146 results about "Direct writing" patented technology

The invention discloses a scanning type exposure method and system adopting a parallel digital micromirror array, and relates to the technical field of photoetching exposure and maskless direct writing of mask.The scanning type exposure method comprises the steps that parallel digital micromirror initial mapping is established through a reference target exposure detection registration method; generating a block distortion field parameter table according to the initial mapping of the parallel digital micromirror, determining a micro-mark insertion position based on the block distortion field parameter table, and generating an expected coordinate; performing micro-mark exposure on the expected coordinate position, acquiring imaging data of the inserted micro-mark position, extracting an actual measurement coordinate from the imaging data of the micro-mark position, calculating a residual error by taking the expected coordinate and the actual measurement coordinate as an input difference, and writing the residual error into a residual error set; incremental fitting is carried out according to the residual set, the block distortion field parameter table is updated, and the exposure controller controls the parallel digital micromirror array to remap the pattern according to the updated block distortion field parameter table and triggers exposure. The method provided by the invention has better effects in coordinate mapping consistency and block parameter manageability.

The invention discloses a nonlinear path planning method for a melt electrostatic direct writing stent guided by micropore characteristics, and relates to the technical field of additive manufacturing. Comprising the following steps: according to design requirements, defining binary functions L (x, y) and W (x, y), and respectively controlling spatial distribution of pore length and width of micropores; an XY plane is divided into orthogonal reference line grids through two groups of equidistant reference lines parallel to an X axis and a Y axis, namely an X (y) line and a Y (x) line, and each reference line can determine an upright plane, namely an X (y) plane and a Y (x) plane; and then determining geometric intersection points of the L / 2 (x, y) and W / 2 (x, y) function curves and an X (y) plane and a Y (x) plane determined by the reference line as path intersection points by using zigzag broken lines, after all the intersection points are obtained, sequentially connecting the intersection points to obtain a designed nonlinear path, and carrying out feasibility verification on the generated nonlinear path. The method provides a parameterized solution for micro-structure bionic design of the MEW stent, and is suitable for stent manufacturing with complex tissue regeneration requirements.

The present disclosure provides a high-temperature resistant nano-copper produced by laser direct writing, a preparation method and an application thereof. The high-temperature resistant nano-copper exhibits excellent oxidation resistance, thermal stability and superior conductivity. In this disclosure, the preparation is simple, and the nano-copper oxide ink can be stored for extended periods without being affected by oxidation. It is suitable for various manufacturing processes including printing, coating, and other similar methods. Moreover, based on laser direct writing, the processing efficiency is high, enabling the one-step integration of multi-performance of the high-temperature resistant nano-copper. The high-temperature resistant nano-copper described in the present disclosure can be used as an interconnection circuit in an integrated sensor system based on all-laser in-situ direct writing, and can be widely applied in fields of aerospace, automobile, electronics, etc.

The invention discloses a laser-assisted direct writing printing perception monitoring and intelligent prediction method and system, and the system comprises an optical dynamic focusing module, a liquid supply module, a temperature / modulus feedback module, a real-time morphology observation module, a printing platform motion module, a performance prediction and parameter reverse optimization module, and a programming controller cooperating with the modules. Further, through the steps of data acquisition, prediction model construction, modeling partition, parameter optimization and automatic process and intelligent printing, a multi-parameter coupling prediction model among temperature field parameters, printing size parameters and structural modulus parameters is constructed through a performance prediction and parameter reverse optimization module; according to the in-situ monitoring system, high-resolution in-situ multi-parameter detection and printing performance prediction feedback control in the printing process can be met at the same time, key performance indexes can be dynamically perceived and predicted in the printing process, and parameter self-adaptive regulation and control are achieved.

The invention relates to a method for preparing grain-oriented silicon nitride ceramic through direct-writing 3D printing. The method for preparing the grain-oriented silicon nitride ceramic through direct-writing molding 3D printing comprises the following steps: (1) mixing silicon nitride powder, a sintering aid, a dispersing agent and deionized water to obtain homogeneous direct-writing molding slurry; adding beta-Si3N4 whiskers into the slurry, carrying out primary high-speed stirring, then adding a thickening agent into the slurry, and carrying out secondary high-speed stirring, so as to obtain silicon nitride ceramic slurry of which the rheological property meets the printing requirement; (2) carrying out layer-by-layer printing on the silicon nitride ceramic slurry by adopting a 3D printing direct writing molding technology, and inducing Si3N4 whiskers to be directionally arranged along the printing direction by utilizing extrusion shearing force to obtain a 3D printed silicon nitride blank; and (3) drying, degreasing and sintering the obtained 3D printed silicon nitride green body to obtain the grain-oriented silicon nitride ceramic.

