333 results about "Direct writing" patented technology

The invention provides an immersed laser direct-writing photoetching method and device. The immersed laser direct-writing photoetching device comprises a laser light source, a laser beam splitter, an acousto-optic modulator, a dichroscope-spectroscope module, an acousto-optic deflector, an objective lens, an immersion head and a motion platform, the motion platform is used for placing a wafer to be photoetched; the laser light source, the laser beam splitter, the acousto-optic modulator and the dichroscope-spectroscope module are sequentially arranged along a first straight line, the dichroscope-spectroscope module is arranged in a deflection mode relative to the first straight line, and the acousto-optic deflector, the objective lens, the immersion head and the motion platform are sequentially arranged along a second straight line; laser generated by the laser light source sequentially passes through the laser beam splitter and the acousto-optic modulator and is emitted to the dichroscope-spectroscope module, the dichroscope-spectroscope module selectively reflects laser with specific wavelength, and the reflected laser sequentially passes through the acousto-optic deflector, the objective lens and the immersion head and is emitted to a wafer to be photoetched. And high-speed and high-flux parallel laser scanning direct writing photoetching can be realized.

The invention belongs to the technical field of polymer additive manufacturing, and relates to a melt electrostatic direct writing preparation method of a polymer fiber scaffold with a continuous gradual change structure, which comprises the following steps of: designing a basic homogeneous pattern according to the transition interface characteristics of a to-be-repaired tissue, and discretizing the basic homogeneous pattern into a dense ordered point array; designing nonlinear transformation functions f and g according to structural change characteristics at a transition interface, mapping points one by one by using the nonlinear transformation functions f and g so as to obtain a point column, performing equidistant sampling on the point column to obtain an expected printing path, and finally performing melt electrostatic direct writing based on the expected printing path so as to obtain the melt electrostatic direct writing. And preparing the polymer fiber scaffold with the continuous gradually-changed structure. According to the method, a curve printing process is adopted to simulate a smooth transition interface between tissues, so that the structure and mechanical bionic degree of the polymer fiber scaffold are improved.

The invention discloses a preparation method and application of a flexible resistance-type humidity sensor based on Zn / Ag / PEO nanowire stacking, and the method comprises the steps: putting particle-free ink into electrospinning direct-writing equipment, and depositing a plurality of layers of Zn / Ag / PEO conductive fibers with a certain structural morphology on a film according to a pre-designed track perpendicular to the direction of an interdigital electrode; and sintering to form the flexible humidity sensor with excellent humidity response performance and environment tolerance. The flexible resistance-type humidity sensor prepared by the invention has excellent humidity sensitivity, high response sensitivity, wide response range and high stability.

The invention discloses direct writing forming equipment and method for a continuous fiber reinforced ceramic matrix composite, the direct writing forming equipment comprises an XYZ-axis motion platform, an extrusion nozzle, an ultrasonic transducer, a screw propeller, a wire feeder, a forming table and a curing mechanism, the extrusion nozzle is mounted on the XYZ-axis motion platform, and an outlet is formed in the bottom of the extrusion nozzle; the screw propeller comprises a motor and a screw, the motor is mounted on the extrusion nozzle and connected with the screw to drive the screw to rotate, so that the screw shears ceramic slurry in the extrusion nozzle and extrudes the ceramic slurry from an outlet of the extrusion nozzle, and a through hole is formed in the screw. Continuous fibers sent out by the wire feeder penetrate through the screw rod and then are discharged from an outlet of the extrusion nozzle; and the curing mechanism is used for curing the ceramic slurry on the forming table. The viscosity of the ceramic slurry is reduced through the shearing effect of the screw rod, blockage is prevented, and the extrusion nozzle can disperse nano-particle aggregates in the ceramic slurry through the vibration effect of ultrasonic waves.

