83952results about How to "Improve processing efficiency" patented technology

By performing a plasma treatment for efficiently sealing the surface of a stressed dielectric layer containing silicon nitride, an enhanced performance during the patterning of contact openings may be achieved, since nitrogen-induced resist poisoning may be significantly reduced during the selective patterning of stressed layers of different types of intrinsic stress.

A method and system for shipping items. A server is configured to send out requests for quotes to a number of regional shipping companies using a network. The server receives responses from the network and selects a route based on the responses. The route may include shipping the item to one or more intermediate destinations before the item arrives at the final destination. The server may create a data file reflecting the selected route. The items are packed in one or more containers, wherein each container has a memory device. At least part of the data file is then stored into the memory device. The memory device may be accessed as needed during shipping to determine where the item is going and when the item needs to arrive. Additional information may also be stored in the memory device, and the device may be updated at intermediate destinations. Each container may take a different routing, and the server may actively search for better routings as the item proceeds along the selected route. The containers may be configured to be placed within carriers that hold multiple containers, and the carriers may also be configured with memory devices.

A substrate processing apparatus (1) has a first polishing unit (400A) and a second polishing unit (400B) for polishing a peripheral portion of a substrate. Each of the two polishing units (400A, 400B) includes a bevel polishing device (450A, 450B) for polishing a peripheral portion of a substrate and a notch polishing device (480A, 480B) for polishing a notch of a substrate. The substrate processing apparatus (1) has a maintenance space (7) formed between the two polishing units (400A, 400B). The bevel polishing devices (450A, 450B) in the two polishing units (400A, 400B) face the maintenance space (7) so as to be accessible from the maintenance space (7).

The invention provides a manufacture method for polarization maintaining fiber and a polarization maintaining fiber, and relates to optical waveguide fibers in the field of fiber-optical communication and fiber optical sensors. The method comprises the following steps that: (1) two oppositely arranged open slots with a same shape are inwardly provided at a side surface of a glass mother rod, stress rods are machined to obtain a shape matching the open slots, and the centers of the cross sections of the two open slots and the center of circle in the cross section of the glass mother rod are in a same line; (2) the stress rods are respectively inserted into each open slot on the glass mother rod, and the assembled glass mother rod and stress rods are put in a cannula to form a preformed rod of the polarization maintaining fiber; (3) the preformed rod of the polarization maintaining fiber is drew to form the polarization maintaining fiber. According to the invention, the glass mother rod is provided with the open slots, and the stress rods are embedded in the open slots, thereby obtaining high process repeatability; inner surfaces of the open slots have high fineness, and the open slots have good symmetry, thereby improving processing efficiency; therefore, the optical performance and reliability of the polarization maintaining fiber are substantially improved.

Provided atomic layer deposition equipment comprises a reaction chamber and a gas source; the reaction chamber is inside provided with a gas distribution plate arranged at the top, a base disc and a rotary driving mechanism; the upper surface of the base disc and the lower surface of the gas distribution plate are mutually superposed; multiple sub-spaces uniformly distributed along the circumferential direction of the reaction chamber at intervals are formed between the upper surface of the base disc and the lower surface of the gas distribution plate, the multiple sub-spaces are successively arranged according to the operation sequence, and each sub-space is corresponding to one operation in a process of performing once technology on a base chip; and the rotary driving mechanism is used to drive the base disc to rotate relatively to the gas distribution plate so as to enable the base disc to drive all base chips thereon to be successively placed into the multiple sub-spaces for technological processing according to the operation sequence. The provided atomic deposition equipment is capable of processing multiple base chips at the same time by using different operations, thereby improving the technological efficiency and further improving the production power.

An automated adaptive muscle stimulation system and method are disclosed. The stimulation system includes at least one electrode assembly adapted to deliver a muscle stimulation signal to the tissue of a user, a sensor system adapted to detect a muscle response, and an electrical stimulation device operably coupled to the at least on electrode assembly and the sensor system, the electrical stimulation device including a control system operable to automatically diagnose at least one characteristic of a muscle from the detected muscle response and adjust at least one parameter of the muscle stimulation signal in response thereto to deliver an adjusted muscle stimulation signal. A dual mode muscle stimulation system adapted to accept first and second data sets and provide first and second levels of treatment data is also disclosed.