The invention discloses a geometric phase metasurface high-flux laser direct writing system and method, and the system comprises a femtosecond laser, a beam expander, a angular dispersion compensation module, a digital micromirror array, a second 4F system, a spatial light modulator, a fifth lens and an objective lens according to the light advancing direction. Wherein the spatial light modulator is used for performing phase modulation on each unit light spot from the digital micromirror array based on a loaded holographic phase diagram to form a rod-shaped light spot array, and the rod-shaped light spot array forms parallel light transmitted at different angles through the fifth lens and converges at an entrance pupil of the objective lens together. And finally, a parallel direct-writing light spot array is formed in the two-photon photoresist, and geometric phase metasurface unit structure array printing is completed. According to the system, high-flux and high-flexibility direct-writing manufacturing of the geometric phase type metasurface is finally realized.

The application provides a hot-melt direct-writing heating system and a metal-melting direct-writing forming method. The hot-melt direct-writing heating system comprises a barrel exhaust mechanism (1), a feeding heating system and a printing substrate heating system (2). The feeding heating system comprises a barrel heating mechanism (4) for heating a barrel (3) and a needle heating mechanism (5) for heating a direct-writing needle (6). The printing substrate heating system comprises a suction disc (21), a suction disc heating mechanism (22) and a cooling mechanism (23) for cooling the suction disc heating mechanism in sequence. The suction disc comprises a suction disc surface (211) and a high-temperature-resistant fixing ring (212) arranged along the circumference of the suction disc surface. The suction disc surface is uniformly provided with a plurality of micropores. The application independently designs two heating sources to heat the barrel and the direct-writing needle respectively, and the barrel exhaust mechanism exhausts all oxygen. The micropores arranged on the suction disc surface can uniformly distribute the vacuum on the suction disc surface, thereby improving the adsorption uniformity.

The present application relates to the technical field of additive manufacturing, and particularly relates to a self-compensation printing head and method, an extrusion direct writing device and a working method. The printing head comprises a shell, a barrel, a screw and a self-compensation assembly; the lower part of the shell has a cavity, the barrel is rotatably installed in the cavity, and the screw is installed in the barrel for extruding material; the self-compensation assembly comprises an outer magnetic pole, an inner magnetic pole and a potentiometer, the outer magnetic pole is arranged on the inner wall of the cavity of the shell, the inner magnetic pole is arranged on the outer wall of the barrel and is arranged in the same polarity opposite to the outer magnetic pole, and the potentiometer is also installed on the barrel; the magnetic force of the outer magnetic pole and the inner magnetic pole makes the barrel at an initial angle, and when the material shear force increases, the magnetic force is overcome to drive the barrel and the potentiometer to rotate. According to the present application, the screw rotating speed can be automatically adjusted in real time according to the change of the material shear force, the stable control of the extrusion amount of different materials is realized, and the precision, quality and efficiency of multi-material direct writing forming are improved.

The application belongs to the technical field of electrode materials, and specifically discloses an electrode material based on ink direct writing 3D printing and a preparation method thereof. By controlling the rheological property of silver / silver chloride ink in ink direct writing, silver / silver chloride filaments of different sizes are printed. The silver / silver chloride ink in filament form is used to print silver / silver chloride rods or sheets with high surface area in a hollow shape. After degreasing and sintering at different temperatures, a silver / silver chloride reference electrode with high specific surface area and high mechanical strength is obtained. The reference electrode has higher specific surface area and mechanical strength, stronger impact and vibration resistance, lower polarization resistance, better long-term stability, higher polarization resistance of the electrode body with the same mass, minimum potential deviation under the same current, and minimum open circuit potential drift in natural seawater with certain temperature and salinity.

The application belongs to the technical field of ceramic materials, and discloses a carbon fiber reinforced silicon carbide ceramic composite material and a direct writing forming method.The direct writing forming method comprises the following steps: mixing carbon fibers and silicon carbide powder to obtain mixed powder, mixing a solvent and an additive to obtain a mixed solution, then mixing the mixed powder and the mixed solution, stirring and defoaming to obtain carbon fiber reinforced ceramic slurry; printing and forming the carbon fiber reinforced ceramic slurry by using a direct writing forming technology to obtain a green body; curing and drying the green body to remove free water of the green body; and performing debinding and sintering on the green body from which the free water is removed.The application can realize one-time forming of a product with a complex structure by using the direct writing forming method, and does not need to use a mold and perform complex densification treatment, so that the preparation cost is low; and the prepared product has no warping and cracking problems, and has good bending strength and fracture toughness.