The invention discloses a bismuth telluride nanopore maskless direct writing preparation method based on electron beam irradiation, and belongs to the technical field of nanometer manufacturing. The method comprises the following steps: firstly, constructing an initial nanopore in a two-dimensional bismuth telluride material by utilizing a converged electron beam; and then the aperture size of the nanopore is accurately regulated and controlled by adjusting the beam density of the electron beam. The method effectively solves the key technical bottlenecks of interface chemical residue pollution caused by a traditional photoresist mask process, intrinsic defect formation caused by high-energy particle bombardment and the like, and breaks through the limitation of an existing etching technology in the aspect of sub-nanoscale structure precision control; precise control of the aperture of the nanopore can be achieved by adjusting the irradiation intensity of the electron beam, and the method has the advantages of being easy and convenient to operate, low in cost, environmentally friendly and the like and can be widely applied to the fields of nanometer electronic devices, sensors and the like.

The invention discloses a method for improving optical storage capacity based on ultraviolet femtosecond laser multi-cycle low-temperature direct writing, and belongs to the technical field of laser processing. Leveling the sample table; designing a random data structure and calculating parameters; preparing a random data structure; reading and characterizing a random data structure; according to the method, firstly, ultraviolet femtosecond laser with the wavelength of 343 nm is used for replacing infrared / visible band laser used in traditional five-dimensional optical storage, secondly, a multi-cycle scanning mode is used for replacing an existing scanning mode, and birefringence modification with the smaller size is induced in quartz glass at low temperature; the tiny birefringence modification is used for realizing data writing and reading of the optical memory with higher storage density; according to the multi-cycle scanning mode, heat accumulation in the machining process is affected by changing single-point one-way acting time, so that the dot spacing is shortened, and the storage capacity is increased.

The invention provides a cache-based asynchronous direct writing method and an artificial intelligence chip, and relates to the technical field of artificial intelligence chips, the method comprises the following steps: detecting respective status bits of a plurality of cache groups in a cache; when the status bit of the cache group indicates that a cache line meeting a preset condition exists in the cache group, the link state between the cache and the main memory is detected, and the preset condition is that refreshing prompt information is contained and the state is marked as a dirty state; and when the link state is an idle state and the data request of the processing core is not received, the cache lines meeting a preset condition in the cache group are evicted to the main memory. When the link between the cache and the main memory is idle, the cache line which contains the refresh prompt information and is marked as a dirty state is timely evicted into the main memory, so that the interconnection bus bandwidth between the cache and the main memory is in a dynamic balance state, the interconnection bus bandwidth between the cache and the main memory is fully utilized, and the interconnection bus bandwidth between the cache and the main memory is not influenced. And meanwhile, the excessive pressure of the interconnection bus bandwidth between the cache and the main memory is avoided.

The invention discloses a scanning type exposure method and system adopting a parallel digital micromirror array, and relates to the technical field of photoetching exposure and maskless direct writing of mask.The scanning type exposure method comprises the steps that parallel digital micromirror initial mapping is established through a reference target exposure detection registration method; generating a block distortion field parameter table according to the initial mapping of the parallel digital micromirror, determining a micro-mark insertion position based on the block distortion field parameter table, and generating an expected coordinate; performing micro-mark exposure on the expected coordinate position, acquiring imaging data of the inserted micro-mark position, extracting an actual measurement coordinate from the imaging data of the micro-mark position, calculating a residual error by taking the expected coordinate and the actual measurement coordinate as an input difference, and writing the residual error into a residual error set; incremental fitting is carried out according to the residual set, the block distortion field parameter table is updated, and the exposure controller controls the parallel digital micromirror array to remap the pattern according to the updated block distortion field parameter table and triggers exposure. The method provided by the invention has better effects in coordinate mapping consistency and block parameter manageability.

