692 results about "Laser direct writing" patented technology

A multimode long period fiber Bragg grating (LPFBG) for a predetermined wavelength band. The LPFBG formed of a non-photosensitive material having an initial index of refraction. The multimode optical fiber core includes a substantially cylindrical surface, a longitudinal core axis, a core radius, and a number of index-altered portions having an altered index of refraction different from the initial cladding index of refraction. Each of the index-altered multimode optical fiber core has a first transmission surface and second transmission surface that is substantially parallel to the first transmission surface. Also, these index-altered portions are arranged within the non-photosensitive material of the multimode optical fiber core such that the first transmission surface of one portion of the plurality of index-altered portions is substantially parallel to the second transmission surface of a neighboring portion to form a long period Bragg grating structure.

The invention discloses a system and a method for preparing a micro-pore array through femtosecond laser direct writing. The system comprises a femtosecond vector light field generation system, a spatial filtering component, a computer and a three-dimensional mobile platform, wherein a 1/2 wave plate, a Glan-laser polarizer, a beam expander and the femtosecond vector light field generation system are arranged on an output straight light path of a femtosecond laser device in sequence; a 4f system is arranged on a light path behind a reflective pure phase spatial light modulator after a holographic phase plate is loaded; a spatial filter is arranged on a frequency spectrum surface; and positive and negative levels of diffraction light which pass through the spatial filter pass through a 1/4 wave plate respectively and are combined into a beam of laser through a Rochi grating. A material is adjusted to a focal position through the spatial filtering component, an electronic diaphragm, a focusing lens and the three-dimensional mobile platform; and the spatial light modulator, the electronic diaphragm and the three-dimensional mobile platform are connected with a computer through data lines. The device has the advantages of simple structure, convenience in operation and capabilities of preparing the micro-pore array with various patterns and improving the machining efficiency.

The invention discloses a multi-beam parallel laser direct writing device and a multi-beam parallel laser direct writing method. A Dammann grating beam-splitting device is combined with two-photon absorption, so that the device has the characteristics of high stability and high resolution ratio, a periodic micro-nano structure is easily manufactured, and the processing efficiency can be improved by hundreds of times. The multi-beam parallel laser direct writing device and the multi-beam parallel laser direct writing method are suitable for processing and industrial production of large-area periodic micro-nano optical structures.

The invention discloses a multi-material laser direct writing conformal system and a method. The system comprises a vacuum seal case, a multi-joint mechanical arm, a multi-material laser direct writing head and a control system for controlling the constituent parts, wherein the mechanical arm and the laser direct writing head are arranged in the vacuum seal case; the laser direct writing head comprises a direct writing head body, a laser and at least two groups of material cylinders; a material channel and a laser focusing channel communicated with the laser and the material cylinders respectively are arranged on the direct writing head body; and the at least two groups of material cylinders are arranged on the direct writing head body in parallel. A particular process is as follows: the mechanical arm drives a workpiece to move along a set path; a material controller selects the corresponding material cylinders; a discharge head delivers and allows materials to be attached to the surface of the workpiece; and at the same time, laser light emitted from the laser focusing channel carries out solidifying or sintering forming on the attached materials. According to the invention, a control process is simple, the forming precision is high, continuous production is achieved, and production efficiency is improved.

The invention discloses a clamping-piece-type microfluidic device and a manufacturing method. The clamping-piece-type microfluidic device comprises a cover plate, sealing gaskets, a microfluidic chip assembly and a bottom plate; a sample inlet and a cover plate sealing gasket groove are formed in the cover plate; the microfluidic chip assembly is composed of a laminating film and a microfluidic chip with a microfluidic channel, and a liquid inlet hole, a liquid outlet hole and a positioning hole are formed in the microfluidic chip assembly; the bottom plate is provided with a sample outlet, a bottom plate sealing gasket groove and a positioning column; the sealing gaskets are arranged in the sealing gasket grooves formed in the cover plate and the bottom plate. The manufacturing method comprises an injection molding process method of the cover plate and the bottom plate, a laser direct writing method of the microfluidic chip, a laminating and bonding method of the microfluidic chip assembly and a hot-press assembly method of the microfluidic device. The clamping-piece-type microfluidic device is simple in structure and manufacturing method, low in cost, high in finished product rate and suitable for both one-piece making for laboratory scientific research and commercial mass production.