This invention belongs to the field of cemented carbide additive manufacturing technology and discloses a method for preparing a high-solids WC-Co water-based slurry for direct-write forming. The invention uses cobalt-coated tungsten carbide powder as the solid phase, which is dispersed in an aqueous solution of ammonium citrate and polyethylene glycol composite additives to obtain a WC-Co water-based slurry with a solid content of 90wt%~93wt%. The slurry of this invention exhibits good shear-thinning properties and extrusion shape retention, with a total dispersant dosage of only 1~1.2wt%. After direct-write 3D printing and debinding sintering, a density ≥99% and a Vickers hardness >1900HV can be obtained. 30 The complex structure of WC-Co cemented carbide components is suitable for the low-cost preparation of high-performance cemented carbide in industrial applications.

The invention belongs to the technical field of hard alloy additive manufacturing, and discloses a preparation method of high-solid-phase WC-Co water-based slurry for direct writing forming. According to the preparation method, cobalt-coated tungsten carbide powder is used as a solid-phase main body and is dispersed in an ammonium citrate and polyethylene glycol composite additive aqueous solution, and WC-Co water-based slurry with the solid-phase content being 90-93 wt% is prepared. The slurry has the good shear thinning characteristic and extrusion shape preserving capacity, the total dosage of the dispersing agent is only 1-1.2 wt%, after direct-writing 3D printing and degreasing sintering, a WC-Co hard alloy component of a complex structure with the density larger than or equal to 99% and the Vickers hardness larger than 1900 HV30 can be obtained, and the slurry is suitable for low-cost preparation of high-performance hard alloy in the industrial field.

The application discloses a kind of laser volume direct writing optical lens additive manufacturing system and method, first by single point printing experiment to photosensitive resin obtains the relationship between irradiation time and solidification shape and depth, and obtains solidification growth function model by fitting and correction;Second, the residence time required by design surface is calculated by linear convolution and nonlinear algorithm;Residence time is processed by two-dimensional Gaussian filtering again, finally the corresponding conversion between residence time and laser irradiation energy is realized by 3D printing equipment, and the additive manufacturing of precision optical parts is realized.The application combines growth function and 3D printing technology, and proposes a new laser direct writing volume forming 3D printing method with high customization.The forming speed, precision and optical performance of the optical lens printed by the application are far superior to the optical lenses processed by other additive manufacturing equipment of the same price, so that additive manufacturing has further breakthrough in the field of precision optical manufacturing.

The invention relates to a direct writing assembly for synchronous patterning of different liquids, a device thereof, a use method and application. The direct writing assembly comprises at least two coating units arranged according to a preset mode; each coating unit comprises at least two conical flexible parts and a liquid containing device, the conical flexible parts are arranged along an arrangement line, and a first spacing distance S1 is formed between every two adjacent conical flexible parts; the arrangement lines of every two adjacent coating units are parallel, and a second spacing distance S2 is formed between every two adjacent coating units; the distance between the conical flexible parts belonging to different coating units is greater than a third spacing distance S3; the third spacing distance S3 is greater than the first spacing distance S1. By controlling the first spacing distance S1, the second spacing distance S2 and the third spacing distance S3, direct writing patterning of at least two different functional material solutions can be synchronously realized.

The application discloses a method for preparing a special-shaped metal matrix composite preform based on a direct writing forming technology, and comprises the following steps: at room temperature, auxiliary agents containing a solvent, a retarder, a thickening agent, a water-retaining agent and a defoaming agent are fully mixed and dissolved at a certain proportion, then a proper amount of gypsum powder is added for fully stirring to obtain a gypsum slurry; at room temperature, a certain amount of a dispersing agent is dissolved in water, and after the pH value is adjusted, ceramic powder is added and mixed to prepare a reinforced phase slurry; the gypsum slurry and the reinforced phase slurry are installed on two printing heads of a double-head direct writing forming device, printing is carried out based on a preset preform model, and after drying treatment, a metal matrix composite preform with a complex special-shaped structure is obtained. The application adopts the double-head direct writing forming technology to form the preform of the metal matrix composite with a complex shape structure of a sacrificial phase and a reinforced phase, the gypsum is removed after the metal infiltration is completed, and then a complex-shaped metal matrix ceramic composite is obtained.