The invention discloses a method for preparing a low-loss sharp-bend waveguide through femtosecond laser in-situ multi-time modification, belongs to the technical field of laser processing, and adopts femtosecond laser in-situ multi-time modification to accurately optimize the problem of large bending loss of a 90 sharp-bend waveguide in single direct writing. The main principle is as follows: femtosecond laser is focused in a material by controlling a high-precision three-dimensional motion platform, and femtosecond laser processing energy and laser scanning speed are adjusted to reach preparation conditions of a single-mode waveguide; and performing in-situ multi-time modification regulation and control on waveguide performance by using femtosecond laser to prepare 90 low-loss sharp-bend waveguides with different bending radiuses. In-situ multiple modification enables the structure of the material modified by laser in the material to be more compact, the refractive index of the core layer of the waveguide is increased, and radiation loss can be inhibited; in-situ multi-time modification can also drive foreign ions in the waveguide to migrate to the waveguide boundary, scattering and absorption of light by the foreign ions are reduced, and absorption and scattering loss of the waveguide is reduced. The method is simple in preparation process, high in reliability and easy to implement.

The invention discloses a multi-focus translation staggered close connection type parallel laser direct writing rapid processing method which comprises the steps that a multi-focus module and a laser direct writing scanning device are built, the multi-focus module generates multi-beam arrays which are arranged in parallel, and after the multi-beam arrays are focused by the laser direct writing scanning device, multi-focus laser arrays which are arranged in parallel at equal intervals are formed at a focal plane; a multi-focus translation staggered scanning strategy is designed, and in the scanning strategy, direct-writing machining areas of all focuses are interspersed and staggered, so that a close-connection direct-writing machining area is formed; the multi-focus laser arrays arranged in parallel at equal intervals perform scanning through a scanning strategy, in the scanning process, each focus is controlled through an independent laser switch of the focus, the multi-focus laser arrays interact with a photoetching material, and rapid laser direct writing of any pattern to be processed is achieved in a close connection direct writing processing area. According to the invention, one-mirror-to-bottom type seamless laser direct-writing scanning can be realized, and the multi-focus laser direct-writing processing efficiency and quality can be effectively improved.

The invention relates to high-solid-content water-based silicon nitride slurry for direct writing forming and a preparation method of the high-solid-content water-based silicon nitride slurry. The high-solid-content water-based silicon nitride slurry for direct writing molding comprises 60-76 wt% of silicon nitride powder, 0.2-1 wt% of a dispersing agent, 0.1-3 wt% of a thickening agent, a sintering aid and water, the sintering aid powder accounts for 0-12wt% of the total mass of the silicon nitride powder and the sintering aid.

The utility model discloses a 3D printer combining photocuring with ink direct writing, which comprises a printing platform, an injector and a laser, and a printing groove for accommodating ceramic slurry is formed in the printing platform; the injector is arranged above the printing platform and connected with a driving mechanism erected on the printing platform, and a conveying channel communicating with the metal slurry conveying pipe, a negative pressure cavity communicating with the outlet end of the conveying channel, a waterproof breathable film arranged between the negative pressure cavity and the conveying channel and a material extruding piece are arranged in the injector. The driving end of the material extruding part is arranged in the conveying channel so as to extrude and convey the metal slurry to an outlet of the conveying channel; the laser is connected with the injector; according to the device, residual bubbles in the metal slurry can be effectively removed, so that the situation of discharging interruption of a printing spray head is avoided, and the forming quality of a printed finished product is guaranteed.

The invention belongs to the technical field of biomedical engineering and tissue engineering, and particularly relates to an acellular matrix modified bionic micro-fluidic organ chip constructed by 3D printing composite near-field direct writing as well as a preparation method and application of the bionic micro-fluidic organ chip. According to the bionic micro-fluidic organ chip prepared by the invention, the microstructure and physiological similarity of a model are remarkably improved, the problems of insufficient bionic property, single cell and the like at present are solved, and the preparation method is simple, is suitable for batch production and solves the problem of high production cost. The invention provides a new technical direction for the construction of the bionic organ model.

