655 results about "Focal position" patented technology

The invention provides a three-dimensional automatic focusing method and device based on multi-modal data fusion and Kalman filtering and a readable storage medium, and high-precision real-time focusing is realized through multiple steps: collecting sample three-dimensional phase information and different focal plane image data by using a phase and image sensor, and calculating phase depth and definition; constructing a multi-plane Kalman filtering cluster, modeling the focus state of each focal plane, and predicting the focus by fusing the neighborhood coupling influence; the focus state is updated and corrected in combination with the image definition and the phase gradient, and the optimal three-dimensional focus position is determined by means of a collaborative optimization decision maker; dynamically adjusting the noise matrix and the coupling coefficient, and controlling the objective lens to complete focusing. According to the method, through multi-modal fusion and multi-plane cooperation, the problems of focus drifting and jumping are effectively solved, the focusing precision and stability of an imaging system in a complex sample and a dynamic environment are remarkably improved, and the method is suitable for equipment such as a biomedical full-automatic microscope and a digital pathological section scanner.

The invention discloses a reflection-transmission mixed extreme ultraviolet collimation illumination system, and relates to the technical field of extreme ultraviolet optics. The system comprises a discharge plasma EUV light source, a multilayer film ellipsoid reflector and a collimating super lens. Wherein the discharge plasma EUV light source is used for generating radiation light in an extreme ultraviolet band; the multi-layer film ellipsoid reflector adopts an ellipsoid design, is plated with a high-reflectivity multi-layer film, is arranged on a transmission line of the discharge plasma EUV light source, and is used for focusing light beams of the light source; and the collimating super lens is arranged behind the focal position of the multi-layer film ellipsoid reflector and is used for collimating the focused light beams to form parallel light beams for Talbot photoetching illumination. The extreme ultraviolet illumination system is compact in structure, high in light beam energy and high in collimation, and the exposure quality in an application scene needing high-collimation extreme ultraviolet light beams is effectively improved.

The invention provides a laser positioning method for improving gemstone cutting precision, and belongs to the technical field of gemstone cutting laser positioning. A gemstone crystal refractive index tensor model and a ray tracing algorithm are established to simulate a propagation path of light in a gemstone; a thermo-optic effect prediction model is adopted to predict a focus drift distance according to temperature distribution and laser power data and calculate wavefront predistortion phase distribution for compensation, and a zero-vibration input shaping filter is designed for a galvanometer scanning system to suppress residual vibration. A composite control strategy that feedforward control compensates inertia lag and feedback control corrects position errors is adopted to drive a galvanometer, the inherent frequency of a system is recognized through spectral analysis, and the scanning frequency is adjusted to avoid resonance. The technical problem that in the long-time machining process, due to the thermo-optic effect and vibration of a galvanometer scanning system, the laser focus point position generates accumulated drifting, and the cutting precision is reduced is solved.

The invention relates to the technical field of X-ray tube control, and discloses a control method and device for a controllable flying focus X-ray tube, and the method comprises the steps: building an orthogonal electromagnetic deflection system based on an electron beam flight path of the X-ray tube, and the orthogonal electromagnetic deflection system comprises an X-direction electromagnetic coil and a Y-direction electromagnetic coil; creating a conversion relation for converting the target focus position function into an electromagnetic coil current value; executing nonlinear magnetic field response compensation to obtain high-speed switching control signals of the X-direction electromagnetic coil and the Y-direction electromagnetic coil; and performing focus trajectory prediction based on the high-speed switching control signal to obtain a focus motion trajectory formed by the electron beam on the target material, and performing thermal load distribution optimization on the focus motion trajectory to obtain a focus position control scheme for uniform distribution of the surface temperature of the target material. Accurate positioning control of the electron beam on the target material is achieved, and the X-ray imaging quality is improved.

