The utility model discloses a
liquid nitrogen type cooling sample table for
vacuum coating, which comprises a rotating table, a first lifting table mounted on the rotating table, a hollow interlayer
pipe mounted on the first lifting table, a hollow shaft arranged on the rotating table and driven by the rotating table to rotate, and a second lifting table arranged on the outer side of the hollow shaft and connected with the rotating table. A
wafer bracket is arranged at the end, away from the rotating table, of the hollow shaft. According to the utility model, the structure is simple, through the arrangement of the
liquid nitrogen chamber, after a sample is subjected to high-
temperature treatment, the
liquid nitrogen chamber can be utilized to quickly cool the sample to a liquid
nitrogen low temperature, and then under the action of the first lifting platform, the first lifting platform drives the liquid
nitrogen chamber and the heating disc to perform synchronous height lifting adjustment, so that the distance between the heating disc and the
wafer holder is adjusted; when the liquid
nitrogen chamber and the heating disc are spaced from the
wafer support by a certain distance, a worker can more conveniently put a sample into the wafer support for treatment, and then the sample on the wafer support can be subjected to high-
temperature treatment or cooling treatment by adjusting the height of the liquid nitrogen chamber and the height of the heating disc respectively.