The invention discloses a ceramic pug for 3D printing direct-writing molding by using waste porcelain as a raw material, and a preparation method and a product thereof. Waste porcelain particles, Longyan kaolin, potassium feldspar, quartz, ulexite, water, a sodium silicate aqueous solution and a sodium tripolyphosphate aqueous solution are used as raw materials; the formed ceramic pug is prepared into a 3D printing direct-writing molded ceramic product through 3D printing direct-writing molding. According to the invention, the large-particle waste porcelain is used as a raw material, so that the recycling and crushing cost of the waste porcelain is reduced, the recycling proportion of the waste porcelain is increased, and the additional value of the product is increased by utilizing the unique appearance mechanism of the waste porcelain particles, so that a new technology and a new way are provided for the preparation of the ceramic pug for 3D printing direct-writing molding and the utilization of the large-particle waste porcelain.

The invention belongs to the technical field of casting, and particularly relates to a method for preparing a water-soluble composite salt core based on a slurry direct-writing forming 3D printing technology. A water-soluble composite salt core material for low-melting-point alloy casting is composed of pretreated water-soluble inorganic salt, a binder and an additive, the pretreated water-soluble inorganic salt is obtained by mixing a coating solution and inorganic salt powder, and the mass percent of the coating solution and the inorganic salt powder is 100%. The ratio of the pretreated water-soluble inorganic salt to the binder to the additive is (60-80%): (20-30%): (0-10%). Compared with a traditional method for preparing a water-soluble salt core, the water-soluble composite salt core material has the advantages that the water-soluble salt core formed through slurry direct writing can be used for rapidly forming parts without a mold, the process is simple, the raw material cost is low, the equipment requirement is low, and rapid and accurate mold-free forming of high-precision complex salt cores can be achieved; the problem that complex salt cores are difficult to integrally form is solved.

The present application discloses a method for direct-writing printing of curved surface conformal sensors based on a five-axis motion platform, which relates to the field of direct-writing printing technology. The method performs grid discretization processing on the printed curved surface in a three-dimensional digital model of a three-dimensional structural part and then designs a target printing trajectory, thereby simplifying the process of complex curved surface trajectory design and avoiding trajectory distortion caused by existing two-dimensional to three-dimensional projection methods; then, a two-axis rotation mechanism is used in a direct-writing printing system based on a five-axis motion platform to perform posture adjustment, and a three-axis motion mechanism is used to perform position adjustment and printing. Direct manufacturing on a three-dimensional structural part can be performed when the printing nozzle extrudes ink vertically downward along the normal direction of the contact surface, thereby improving the manufacturing efficiency of curved surface conformal sensors, avoiding pattern distortion caused by transfer, and improving the accuracy and conformality of the manufactured curved surface conformal sensors. The method is suitable for promotion and application in the preparation of curved surface electronics.

The invention discloses a direct writing type photoetching machine exposure control method and device, a medium and a direct writing type photoetching machine, and the direct writing type photoetching machine exposure control method comprises the following steps: obtaining exposure data; digital micromirror control information is obtained according to the exposure data and a uniformity compensation template, and the uniformity compensation template is determined according to the influence value of the DMD digital micromirror on the photoresist thickness in the effective area of the DMD digital micromirror array and the corresponding photoresist thickness difference value; and controlling the DMD digital micromirror array according to the digital micromirror control information. According to the method disclosed by the invention, the exposure uniformity can be more finely controlled, the non-uniform glue thickness caused by factors such as equipment error and non-uniform light source is reduced, the precision of the photoetching process and the line width size consistency are improved, meanwhile, the high cost of replacing hardware and repeatedly exposing is avoided, the production efficiency and the yield are improved, and the production cost is reduced.

