Crystal direction finder for directly measuring deflecting angle in crystal orientation and measurement method thereof

A technology for measuring the deviation angle and crystal, which is applied in the direction of measuring devices, instruments, scientific instruments, etc., can solve the problems of cumulative error X-rays, complicated operation methods, and low measurement efficiency, so as to reduce the cumulative error and avoid the influence of human factors. The effect of avoiding leakage

CN103257150AInactive Publication Date: 2013-08-21YUNNAN KIRO CH PHOTONICS
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Publication Date
2013-08-21
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a crystal direction finder for directly measuring deflecting angle in crystal orientation, which is characterized in that one side of an objective table is connected with an X-ray generator, and the other side is connected with an X-ray detector, and an objective table is provided with a horizontal revolving bench, and the horizontal revolving stage can revolve a crystal to be measured parallely to the light propagation surface, and the center of the horizontal revolving bench is fixed with a vertical revolving stage, and the vertical revolving stage can revolve the crystal to be measured on the plane which is perpendicular to the light propagation surface; the crystal direction finder is used for directly finding the intersection line of the machined surface and the crystal face, and an angle measuring instrument of the objective table can be used for directly reading the deflecting angle beta in crystal orientation. The invention overcomes the defects that the present X-ray crystal direction finder has a complex operating method, wherein, the measurement process needs multiple times of rotations, dismountings and fixations of the detected crystal with low measurement efficiency, which is easy to induce cumulative errors and X-ray leakage.
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Description

technical field

[0001] The invention belongs to the field of crystal structure detection, and in particular relates to a crystal orientation instrument and a measurement method for directly measuring the crystal orientation of a single crystal by using an X-ray diffraction orientation method. Background technique

[0002] Single crystal materials generally have anisotropy, and its crystal orientation is an important parameter for the application of single crystal materials. Determination of crystal orientation and deviation angle of single crystal is an important content of single crystal inspection.

[0003] Usually, the processing surface of a single crystal material deviates from a certain crystal plane (usually a low-index crystal plane, such as (100), (111)) at a certain angle, which is expressed by the dihedral angle between the crystal plane and the processing plane, that is Crystal orientation deviation angle β (such as figure 1 shown).

[0004] A single crystal c...

Examples

Embodiment 1

[0043] The method for directly measuring the crystal orientation deviation angle of the present invention is characterized in that the steps are as follows:

[0044] Step 1: Fix the crystal to be tested on the vertical rotary table 31, so that the normal of the processed surface of the crystal to be tested is in the A plane determined by the incident light and the optical path of the X-ray detector. According to the calibrated crystal plane required by the single crystal, calculate the θ angle and 2θ angle according to the formula (1), and adjust the crystal orientation instrument according to the θ angle and 2θ angle as follows: fix X-ray generator 1, adjust X-ray detector 2 , so that the angle between the incident light and the optical path of the X-ray detector is 2θ. Rotate the horizontal rotating platform 32 so that the incident light and the X-ray detector are separated on both sides of the normal line, and the included angle with the crystal processing surface is θ. At ...

Embodiment 2

[0049] The method for directly measuring the crystal orientation deviation angle of the present invention is characterized in that the steps are as follows:

[0050] Step 1: Fix the crystal to be tested on the vertical rotary table 31, so that the normal of the processed surface of the crystal to be tested is in the A plane determined by the incident light and the optical path of the X-ray detector. According to the calibrated crystal plane required by the single crystal, the θ angle and 2θ angle are calculated according to the formula (1), and the crystal orientation instrument is adjusted as follows according to the θ angle and 2θ angle: Adjust the X-ray generator 1 so that the incident light and the crystal processing The included angles of the X-ray detector 2 are all θ; adjust the angle of the X-ray detector 2 so that the X-ray detector optical path and the crystal processing surface have an angle of θ, and are separated from the X-ray generator on both sides of the normal...