laundered therewith and to methods for preparing such compositions. Such compositions comprise (A) at least one textile-cleaning surfactant; (B) droplets of miscible silicones comprising both a polarly-functionalized, preferably nitrogen-containing amino or ammonium functionalized, polysiloxane component and a nitrogen-free non-functionalized or non-polarly-functionalized polysiloxane component; and (C) a perfume component comprising fragrant aldehydes and / or ketones or a pro-perfume capable of providing such aldheyde and / or ketone perfume materials in situ. Incorporation of a polarly-functionalized polysiloxane fabric care agent into liquid laundry detergent compositions by miscibly combining it with a non-functionalized or non-polarly functionalized polysiloxane minimizes the undesirable interaction such polarly-functionalized silicone material might otherwise have with aldehyde and / or ketone perfume compounds.
Owner:THE PROCTER & GAMBLE COMPANY
Silicone based membranes for use in implantable glucose sensors
Membrane systems incorporating silicone polymers are described for use in implantable analyte sensors. Some layers of the membrane system may comprise a blend of a silicone polymer with a hydrophilic polymer, for example, a triblock poly(ethylene oxide) -poly(propylene oxide)-poly(ethylene oxide) polymer. Such polymeric blends provide for both high oxygen solubility and aqueous analyte solubility.
Owner:DEXCOM
Catalyst components in use for polymerizing ethylene, and catalyst
This invention relates to a method for preparing catalyst for ethylene homopolymerization or copolymerization with other alpha-olefins. The catalyst comprises at least one Mg composite, at least one Ti compound, at least one organic alcohol compound, and at least one Si compound. The general formula of the Si compound is R1xR2ySi (OR3) z, where R1 and R2 are alkyl or halogen; R3 is alkyl; x is 0-2; y is 0-2; z is 0-4; x + y + z = 4. The catalyst has such advantages as high catalytic activity, high hydrogen sensitivity and narrow particle size distribution of polymer. The catalyst is suitable for slurry polymerization of ethylene, and combined polymerization process where catalyst with high activity is needed.
Owner:CHINA PETROLEUM & CHEM CORP +1
Fabric care and perfume compositions and systems comprising cationic silicones and methods employing same
InactiveUS6903061B2Superior fabric careGood lookingInorganic/elemental detergent compounding agentsCationic surface-active compoundsSiliconeChemistry
Owner:THE PROCTER & GAMBLE COMPANY
Transdermal patch for delivering volatile liquid drugs
A transdermal patch for administering a volatile liquid drug, such as nicotine, transdermally to a patient comprising a four-layer laminated composite of: a top drug impermeable backing layer; a pressure sensitive silicone adhesive layer containing the drug; a pressure sensitive acrylic adhesive layer also containing the drug; and a removable siliconized release liner layer. Also disclosed is a method for treating a person for nicotine dependence and particularly for treating a woman for nicotine dependence.
Owner:ELAN PHRMA INT LTD +1
Silicone hydrogels comprising n-vinyl amides and hydroxyalkyl (meth)acrylates or (meth)acrylamides
Owner:JOHNSON & JOHNSON VISION CARE INC
Method of improving stability in low k barrier layers
InactiveUS20040137756A1Decorative surface effectsSemiconductor/solid-state device detailsHydrogenPhenyl group
A method is provided for processing a substrate including providing a processing gas comprising hydrogen gas and an organosilicon compound comprising a phenyl group to the processing chamber, and reacting the processing gas to deposit a low k silicon carbide barrier layer useful as a barrier layer in damascene or dual damascene applications with low k dielectric materials.
Owner:APPLIED MATERIALS INC
Ionic silicone hydrogels
Owner:JOHNSON & JOHNSON VISION CARE INC
High dielectric strength thermal interface material
InactiveUS6096414AImprove performanceMaintain good propertiesOther chemical processesSynthetic resin layered productsThermal conductivityThermal transmittance
A thermally-conductive, electrically insulative interface for conductively cooling a heat-generating source, such as an electronic component, having an associated thermal dissipation member such as a heat sink. The interface is provided as a cured sheet of a curable material formulated as a blend of a curable silicone binder, and a particulate alumina, i.e., aluminum oxide (Al2O3), filler. The interface is observed to exhibit a thermal conductivity of at least about 0.8 W / m-K and a wet dielectric breakdown strength of at least about 475 Vac / mil.
Owner:PARKER INTANGIBLES LLC
Direct photo-patterning of nanoporous organosilicates, and method of use
InactiveUS7056840B2Simple methodOrganic-compounds/hydrides/coordination-complexes catalystsSemiconductor/solid-state device manufacturingElectromagnetic radiationDielectric permittivity
Owner:INT BUSINESS MASCH CORP
Silicone compound, a process for the preparation thereof and a process for the preparation of an ophthalmic device therefrom
ActiveUS20090299022A1High purityHigh capping rateSilicon organic compoundsOptical elementsHydrogen atomMethyl group
The present invention provides a hydrophilic silicone which has a predetermined number of silicon atoms and a high purity and is suitable for producing an ophthalmic device and a process for preparing the same.The silicone compound is represented by formula (1) with a purity of 95% by weight or higher,wherein m is one value out of the integers of from 3 to 10, n is one value out of the integers of from 1 to 10, R1 is one out of alkyl groups having 1 to 4 carbon atoms, and R2 is one out of a hydrogen atom and a methyl group.
Owner:SHIN ETSU CHEM IND CO LTD
Emulsion compositions
An emulsion is useful in allowing a wide variety of gene products to be expressed via eukaryotic in vitro expression. The emulsion comprises a silicone based surfactant, a hydrophobic phase and a hydrophilic phase; wherein the hydrophilic phase comprises a plurality of compartments containing a functional in vitro eukaryotic expression system.
Owner:UK RES & INNOVATION LTD
Polyol-in-silicone emulsions
InactiveUS20050002976A1Process stabilityComposition is stableCosmetic preparationsToilet preparationsEmulsionPolyol
Owner:THE PROCTER & GAMBLE COMPANY
Silicone polymer insulation film on semiconductor substrate and method for forming the film
InactiveUS6432846B1Low dielectric constantImprove thermal stabilitySolid-state devicesPretreated surfacesPolymer scienceHigh humidity
A method for forming a silicone polymer insulation film having low relative dielectric constant, high thermal stability and high humidity-resistance on a semiconductor substrate is applied to a plasma CVD apparatus. The first step is vaporizing a silicon-containing hydrocarbon compound expressed by the general formula SialphaObetaCxHy (alpha=3, beta=3 or 4, x, and y are integers) and then introducing the vaporized compound to the reaction chamber of the plasma CVD apparatus. The next step is introducing additive gas into the reaction chamber. The residence time of the material gas is lengthened by reducing the total flow of the reaction gas, in such a way as to formed a silicone polymer film having a micropore porous structure with low relative dielectric constant.
Owner:ASM JAPAN
Silicon composite particles, preparation thereof, and negative electrode material for non-aqueous electrolyte secondary cell
ActiveUS20050214644A1Improve cycle performanceMinimize changesSilicaNitrogen compoundsSilicon alloyInorganic compound
Silicon composite particles are prepared by sintering primary fine particles of silicon, silicon alloy or silicon oxide together with an organosilicon compound. Sintering of the organosilicon compound results in a silicon-base inorganic compound which serves as a binder. Each particle has the structure that silicon or silicon alloy fine particles are dispersed in the silicon-base inorganic compound binder, and voids are present within the particle.
Owner:SHIN ETSU CHEM IND CO LTD
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