The resolution-customizable micro spectrometer based on the transverse dispersion metasurface comprises a dispersion metasurface array structure and a focal plane pixel array, and the dispersion metasurface array structure comprises a plurality of dispersion metasurface sub-arrays which are distributed in an array mode and used for preliminary spectrum decoupling and directional convergence. The dispersion metasurface subarray comprises a plurality of dispersion metasurface units and all-dielectric substrates thereof, the dispersion metasurface units are nano-columns with four-fold symmetry, the nano-columns are periodically arranged, and the phase of transmission light is dynamically regulated and controlled according to the frequency omega of incident light. The focal position (x ', y') of the transmission light on the focal plane is in a linear mapping relation along with the change of the omega; the focal plane pixel array comprises a multi-element plane array composed of a plurality of pixels, and the multi-element plane array is in pixel-level registration with the dispersion metasurface sub-array. According to the invention, pixel-level precise condensation is realized, crosstalk is effectively inhibited, the detection precision is improved, and real snapshot spectral imaging is realized.

The illumination system comprises a light source and a digital micro-mirror device used for generating different phase modulation images, an aberration-eliminating combined lens is arranged between the digital micro-mirror device and a microscope main body, the digital micro-mirror device is arranged at the front focus position of the aberration-eliminating combined lens, and the digital micro-mirror device is arranged at the front focus position of the aberration-eliminating combined lens. The rear focus of the aberration-eliminating combined lens coincides with the focus of the objective lens of the microscope main body in the direction of the digital micro-mirror device, the aberration-eliminating combined lens comprises an aberration-eliminating lens group, the focal length f of the aberration-eliminating lens group is 45-70mm, f and the diagonal length X of the digital micro-mirror device meet the following relation: X is greater than or equal to 0.125 * f, the digital micro-mirror device has the advantages that a larger area can be imaged during single imaging while the digital micro-mirror device is used for stably switching modulation images with different phases, and more accurate analysis and measurement are facilitated.

The invention discloses a wafer six-surface detection automatic focusing method comprising the following steps: correcting the crystal grain position through a feeding XYR platform, and obtaining a to-be-detected crystal grain image; according to a to-be-detected crystal grain image, edge points in the edge contour of the crystal grain are converted into geometric parameters by using a Hough transform algorithm, and a position compensation value of the crystal grain is calculated; determining an optimal focus position of a front / back detection station of the to-be-detected crystal grain according to the optical characteristics, the light deflection angle and the incident light intensity of the crystal grain, and adjusting the focus position of the focusing module; according to the position compensation value of the crystal grain, an electric sliding table is controlled to carry an optical camera to move in place and focus and image; and by comparing actual detection data with prediction results of the refraction deviation correction model and the crystal grain front / back focus adjustment model, the accuracy of the model is evaluated and optimized. According to the invention, the problems of position error, optical characteristic difference, refraction deviation and the like in the prior art are effectively solved, and efficient and accurate crystal grain detection is realized.

A communication module including a primary radiator for transmitting an electromagnetic flux, and an electromagnetic flux controlling member for controlling a travelling direction of the electromagnetic flux sent from the primary radiator. The electromagnetic flux controlling member includes an incidence surface and an emission surface. The incidence surface and the emission surface are configured such that the electromagnetic flux emitted is expanded than the electromagnetic flux transmitted from a focal position of a reference lens optimized to collimate the electromagnetic flux from the primary radiator and emitted after incidence on the reference lens on a basis of an emission angle of the electromagnetic flux emitted from the primary radiator, a dielectric constant of the electromagnetic flux controlling member, and an arbitrarily set focal length of the electromagnetic flux controlling member.

The invention relates to the technical field of computer vision, and discloses a Monte Carlo tree search-based camera lens assembly focusing calibration algorithm and system, and the algorithm comprises the steps: constructing a three-dimensional search space comprising a focus position, a horizontal inclination angle and a vertical inclination angle, and combining a high-contrast cross wire test pattern to generate a local definition matrix; calculating an initial inclination angle based on the matrix to construct a root node of the Monte Carlo tree; according to the algorithm, an optimal search path is dynamically selected by applying an upper confidence bound strategy, child nodes are expanded in a three-dimensional space, physical adjustment is executed, and optimal three-dimensional configuration parameters are finally determined based on node scores through back propagation iterative optimization. The method breaks through a traditional one-dimensional search framework, effectively avoids a pseudo peak trap caused by inclination of a lens-sensor axis, improves the calibration precision and efficiency of the full-view-field definition of the camera, and achieves the precise positioning of a global optimal solution under a complex assembly tolerance.

