2922 results about "Plasma treatment" patented technology

The invention discloses a carbon fiber composite material surface modification spraying system and a control method thereof. The system comprises a multi-axis robot, a plasma spray gun, a contact angle measuring probe, a 3D line laser scanner, a hyperspectral imager, an environment sensor and a controller. According to the method, the plasma power and the robot speed are adjusted in real time through contact angle measurement and plasma treatment feedback control, so that the CFRP surface can accurately reach a target value, and the coating adhesive force is improved; 3D line laser scanning and hyperspectral imaging are combined, and the posture, the distance, the wet film thickness and the component uniformity of the spray gun are monitored in real time; based on a prediction model fusing a physical model and a neural network, a self-adaptive fuzzy PID control algorithm is adopted, and the coating flow and the track posture of a spray gun are accurately regulated and controlled in real time. The problems of weak coating binding force, uneven thickness, orange peel, sagging and serious coating waste in traditional spraying are effectively solved, and self-adaptive, high-quality and green spraying of workpieces with complex curved surfaces is achieved.

A plasma processing system includes a pulsed voltage source configured to generate a pulsed voltage waveform having a first frequency. The plasma processing system includes a radio frequency source configured to generate a radio frequency waveform having a second frequency that is higher than the first frequency. The plasma processing system includes a junction box enclosure electrically coupling the pulsed voltage source to a direct current conductor coupled to a substrate support and further electrically coupling the pulsed voltage source to a radio frequency conductor coupled to a radio frequency baseplate. The junction box enclosure includes a pulsed voltage filter circuit coupled between the radio frequency source and the radio frequency conductor and operable to filter the pulsed voltage waveform. The junction box enclosure further includes a radio frequency filter circuit coupled between the pulsed voltage source and the direct current conductor and operable to filter the radio frequency waveform.

The embodiment of the invention provides a glass-based structural member as well as a preparation method and application thereof, and the preparation method comprises the following steps: carrying out at least one pre-plating cleaning selected from alkali cleaning, acid pickling and plasma treatment on a glass substrate, so that the surface water drop angle of the glass substrate is in a range of 10-30 degrees; forming a dielectric layer comprising a silicon dioxide layer on the surface of one side of the glass substrate cleaned before plating; forming an anti-fingerprint layer on the silicon dioxide layer; si-CH2 bonds are formed between the silicon dioxide layer and the anti-fingerprint layer. After the glass base material is cleaned before plating, the binding force between the SiO2 layer formed on the glass base material and the glass base material and the binding force between the anti-fingerprint layer and the SiO2 layer are both high, so that the thickness of the SiO2 layer and the anti-fingerprint layer can be large, the structure of the whole coating is stable, and the glass-based structural part can have good abrasion resistance, good scratch resistance and a lasting anti-fingerprint effect; and the application requirements in the fields of electronic equipment and the like can be well met.

The invention relates to the technical field of wafer processing, in particular to a reaction chamber and plasma processing equipment, which comprises a quartz tube, an induction coil, a Faraday shield cage, a state monitoring device, a rotation driving device and a control unit, and is characterized in that the quartz tube is arranged at the top of a processing chamber; the induction coil is arranged around the outer side of the quartz tube; the Faraday shielding cage is provided with a slit, and the orthographic projection of the slit on the circumferential wall of the quartz tube forms an erosion area; the state monitoring device is used for monitoring the erosion area; the driving end of the rotary driving device is connected with the quartz tube or the Faraday shielding cage; the control unit is in communication connection with the state monitoring device and the rotary driving device; according to the invention, through real-time monitoring and an active regulation and control mechanism, the problem of concentrated erosion of plasma to the quartz tube in a high-hydrogen process is effectively solved.

The invention relates to the technical field of wafer processing equipment, in particular to a reaction cavity for a high-hydrogen process and plasma processing equipment, and the reaction cavity comprises a quartz tube; the first coil surrounds the outer side of the quartz tube and is connected with an external radio frequency power supply; the Faraday shielding cage is annularly arranged outside the quartz tube and between the quartz tube and the first coil, and a plurality of slits which penetrate through the side wall of the Faraday shielding cage and extend in the axial direction are formed in the Faraday shielding cage; the blocking piece is arranged in the quartz tube, and a structure formed by orthographic projection of the blocking piece on the circumferential side wall of the Faraday shielding cage covers a structure formed by orthographic projection of the first coil on the circumferential side wall of the Faraday shielding cage; the blocking piece is arranged in the quartz tube, so that concentrated bombardment of plasma generated in the high-hydrogen process on the inner wall of the quartz tube can be effectively blocked, the problems of erosion of the quartz tube and particle stripping are remarkably relieved, the process yield of plasma processing equipment is increased, and the service life of a machine table is prolonged.