The invention provides a high-speed multi-beam parallel laser direct-writing device applying to micro-nano processing. The device consists of an inscribing light source modulation module, an inscribing optical header, an out-of-focus detection module, an illuminating and monitoring module, a sample displacement table and a master control module. The device greatly improves inscribing speed by multi-beam laser parallel high-speed inscribing. A multi-beam inscribing sub-system can be combined with sample tables with different motion modes to form inscribing devices with different functions according to the requirement of actual application.

The invention discloses a rotating table type femtosecond laser direct writing device. The rotating table type femtosecond laser direct writing device comprises a femtosecond laser source, a laser path, an X-Y axis two-dimension translation table, a rotating table and a controller, wherein the laser path is provided with a laser modulator, a two-dimension laser scanning galvanometer and a microobjective, after being modulated by the laser modulator, laser beams from the femtosecond laser source pass through the two-dimension laser scanning galvanometer to be projected onto a machined workpiece through the microobjective; the rotating table is arranged on the X-Y axis two-dimension translation table, a rotating shaft of the rotating table is aligned with a direct writing light axis, the table face of the rotating table is perpendicular to the direct writing light axis, and the machined workpiece is fixed onto the table face of the rotating table, and the controller is constructed into a form capable of controlling the laser beams incoming onto the machined workpiece through the laser path and the operation of the X-Y axis two-dimension translation table and the rotating table.

Te invention discloses a method for preparing a three-dimensional hollow micro nanometer functional structure by utilizing laser direct writing. The method is used for obtaining a three-dimensional micro nanometer functional structure through surface functionalization. The method comprises the following steps of: selecting and processing a hollow substrate, and placing a hollow substrate on an object carrying support foundation base; titrating a photoresist on the object carrying support foundation base of the hollow substrate, and preparing a laser direct writing photoresist polymeric compound three-dimensional hollow micro nanometer structure; and carrying out surface functionalization of the photoresist polymeric compound three-dimensional hollow micro nanometer structure, carrying out ornament and treatment on the three-dimensional hollow micro nanometer functional structure, thereby obtaining a finished product. The method provided by the invention can be used for preparing photoresist polymeric compound hollow three-dimensional micro nanometer structures with different heights, side lengths and cross-section geometrys on the hollow substrate based on a two-photon polymerization, and then the functionalization of the photoresist polymeric compound hollow three-dimensional micro nanometer structure is realized through growth and ornament treatment of a functionalization material, and the method has the characteristics of complex picture batch, reiteration design and controllable preparation of any complex picture.

The invention provides a synchronous pulse exposure method for maskless lithography equipment. The maskless lithography equipment adopts an exposure imaging system consisting of a UV (ultraviolet) laser or UV LED light source, a DMD (digital micro-mirror device) and an optical lens; the synchronous pulse exposure method is characterized in that a series of pulse synchronization signals are generated, the DMD and the UV laser or UV LED light source are triggered to synchronously work, and the pulse interval of the pulse synchronization signals depends on the replacement or refreshing cycle of the DMD to graphs; a digital laser direct-writing system comprises an upper computer in charge of outputting digital lattice patterns and the series of pulse synchronization signals to the exposure imaging systems, and one or more exposure imaging systems arranged side by side. According to the method, a synchronous control problem of parts of the lithography equipment is solved, more effective and reasonable exposure and refreshing time is convenient to design, and the shortcomings of low production capacity and poor system adaptability of a conventional exposure machine are overcome.