The invention relates to the technical field of optical detection, and particularly provides a mirror surface detection method for a large-aperture spliced telescope, which comprises the following steps of: emitting light from a focus position by using a light source, reflecting the light through a mirror surface of the large-aperture spliced telescope to enter a discrete lens arranged at the rear end, and splitting the light by using a spectroscope to obtain a split light beam; the first light beam enters the camera to obtain interference fringes of the splicing seams, the second light beam enters the optical switch to carry out aperture coding, and the mirror surface precision of the large-aperture spliced telescope can be determined according to the code of each splicing seam and the confocal and co-phase information of the sub-reflectors on the two sides of the splicing seam. According to the invention, splicing seam detection is carried out through focus reverse auto-collimation, the problem that an oversized collimator is needed traditionally is avoided, point-by-point detection is carried out on the sub-reflectors according to the splicing seam, and confocal and co-phase detection of the adjacent sub-reflectors is realized according to interference fringes.

The utility model discloses a receiving end assembly of a high-speed optical module, which belongs to the technical field of optical devices and comprises a Receptacle optical interface, an optical fiber, a capillary tube, a lens, a wavelength division multiplexer, an array lens, a prism and a substrate, the optical fiber is used for transmitting light, the capillary tube, the lens, the wavelength division multiplexer, the array lens and the prism are fixed on the substrate, the Receptacle optical interface is connected with the optical fiber, and the optical fiber is connected with the substrate. The lens is located between the capillary tube and the wavelength division multiplexer, the array lens is located between the wavelength division multiplexer and the prism, the capillary tube converges light rays and enables the light rays to enter the lens, the lens enables collimated light converged by the capillary tube to enter the wavelength division multiplexer, the wavelength division multiplexer demultiplexes wavelengths, four paths of parallel light are formed and enter the array lens, and the array lens is located between the prism and the array lens. The array lens gathers incident light, and the gathered light beam is emitted from the prism and then gathers to the focus position. According to the invention, four light beams of 0.75 Pitch are converted into four light beams of 0.25 Pitch by using the turning prism; according to the invention, four light beams with the interval of 0.25 mm can be realized at the receiving end of the optical module.

An accessory detachably attached between an interchangeable lens and an imaging apparatus includes a communication unit for communicating with the interchangeable lens and the imaging apparatus, a first operation unit operated when focus position information on the interchangeable lens is to be acquired from the interchangeable lens, a memory unit storing information relating to focus of the interchangeable lens based on the focus position information, a second operation unit operated when reproduction driving is to be performed of a focus lens included in the interchangeable lens, and a control unit controlling driving of the focus lens. When the first operation unit is operated, the control unit acquires the information relating to focus by using the focus position information. When the second operation unit is operated, the control unit performs the reproduction driving of the focus lens by using the information relating to focus.

The invention discloses a light focusing and condensing device for a high-energy pulse incandescent light source, and relates to the field of air flow test, the light focusing device comprises a light focusing collimating lens and a light focusing converging lens, and the parameters of the light focusing collimating lens and the light focusing converging lens are the same so as to construct a conjugate light path structure I to adjust the converging angle; the light condensing device comprises a light condensing collimating mirror and a light condensing converging mirror, and the relative aperture of the light condensing collimating mirror is larger than the parameter of the light condensing converging mirror, so that a conjugate light path structure II is constructed to efficiently collect light beams to the focus position of the schlieren collimating mirror in the schlieren light path; the positions of the light focusing device and the light condensing device can be adjusted front and back in the direction of the optical axis. By designing the special focusing collimating mirror or focusing converging mirror matched with the high-energy pulse incandescent light source and adjusting the positions of the focusing device and the condensing device, the focusing converging angle can be adaptively adjusted as required, meanwhile, the position of a focusing converging point can be kept unchanged, and the use requirement is met.