The invention discloses a silica gel pad with high thermal conductivity and heat resistance and a preparation method thereof, and the method comprises the following steps: preparing a composite thermal conductive filler, mixing boron nitride nanosheets and graphene according to a certain mass ratio, adding a silane coupling agent, carrying out ball milling, adding spherical alumina, and mixing; preparing modified organic silicon resin, wherein methyl vinyl silicone rubber, hydrogen-containing silicone oil, a platinum catalyst and MQ silicon resin react to obtain the modified organic silicon resin; mixing and defoaming the modified organic silicon resin, the composite heat-conducting filler, the flame retardant and the antioxidant to obtain a heat-conducting silica gel mixture; preparing a reinforced base material, carrying out plasma treatment on glass fiber cloth, and then impregnating the glass fiber cloth with vinyl ester resin for pre-curing; and grinding the mixture by three rollers, coating the mixture on a reinforced base material, and heating and curing. The thermal conductivity of the obtained silica gel pad is 2.5-3.5 W / m.K, the volume resistivity is larger than 1012 omega.cm, the long-term heat-resistant temperature reaches 200 DEG C or above, the tensile strength is larger than 5 MPa, the peel strength is larger than 15 N / cm, and the silica gel pad has excellent thermal conductivity, insulativity, heat resistance and mechanical strength.

The invention relates to the technical field of wafer processing equipment, in particular to a reaction cavity and plasma processing equipment, comprising a quartz tube, an induction coil and a shielding member, the quartz tube is arranged at the top of a processing chamber; the induction coil is arranged on the outer side of the quartz tube in a surrounding manner and comprises a plurality of annular sections which are arranged at intervals in the axial direction of the quartz tube and a plurality of connecting sections which are arranged between every two adjacent annular sections and are used for connecting every two adjacent annular sections; the shielding component is annularly arranged between the quartz tube and the induction coil and comprises a plurality of annular shielding parts arranged in the axial direction of the quartz tube and a plurality of arc-shaped shielding parts arranged between every two adjacent annular shielding parts and used for connecting every two adjacent annular shielding parts; a slit is formed between two adjacent annular shielding parts; concentrated bombardment of high-energy ions on the inner wall of the quartz tube can be obviously prevented, so that erosion of the quartz tube is effectively reduced, particulate matter is reduced, the service life of a machine is prolonged, and the process yield is increased.

The invention relates to the technical field of semiconductor manufacturing equipment, in particular to a process cavity with a controllable gas flow field and plasma processing equipment, and the process cavity comprises a cavity body which is provided with a cavity for bearing a wafer; the air inlet channel is communicated with the cavity; the main air exhaust channel is arranged at the bottom of the cavity body and is communicated with the cavity; the main air exhaust channel is connected with a main control valve; the auxiliary air exhaust channel is arranged on the side wall of the cavity body and is communicated with the cavity; the main control valve and the auxiliary control valve work cooperatively. The control device is in communication connection with the main control valve and the auxiliary control valve; through the cooperation of the auxiliary air exhaust channel and the auxiliary control valve and the cooperation of the main air exhaust channel and the main control valve, the flow field distribution in the process cavity is adjusted, the gas concentration gradient and the edge dead zone in the radial direction of the wafer are guided to be eliminated, and the consistency of the side face angle, the surface roughness center area and the edge area of the outer ring groove or hole of the wafer is achieved.

The invention relates to the technical field of spaceflight material forming, in particular to a tension control winding process of a spaceflight carbon fiber composite launch canister, which comprises pretreatment, winding forming, curing and post-treatment. The method comprises the following steps: S1, coating a release agent and a modified coating after processing a core mold, carrying out plasma treatment and eliminating stress; the carbon fiber filaments are soaked in resin containing nanometer components, and are pre-stretched after a hot melting reaction; s2, closed-loop tension control is conducted, winding is conducted according to segmented angles, and modified resin is coated between layers to be overlapped in a crossed mode; s3, stepwise heating and curing, dynamically regulating the pressure and introducing inert gas; and S4, polishing after hydraulic demolding, carrying out sand blasting, carrying out transition layer and ceramic coating, and carrying out multi-dimensional detection. According to the process, the mechanical property and environmental adaptability of the launch canister are improved, the process precision is high, defects are reduced, the forming time is shortened, the rework rate and cost are reduced, the spaceflight requirement is met, and the process is suitable for batch production.