The invention discloses a femtosecond laser direct writing sapphire ring light guide and a preparation method thereof. A cross section of the prepared femtosecond laser direct writing sapphire ring light guide is elliptic, a light guide part thereof is in a shape of a three-dimensional ring, which is close to a femtosecond laser acting region, and the outer circle of the ring is 200nm from the femtosecond laser acting region. The preparation method comprises the following steps of (1) optically polishing a sapphire wafer; (2) cleaning the sapphire wafer; (3) placing the sapphire wafer on a three-dimensional micromachining platform; (4) setting parameters; (5) carrying out femtosecond laser direct writing; (6) carrying out real-time monitoring through a CCD; (7) carrying out a light pass test; (8) judging whether a three-dimensional ring light guide is formed at a specific position of the sapphire wafer; (9) completing direct writing of the sapphire ring light guide so as to obtain the sapphire ring light guide. The invention is used for transmitting light signals in the environment with ultra-high intensity and ultra-high temperature, and the prepared ring light guide of micron dimension is further used for integration of an optical system.

A volume Fresnel zone plate and a method of producing such a device using a femtosecond laser for direct writing of zone plates. A volume zone plate has a number of Fresnel zone plate layers designed to focus light coherently to a single spot. Embodiments include both low numerical aperture (NA) and high NA zone plates, and provide a significant increase in overall diffraction efficiency over a single Fresnel zone plate.

A galvanometer type laser direct writing photoetching machine adopts the modular design, and is composed of a laser scanning module, an automatic focusing module, a sample table module, a displacement table module, a sample wafer monitoring module and a control module. By adopting double-galvanometer laser scanning and a wide-range two-dimensional displacement table, the galvanometer type laser direct writing photoetching machine can achieve high-speed wide-range high-precision laser direct writing photolithography, and suitable for rapid and economic manufacture of micronano structures.

The invention discloses a preparation method of a self-powered electronic skin system based on a laser reduced graphene/MXene composite material. The preparation method comprises the following steps:S1, preparing a graphene oxide/MXene mixed solution; S2, uniformly coating a flexible substrate with the graphene oxide/MXene mixed solution prepared in the step S1 to obtain a high-density flexible graphene oxide/MXene composite film; S3, obtaining a patterned laser reduced graphene/MXene composite electrode from the high-density flexible graphene oxide/MXene composite film obtained in the step S2 by a laser direct writing technology. According to the technical scheme, the laser reduced graphene/MXene patterned composite electrode is prepared by the laser direct writing technology after low-cost graphene oxide and an MXene solution are mixed, and the laser reduced graphene/MXene patterned composite electrode is used as a sensing and energy storage material, so that a multifunctional passive self-powered electronic skin system is designed.

The method of making grating using laser direct writing apparatus is mainly used to make and measure long or circular grating. The laser direct writing apparatus is used to expose to light the rough blank of grating coated with photo-sensitive materials, the manufacturing process being controlled automatically by a computer. The operating steps are: The special computer controlling system sends a driving instruction to a displacement driver; the displacement driver drives a making platform to move, a displacement sensor transmits the amount of displacement of the working platform to the computer, comparing the amount with the ruling positions stored in the computer; if "Yes", the computer sends an instruction to an exposure controller to start a light beam scanning head to make an exposure, if "No", it sends an instruction to turn off the scanning head not to make exposure.

The invention relates to a method and a device of laser direct writing machining and belongs to the technical field of laser machining. The device is a laser machining device which comprises a laser light source, a reflector group, a front reshaping lens group, a liquid crystal light valve, a rear reshaping lens group, a focusing lens, materials to be processed and a reflector or a multi-surface rotating reflector. The laser light source is used to generate laser to be machined, after beams of the laser to be machined are expanded by the front lens group, the laser is reshaped by the liquid crystal light valve, and then the beams of the laser to be machined are expanded by the rear lens group and the laser is converged on the materials to be machined, so that the laser direct writing machining can be achieved. The laser machining device can machine in a high speed direct writing mode, and at the same time, meets requirements of special machining shapes, achieves wide range of laser direct writing machining and has good practical significance.