The application discloses a kind of based on three-dimensional phase diagram straight writing line topography regulation and control method, device, equipment and medium, it is related to printing technical field, comprising: by obtaining the rheological test result of different viscosity ink, printing process parameters and line form characterization data, apparent viscosity and boundary parameter are obtained by integration and power law fitting, construct with normalized height, normalized velocity, apparent viscosity as three-dimensional dimension process phase diagram, then by matching adaptive parameter or ink rheological property obtains target form.This introduces apparent viscosity as the third dimension, optimizes the limitation that two-dimensional phase diagram only adapts specific viscosity ink, quantifies the correlation of process parameters, rheological property and line form, only three core parameters can realize cross-ink system form accurate prediction and regulation, compatible with multiple viscosity inks, significantly reduce parameter optimization time consumption, avoid experience trial and error, accurately identify material process window, provide quantitative target for ink formula optimization, improve printing process adaptability.

The invention discloses a processing method of a VCSEL chip surface micro-lens array, and belongs to the technical field of micro-lens arrays, and the method comprises the following steps: firstly, preparing a silicon-based mold S1 through gray scale direct writing and first-stage etching; coating photoresist on the surface of the S1, performing overlay exposure, and performing development and second-stage etching to obtain a mold S2 with a complementary structure; and finally, by taking the S2 as a template, forming a microlens prototype on the surface of the VCSEL chip through an imprinting process, and removing residual glue through plasma ashing to obtain a final microlens array. According to the preparation method, a combined process of combining gray scale direct writing with two-stage etching and imprinting copying is adopted, so that the problems of low aspect ratio, poor mold precision, insufficient process compatibility, difficulty in removing residual glue and the like in the prior art are solved, efficient preparation of the high-precision and high-aspect-ratio micro-lens array is realized, and the light beam quality and the coupling efficiency of the VCSEL chip are remarkably improved.

The invention discloses a direct-writing photoetching system, method and device. The system comprises a mechanical subsystem, an optical subsystem and an electric control subsystem, the electric control subsystem is used for determining an exposure mechanism conforming to the exposure dot matrix image and determining the moving position of the mechanical subsystem; the optical subsystem is used for providing a light source, correcting optical distortion and generating an exposure dot matrix image under the control of the electric control subsystem; a substrate coated with photoresist is carried on the mechanical subsystem, and the mechanical subsystem is used for moving from a first position to a second position after single exposure under the control of the electric control subsystem; the distance between the first position and the second position is an integer, and p is the grid width. By adopting the system, the exposure speed of the exposure dot matrix image can be improved, and the requirement on the mobility performance of the workpiece table is reduced.

The invention relates to the technical field of electro-catalysis and 3D printing, in particular to an ink direct-writing type 3D printing porous carbon electrode and a preparation method thereof, and is mainly applied to the electro-catalysis process of electro-synthesis of hydrogen peroxide. Carbon black powder and polytetrafluoroethylene are mixed to prepare printing slurry, and an ink direct-writing type 3D printer is used for preparing the porous electrode.

The invention relates to an automated method and system for solar panel repair, wherein the method comprises: a) detecting, using at least one detection means, at least one defective cell in at least one solar panel; b) making at least one incision, using at least one cutting means, in the rear face of at the least one solar panel to expose the contacts of the at least one defective cell; c) printing on the rear face of the at least one solar panel, using at least one direct writing means with ink, at least one marking comprising at least one compound containing at least one metallic element with a load of at least 80%, following a random pattern to short-circuit the at least one defective cell; d) sintering the at least one marking, using at least one energy application means, thereby transforming the marking into at least one metallic circuit; and e) encapsulating the at least one printed circuit, using at least one encapsulating means, which applies at least one insulating element.

The invention provides a high repetition frequency pulse train ultrashort pulse laser reduction direct writing method, which is applied to the technical field of laser processing and comprises the following steps: preparing precursor ink which comprises metal salt or metal oxide, polyhydric alcohol, deionized water and a dispersing agent; coating the precursor ink on the surface of a transparent substrate to form a liquid film; according to the target metal pattern, performing reduction direct writing on the surface of the transparent substrate by adopting ultra-short pulse laser of a high-repetition-frequency pulse string; and washing and blow-drying redundant precursor ink on the surface of the transparent substrate through deionized water and ethyl alcohol respectively, and obtaining a target metal pattern on the surface of the transparent substrate. According to the method, the heat influence of the substrate is effectively reduced, and the applicability of the laser direct writing technology based on the photothermal effect to different transparent substrate materials is expanded.

