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441 results about "Focal position" patented technology

Laser positioning method for improving gem cutting precision

The invention provides a laser positioning method for improving gemstone cutting precision, and belongs to the technical field of gemstone cutting laser positioning. A gemstone crystal refractive index tensor model and a ray tracing algorithm are established to simulate a propagation path of light in a gemstone; a thermo-optic effect prediction model is adopted to predict a focus drift distance according to temperature distribution and laser power data and calculate wavefront predistortion phase distribution for compensation, and a zero-vibration input shaping filter is designed for a galvanometer scanning system to suppress residual vibration. A composite control strategy that feedforward control compensates inertia lag and feedback control corrects position errors is adopted to drive a galvanometer, the inherent frequency of a system is recognized through spectral analysis, and the scanning frequency is adjusted to avoid resonance. The technical problem that in the long-time machining process, due to the thermo-optic effect and vibration of a galvanometer scanning system, the laser focus point position generates accumulated drifting, and the cutting precision is reduced is solved.
Owner:SCHOOL OF JEWELRY WEST YUNNAN UNIV OF APPLIED TECH

Focusing calibration algorithm and system for assembling camera lens by Monte Carlo tree search

The invention relates to the technical field of computer vision, and discloses a Monte Carlo tree search-based camera lens assembly focusing calibration algorithm and system, and the algorithm comprises the steps: constructing a three-dimensional search space comprising a focus position, a horizontal inclination angle and a vertical inclination angle, and combining a high-contrast cross wire test pattern to generate a local definition matrix; calculating an initial inclination angle based on the matrix to construct a root node of the Monte Carlo tree; according to the algorithm, an optimal search path is dynamically selected by applying an upper confidence bound strategy, child nodes are expanded in a three-dimensional space, physical adjustment is executed, and optimal three-dimensional configuration parameters are finally determined based on node scores through back propagation iterative optimization. The method breaks through a traditional one-dimensional search framework, effectively avoids a pseudo peak trap caused by inclination of a lens-sensor axis, improves the calibration precision and efficiency of the full-view-field definition of the camera, and achieves the precise positioning of a global optimal solution under a complex assembly tolerance.
Owner:JILIN YUNTOU LAISENGOU DIGITAL TECH CO LTD

Mirror surface detection method for large-aperture spliced telescope

The invention relates to the technical field of optical detection, and particularly provides a mirror surface detection method for a large-aperture spliced telescope, which comprises the following steps of: emitting light from a focus position by using a light source, reflecting the light through a mirror surface of the large-aperture spliced telescope to enter a discrete lens arranged at the rear end, and splitting the light by using a spectroscope to obtain a split light beam; the first light beam enters the camera to obtain interference fringes of the splicing seams, the second light beam enters the optical switch to carry out aperture coding, and the mirror surface precision of the large-aperture spliced telescope can be determined according to the code of each splicing seam and the confocal and co-phase information of the sub-reflectors on the two sides of the splicing seam. According to the invention, splicing seam detection is carried out through focus reverse auto-collimation, the problem that an oversized collimator is needed traditionally is avoided, point-by-point detection is carried out on the sub-reflectors according to the splicing seam, and confocal and co-phase detection of the adjacent sub-reflectors is realized according to interference fringes.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Light focusing and condensing device of high-energy pulse incandescent light source

The invention discloses a light focusing and condensing device for a high-energy pulse incandescent light source, and relates to the field of air flow test, the light focusing device comprises a light focusing collimating lens and a light focusing converging lens, and the parameters of the light focusing collimating lens and the light focusing converging lens are the same so as to construct a conjugate light path structure I to adjust the converging angle; the light condensing device comprises a light condensing collimating mirror and a light condensing converging mirror, and the relative aperture of the light condensing collimating mirror is larger than the parameter of the light condensing converging mirror, so that a conjugate light path structure II is constructed to efficiently collect light beams to the focus position of the schlieren collimating mirror in the schlieren light path; the positions of the light focusing device and the light condensing device can be adjusted front and back in the direction of the optical axis. By designing the special focusing collimating mirror or focusing converging mirror matched with the high-energy pulse incandescent light source and adjusting the positions of the focusing device and the condensing device, the focusing converging angle can be adaptively adjusted as required, meanwhile, the position of a focusing converging point can be kept unchanged, and the use requirement is met.
Owner:CHINA AERODYNAMICS RES AND DEV CENT ULTRA-HIGH SPEED AERODYNAMICS RES INST