The present invention discloses a laser head air path structure for improving cutting quality, comprising: a laser, a laser channel, a focusing mechanism, an air supply unit and a nozzle device; wherein, the laser channel is vertically arranged in the middle of the laser, the focusing mechanism is horizontally installed in the laser channel inside the laser, the nozzle device is vertically installed below the laser, and an independent first air channel and a second air channel are provided in the nozzle device, and the first air channel and the second air channel respectively spray protective gas to the laser cutting point from corresponding blowing points at the same time; an air supply unit is installed between the laser and the nozzle device, and the air supply unit is used to supply protective gas to the first air channel and the second air channel in the nozzle device; the spray direction of the first air channel is directly facing the cutting focus position of the laser; the spray direction of the second air channel is the peripheral position of the cutting focus circle of the laser.

The invention discloses an automatic focusing method and system of a cell slide scanner, and relates to the related field of optical equipment focusing technology.The method comprises the steps that a slide is previewed and scanned, a multi-mode preview image and physical height sensing data are synchronously collected and preprocessed, and then the pre-processed image is obtained; the multi-modal preview image and the corresponding height data are input into a pre-training focus prediction model, a focusing strategy graph aligned with a slide coordinate space is output, and the graph comprises the predicted optimal focus offset, the focusing function recommendation identifier, the focus verification confidence coefficient and the search radius of each view point; according to the focusing strategy graph, a final focus is determined through feedforward positioning, limited verification and conditional adjustment, a scanner objective table is controlled to carry out formal scanning at the final focus position, and a complete scanning image of the cell slide is collected. The problems that a traditional focusing method is long in time consumption and poor in adaptability to complex samples with low contrast, high background fluorescence and scratch pollution are solved, and the adaptive capacity of the focusing process is improved.

According to one aspect of the present invention, a pattern inspection apparatus includes: an imaging sensor including a plurality of first detection elements that detect light flux transmitted through or reflected by a target object illuminated with inspection Light and capture a pattern image of the target object, and a plurality of second detection elements that are arranged adjacent to the plurality of first detection elements, detect Light fluxes obtained by shifting a focus position of the light flux front side and rear side, and capture images for focus adjustment; an adjustment mechanism configured to adjust a focal position of the light flux by using the images for the focus adjustment captured by the plurality of second detection elements; and a comparison circuit configured to compare the pattern image captured by the plurality of first detection elements and a predetermined reference image.

The invention belongs to the technical field of additive manufacturing, and provides an SLM quality improving method and system based on dynamic focusing and light spot tracking. Comprising three core processes of real-time measurement, compensation calculation and dynamic focusing scanning, wherein height information of an actual working surface on a current scanning path relative to an ideal focal plane is measured in real time; the central processing and control unit calculates the real-time compensation amount of the laser focus; the three-dimensional dynamic focusing device adjusts the laser Z-axis focus position and is matched with the two-dimensional galvanometer to realize that a light spot is always focused on an actual working surface; according to the invention, the three-dimensional dynamic focusing device works cooperatively with the central processing and control unit and the distance measuring device to form a shape follow-up processing mechanism; a closed-loop control system effectively reduces forming defects through a ranging-control-focusing circulation mechanism; the adaptive adjustment capability of the system broadens the application boundary of the SLM technology.

The present invention provides an X-ray imaging apparatus and X-ray tube that can reduce artifacts caused by a limited number of imaging angles while suppressing the increase in imaging time required to acquire projected image data. [Solution] This X-ray imaging apparatus 100 comprises an X-ray tube 1 including a first electron irradiation unit 10a and a second electron irradiation unit 10b, a detector 2, a subject placement unit 3, a rotation mechanism 4, and a control unit 21. The control unit 21 performs the following controls: for each of the multiple imaging angles 6, it controls the simultaneous irradiation of electrons from the first electron irradiation unit 10a and the second electron irradiation unit 10b; and it controls the first relative focal position 7a of the first electron irradiation unit 10a at the first imaging angle 6a, the second relative focal position 7b of the second electron irradiation unit 10b at the first imaging angle 6a, the third relative focal position 7d of the first electron irradiation unit 10a at the second imaging angle 6b, and the fourth relative focal position 7e of the second electron irradiation unit 10b at the second imaging angle 6b, so as not to overlap with each other.

