The invention relates to a preparation method of a
silicon-
germanium rotating target material, which comprises the following steps: S1, preparing raw materials: preparing
silicon powder and
germanium powder, and mixing according to a required proportion; s2,
powder mixing treatment is conducted, specifically, mechanical powder mixing is conducted through a V-shaped powder mixing
machine, after powder mixing is finished,
drying is conducted through a hot
air drying oven, it is guaranteed that powder is dry, and adhesion is prevented; s3, the back
pipe is pretreated, whether
jumping and the thickness of the back
pipe are normal or not is checked, and
industrial alcohol is used for cleaning the surface of the back
pipe. According to the preparation method of the
silicon-
germanium rotating target material, the silicon-germanium target material layer surrounding the base body pipe is formed by adopting the
plasma thermal spraying technology, the silicon-germanium rotating target material which is high in structural density and free of cracks and has the length and thickness meeting the sputter
coating requirement is obtained, the size of the silicon-germanium rotating target material is integrated, and the yield of the silicon-germanium rotating target material is improved. The length and the thickness of the silicon-germanium rotating target material are not limited, the preparation process of the silicon-germanium rotating target material can be simplified, and the preparation cost is reduced.