System and method for preparing micro-pore array through femtosecond laser direct writing

A micro-hole array, femtosecond laser technology, applied in laser welding equipment, welding equipment, manufacturing tools, etc., can solve the problems of complex experimental conditions, low processing efficiency, difficult to change, etc., to achieve good processing effect, high processing efficiency, Easy to operate effect

Inactive Publication Date: 2013-05-01
NANKAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to solve the technical problems of low processing efficiency, low aspect ratio, single style and difficult to change, and complicated experime

Method used

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  • System and method for preparing micro-pore array through femtosecond laser direct writing
  • System and method for preparing micro-pore array through femtosecond laser direct writing
  • System and method for preparing micro-pore array through femtosecond laser direct writing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Example 1: Femtosecond laser direct writing system for preparing microwell arrays

[0059] Such as figure 1 As shown, the femtosecond laser direct writing system for preparing microwell arrays provided by the present invention includes a femtosecond vector light field generation system, a spatial filter component, a computer and a three-dimensional mobile platform; the femtosecond vector light field generation system consists of a reflective phase-only Composed of a spatial light modulator, a 4f system and a Rochi grating; the spatial filter component consists of a fourth achromatic convex lens (15), a second spatial filter (16) on the spectral plane, and a fifth achromatic convex lens (17);

[0060] On the output linear optical path of the femtosecond laser (1), a half-wave plate (2), a Glan laser prism (3) and a first high reflection mirror (4) are arranged in sequence, passing through the first high reflection mirror (4) ) on the first reflection optical path in tur...

Embodiment 2

[0061] Example 2, Femtosecond laser direct writing method for preparing microhole arrays

[0062] After the laser beam emitted by the femtosecond vector light field generation system is focused by a single lens, the light intensity distribution at the focal point will be determined by the light field amplitude and its local field distribution. The following will specifically analyze the wavefront shaping of a single linearly polarized laser beam to generate multiple parallel laser beams with different positions and local field distributions, and analyze the relationship between the field distribution at the focal point and the processing effect.

[0063] According to the Fourier transform of thin lenses, see Joseph W.Goodman, Introduction to Fourier Optics, Electronic Industry Press, Beijing, 2011. The geometric center of the generated parallel beams is the origin of the coordinates, and in the lens On the front focal plane (r, θ), for the wavelength λ and the topological numb...

example 1

[0068] The following describes in detail the specific implementation steps of preparing the microhole array on the polished single crystal silicon surface placed on the three-dimensional mobile platform by combining the processing system of the present invention with femtosecond laser direct writing to prepare the microhole array.

[0069] refer to figure 1 , using a computer to generate a holographic phase plate, there is no holographic grating in the central area of ​​the phase plate, but four centrally symmetrical light-through circular holes are generated in the four quadrants of the coordinate axis, and the center positions of the light-through holes are: (156,1.56), (-1.56, 1.56), (-1.56, -1.56) and (1.56, -1.56). The topological number of each aperture holographic phase plate is 0. If the initial phase of each aperture is the same, there is only one extremely strong point on the focal plane. In this embodiment, the initial phases of the first and third quadrants are 0,...

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Abstract

The invention discloses a system and a method for preparing a micro-pore array through femtosecond laser direct writing. The system comprises a femtosecond vector light field generation system, a spatial filtering component, a computer and a three-dimensional mobile platform, wherein a 1/2 wave plate, a Glan-laser polarizer, a beam expander and the femtosecond vector light field generation system are arranged on an output straight light path of a femtosecond laser device in sequence; a 4f system is arranged on a light path behind a reflective pure phase spatial light modulator after a holographic phase plate is loaded; a spatial filter is arranged on a frequency spectrum surface; and positive and negative levels of diffraction light which pass through the spatial filter pass through a 1/4 wave plate respectively and are combined into a beam of laser through a Rochi grating. A material is adjusted to a focal position through the spatial filtering component, an electronic diaphragm, a focusing lens and the three-dimensional mobile platform; and the spatial light modulator, the electronic diaphragm and the three-dimensional mobile platform are connected with a computer through data lines. The device has the advantages of simple structure, convenience in operation and capabilities of preparing the micro-pore array with various patterns and improving the machining efficiency.

Description

technical field [0001] The invention relates to a processing system for preparing microhole arrays by femtosecond laser direct writing, and particularly proposes a preparation method for preparing microhole arrays with various pattern distributions by laser direct writing and improving the processing efficiency and aspect ratio of large-area microhole arrays. Background technique [0002] Since the advent of laser, laser micro-nano processing technology has been one of the main means of micro-nano processing technology. Laser direct writing micro-nano processing technology refers to the use of adjustable intensity laser beams to directly expose the surface of the material to form the desired micro-nano structure. Compared with traditional long-pulse laser, femtosecond laser has less processing energy loss and higher utilization rate. Femtosecond laser micro-nano processing provides a new method for preparing large-area micro-nano structures due to its non-pollution, non-con...

Claims

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Application Information

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IPC IPC(8): B23K26/38B23K26/04
Inventor 李勇男娄凯钱升霞涂成厚王慧田
Owner NANKAI UNIV
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