The invention provides ink direct writing additive manufacturing equipment based on fiber directional regulation and control and a working method of the ink direct writing additive manufacturing equipment. The device comprises a fiber wire feeding system, a fiber / ceramic ink co-extrusion system and an ink direct-writing printing platform system, wherein the fiber wire feeding system and the fiber / ceramic ink co-extrusion system are arranged at the front part of the ink direct-writing printing platform system; the fiber wire feeding system comprises a servo motor, a gear, a roller, a bearing and a fiber transmission shaft; the fiber / ceramic ink co-extrusion system comprises a charging cylinder, a needle cylinder, a push rod, a Luer taper and a co-extrusion nozzle; the problems that in an existing ink direct writing technology, continuous fibers are prone to breakage depending on passive friction driving, and fibers are bent disorderly or locally gathered through a traditional single-channel nozzle are solved, the printing cost is effectively reduced, real-time synchronization of the fiber conveying speed and the ink extrusion speed is achieved, the possibility of fiber breakage is reduced, and the printing quality is improved. Fibers are physically isolated from ink, transverse deviation of the fibers is inhibited, and directional toughening of the fibers is achieved.

The invention discloses a write-through lithography machine and an exposure synchronization diagnosis method and a signal synchronization processing unit thereof, and the write-through lithography machine exposure synchronization diagnosis method comprises the following steps: in an exposure process, obtaining a first position synchronization signal when the movement displacement of a motion platform reaches a theoretical trigger interval, and obtaining a second position synchronization signal when the movement displacement reaches a theoretical trigger interval; acquiring the physical position of the motion platform; calculating a calculation position of the motion platform according to the first position synchronization signal; and when the position deviation between the physical position and the calculation position is greater than a position deviation threshold value, performing early warning processing. According to the method provided by the invention, diagnosis and timely early warning of the abnormity of the position synchronization signal in the exposure process are realized, and the abnormal deviation between the calculated position of the motion platform and the actual physical position of the motion platform obtained based on the position synchronization signal can be found in time; therefore, the risks of exposure position offset, pattern distortion and the like caused by abnormal position synchronization are reduced, and the reliability of the exposure process is improved.

The invention discloses a critical dimension uniformity verification method, and belongs to the technical field of photoetching. According to the method, the to-be-measured target is rotated, and exposure is continuously performed twice on the same to-be-measured target; then developing, etching and cleaning are carried out in sequence, and two measurement patterns are formed in the same target to be measured; and finally, respectively measuring the two measurement patterns, so that the influence of the exposure step on the uniformity of the critical dimension can be determined according to the uniformity distribution diagrams of the critical dimension corresponding to the two measurement patterns and the preset angles of the two times of exposure rotation. Therefore, independent analysis of the uniformity of the critical dimension of the direct-writing exposure machine can be realized under the condition of a single line, and meanwhile, the verification process can be simplified and verification materials can be saved.

The application belongs to the field of additive manufacturing, and specifically discloses a 3D printing and mechanical processing composite manufacturing system and a workpiece manufacturing method. The composite manufacturing system comprises a servo turntable, a first mechanical arm, an additive manufacturing module integrated at the tail end of the first mechanical arm for forming a solid member on the servo turntable, the additive manufacturing module comprising a direct writing forming nozzle and at least one fused deposition forming nozzle, a second mechanical arm, a subtractive and detection module integrated at the tail end of the second mechanical arm for 3D scanning and milling processing of the solid member, the subtractive and detection module comprising a 3D scanning device and a mechanical milling device, and a control module electrically connected with the servo turntable, the first mechanical arm, the additive manufacturing module, the second mechanical arm and the subtractive and detection module. The application can solve the technical problem that heat-sensitive non-metallic members are difficult to balance between efficient forming and high-precision processing, effectively improves the functional integration level of the equipment, and simplifies the manufacturing process of multifunctional members.