The invention discloses a ceramic rock plate with a decorative effect and a production process thereof, and belongs to the technical field of ceramics. The rock plate is composed of a green body layer, a ground glaze layer, a cover glaze layer and an ink jet pattern layer, and after firing, a micro-nano rough and low-surface-energy synergistic protection layer is formed through oxygen-nitrogen plasma activation, a hydrothermal reaction of aluminum salt and an ammonia source compound, high-temperature calcination and silane derivative dipping and curing. The green body takes wollastonite, quartz sand and the like as raw materials, and the ground glaze and the cover glaze adopt a feldspar-quartz-nepheline system; after firing, performing plasma treatment and hydrothermal treatment to generate needle-shaped aluminum oxide, and introducing a silane derivative to realize double functions of super-hydrophobicity and wear resistance. Compared with the prior art, the anti-fouling and wear-resistant coating reaches the national standard 5 level, the process is simple, and the coating can be directly connected to an existing production line and is suitable for high-end wall floor decoration.

The invention relates to a preparation method and application of a three-step method environment-friendly SBS modified asphalt regenerant, and the regenerant is composed of modified bio-oil, functionalized desulfurized rubber, a solubilizer, an anti-oxidation aging agent, an anti-light aging agent, a multi-sulfydryl chain reconstruction auxiliary agent, a reversible thioether cross-linking agent and other components. The matrix and polymer network structure of the aged SBS modified asphalt is repaired through light oil supplement and chemical reaction. The preparation method comprises the following steps: introducing a polar functional group into ultrasonic transesterification modified bio-oil to improve wettability; the surface activity of the desulfurized rubber is improved through plasma low-temperature treatment; high-speed shearing and closed-loop control reaction are combined to realize rubber particle dispersion and network reconstruction; chemical crosslinking and aging regeneration are realized through cooperation of specific components. The prepared regenerant is doped into aged SBS modified asphalt at the temperature of 145-165 DEG C according to the proportion of 4-20 wt% to prepare regenerated asphalt.

The present disclosure describes a method for forming a nitrogen-rich protective layer within a low-k layer of a metallization layer to prevent damage to the low-k layer from subsequent processing operations. The method includes forming, on a substrate, a metallization layer having conductive structures in a low-k dielectric. The method further includes forming a capping layer on the conductive structures, where forming the capping layer includes exposing the metallization layer to a first plasma process to form a nitrogen-rich protective layer below a top surface of the low-k dielectric, releasing a precursor on the metallization layer to cover top surfaces of the conductive structures with precursor molecules, and treating the precursor molecules with a second plasma process to dissociate the precursor molecules and form the capping layer. Additionally, the method includes forming an etch stop layer to cover the capping layer and top surfaces of the low-k dielectric.

The invention relates to the technical field of preparation of medical supplies, in particular to a surgical membrane and a preparation process. During specific use, firstly, a polyurethane base membrane is selected and subjected to plasma treatment; spraying a nano SiO2 dispersion liquid containing a photoinitiator on the surface of the treated polyurethane base film, and then performing ultraviolet patterning irradiation to form a micro-bulge structure to obtain a base material layer; projecting the colloidal fluid to a temperature gradient mask through a digital micromirror device, so that the colloidal fluid is subjected to regional thermal polymerization on the substrate layer to form an intelligent adhesive layer with viscosity gradient; by adopting an aerosol jet printing technology, super absorbent fibers and polyvinyl alcohol-borax dynamic crosslinking hydrogel are co-deposited to form a drainage layer, so that the technical problems that a surgical membrane prepared by a surgical membrane preparation mode in the prior art is inflexible in adhesion and poor in surface structure performance, and a preparation process is difficult to accurately control are solved.

The invention discloses a BDD electrode material and a preparation method thereof. The preparation method comprises the following core steps: pretreating the surface of a porous titanium substrate; depositing a nanoscale TiN film layer on the surface of the pretreated porous titanium substrate in advance; depositing a layer of single-walled carbon nanotube network on the TiN thin film layer by using an electrophoretic deposition method; growing a highly-doped BDD layer on the single-walled carbon nanotube network by adopting a plasma enhanced chemical vapor deposition technology; repeating the two steps to form a multi-layer SWCNT / BDD composite structure, and controlling the thickness of the multi-layer SWCNT / BDD composite structure to be 1-50 microns; and finally, depositing a low-doped BDD active layer with the thickness of 1-5 microns by adopting a hot filament chemical vapor deposition (HFCVD) technology. According to the pulse laser assisted preparation process provided by the invention, the femtosecond laser pulse is introduced to replace traditional plasma treatment, so that the process flow is simplified, and the efficiency is improved; according to the technology, the process is simplified, the quality of the TiN film is improved through accurate energy input, and a new way is opened up for further improving the performance of the BDD electrode.