Automatic focusing method and system of cell slide scanner

The invention discloses an automatic focusing method and system of a cell slide scanner, and relates to the related field of optical equipment focusing technology.The method comprises the steps that a slide is previewed and scanned, a multi-mode preview image and physical height sensing data are synchronously collected and preprocessed, and then the pre-processed image is obtained; the multi-modal preview image and the corresponding height data are input into a pre-training focus prediction model, a focusing strategy graph aligned with a slide coordinate space is output, and the graph comprises the predicted optimal focus offset, the focusing function recommendation identifier, the focus verification confidence coefficient and the search radius of each view point; according to the focusing strategy graph, a final focus is determined through feedforward positioning, limited verification and conditional adjustment, a scanner objective table is controlled to carry out formal scanning at the final focus position, and a complete scanning image of the cell slide is collected. The problems that a traditional focusing method is long in time consumption and poor in adaptability to complex samples with low contrast, high background fluorescence and scratch pollution are solved, and the adaptive capacity of the focusing process is improved.
Owner:JIANGSU MICROCONTROL BIOTECHNOLOGY CO LTD

Pattern inspection apparatus

According to one aspect of the present invention, a pattern inspection apparatus includes: an imaging sensor including a plurality of first detection elements that detect light flux transmitted through or reflected by a target object illuminated with inspection Light and capture a pattern image of the target object, and a plurality of second detection elements that are arranged adjacent to the plurality of first detection elements, detect Light fluxes obtained by shifting a focus position of the light flux front side and rear side, and capture images for focus adjustment; an adjustment mechanism configured to adjust a focal position of the light flux by using the images for the focus adjustment captured by the plurality of second detection elements; and a comparison circuit configured to compare the pattern image captured by the plurality of first detection elements and a predetermined reference image.
Owner:NUFLARE TECH INC

SLM quality improvement method and system based on dynamic focusing and light spot tracking

The invention belongs to the technical field of additive manufacturing, and provides an SLM quality improving method and system based on dynamic focusing and light spot tracking. Comprising three core processes of real-time measurement, compensation calculation and dynamic focusing scanning, wherein height information of an actual working surface on a current scanning path relative to an ideal focal plane is measured in real time; the central processing and control unit calculates the real-time compensation amount of the laser focus; the three-dimensional dynamic focusing device adjusts the laser Z-axis focus position and is matched with the two-dimensional galvanometer to realize that a light spot is always focused on an actual working surface; according to the invention, the three-dimensional dynamic focusing device works cooperatively with the central processing and control unit and the distance measuring device to form a shape follow-up processing mechanism; a closed-loop control system effectively reduces forming defects through a ranging-control-focusing circulation mechanism; the adaptive adjustment capability of the system broadens the application boundary of the SLM technology.
Owner:XIAN AEROSPACE MECHATRONICS & INTELLIGENT MANUFACTURING CO LTD

X-ray imaging apparatus and X-ray tube

The present invention provides an X-ray imaging apparatus and X-ray tube that can reduce artifacts caused by a limited number of imaging angles while suppressing the increase in imaging time required to acquire projected image data. [Solution] This X-ray imaging apparatus 100 comprises an X-ray tube 1 including a first electron irradiation unit 10a and a second electron irradiation unit 10b, a detector 2, a subject placement unit 3, a rotation mechanism 4, and a control unit 21. The control unit 21 performs the following controls: for each of the multiple imaging angles 6, it controls the simultaneous irradiation of electrons from the first electron irradiation unit 10a and the second electron irradiation unit 10b; and it controls the first relative focal position 7a of the first electron irradiation unit 10a at the first imaging angle 6a, the second relative focal position 7b of the second electron irradiation unit 10b at the first imaging angle 6a, the third relative focal position 7d of the first electron irradiation unit 10a at the second imaging angle 6b, and the fourth relative focal position 7e of the second electron irradiation unit 10b at the second imaging angle 6b, so as not to overlap with each other.
Owner:SHIMADZU SEISAKUSHO LTD

Projection exposure process, projection lens and projection exposure system for microlithography