The application provides a three-dimensional special-shaped light waveguide laser direct writing method and system, and relates to the technical field of laser.The method comprises the following steps: based on an initial topography control vector, cooperative calculation and optimization are performed through a preset process model, the process model is integrated with a material response database, a slit transfer function model and a scanning superposition model, so that a cooperative control instruction set for each path point is generated, and the instruction set accurately specifies the states that need to be synchronously reached by a polarization control unit, an electric slit mechanism and a laser power module when laser reaches each path point; a three-dimensional displacement platform is driven to scan along a path point sequence, and a topography cooperative controller performs interpolation calculation on the instructions of adjacent path points in the cooperative control instruction set according to real-time position feedback of the platform.The application can actively design the waveguide cross section geometry topography and accurately realize it in three-dimensional space.

The invention provides a printing head of a direct-writing type 3D printer and the direct-writing type 3D printer, and relates to the technical field of 3D printing. The printing head comprises a storage shell, a plurality of storage barrels, a nozzle, a spherical fixed shell, a spherical rotating shell and a driving mechanism; a plurality of vent holes are formed in the spherical fixing shell; a plurality of air outlet holes are formed in the spherical rotating shell; and the driving mechanism is used for driving the spherical rotating shell to rotate in the spherical fixed shell, so that the materials in one storage barrel are extruded out through the nozzles, or the materials in the multiple storage barrels are extruded out through the nozzles. Composite printing can be carried out on two or more materials under the condition that the printing head is not replaced, use is convenient, rapid switching of the materials in the continuous printing process is achieved, errors caused by position deviation in the process of frequently replacing the printing head in the prior art are avoided, and for preparation of intelligent composite materials, the production efficiency is greatly improved. And the method has important application prospects in diversified combination design and development and the like.

The invention discloses a three-dimensional phase diagram-based straight writing line morphology regulation and control method, device, equipment and medium, and relates to the technical field of printing, and the method comprises the steps: obtaining the rheological test results of inks with different viscosities, printing process parameters and line morphology representation data, and carrying out integration and power law fitting to obtain apparent viscosity and boundary parameters; a process phase diagram with normalization height, normalization speed and apparent viscosity as three dimensions is constructed, and a target form is obtained by matching adaptive parameters or ink rheological characteristics. In this way, apparent viscosity is introduced as a third dimension, the limitation that a two-dimensional phase diagram is only adapted to ink with specific viscosity is optimized, correlation among technological parameters, rheological properties and line forms is quantified, accurate prediction and regulation of the form of a cross-ink system can be achieved only through three core parameters, the method is compatible with ink with various viscosities, time consumed for parameter optimization is remarkably shortened, and the method is suitable for large-scale popularization and application. And experience trial and error are avoided, a material process window is accurately identified, a quantitative target is provided for ink formula optimization, and the adaptability of a printing process is improved.

The invention relates to a method for preparing a single-line type optical waveguide in ultralow-expansion microcrystalline glass by directly using a femtosecond laser direct writing technology without a mask, and belongs to the field of optical waveguide preparation and integrated photonics. The preparation method comprises the following steps: (1) selecting commercial ultralow-expansion microcrystalline glass as a matrix material, and carrying out ultrasonic cleaning pretreatment on a sample; (2) focusing a laser beam at a position about 150 [mu] m below the surface of the sample for direct writing by using a femtosecond laser with a pulse width of 300fs under optimized laser parameters to form a waveguide structure; and (3) polishing the directly written sample, characterizing the structure, morphology, transmittance and chemical corrosion resistance of the sample, and testing the insertion loss and other transmission characteristics of the waveguide. Compared with the existing technology of directly writing the waveguide in a glass system such as silicon dioxide, the method has the advantages that the optical waveguide is prepared in the ultralow-expansion microcrystalline glass through femtosecond laser direct writing for the first time, and the method has important research significance for improving the stability of an optical path and the precision of an optical device.

The invention provides a mask and a preparation method thereof, and relates to the technical field of semiconductors, and the preparation method comprises the following steps: manufacturing a mother set pattern on a first substrate through an electron beam lithography process; the mother set pattern is reversely reprinted on a working mold; the mother set pattern on the working mold is imprinted on a second substrate; and repeatedly coining the mother set pattern on the second substrate, and forming a plurality of preset arranged mother set patterns on the second substrate so as to obtain the mask with the preset pattern. A nano-imprinting photoetching process and an electron beam photoetching process are introduced to be matched for production, only a single mother set pattern is processed in the electron beam photoetching process, photoetching processing of a mask chip array on the front side is completed by the nano-imprinting photoetching process, the area and workload of direct writing of a single electron beam photoetching sheet are reduced, and the production efficiency is improved. The electron beam lithography single-chip process time is greatly reduced, the overall tape-out efficiency is improved, the productivity is optimized, and the cost is greatly reduced.