In a projection exposure method for exposing a substrate arranged in the region of an image plane of a projection lens with at least one image of a pattern arranged in the region of an object plane of the projection lens, using radiation from a wavelength range around a design wavelength < 260 nm, a substrate (SUB) is coated with a relatively thick radiation-sensitive photoresist layer (RS) and exposed using a projection lens (PO). This lens produces a focus at a design focus position (FOCO) at the design wavelength and, for other wavelengths outside the wavelength range, offset focus positions from an axially extended focus area (ΔFOC) around the design focus position (FOCO). The projection lens is designed as a single-waisted or double-waisted system.During an exposure time interval, different wavelengths from the wavelength range around the design wavelength are used such that the axial extent of the focus area is at least as large as the layer thickness. The projection lens is optically corrected for chromatic aberration (CHV) such that, in the region of the design wavelength, the image scale is essentially independent of the wavelength, so that a change in wavelength of 1 picometer results in a maximum variation of 2 nm between the position of an image point corresponding to an object point within an image field.

The invention belongs to the technical field of micro-nano optics. The invention provides a multi-focus off-axis super lens of a visible light wave band. The multi-focus off-axis super lens comprises a plurality of groups of off-axis single-focus sub super lens assemblies which are circularly arranged, wherein each group of off-axis single-focus sub super lens assemblies comprises a plurality of off-axis single-focus sub super lenses which are concentrically and annularly distributed; wherein the off-axis single-focus sub-super-lens comprises a micro-structure unit and a substrate unit, the micro-structure unit comprises a plurality of micro-structure columns which are uniformly arranged, and one end of each micro-structure column is arranged on the substrate unit. According to the embodiment of the invention, on the basis of a geometric phase modulation principle, through reasonable phase design and microstructure arrangement, the off-axis single-focus sub-super-lens has a designed focus position; through spatial multiplexing of the micro-structures of the multiple off-axis single-focus sub-super-lenses, one super-lens has the phase characteristics of the multiple off-axis single-focus sub-super-lenses, and the functions of the multiple off-axis single-focus sub-super-lenses are achieved on one super-lens.

Displacement in a positional relationship between a focal point and a sample is performed with high accuracy and high speed. A transmission charged particle beam device is an device that acquires a Ronchigram of a sample 59 and performs aberration correction. The device includes a piezoelectric element 65 that displaces the sample by expanding and contracting, a position detection element 72 that detects a position of the sample 59, a control unit 35 that controls an amount of expansion or contraction of the piezoelectric element 65 on the basis of the position of the sample 59 detected by the position detection element 72 such that the sample 59 is displaced and the sample 59 is stopped, and an imaging unit 20 that images one or a plurality of single Ronchigrams without changing a focal position of the beam with which the sample 59 is irradiated in a state where the sample 59 is stopped.

The invention discloses a multi-wavelength same-viewing-direction laser radar telescope system, and belongs to the technical field of laser radar detection. The system comprises a paraboloid single primary mirror which focuses a specific wavelength optical signal received by a telescope to a focus through a primary mirror paraboloid; the replaceable small hole is fixedly formed in the focus position of the paraboloid single primary mirror; the collimating lens group is used for collimating the telescope focusing light beam penetrating through the replaceable small hole to form parallel light beams; the n dichroic mirror groups are used for dividing the parallel light beams into reflected parallel light beams and transmitted parallel light beams; and the plurality of focusing lens group assemblies are used for focusing the parallel light beams split by the dichroic mirror to the focal points of the focusing lens group assemblies, and the number of the plurality of focusing lens group assemblies is n + 1. Multi-wavelength receiving in the same direction can be achieved, light background noise is suppressed by the secondary diaphragm, view fields of different wavelengths are controlled respectively, the size is small, the light collecting efficiency is high, and noise is low.