In a projection exposure method for exposing a substrate arranged in the region of an image plane of a projection lens with at least one image of a pattern arranged in the region of an object plane of the projection lens, using radiation from a wavelength range around a design wavelength < 260 nm, a substrate (SUB) is coated with a relatively thick radiation-sensitive photoresist layer (RS) and exposed using a projection lens (PO). This lens produces a focus at a design focus position (FOCO) at the design wavelength and, for other wavelengths outside the wavelength range, offset focus positions from an axially extended focus area (ΔFOC) around the design focus position (FOCO). The projection lens is designed as a single-waisted or double-waisted system.During an exposure time interval, different wavelengths from the wavelength range around the design wavelength are used such that the axial extent of the focus area is at least as large as the layer thickness. The projection lens is optically corrected for chromatic aberration (CHV) such that, in the region of the design wavelength, the image scale is essentially independent of the wavelength, so that a change in wavelength of 1 picometer results in a maximum variation of 2 nm between the position of an image point corresponding to an object point within an image field.
Owner:CARL ZEISS SMT GMBH

Multi-focus off-axis super lens of visible light wave band

The invention belongs to the technical field of micro-nano optics. The invention provides a multi-focus off-axis super lens of a visible light wave band. The multi-focus off-axis super lens comprises a plurality of groups of off-axis single-focus sub super lens assemblies which are circularly arranged, wherein each group of off-axis single-focus sub super lens assemblies comprises a plurality of off-axis single-focus sub super lenses which are concentrically and annularly distributed; wherein the off-axis single-focus sub-super-lens comprises a micro-structure unit and a substrate unit, the micro-structure unit comprises a plurality of micro-structure columns which are uniformly arranged, and one end of each micro-structure column is arranged on the substrate unit. According to the embodiment of the invention, on the basis of a geometric phase modulation principle, through reasonable phase design and microstructure arrangement, the off-axis single-focus sub-super-lens has a designed focus position; through spatial multiplexing of the micro-structures of the multiple off-axis single-focus sub-super-lenses, one super-lens has the phase characteristics of the multiple off-axis single-focus sub-super-lenses, and the functions of the multiple off-axis single-focus sub-super-lenses are achieved on one super-lens.
Owner:LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC

Transmission Charged Particle Beam Device and Ronchigram Imaging Method

Displacement in a positional relationship between a focal point and a sample is performed with high accuracy and high speed. A transmission charged particle beam device is an device that acquires a Ronchigram of a sample 59 and performs aberration correction. The device includes a piezoelectric element 65 that displaces the sample by expanding and contracting, a position detection element 72 that detects a position of the sample 59, a control unit 35 that controls an amount of expansion or contraction of the piezoelectric element 65 on the basis of the position of the sample 59 detected by the position detection element 72 such that the sample 59 is displaced and the sample 59 is stopped, and an imaging unit 20 that images one or a plurality of single Ronchigrams without changing a focal position of the beam with which the sample 59 is irradiated in a state where the sample 59 is stopped.
Owner:HITACHI HIGH TECH CORP

Photodetection device

Provided is an EVS to which an image plane phase difference method AF function can be easily applied.A photodetection device includes: a first pixel configured to photoelectrically convert incident light from a portion on one side to generate a first current; a second pixel configured to photoelectrically convert the incident light from a portion on a side opposite to the portion of the first pixel to generate a second current; a first luminance circuit provided individually corresponding to the first pixel and configured to generate a first luminance signal according to the first current; a second luminance circuit provided individually corresponding to the second pixel and configured to generate a second luminance signal according to the second current; a first current comparison circuit provided individually corresponding to the first pixel, and configured to compare the first luminance signal with a reference signal and convert the first luminance signal into a first digital signal; a second current comparison circuit provided individually corresponding to the second pixel, and configured to compare the second luminance signal with the reference signal and convert the second luminance signal into a second digital signal; and a control unit configured to adjust a focal position of the incident light on the basis of the first digital signal and the second digital signal.
Owner:SONY SEMICON SOLUTIONS CORP