The invention discloses a method for preparing a carbon nanotube through plasma pretreatment-dipping deposition, which comprises the following steps: carrying out plasma treatment on a substrate, dipping the substrate subjected to plasma treatment into a catalyst precursor solution, taking out and drying to obtain a pretreated substrate; and introducing a carbon source gas, and preparing the carbon nanotubes on the surface of the pretreated substrate by adopting a vapor deposition method. According to the method, the wettability of the catalyst solution is improved by processing the base material through the plasma, the surface of the base plate is rough, the migration potential barrier of catalyst atoms on the surface of the base plate in the high-temperature annealing process is increased, excessive agglomeration of the catalyst atoms is prevented, and formation of small catalyst particles which are uniformly distributed is promoted; therefore, the prepared carbon nano tube is relatively compact, and the obtained carbon nano tube is high in density, large in specific surface area, and relatively high in yield and purity.

The invention belongs to the field of material surface treatment, and relates to a glass explosion-proof rubber coating process. According to the process, alpha-Al2O3 nanoparticles and fatty acid grafted modified nano SiO2 are prepared, a nano composite adhesive containing aramid fibers and nickel hydroxyl iron powder is prepared in combination with a three-stage dispersion process (mechanical shearing, ultrasonic cavitation and rolling grinding), and a glass surface nano rough interface is constructed in combination with plasma treatment and a PECVD (Plasma Enhanced Chemical Vapor Deposition) technology. A magnetoelectric synergistic coating (magnetic field orientation + vacuum infiltration + gradient pressure + electrostatic overlock) and electromagnetic curing-gradient cooling process is adopted to realize uniform coating and rapid crosslinking of an adhesive layer. Through cooperation of material modification and a multi-field coupling process, the impact energy absorption of an adhesive layer is greater than or equal to 80%, the interface bonding strength reaches 22MPa, the curing time is shortened by 50%, degumming is avoided in an extreme environment, and the thickness deviation of the adhesive layer is + / -5 [mu] m. By adopting natural raw materials and a low-VOC formula, the anti-explosion glass is suitable for scenes such as building curtain walls and automobile glass, the anti-explosion performance is improved, and the service life is prolonged.

A method for joining, by brazing, a first part and a second part, the steps of preparing at least one of the parts including the following: a) providing a part intended to be brazed, the part being made of carbon or based on titanium, nickel or a CoCr alloy, b) performing inert gas plasma treatment on the part whereby the part is cleaned and an active surface is formed on the part, c) depositing a first layer comprising an active element on the active surface of the part, the active element being a carbide-forming element, d) depositing a second layer of gold on the first layer, whereby the first layer is protected from oxidation and good wetting is ensured.

A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

The invention provides a multi-zone temperature control electrostatic chuck and a plasma processing device. The multi-zone temperature control electrostatic chuck comprises at least one of a grid temperature control module and a radial partition temperature control module. The grid temperature control module comprises a plurality of first independent temperature control units arranged in an array; the radial partition temperature control module comprises a plurality of annular second independent temperature control units; each of the first independent temperature control unit and the second independent temperature control unit comprises a partition variable heating structure; the partition variable heating structure comprises a partition control piece, a first partition deformation piece and at least two first partition heating pieces, the first partition deformation piece comprises a first center and at least two first connecting claws, and the partition control piece is electrically connected with the first partition deformation piece and the first partition heating pieces; the first partition heating piece is connected with the end, away from the first center, of the first connecting claw. The multi-zone temperature control electrostatic chuck is used for balancing a local overheat area or a local supercooling area caused by uneven plasma distribution.