Provided is a method for preparing a two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing. The invention provides a method and experiment device for preparing the periodically-distributed two-dimensional photonic crystal structure with the feature size being the sub-micron dimension in one step in the large area by focusing identical-wavelength double-pulse femtosecond laser on the surface of metal through a plano-convex cylindrical lens, and the identical-wavelength double-pulse femtosecond laser is obtained based on the spectrophotometry of birefringent crystals and has the features of collinear transmission, cross polarization and picosecond time delay. Two-dimensional periodic structure patterns can be effectively regulated and controlled by changing the energy and the number of pulses of input laser, the thicknesses and the azimuth angles of the birefringent crystals and the like. Through the combined design of different linear polarization directions and the variable time delay feature of two femtosecond laser pulses and focusing of the cylindrical lens, preparation of the two-dimensional metallic photonic crystal structure within the large area is achieved conveniently and quickly. The novel preparation method adopting the double-pulse femtosecond laser with cross polarization and variable time delay has potential important applications in the field of material micro-nano processing and preparation.

The invention discloses a laser direct writing exposure device based on stimulated light emission loss. The laser direct writing exposure device is characterized by comprising an excitation light source, a de-excitation light source, a first space light modulator, a second space light modulator, a half wave plate group, a dichroscope, a phase position type wave zone plate, an amplitude type wave zone plate, a high numerical value aperture achromatic objective and a three-dimension scanning platform. The laser direct writing exposure device provided by the invention can realize the optical exposure of high resolution and long focus depth.

The invention discloses a laser direct writing photolithographic system combined with a single quantum dot locating function. The laser direct writing photolithographic system can be directly switched to a direct writing photolithographic function to achieve good connection after locating the position of a single quantum dot in a sample; the laser direct writing photolithographic system combined with the single quantum dot locating function can be used for manufacturing a micro-nano structure directly after locating the quantum dot. The system can use a single photon detection system composed of a single photon detector and a single photon counting board at the detection end and can record the coordinates, thereby achieving the laser direct writing processing function and achieving pumping and detecting operations of the quantum dot, and besides, the laser direct writing processing function and the pumping and detecting function of the quantum dot can be organically combined.

Disclosed is an assembly for aligning a rotating shaft of a rotating table type laser direct writing device to the direct writing optical axis. The direct writing device comprises a laser source, a laser path and a rotating table, wherein a laser modulator, a first reflector, a second reflector and a microscope objective are sequentially arranged on the laser path, laser beams are modulated by the laser modulator and then reflected by the first and second reflectors to be incident onto the microscope objective, and the tabletop of the rotating table is perpendicular to the direct writing optical axis. The alignment assembly comprises a panel piece and a digital imaging system, wherein a metal film is arranged on one side of the panel piece, the panel piece is fixed to the tabletop of the rotating table, the metal film faces the microscope objective, and the digital imaging system comprises a lighting source, a visible light splitter, an image sensor and a displayer. Visible light from the lighting source is reflected by the light splitting piece and then passes through the second reflector to be incident onto the metal film through the microscope objective, visible light reflected by the metal film passes through the microscope objective, the second reflector and the visible light splitter to enter the image sensor, and the displayer displays images from the image sensor.

The invention provides a femtosecond laser direct writing method of copper antioxidant microstructure and copper ion ink, A method for fabricate a microelectronic device by directly writing a cop microstructure on a copper ion thin film with a femtosecond laser includes that steps of: (a) providing a copper ion ink comprising a copper salt, a polyvinylpyrrolidone, and a long chain alcohol, whereinthe solvent is water; (b) preparing a copper ion film: aft that substrate to be washed by an organic solvent and soaked in deionized wat, the copper ion ink is dripped or spin-coated on the cleaned substrate, and the thickness is 100 DEG C after oven drying; 500 [mu]m copper ion film; (c) directly writing that copper wire using a femtosecond laser direct write device so as to direct write of thedesired electrode circuit on the thin film; (d) removing that area not irradiated by the femtosecond lase: cleaning the substrate with organic solvent and water in turn, and finally obtaining the substrate printed with the electrode circuit. The method of the invention and the copper ion ink can simplify the manufacturing process of the microelectronic device, reduce the manufacturing cost and improve the product performance.