33000results about How to "Increase resistance" patented technology

An oligonucleotide analogue useful for the antisense method, etc., having excellent enzyme resistance, having potent selective binding affinity for single-stranded RNA, and further having an excellent triplex-forming capacity with double-stranded DNA, and a nucleoside analogue useful for its production are provided.Nucleoside analogues, which are compounds of the general formula (I) and salts thereof, and oligonucleotide analogues containing one or more of the nucleoside analogues:where Base is an aromatic heterocyclic group or the like optionally having a substituent; R1, R2 and R3 are each a hydrogen atom, a protective group for an amino group, a protective group for a hydroxyl group, a phosphate group, or —P(R4)R5 [where R4 and R5 are each a hydroxyl group, a protected hydroxyl group, a mercapto group, a protected mercapto group, etc.]; m=0 to 2; and n=1 to 3].

A tamper switch mechanism utilized in security interface devices such as keypad installations to render them tamper-resistant, wherein the devices are generally connected to burglar alarm and fire alarm systems. More particularly, provided is a conductive tamper switch which is installed in a security interface device, such as a keypad, which upon an unauthorized attempt to dislodge the device or keypad from a wall or surface on which it is mounted, will trigger an alarm or generate a warning signal at a monitoring site indicative that an effort at tampering with the device has been effected. Also disclosed is a method of providing the tamper switch mechanism in a security interface device, such as a keypad installation.

The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and / or nanosized features of selected lengths in one, two or three dimensions. The present invention provides composite patterning devices comprising a plurality of polymer layers each having selected mechanical properties, such as Young's Modulus and flexural rigidity, selected physical dimensions, such as thickness, surface area and relief pattern dimensions, and selected thermal properties, such as coefficients of thermal expansion, to provide high resolution patterning on a variety of substrate surfaces and surface morphologies.

A shock absorbing component having a pair of surfaces with a plurality of inwardly extending indentations in the top and bottom surfaces. The indentations extend between the surfaces to provide support members for the shock absorbing component. At least some of the indentations are hemispherical. The surfaces may be formed of mesh material to allow the passage of gas or fluid therethrough. One or more inserts may be placed in the indentations. The shock absorbing component can be constructed by molding upper and lower shock absorbing component halves wherein the molds are configured to provide indentations in the top and bottom surfaces. The upper and lower halves are then joined to complete the shock absorbing component.

A coating composition is disclosed which comprises an aqueous polymeric matrix, a hydrophilic polymer, a colloidal metal oxide and a crosslinker. The coating composition when applied on medical devices is hydrophilic, shows improved lubricity, abrasion resistance and substrate adhesion on metallic or plastic substrates. The coating also shows improved water sheeting thus providing the coated substrates with anti-fog properties. The coating absorbs aqueous dye or stain solutions making the substrate suitable for printing.

A metal film composed of multiple atomic layers continuously formed by atomic layer deposition of Ru and Ta or Ti includes at least a top section and a bottom section, wherein an atomic composition of Ru, Ta or Ti, and N varies in a thickness direction of the metal film. The atomic composition of Ru, Ta or Ti, and N in the top section is represented as Ru(x1)Ta / Ti(y1)N(z1) wherein an atomic ratio of Ru(x1) / (Ta / Ti(y1)) is no less than 15, and z1 is 0.05 or less. The atomic composition of Ru, Ta or Ti, and N in the bottom section is represented as Ru(x2)Ta / Ti(y2)N(z2) wherein an atomic ratio of Ru(x2) / (Ta / Ti(y2)) is more than zero but less than 15, and z2 is 0.10 or greater.