The present application discloses a laser scribing device and a laser scribing method. The laser scribing device is used to laser scribing the substrate of a thin-film solar cell, and includes a mobile scribing module and a control module. The mobile scribing module includes a laser emitting unit, a reflector, a reflector driving unit and a rangefinder. The reflector is used to reflect the laser from the laser emitting unit and direct the reflected laser vertically onto the processing surface of the substrate. The reflector driving unit is used to drive the reflector to move in the current scribing direction, and adjust the focal position of the laser by adjusting the position of the reflector in the current scribing direction. The rangefinder is used to measure the current position to be scribed on the processing surface to obtain a distance value. The control module is used to control the reflector driving unit to adjust the position of the reflector in the current scribing direction according to the distance value of the current position to be scribed. The structure of adjusting the laser focus of the present application is simple, which is conducive to reducing the cost of the scribing device.

Methods, systems, and media are provided for compensating for focus temperature excursion of a laser cutting head. The method for compensating the focus temperature excursion of the laser cutting head comprises the steps that a drift data model between the focus drift amount and the light switching-on time and between the focus drift amount and the light switching-off time is obtained; in the machining process through the laser cutting head, focus compensation operation is executed, and the focus compensation operation comprises the steps that the light switching-on time and / or the light switching-off time of the laser cutting head are / is recorded; determining a current focus drift amount according to the drift data model and the light-on time and / or the light-off time; and adjusting the focus position of the emergent laser of the laser cutting head to compensate for the current focus drift amount, in which the drift data model includes a light-off fitting curve between the focus drift amount and the light-off time, and the light-off fitting curve is obtained by measuring the focus drift amount in a state in which the laser cutting head is set to be minimum power.

Provided is an EVS to which an image plane phase difference method AF function can be easily applied.A photodetection device includes: a first pixel configured to photoelectrically convert incident light from a portion on one side to generate a first current; a second pixel configured to photoelectrically convert the incident light from a portion on a side opposite to the portion of the first pixel to generate a second current; a first luminance circuit provided individually corresponding to the first pixel and configured to generate a first luminance signal according to the first current; a second luminance circuit provided individually corresponding to the second pixel and configured to generate a second luminance signal according to the second current; a first current comparison circuit provided individually corresponding to the first pixel, and configured to compare the first luminance signal with a reference signal and convert the first luminance signal into a first digital signal; a second current comparison circuit provided individually corresponding to the second pixel, and configured to compare the second luminance signal with the reference signal and convert the second luminance signal into a second digital signal; and a control unit configured to adjust a focal position of the incident light on the basis of the first digital signal and the second digital signal.

In a projection exposure method for exposing a substrate arranged in the area of ​​an image plane of a projection lens with at least one image of a pattern arranged in the area of ​​an object plane of the projection lens with radiation from a wavelength range around a design wavelength < 260 nm, a projection lens (PO) is used which is optically corrected such that at the design wavelength a focus is generated in a design focus position (FOC0) and for other wavelengths from the wavelength range offset focus positions are generated from an axially extended focus area (ΔFOC) around the design focus position (FOC0).The projection lens has a wavefront manipulation system (WFM) for controllably influencing the wavefront of the projection radiation extending from the object plane to the image plane, wherein the wavefront manipulation system (WFM) has at least one manipulator which, in response to control signals from a control unit within a usable setpoint range, undergoes setpoint changes that lead to changes in the wavefront. The method comprises the following steps: . Coating the substrate (SUB) with a radiation-sensitive photoresist layer (RS) having a layer thickness (SD); exposing the photoresist-coated substrate with the image of the pattern using radiation that, under the control of a control unit, has different wavelengths from a wavelength range with a spectral bandwidth around the design wavelength according to a predetermined temporal sequence; synchronizing a wavefront manipulation system (WFM) control with the temporal sequence of radiation of different wavelengths such that a lateral chromatic aberration caused by switching between different wavelengths is at least partially compensated.

