The invention belongs to the technical field of
silicon carbide single crystal materials, and particularly relates to a growth device of large-size
silicon carbide single crystals and a preparation method of the
silicon carbide single crystals, porous
graphite cylinders are arranged in a
powder area of the growth device of the large-size
silicon carbide single crystals, and the porous
graphite cylinders are distributed along the edge of the
powder area to the center in a stepped mode. The height is gradually increased from the edge to the center; a plurality of
layers of stacked
graphite pore plates are arranged at the top of the
powder area, the upper end parts of the porous graphite cylinders are flush with the upper surfaces of the corresponding
layers of graphite pore plates, and the porous graphite cylinders penetrate through the graphite pore plates, so that a continuous
gas phase transmission channel from the powder area to the
crystal growth area is formed. According to the invention, the plurality of porous graphite cylinders are arranged in the
silicon carbide raw material area in a stepped manner, so that the temperature field distribution of the
raw material area is stabilized, the
gas phase layout is optimized, impurities in
gas phase components are filtered, and the defects of microtubes, inclusions,
dislocation and the like in crystals are improved.