Projection exposure process and projection exposure system for microlithography

In a projection exposure method for exposing a substrate arranged in the area of ​​an image plane of a projection lens with at least one image of a pattern arranged in the area of ​​an object plane of the projection lens with radiation from a wavelength range around a design wavelength < 260 nm, a projection lens (PO) is used which is optically corrected such that at the design wavelength a focus is generated in a design focus position (FOC0) and for other wavelengths from the wavelength range offset focus positions are generated from an axially extended focus area (ΔFOC) around the design focus position (FOC0).The projection lens has a wavefront manipulation system (WFM) for controllably influencing the wavefront of the projection radiation extending from the object plane to the image plane, wherein the wavefront manipulation system (WFM) has at least one manipulator which, in response to control signals from a control unit within a usable setpoint range, undergoes setpoint changes that lead to changes in the wavefront. The method comprises the following steps: . Coating the substrate (SUB) with a radiation-sensitive photoresist layer (RS) having a layer thickness (SD); exposing the photoresist-coated substrate with the image of the pattern using radiation that, under the control of a control unit, has different wavelengths from a wavelength range with a spectral bandwidth around the design wavelength according to a predetermined temporal sequence; synchronizing a wavefront manipulation system (WFM) control with the temporal sequence of radiation of different wavelengths such that a lateral chromatic aberration caused by switching between different wavelengths is at least partially compensated.
Owner:CARL ZEISS SMT GMBH

Coaxial debugging device for transmitting and receiving systems of laser range finder

The utility model provides a coaxial debugging device for transmitting and receiving systems of a laser range finder, which comprises a parabolic mirror, the laser range finder and an attenuation assembly arranged between the parabolic mirror and the laser range finder. The laser range finder is provided with a paraboloid mirror, the paraboloid mirror reflects to a CCD type light spot analyzer detection surface located at the focus position of the paraboloid mirror, a simulation detector structure tool is installed in the laser range finder, the simulation detector structure tool is used for simulating the position of a detector APD detection surface in the laser range finder, and a semiconductor laser with tail fiber output is installed on the simulation detector structure tool. Laser emitted by the semiconductor laser with tail fiber output penetrates through a receiving mirror of the laser range finder, enters the parabolic mirror through the attenuation assembly and is reflected to a detection surface of the CCD type light spot analyzer through the parabolic mirror, the CCD type light spot analyzer is connected with the upper computer, and the upper computer is used for calculating the mass center position of a laser light spot pattern collected by the CCD type light spot analyzer.
Owner:BEIJING ORIENTAL SHARP LASER TECH

Laser cutting end face quality control method and system

The invention discloses a laser cutting end surface quality control method, which comprises the following steps: S1, data acquisition: acquiring the thickness, material spectrum, surface roughness, laser power and auxiliary gas pressure data of a workpiece by using a multi-mode sensing module, performing dimension reduction on hyperspectral data through a principal component analysis algorithm, extracting a material feature vector, and calculating the material feature vector; and generating an initial process parameter request in combination with the thickness information. Through a multi-parameter dynamic collaborative optimization mechanism, a coupling rule among parameters in the laser cutting process is deeply excavated, parameters such as laser power, cutting speed, focus position and auxiliary gas pressure are brought into a unified regulation and control system, and through a parameter coupling relation model and a multivariable collaborative regulation strategy, compared with a traditional single-parameter regulation mode, the adjustment efficiency is greatly improved. The notch width consistency is improved by 65%, the fluctuation range is controlled within + / -0.02 mm, the end face roughness is reduced by 52%, the Ra value can reach 3.2 [mu] m or below, and the problems of thick plate slag residue, thin plate overburning deformation and the like are effectively solved.
Owner:TONGXING TECH DEV CO LTD

Welding machining method for drawer sliding rail

The invention discloses a welding machining method for a drawer sliding rail, and belongs to the technical field of welding machining. S1, a middle rail workpiece is conveyed to a welding platform; s2, the clamp is controlled, so that the separation blade workpiece is attached to the welding position of the middle rail workpiece; s3, the compressed to-be-welded area is scanned through a visual sensor, and detection data of the gap and the surface state are obtained; s4, based on the detection data, the output power, the welding speed and the focus position parameters of a laser welding head are set; and S5, according to the set parameters, the laser welding head is controlled to weld the joint part of the separation blade workpiece and the middle rail workpiece, the visual sensor is used for detecting the assembly gap and the surface state in real time, and it is guaranteed that the weld penetration depth is consistent, and connection is firm; and secondly, a low heat input process is combined, so that the welding thermal deformation is greatly inhibited, the flatness of the separation blade and the middle rail is effectively maintained, and the welding precision, the structural strength and the sliding smoothness of the sliding rail are remarkably improved.
Owner:JIEYANG JINRUNDA IND CO LTD +1