The utility model provides a coaxial debugging device for transmitting and receiving systems of a laser range finder, which comprises a parabolic mirror, the laser range finder and an attenuation assembly arranged between the parabolic mirror and the laser range finder. The laser range finder is provided with a paraboloid mirror, the paraboloid mirror reflects to a CCD type light spot analyzer detection surface located at the focus position of the paraboloid mirror, a simulation detector structure tool is installed in the laser range finder, the simulation detector structure tool is used for simulating the position of a detector APD detection surface in the laser range finder, and a semiconductor laser with tail fiber output is installed on the simulation detector structure tool. Laser emitted by the semiconductor laser with tail fiber output penetrates through a receiving mirror of the laser range finder, enters the parabolic mirror through the attenuation assembly and is reflected to a detection surface of the CCD type light spot analyzer through the parabolic mirror, the CCD type light spot analyzer is connected with the upper computer, and the upper computer is used for calculating the mass center position of a laser light spot pattern collected by the CCD type light spot analyzer.

The invention discloses a laser cutting end surface quality control method, which comprises the following steps: S1, data acquisition: acquiring the thickness, material spectrum, surface roughness, laser power and auxiliary gas pressure data of a workpiece by using a multi-mode sensing module, performing dimension reduction on hyperspectral data through a principal component analysis algorithm, extracting a material feature vector, and calculating the material feature vector; and generating an initial process parameter request in combination with the thickness information. Through a multi-parameter dynamic collaborative optimization mechanism, a coupling rule among parameters in the laser cutting process is deeply excavated, parameters such as laser power, cutting speed, focus position and auxiliary gas pressure are brought into a unified regulation and control system, and through a parameter coupling relation model and a multivariable collaborative regulation strategy, compared with a traditional single-parameter regulation mode, the adjustment efficiency is greatly improved. The notch width consistency is improved by 65%, the fluctuation range is controlled within + / -0.02 mm, the end face roughness is reduced by 52%, the Ra value can reach 3.2 [mu] m or below, and the problems of thick plate slag residue, thin plate overburning deformation and the like are effectively solved.

The invention discloses a welding machining method for a drawer sliding rail, and belongs to the technical field of welding machining. S1, a middle rail workpiece is conveyed to a welding platform; s2, the clamp is controlled, so that the separation blade workpiece is attached to the welding position of the middle rail workpiece; s3, the compressed to-be-welded area is scanned through a visual sensor, and detection data of the gap and the surface state are obtained; s4, based on the detection data, the output power, the welding speed and the focus position parameters of a laser welding head are set; and S5, according to the set parameters, the laser welding head is controlled to weld the joint part of the separation blade workpiece and the middle rail workpiece, the visual sensor is used for detecting the assembly gap and the surface state in real time, and it is guaranteed that the weld penetration depth is consistent, and connection is firm; and secondly, a low heat input process is combined, so that the welding thermal deformation is greatly inhibited, the flatness of the separation blade and the middle rail is effectively maintained, and the welding precision, the structural strength and the sliding smoothness of the sliding rail are remarkably improved.

The invention discloses a virtual image distance detection method and system, and relates to the technical field of optical image processing, and the method comprises the steps: controlling an electric drive lens of a test camera to collect test virtual images presented on an image display panel under different drive steps, and obtaining multiple frames of reference images collected by the test camera, different reference images correspond to different driving step numbers of the electric driving lens, and the test virtual image is a virtual image output by the optical display module to be tested to the image display panel; determining the definition of the reference image; based on the definition of each reference image and the driving step number corresponding to each reference image, determining a target driving step number corresponding to the focus position of the electric driving lens; and determining a target virtual image distance corresponding to the target driving step number based on a mapping relationship between the driving step number and the virtual image distance, and determining the target virtual image distance as a virtual image distance corresponding to the optical display module. According to the scheme, the virtual image distance of the optical display module can be detected.