The invention discloses a nonlinear path planning method for a melt electrostatic direct writing stent guided by micropore characteristics, and relates to the technical field of additive manufacturing. Comprising the following steps: according to design requirements, defining binary functions L (x, y) and W (x, y), and respectively controlling spatial distribution of pore length and width of micropores; an XY plane is divided into orthogonal reference line grids through two groups of equidistant reference lines parallel to an X axis and a Y axis, namely an X (y) line and a Y (x) line, and each reference line can determine an upright plane, namely an X (y) plane and a Y (x) plane; and then determining geometric intersection points of the L / 2 (x, y) and W / 2 (x, y) function curves and an X (y) plane and a Y (x) plane determined by the reference line as path intersection points by using zigzag broken lines, after all the intersection points are obtained, sequentially connecting the intersection points to obtain a designed nonlinear path, and carrying out feasibility verification on the generated nonlinear path. The method provides a parameterized solution for micro-structure bionic design of the MEW stent, and is suitable for stent manufacturing with complex tissue regeneration requirements.

The present disclosure provides a high-temperature resistant nano-copper produced by laser direct writing, a preparation method and an application thereof. The high-temperature resistant nano-copper exhibits excellent oxidation resistance, thermal stability and superior conductivity. In this disclosure, the preparation is simple, and the nano-copper oxide ink can be stored for extended periods without being affected by oxidation. It is suitable for various manufacturing processes including printing, coating, and other similar methods. Moreover, based on laser direct writing, the processing efficiency is high, enabling the one-step integration of multi-performance of the high-temperature resistant nano-copper. The high-temperature resistant nano-copper described in the present disclosure can be used as an interconnection circuit in an integrated sensor system based on all-laser in-situ direct writing, and can be widely applied in fields of aerospace, automobile, electronics, etc.

The invention discloses a laser-assisted direct writing printing perception monitoring and intelligent prediction method and system, and the system comprises an optical dynamic focusing module, a liquid supply module, a temperature / modulus feedback module, a real-time morphology observation module, a printing platform motion module, a performance prediction and parameter reverse optimization module, and a programming controller cooperating with the modules. Further, through the steps of data acquisition, prediction model construction, modeling partition, parameter optimization and automatic process and intelligent printing, a multi-parameter coupling prediction model among temperature field parameters, printing size parameters and structural modulus parameters is constructed through a performance prediction and parameter reverse optimization module; according to the in-situ monitoring system, high-resolution in-situ multi-parameter detection and printing performance prediction feedback control in the printing process can be met at the same time, key performance indexes can be dynamically perceived and predicted in the printing process, and parameter self-adaptive regulation and control are achieved.

The invention relates to a device and a method for manufacturing a wave absorber through direct writing of photo-thermal auxiliary in-situ cured ink. The device comprises an ink direct writing assembly, a Delta mechanical arm assembly, an ultraviolet light assembly and a heating assembly, and is used for preparing the wave absorber with a complex structure and multiple loss mechanisms. According to the method, composite light-cured resin slurry containing a wave-absorbing agent is extruded through an ink direct-writing spray head, and in-situ light curing and heat curing of the printed composite light-cured resin slurry are achieved through an annular ultraviolet light LED lamp installed below an ink direct-writing printing head and a heating assembly arranged in a printing platform. And the formability and the printing precision of the ink direct-writing additive manufacturing wave absorber are improved.

The invention discloses a deviation rectification and alignment method and device applied to a direct-writing photoetching machine, a medium and a photoetching machine.The deviation rectification and alignment method applied to the direct-writing photoetching machine comprises the steps that when a medium layer has deviation rectification requirements, partition rigid transformation parameters of chip theoretical patterns in the medium layer corresponding to chips in a chip layer are obtained; the partition rigid transformation parameter comprises displacement; obtaining the iteration displacement step length based on the displacement of the chip theoretical pattern in the dielectric layer corresponding to each chip; the position of the chip theoretical pattern in the dielectric layer corresponding to each chip is corrected based on the iteration displacement step length until the dielectric layer and the chip layer meet a first condition, the chip theoretical pattern in the dielectric layer moves in the vector direction of the displacement during correction, and the dielectric layer and the chip layer meet a second condition; the vector direction is the direction from the center coordinate of the theoretical pattern of the chip on the dielectric layer to the center coordinate of the chip corresponding to the chip layer. According to the method provided by the invention, the alignment precision in a multi-chip packaging process is improved, and the condition of inaccurate pattern alignment caused by patch errors is corrected.