The invention relates to a method for preparing a high-quality quasi-two-dimensional perovskite thin film on a gallium nitride substrate, and relates to the technical field of semiconductors. The method for preparing the high-quality quasi-two-dimensional perovskite thin film on the gallium nitride substrate comprises the following steps: cleaning the gallium nitride substrate, and carrying out Plasma treatment; spin-coating a perovskite precursor solution on the processed gallium nitride substrate; the solute of the perovskite precursor solution is butylamine bromide powder, lead bromide powder and cesium bromide powder, and the solvent is a mixed solution of DMF (Dimethyl Formamide) and DMSO (Dimethylsulfoxide); adding a brominated metal salt into the perovskite precursor solution; and performing thermal annealing treatment on the perovskite thin film. According to the invention, a technology of growing a high-quality quasi-two-dimensional perovskite thin film by adopting a spin-coating process is adopted, and the high-quality thin film with uniform phase distribution is obtained by optimizing the proportion of a precursor solution and introducing inorganic salt to regulate and control growth kinetics.

A control method of a plasma processing apparatus including a first electrode that places a workpiece thereon includes supplying a bias power to the first electrode, and supplying a source power having a frequency higher than that of the bias power into a plasma processing space. The source power has a first state and a second state. The control method further includes a first control process of alternately applying the first state and the second state of the source power in synchronization with a signal synchronized with a cycle of a radio frequency of the bias power, or a phase within one cycle of a reference electrical state that represents any one of a voltage, current, and electromagnetic field measured in a power feeding system of the bias power.

The invention relates to the field of optical thin films, in particular to a preparation method of an optical diffusion film. A preparation method of an optical diffusion film comprises the following steps: uniformly mixing a curing agent and polydimethylsiloxane, curing, and then carrying out oxygen plasma treatment and room temperature aging treatment to obtain a polydimethylsiloxane flat plate; dissolving PET particles and PMMA particles in a solvent to obtain a polymer solution; and placing a polydimethylsiloxane flat plate above the polymer solution, and standing to obtain the optical diffusion film. According to the application, PMMA is used as a high glass transition temperature component to be blended with PET, so that the overall glass transition temperature of a blending system is improved, and the practicability of the optical diffusion film in a high-temperature environment is improved; strong scattering is provided through the refractive index difference between air holes and a polymer phase, and a refractive index gradient is formed by using the refractive index difference between PET and PMMA, so that a secondary scattering interface is formed, and light absorption is reduced and high transmittance is maintained while high haze is ensured.

The invention provides a photoresist removing method and a semiconductor device manufacturing method, when photoresist on a substrate needs to be removed, corresponding oxygen-free gas is introduced into a plasma processing chamber and plasma excitation is carried out, so that corresponding rays are generated and act on the surface of the photoresist, the surface of the photoresist is re-melted, and the photoresist on the substrate is removed; according to the method, the photoresist is cleaned by the wet method, and then the hard shell on the surface of the photoresist is removed, so that the photoresist removal capability of subsequent wet cleaning can be effectively improved, the wet cleaning time is shortened, the photoresist is effectively removed, meanwhile, residues generated after the photoresist is removed by wet cleaning can be effectively avoided, the product yield is further improved, and the general applicability is high. Moreover, the surface of the photoresist is re-melted by mainly utilizing the action of rays generated after plasma excitation is carried out on the oxygen-free gas to remove the hard shell on the surface of the photoresist, so that the problem of secondary influence on the exposed substrate caused by the existing dry photoresist removing processes such as a plasma ashing process and the like can be effectively avoided.

The application relates to a modified separation membrane in the technical field of membrane materials, a preparation method and application thereof. The modified separation membrane comprises a base film and a nanostructure layer on the upper surface of the base film and the membrane hole surface close to one side of the upper surface of the base film; wherein the pore size of the base film is 120-400 mu m; the nanostructure layer is composed of microparticles with a size of 100-1000 nm; the preparation method comprises 3D printing of the separation membrane; and the upper surface of the separation membrane and the membrane hole surface close to one side of the upper surface of the separation membrane are subjected to plasma treatment. The modified separation membrane preparation method combines the 3D printing technology and the membrane separation technology, improves the traditional membrane preparation process, finds a more optimal membrane replacement process, and the modification method is free of chemical agents, has the advantages of being more convenient and fast to operate, high in separation efficiency, low in processing cost, green and pollution-free, and the like, and has important significance in the aspects of membrane separation technology improvement and application of oily wastewater treatment.