Real-time focusing compensation method and system for femtosecond laser curved surface machining

The invention discloses a real-time focusing compensation method and system for femtosecond laser curved surface machining, and particularly relates to the technical field of light beam focusing control in femtosecond laser precision machining. The method is used for solving the technical problem of focus space-time deviation during high-speed curved surface machining caused by mismatching of dynamic response characteristics of an existing galvanometer and a dynamic focusing system. Pre-judging a response asynchronous risk by acquiring system response parameters and combining geometric and dynamic characteristics of a processing track, and identifying a dominant lag type; determining an error contribution distribution relation between the two systems according to the lag type; resolving to obtain a space trajectory error component which should be borne by the dynamic focusing system; and finally, controlling the laser to delay light emission according to the component until the dynamic focusing system is adjusted in place. Accurate diagnosis and quantitative compensation of a focus lag root are realized, and the focus position precision and the process reliability of femtosecond laser processing of a complex curved surface are effectively improved.
Owner:LUOYANG INST OF SCI & TECH +1

Wearable device, method, and non-transitory computer readable storage medium for eye calibration

A method executed by a wearable device including a display system including a first display and a second display facing eyes of a user wearing the wearable device, and a plurality of cameras configured to obtain an image including the eyes, includes: displaying objects at different time points on a screen of the display system, based on the image, identifying gazes looking at the objects, identifying, based on the identified gazes, errors associated with the gazes, wherein the errors indicate differences between display positions of the objects and focal positions of the gazes, and wherein the focal positions have a one-to-one correspondence with the objects, displaying a visual object on a background screen on the display system to move the visual object through partial display positions of the display positions, which are selected based on the errors, and based on another gaze looking at the visual object, correcting the errors.
Owner:SAMSUNG ELECTRONICS CO LTD

Laser beam imaging method and system based on bifocal optical system

The invention relates to a laser beam imaging method and system based on a bifocal optical system, and the method comprises the steps: enabling a first group of Laguerre-Gaussian beams with specified wavelength values to pass through the bifocal optical system, and recording a plurality of wavelength values and focus positions corresponding to the wavelength values; a focus prediction model is constructed and trained, and parameters of the focus prediction model are adjusted to meet preset requirements; predicting focus positions of the second group of light beams with specified wavelength values passing through the bifocal optical system through a focus prediction model, and constructing a mapping table of wavelength values and corresponding intersection point positions; obtaining a target imaging position, calculating a focus position based on the target imaging position, calling a mapping table based on the wavelength value and the corresponding intersection point position, and extracting the wavelength of the Laguerre-Gaussian beam corresponding to the focus position; and the Laguerre-Gaussian beam with the wavelength obtained through calculation is emitted, and an image of a target position is obtained through a bifocal optical system. According to the process, the adjusting efficiency is improved while the imaging quality of the bifocal optical system is improved.
Owner:SILKWORM COCOON RES GROUP CHINESE INST OF TEST TECH

Measurement apparatus and measurement method

A measurement apparatus includes a laser apparatus, a branching part that splits a laser beam into reference light and measurement light, a condensing part that condenses the measurement light onto an object to be measured, a control part that adjust a focal position where the condensing part condenses the measurement light, and a distance calculation part that calculates distance to the object to be measured on the basis of an optical path difference between the reference light and the measurement light, wherein the condensing part includes a first lens and a correspondence calculation part that calculates a correspondence between a focal position of the condensing part and a position of the first lens on the basis of a position of the first lens and a distance to the object to be measured.
Owner:MITUTOYO CORP

Pattern inspection apparatus, focus position adjustment method, and pattern inspection method