The invention relates to a method for preparing grain-oriented silicon nitride ceramic through direct-writing 3D printing. The method for preparing the grain-oriented silicon nitride ceramic through direct-writing molding 3D printing comprises the following steps: (1) mixing silicon nitride powder, a sintering aid, a dispersing agent and deionized water to obtain homogeneous direct-writing molding slurry; adding beta-Si3N4 whiskers into the slurry, carrying out primary high-speed stirring, then adding a thickening agent into the slurry, and carrying out secondary high-speed stirring, so as to obtain silicon nitride ceramic slurry of which the rheological property meets the printing requirement; (2) carrying out layer-by-layer printing on the silicon nitride ceramic slurry by adopting a 3D printing direct writing molding technology, and inducing Si3N4 whiskers to be directionally arranged along the printing direction by utilizing extrusion shearing force to obtain a 3D printed silicon nitride blank; and (3) drying, degreasing and sintering the obtained 3D printed silicon nitride green body to obtain the grain-oriented silicon nitride ceramic.

The utility model discloses an English writing corrector with an adjustable angle, which relates to the technical field of writing correctors and comprises a straight rule body, a vernier component and a wavy sub-rule, the straight rule body is slidably connected with the vernier component, a groove is arranged on the straight rule body, the wavy sub-rule is detachably connected with the groove, and the straight rule body is provided with a groove. The vernier assembly comprises a sliding head base, a rotating sliding head and a locking screw, and the rotating sliding head is rotationally connected with the sliding head base through the locking screw. When the straight rule is used, the vernier assembly slides on the straight rule body, a user can conveniently and rapidly draw a plurality of basically equidistant lines on blank paper, the slotted hole in the rotating sliding head can help a learner to rapidly draw four-line three-grids of different styles, grid drawing efficiency is effectively improved, and practicability is good. Meanwhile, the design of the child-mother ruler jigsaw puzzle increases practicability, the small ruler can have the function of drawing straight lines and wave lines at the same time, direct writing can be conducted in the ruler through the groove, and the bad writing habit is corrected.

The present invention discloses an integrated method for fabricating a frequency selective surface (FSS) for a complex curved cavity structure. This method utilizes multi-process composite 3D printing as a technical approach, employing FDM technology to fabricate a water-soluble substrate. 3D direct writing technology is then used to create an inner FSS pattern on the substrate surface. The cavity structure itself is then printed on top of the substrate, and an outer FSS pattern is then created on the surface of the cavity structure. The water-soluble substrate is then dissolved, ultimately resulting in a complex curved cavity FSS structure with frequency selective patterns on both the inner and outer surfaces. Furthermore, through the practice of this invention, surface treatment measures are required for the 3D printed structure before fabricating the FSS pattern, improving the quality and precision of the FSS metallization pattern and ensuring the integrated fabrication of the complex curved cavity structure and the inner and outer FSS patterns.

The invention discloses SiBCN ceramic slurry for direct-writing type 3D printing as well as a preparation method and a printing method of the SiBCN ceramic slurry, and belongs to the field of ceramic additive manufacturing. The invention aims to solve the problem of non-uniform selection and dispersion of SiBCN precursor filler in existing direct writing printing. And the slurry is prepared from cured polyborosilazane (PBSZ) powder, an inorganic rheological additive, a rheological synergist and a polyborosilazane (PBSZ) liquid. The preparation method comprises the following steps: 1, curing polyborosilazane (PBSZ); 2, ball-milling and crushing; (3) weighing; and 4, preparing slurry. The printing method comprises the steps of 1, printing a primary blank; and 2, curing and sintering. The SiBCN ceramic slurry for direct-writing type 3D printing and the preparation and printing thereof are provided by the invention.