The invention relates to the technical field of shoes, and discloses a foot bed and leather integrally-formed structure and a preparation method thereof, and the foot bed and leather integrally-formed structure comprises a leather surface layer, a supporting core layer and a bottom layer; a preset circumferential and middle array type printing area on the lower surface of the leather surface layer is subjected to plasma treatment, sprayed with resin and subjected to UV curing to form an anchoring layer, the supporting core layer is connected to the anchoring layer on the lower surface of the leather surface layer through a bottom layer to be integrally formed in a composite mode, and the supporting core layer is of a latticed bionic lattice structure. The flexible supporting core layer of the latticed bionic lattice structure is processed through the technologies such as 3D printing, the flexible supporting core layer and the leather are integrally formed, the shoe pad detachably matched with a shoe for use is manufactured, the shoe pad has the ventilation and drainage functions through the supporting core layer in the shoe pad, the shoe pad can be conveniently matched with ventilation holes in a shoe body for use, and the moisture problem is solved; in the process of matching with ventilation of the supporting core layer, the flexible buffering pad supports the foot sole surface, the comfort degree is high, cleaning and maintenance are convenient, and the insole can flexibly adapt to different shoes and is high in applicability.

A plasma sterilization packaging device for agricultural products includes a feeding unit and a packaging unit, where the packaging unit includes a first conveyor belt, an encapsulation conveyor belt and a second conveyor belt, the lower side of the first conveyor belt is provided with a roll film, the upper side of the encapsulation conveyor belt is provided with a roll film adjustment device and an upper sealing device, and a cutting sealing device is arranged between the encapsulation conveyor belt and the second conveyor belt; the upper sealing device is fixedly connected to both sides of the encapsulation conveyor belt through a first mounting frame, the lower side of the first mounting frame is provided with a hot pressing roller, the hot pressing roller is provided with a sealing positioning wheel, and one side of the sealing positioning wheel is connected to a plasma processing unit.

An antenna includes an inner structure, an outer structure, and a plurality of interconnecting structures coupling the inner structure to the outer structure. The plurality of interconnecting structures is axisymmetric with respect to a center of the antenna. Each interconnecting structure has an azimuthal component of at least 30 degrees.

The invention discloses a preparation method of a novel mixed metal oxide coating titanium electrode, and relates to the technical field of electrode preparation, the method comprises the following specific steps: titanium substrate pretreatment: a titanium plate is sequentially subjected to gradient polishing with 120-800-mesh abrasive paper, the polished titanium substrate is subjected to hydrochloric acid solution etching, argon plasma surface activation and drying treatment, and a titanium substrate is obtained; obtaining a clean substrate surface with proper roughness; through the low-temperature plasma treatment, pulsed bias magnetron sputtering and laser-induced atomic layer deposition (LA-ALD) combined technology, the binding force of the coating and the titanium substrate is remarkably improved, high-energy particles are used for bombarding the surface of the titanium substrate in the low-temperature plasma treatment, residual impurities are effectively removed, the surface roughness and active sites are increased, and the surface hardness of the titanium substrate is improved. In the pulsed bias magnetron sputtering process, the surface of the substrate is further cleaned through periodic ion bombardment, atomic diffusion and mixing between the coating and the substrate are promoted, a transition layer structure is formed, and therefore the binding force is greatly enhanced.

Some embodiments are directed to a method of processing a substrate in a plasma processing system. The method generally includes tuning a first capacitor and a second capacitor of a tuning circuit to match a first impedance corresponding to a first stage of a waveform, while a frequency of a radio frequency (RF) generator is preset to a first frequency; tuning a third capacitor of the tuning circuit and the frequency of the RF generator to match a second impedance corresponding to a second stage of the waveform, wherein the frequency of the RF generator is tuned to a second frequency; recording setting values of the first frequency and the second frequency that match different impedances at different stages of the waveform; and switching between the first frequency and the second frequency to match the different impedances at the different stages of the waveform.

The invention discloses a PEM proton exchange membrane for water electrolysis and a preparation method thereof, and relates to the technical field of water electrolysis. The proton exchange membrane is composed of five layers of structures including a modified sulfonated composite resin layer, an enhancement layer, a water retention layer, a catalyst layer and an anti-permeation layer, the preparation method comprises the following steps: the modified sulfonated composite resin layer is prepared by dispersing perfluorinated sulfonic acid resin and sulfonated lignin in a solvent, coating and drying; the reinforcing layer is prepared by blending a PTFE (Polytetrafluoroethylene) emulsion, a carbon nanotube and a tetrafluoroethylene-hexafluoropropylene copolymer, and then carrying out casting sintering, plasma treatment and hot press molding; the water retention layer is prepared by adopting an electrostatic spinning technology; the catalyst layer is formed by spraying a precursor solution step by step and drying; the anti-permeation layer is prepared through photoetching-etching array construction, resin coating and fluorosilane modification. The prepared proton exchange membrane has excellent mechanical strength, proton conductivity and stability, and is suitable for the field of PEM water electrolysis.