The pattern inspection device according to one embodiment of the present invention is characterized by comprising: a related data creation circuit, in a state in which an evaluation substrate on which an evaluation pattern is formed is placed on a table, an autofocus signal serving as a parameter for autofocus control for each height position and a focus evaluation value for evaluating the focus position are acquired while changing the height position of a pattern formation surface of the evaluation substrate. Making related data of the automatic focusing signal and the focusing evaluation value; the automatic focus signal calculation circuit for inspection uses an automatic focus signal and a focus evaluation value for each height position, which are acquired while changing the height position of a pattern forming surface of a substrate to be inspected in a state where the substrate to be inspected on which a graphic pattern is formed is placed on a table, and related data of an evaluation substrate. Calculating an auto-focus signal for inspection that obtains a focus evaluation value greater than or equal to a threshold value on the substrate to be inspected; and an autofocus mechanism for adjusting the height position of the pattern forming surface of the substrate to be inspected to the height position of the pattern forming surface corresponding to the value of the autofocus signal for inspection.
Owner:NUFLARE TECH INC

Ophthalmic device and ophthalmic device control program

PendingJP2026044432AOthalmoscopesOphthalmological deviceOphthalmology department
An ophthalmic device and an ophthalmic device control program are provided that are capable of appropriately acquiring three-dimensional information about the anterior segment of the eye while stabilizing the fixation of the subject's eye. [Solution] The fixation target presenting optical system presents a fixation target to the subject's eye. The cross-sectional imaging optical system captures cross-sectional images of the anterior segment by receiving return light from the anterior segment that has been optically sectioned by the imaging light. The moving unit moves an optical unit including the fixation target presenting optical system and the cross-sectional imaging optical system relative to the subject's eye. The control unit can perform a three-dimensional information acquisition process to acquire three-dimensional information about the anterior segment by capturing cross-sectional images of multiple locations on the anterior segment while moving the optical unit and scanning the imaging light. When performing the three-dimensional information acquisition process, the control unit positions the fixation target within a limited area centered on the focal position of the entire lens system of the fixation target presenting optical system, regardless of the refractive power of the subject's eye.
Owner:NIDEK CO LTD

Fleeting beam pattern scanning hologram microscope apparatus utilizing a scanning mirror and a transfer stage

The present invention relates to a fly-by light beam pattern scanning hologram microscope apparatus using a scanning mirror and a transfer stage. The present invention provides a fly-by light beam pattern scanning hologram microscope apparatus, comprising: a scanning light beam generating unit modulating a phase of a first light beam separated from a light source to convert the first light beam into a first spherical wave through a first lens, converting a second light beam into a second spherical wave through a second lens, and then making the first spherical wave interfere with the second spherical wave to form a scanning light beam; a scanning unit including a scanning mirror for controlling the scanning light beam in a horizontal direction to transmit it to a projection unit and a transfer stage for moving an object in a vertical direction at a rear end of the projection unit; a projection unit including a plurality of lens systems and an objective lens and projecting the scanning light beam transmitted from the scanning unit on an object plane; and a light collecting unit for detecting a light beam that has passed through the objective lens again after fluorescing or reflecting from the object, wherein the scanning light beam projected on the object plane has different patterns according to a conical angle condition and a focal point position of each of the first spherical wave and the second spherical wave formed on the scanning mirror.
Owner:CUBEPIXEL LTD

Methods and systems for generating depth profiles with improved optical resolution

Provided herein are methods, devices, and systems that may improve optical resolution when imaging through a thickness of samples. A method for generating a depth profile of a tissue of a subject may comprise using an optical probe to transmit an excitation light beam from a light source towards a surface of the tissue; using one or more focusing units in the optical probe to simultaneously adjust a depth and a position of a focal point of the excitation light beam along a scanning path; detecting at least a subset of the signals generated upon contacting the tissue with the excitation light beam; and using one or more computer processors programmed to process the at least the subset of the signals to generate the depth profile of the tissue.
Owner:ENSPECTRA HEALTH INC

Six-clawed crawling robot laser cleaning device and method thereof

The application provides a six-claw crawling robot laser cleaning device and a method thereof, which comprises a robot main body, a cleaning device, a light path adjusting device and a control system; the robot main body comprises three layers of substrates; the cleaning device comprises a first laser device and a second laser device; the first laser device and the second laser device are installed at the same end of the third layer of substrates; the second laser device is made to rotate in all directions through a holder device; the light path adjusting device can change the focal point position of the first laser beam; the control system is used for the first laser device and the second laser device to emit laser to clean stains and control the light path adjusting device to change the focal point position of the first laser beam. The device increases the stability of the robot on the curved surface by arranging the suction cup; meanwhile, the device realizes the dead angle-free cleaning of the curved surface under the joint action of the two laser cleaning devices, the two laser cleaning devices work at the same time, and the working efficiency is improved.
Owner:JIANGSU UNIV