The present invention discloses a system and method for fabricating a double-ring structure in one step based on laser direct writing. The system includes a continuous laser, a beam expansion system, an attenuation plate, a half-wave plate, an optical shutter, a spectrometer, an oil-immersion objective lens, and a positive-negative adjustable photoresist sample arranged along an optical path; further includes a three-dimensional high-precision nanopositioning translation stage, a lens, a CCD camera, and a computer; the spectrometer focuses an incident continuous-wave laser beam onto the surface of the positive-negative adjustable photoresist sample via the oil-immersion objective lens, and a portion of the laser beam incident on the sample surface is reflected back onto the spectrometer and then irradiated onto a third lens; the oil-immersion objective lens focuses the laser beam onto the sample, thereby fabricating the double-ring structure in one step. The present invention can obtain the double-ring structure in one step through a single process at a lower cost, rather than through two or more cumbersome steps; and the inner and outer diameters of the desired double-ring structure can be flexibly changed by changing the power density and the direct writing time.

The present application belongs to the field of carbon nanomaterials and micro-nano processing technology, and particularly relates to a method for assembling carbon nanotube arrays by hot scanning probe direct writing grooves. A polymer bottom layer and a thermosensitive polymer sacrificial layer are formed on the surface of a substrate in sequence; a groove structure array pattern is formed on the thermosensitive polymer sacrificial layer by using a hot scanning probe direct writing process, and residual thermosensitive polymer in the groove is removed; the surface of the polymer bottom layer is immersed in a silane coupling agent solution for functionalization treatment; and carbon nanotubes are directionally assembled in each groove structure, and the carbon nanotubes are arranged in the direction of the groove to obtain a groove-assembled carbon nanotube array. The present application combines the nanoscale direct writing capability of the hot scanning probe with the principle of groove-limited assembly of carbon nanotubes, and can flexibly and quickly prepare a nanoscale groove pattern on the surface of a substrate without traditional micro-nano processing means such as photolithography or electron beam exposure, and can realize high-density and high-orientation assembly of carbon nanotubes by using the groove.

The invention discloses a production process for optical micropore engraving based on color crystal CMF integration, which belongs to the technical field of color crystal glass preparation, and comprises the following steps: coating a layer of metallic color coating on the air surface of tempered glass, coating a bottom cover protective layer with polyurethane coating, and then pre-baking; arranging and finalizing the micropore matrix, micropore density and dot matrix trend changes according to preset parameters; performing arc-shaped engraving and direct writing on the air surface of the tempered glass, and then performing secondary baking and rapid cooling to obtain a finished product, wherein the polyurethane coating comprises a first polyol and a second polyol, wherein the first polyol has a double bond structure conjugated with malonylurea, and the second polyol has a symmetrical imine structure, and the good wear resistance and scratch resistance of the polyurethane coating of the invention makes it possible to directly perform arc-shaped engraving and direct writing on the glass.

The present invention provides an electron beam direct writing device, comprising a control module and at least one electron beam source output module. The control module is used for generating i types of control signals; i is an integer greater than or equal to 2; any one of the electron beam source output module is enabled when receiving the i types of control signals at the same time, and then emits a corresponding electron beam; each electron beam source output module comprises a receiving unit, a beam current intensity regulation and control unit and an output unit; the beam current intensity regulation and control unit is used for providing an intensity regulation and control signal; when i control ends of each receiving unit receive the i types of control signals at the same time, the receiving unit generates an enable signal; each output unit emits a corresponding electron beam on the basis of a received enable signal and the intensity regulation and control signal and regulates and controls the beam current intensity of the electron beam by means of the intensity regulation and control signal. The present invention effectively solves the problems of inconsistent direct writing times, inconsistent uniformity, and the like caused by inconsistent beam current intensities of electron beam sources in an electron beam source array.