937 results about "Direct writing" patented technology

Provided is an integrated circuit (IC) manufacturing method. The method includes receiving a design layout of an IC, the design layout having a main feature; performing a process correction to the main feature thereby generating a modified main feature; using a computer, generating a simulated contour of the modified main feature, the simulated contour having a plurality of points; generating a plurality of assistant data in computer readable format, wherein each assistant data includes at least one process performance factor associated with one of the points; and keeping the simulated contour and the assistant data for use by a further process stage, such as mask making, mask inspection, mask repairing, wafer direct writing, wafer inspection, and wafer repairing.

A method for fabricating an electronic device comprises providing a substrate (501), direct writing a functional material by a thermal spray on the substrate (502) and removing a portion of the function material to form the electronic or sensory device (503).

The method uses a common optical, system and sequentially creates structures of different sizes in a polymer substrate by means of different laser processes is described. One process uses a laser beam that is tightly focussed on the substrate surface and is used for creating fine groove structures by semi-continuous direct write type beam movement. The second process uses a second laser beam that is used to form a larger size image on the substrate surface and is used to create blind pads and contact holes in the substrate in step and drill mode. A third optional process uses the second laser beam operating in direct writing mode to remove layers of the substrate over larger continuous areas or in a mesh type pattern.

The invention relates to methods of writing a light-guiding structure in a bulk glass substrate. The bulk glass substrate is preferably made from a soft silica-based material having an annealing point less than about 1380°K. A pulsed laser beam is focused within the substrate while the focus is translated relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path. Substantially no laser-induced physical damage of the material is incurred along the scan path. Various optical devices can be made using this method.

A composite layer of a sorbent, chemoselective, non-electrically-conducting polymer and nano-particles of an electrically conducting material dispersed throughout the polymer is formed on a substrate by pulsed laser deposition, matrix assisted pulsed laser evaporation or matrix assisted pulsed laser evaporation direct writing.

A device that produces an electron beam with high optical quality for processing a sample, is presented. The optical quality is manifested by very high brightness and low energy spread. The device includes an electron source device comprising an electrode in the form of a shaped first layer, preferably in the form of a conducting crater carrying at least one nanotube, and an extracting electrode, which is formed with at least one aperture and is insulated from the firs layer. The source can be used in any column that requires such properties. The column according to the invention may be a full size or a miniature electron microscope, a lithography tool, a tool used for direct writing of wafers or a field emission display.

The invention discloses an image rendering method, an image rendering device and an electronic device. The image rendering method comprises steps: a to-be-processed image and specific image rendering effects are acquired; according to a pre-generated shader program configuration file for the specific image rendering effects and a program code file of each shader needed for realizing the specific image rendering effects, a shader program for realizing the specific image rendering effects is generated; and the shader program is executed, and image rendering processing is carried out on the to-be-processed image. By adopting the method provided by the invention, the program structure of the shader program, the file name of the program code file of each shader and constant parameters are arranged in the shader program configuration file, direct writing of the shader program code to an application is avoided, the pre-written shader program code can be reused, and the effect of improving GPU development efficiency is improved.

High resolution patterns provided on a surface of a semiconductor substrate and methods of direct printing of such high resolution patterns are disclosed. The high resolution patterns may have dimensions less than 0.1 micron and are formed by a direct writing method employing a supercritical fluid comprising nanometer-sized particles, which may be optionally electrically charged.

Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.

An acoustic transducer and method of making the acoustic transducer is disclosed. A transducer element for converting a signal between one of an electrical signal and an acoustic signal and the other of the electrical signal and the acoustic signal is provided. A backing to the transducer is additively fabricated to a side of the transducer element. The backing includes an electrically conductive path therein for conducting the electrical signal.

The present invention provides a laser-guided electrospinning direct writing device capable of realizing long-time controllable preparation and precise positioning of single uniform micro/nanostructure. The device is provided with a controller, a high-voltage relay, an electrostatic high-voltage [power] source, a hollow nozzle, a collimating focusing lens set, optical fibers, a sealing adjusting part, a laser, a solution feed pump, a solution feed pipe, a collecting board and a motion platform, wherein the controller is connected with the high-voltage relay; ends of the high-voltage relay are respectively connected with the electrostatic high-voltage [power] source, the collecting board and a conductor nozzle arranged at the front end of the hollow nozzle; the sealing adjusting part is in a sealing connection with the rear end of the hollow nozzle; the optical fibers pass through the center of the sealing adjusting part and are fixedly connected with the sealing adjusting part; the collimating focusing lens set is arranged at the front end of the optical fibers; the rear end of the optical fibers comes out of the hollow nozzle and is connected with the laser; the solution feed pump is communicated with the hollow nozzle through the solution feed pipe; and the collecting board is fixed on the motion platform and faces the hollow nozzle. The laser constraints the disordered motion of spinning jet flow and guides the spinning jet flow to deposit at the laser spot of the collecting board.