The invention provides atomic layer deposition equipment. The atomic layer deposition equipment comprises a reaction chamber which comprises a plurality of sub chambers and a drive unit, wherein a plurality of process positions are arranged on the same horizontal plane in the reaction chamber, the plurality of process positions are arranged at intervals along the peripheral direction of the reaction chamber, and are uniformly arranged in sequence according to the sequence of processes, the quantity and positions of the sub chambers are in one-to-one correspondence with those of the process positions, and each sub chamber is used for completing one process of single processes for a substrate in each sub chamber; the drive unit is used for enabling each substrate to complete the corresponding process in the sub chamber placed on the position of each process according to the sequence of the process. The automatic layer deposition equipment provided by the invention can be used for processing a plurality of substrates at the same time by a single process, so that the process efficiency is improved, and thus, the yield is increased.

Systems and methods for analyzing genetic sequence data involve: (a) obtaining, by a computer system, genetic sequencing data pertaining to a subject; (b) splitting the genetic sequencing data into a plurality of segments; (c) processing the genetic sequencing data such that intra-segment reads, read pairs with both mates mapped to the same data set, are saved to a respective plurality of individual binary alignment map (BAM) files corresponding to that respective segment; (d) processing the genetic sequencing data such that inter-segment reads, read pairs with both mates mapped to different segments, are saved into at least a second BAM file; and (e) processing at least the first plurality of BAM files along parallel processing paths. The plurality of segments may correspond to any given number of genomic subregions and may be selected based upon the number of processing cores used in the parallel processing.

The invention relates to an apparatus for growing thin films onto the surface of a substrate by exposing the substrate to alternately repeated surface reactions of vapor-phase reactants. The apparatus comprises at least one process chamber having a tightly sealable structure, at least one reaction chamber having a structure suitable for adapting into the interior of said process chamber and comprising a reaction space of which at least a portion is movable, infeed means connectable to said reaction space for feeding said reactants into said reaction space, and outfeed means connectable to said reaction space for discharging excess reactants and reaction gases from said reaction space, and at least one substrate adapted into said reaction space. At least one loading chamber is arranged to cooperate with said process chamber so as to permit said reaction space or a portion thereof to be moved into said process chamber and away from said process chamber and, further, the operating pressure of the loading chamber is arranged to be controllable independently from said pressure chamber.

An edge of a surface to be measured of wafer and each of search alignment marks on the wafer are detected by an inline measurement instrument or the like that operates independently of an exposure apparatus, and position coordinates of the search marks in an X′Y′ coordinate system, which is a two-dimensional coordinate system substantially parallel to the surface to be measured and is set by a position of a notch of the wafer, are measured. Then, in pre-alignment performed when loading the wafer into the exposure apparatus, the edge of the wafer is detected, and from the detection results, position information of the object in the X′Y′ coordinate system is measured. Further, a relative position in the X′Y′ coordinate system of the wafer to be loaded into the exposure apparatus based on measurement results of the pre-alignment with respect to a measurement field of an alignment system that measures positions of the search marks on the wafer is adjusted based on measurement results of the inline measurement instrument or the like.

A separator disk (4) for use in centrifugal separation of components is designed to automatically position itself during separation at the interface between the supernatant and the remaining components. Preferably the interface is between plasma and red blood cells.

One embodiment sets forth a method for processing draw calls that includes setting up a plurality of shader input buffers in memory, receiving shader input data related to a graphics scene from a software application, storing the shader input data in the plurality of shader input buffers, computing a pointer to each shader input buffer included in the plurality of shader input buffers, and passing the pointers to the plurality of shader input buffers to the software application. By implementing the disclosed techniques, a shader program advantageously can access the shader input data associated with a graphics scene and stored in various shader input buffers without having to go through the central processing unit to have the shader input buffers binded to the shader program.

The invention discloses a collaborative interaction method for an unmanned plane cluster and a visual navigation system of an unmanned plane. The collaborative interaction method for the unmanned plane cluster comprises the following steps of: determining unmanned planes satisfying a collaborative condition in a communication coverage area of a certain unmanned plane by the unmanned plane in the unmanned plane cluster, and establishing an unmanned plane collaboration group according to the unmanned planes satisfying the collaborative condition; determining inter-plane routes of multiple unmanned planes in the unmanned plane collaboration group; allocating collaborative tasks to multiple unmanned planes in the unmanned plane collaboration group according to link state information of the inter-plane routes; and evaluating the link state according to the motion state of multiple unmanned planes in the unmanned plane collaboration group, and updating unmanned planes in the unmanned plane collaboration group and the collaborative task of each unmanned plane according to an evaluation result. The collaborative interaction method for the unmanned plane cluster is good in real-time, strong in reliability and high in communication quality, and can better adapt to an unmanned plane cluster communication environment during visual navigation.