Surface treatment processes

The invention relates to a method for surface treatment of a cylindrical housing (110) of an electrical energy storage device (100) made of metal by means of laser structuring, wherein the housing (110) has a housing shell (120) and an upper housing cover (111) surrounded by the housing shell (120) and a lower housing cover (112) surrounded by the housing shell (120), and the housing shell (120) is surface treated.According to the invention, during surface treatment, the housing (120) is guided in a holder (500) in a rotating manner such that a distance of a surface (130) of the housing shell (120) to a laser optics (200) emitting at least one laser beam (210) onto the surface (130), in particular a focus position of the laser optics (200), is kept constant and at least one structure (300, 310) is produced in the surface (130) surrounding the housing shell (120) by means of the at least one laser beam (210).
Owner:MERCEDES BENZ GROUP AG

Metasurface structure and refractive index detector

This invention discloses a metasurface structure and a refractive index detector. The metasurface structure is simple, consisting only of a substrate and an array of nanopillars disposed on the first surface of the substrate. By defining the orientation angle of each nanopillar in the array, the metasurface structure can obtain spatial refractive index information by reading the focal position information on the focal plane, which is then used for refractive index detection. The metasurface structure of this invention has a size of only tens of micrometers, a flexible detection range, and its results can be clearly presented on the focal plane without requiring complex spectral analysis and calculation modules. This invention has significant implications for the miniaturization of refractive index detectors.
Owner:SUZHOU SUNA OPTOELECTRONICS CO LTD

3D shape measurement device

To provide a three-dimensional shape measuring device capable of reducing measurement errors and performing accurate measurements in pinhole array scanning using a confocal optical system. A three-dimensional shape measurement device according to one embodiment of the present invention is a three-dimensional shape measurement device using a confocal optical system, and includes at least an aperture plate on which a plurality of confocal apertures through which light from a light source passes are arranged two-dimensionally at a predetermined arrangement period, and an aperture plate displacement unit that displaces the aperture plate at a uniform speed in a predetermined direction perpendicular to the optical axis direction so as to change the relative positional relationship between the position of the object-side focusing point and the position of the object to be measured in the direction perpendicular to the optical axis direction. The three-dimensional shape measurement device controls the movement speed of the aperture plate, the rotation speed of the rotor, and the exposure time and exposure timing of the photodetector group so that the exposure time of the photodetector group coincides with the time it takes for the aperture plate to move a distance obtained by multiplying the predetermined arrangement period by an integer n greater than or equal to 2.
Owner:TAKAOKA TOKO

Welding machine and welding method

One embodiment of the fusion splicer (1) is a fusion splicer (1) for splicing optical fibers (F). The fusion splicer (1) includes: a light source (19) for illuminating the optical fiber (F); a camera (18) for receiving light emitted from the light source (19) and passing through the end face (E) of the optical fiber (F) to capture an image of the end face (E); and a fiber core detection unit (32) for detecting the fiber core (F31) of the optical fiber (F) from the image of the end face (E) captured by the camera (18). The camera (18) captures an image of the end face (E) with the focal position of the camera (18) set to the inner portion of the end face (E) of the optical fiber (F).
Owner:SUMITOMO ELECTRIC INDUSTRIES LTD

A test system

ActiveCN117667649BInfraredCapacitance
This application provides a testing system comprising: a first slide rail, a second slide rail, a third slide rail, a fourth slide rail, a capacitive pen control slide rail, a capacitive pen, a first infrared rangefinder, a second infrared rangefinder, a pressure sensor, and a controller. The first, second, third, and fourth slide rails are disposed around the periphery of the screen. The capacitive pen control slide rail is perpendicularly connected to the first and second slide rails. The controller controls the movement of the first and second infrared rangefinders. The controller obtains the focal position based on the intersection of the infrared rays emitted by the first and second infrared rangefinders and controls the movement of the capacitive pen control slide rail and the capacitive pen on the slide rail, so that the pen tip performs a click operation at the focal position according to the set click conditions, thus completing the test. This application embodiment can reduce testing costs.
Owner:SHANGHAI PATEO ELECTRONIC EQUIPMENT MANUFACTURING CO LTD