The invention discloses a multi-material laser direct writing conformal system and a method. The system comprises a vacuum seal case, a multi-joint mechanical arm, a multi-material laser direct writing head and a control system for controlling the constituent parts, wherein the mechanical arm and the laser direct writing head are arranged in the vacuum seal case; the laser direct writing head comprises a direct writing head body, a laser and at least two groups of material cylinders; a material channel and a laser focusing channel communicated with the laser and the material cylinders respectively are arranged on the direct writing head body; and the at least two groups of material cylinders are arranged on the direct writing head body in parallel. A particular process is as follows: the mechanical arm drives a workpiece to move along a set path; a material controller selects the corresponding material cylinders; a discharge head delivers and allows materials to be attached to the surface of the workpiece; and at the same time, laser light emitted from the laser focusing channel carries out solidifying or sintering forming on the attached materials. According to the invention, a control process is simple, the forming precision is high, continuous production is achieved, and production efficiency is improved.

The invention relates to a micrometer-nanometer structure writer of polymer material, wherein it is based on near-field static spinning technique, to quickly write adhesive material or macromolecule material, while the minimum diameter/line width is lower than 300nm/20 mum. It has micro probe control platform, integrated high-voltage static power source, flux controller, X-Y platform, probe and CCD microscope; the integrated high-voltage static power source can power the probe, while its anode is connected to probe and cathode is connected to ground; the flux controller is fixed on the micro probe control platform, while it is connected to probe via tube; the probe is used as ejector of material, while it is mounted on micro probe control platform; the microscope is used to detect the spinning process and the writing effect, while it is arranged on micro probe control platform.

A laser micro/nano processing system (100, 200, 300, 400) comprises: a laser light source used to provide a first laser beam having a first wavelength and a second laser beam having a second wavelength different from the first wavelength, with the pulse width of the first laser beam being in the range from a nanosecond to a femtosecond; an optical focusing assembly used to focus the first laser beam and the second laser beam to the same focal point; and a micro mobile platform (21) controlled by a computer. Also disclosed are a method for micro/nano-processing photosensitive materials with a laser and a method for fabricating a device with a micro/nano structure using laser two-photon direct writing technology. In the system and methods, spatial and temporal overlapping of two laser beams is utilized, so as to obtain a micro/nano structure with a processing resolution higher than that of a single laser beam, using an average power lower than that of a single laser beam.

There are provided techniques for direct printing material into parts made by additive manufacturing, such as parts made by laser sintering. The direct printed material may be a metal, elastomer, ceramic, or any other material. Further, the direct printed material is typically different than the laser sintering material. Other aspects of the invention include using direct printed materials in the laser sintered parts to improve part strength, provide multi-materials, selectively provide electrical conductivity, and/or provide other desirable features to the parts.

A method for making optical connections with optical waveguides includes mounting the optical waveguides or a device comprising the optical waveguides, on a component carrier. A partial region of the optical waveguides is embedded in a volume of resist material. Positions of the optical waveguides to be connected are detected with reference to a coordinate system using a measuring system. Favorable, three-dimensional geometries are determined for optical waveguide structures for connecting the optical waveguides to each other at predetermined connecting locations and the optical waveguide structure geometries are converted to a machine-readable dataset. The optical waveguide geometries in the volume of the resist material are three-dimensionally structured using a direct-writing lithography device operating on the basis of the machine-readable dataset. The structured resist material is treated using physical or chemical methods to form at least one optical waveguide structure having ends connected to predetermined connecting locations of the optical waveguides.

The invention relates to a method for manufacturing a micro-polarizer array based on a metal nanometer grating. The method comprises the steps that (1) a substrate is coated with a metal film layer, and the metal film layer is dried; (2) the metal film layer is coated with an electron beam positive photoresist layer in a spinning mode, and the electron beam positive photoresist layer is dried; (3) electron beam direct writing, exposure and developing are conducted on the photoresist layer, and then a photoresist nanoscale micro-polarizer array graph is obtained; (4) inductive coupled plasma is used for etching, wherein the photoresist layer with the image is used as a mask, the metal film layer is etched, and therefore the image is transferred to the metal film layer; (5) the photoresist layer is removed, and then the micro-polarizer array is obtained. The method for manufacturing the micro-polarizer array based on the metal nanometer grating is easy to implement. According to the method for manufacturing the micro-polarizer array based on the metal nanometer grating, the micro-polarizer array with multiple different polarization directions can be obtained through one-time exposure and developing; the polarization performance of the micro-polarizer array manufactured according to the method is high.