Galvanometer type laser direct writing photoetching machine

Abstract

A galvanometer type laser direct writing photoetching machine adopts the modular design, and is composed of a laser scanning module, an automatic focusing module, a sample table module, a displacement table module, a sample wafer monitoring module and a control module. By adopting double-galvanometer laser scanning and a wide-range two-dimensional displacement table, the galvanometer type laser direct writing photoetching machine can achieve high-speed wide-range high-precision laser direct writing photolithography, and suitable for rapid and economic manufacture of micronano structures.

Description

Technical field [0001] The invention belongs to the field of micro-nano processing, in particular a galvanometer type laser direct writing lithography machine, which is suitable for processing two-dimensional optical elements, micro-electromechanical systems, high-precision printed circuit boards, semiconductor masks, and the like. Background technique [0002] With the continuous shrinking of feature sizes in the field of micro-nano processing, the manufacturing cost of photolithography masks has continued to rise, resulting in a sharp increase in the cost of micro-nano processing in small batches; the increasing demand for product customization and differentiation has led to small batches The demand for processing continues to grow; laser direct writing technology is a lithography technology that does not require a lithography mask. The small batch processing cost is very low, and it undoubtedly adapts to this trend. [0003] Laser direct writing technology uses a variable-intens...

AI Technical Summary

Problems solved by technology

[0005] (1) The device does not have a laser scanning system, relying on the sample table to drive the sample to move to form photolithography, the writing speed is too slow, which is not conducive to writing large-scale samples and mass production of samples;

[0006] (2) The control system of the device is a non-real-time computer, and the control and response speed of the whole system is slow, which is also unfavorable for writing large-scale samples and batch production of samples, especially unfavorable for batch production of samples;

[0008] (1) Due to the use of multi-beam writing, the relative position adjustment between multiple beams is difficult, which reduces the controllability of the relative position of the beams and increases the difficulty of machine adjustment;

[0009] (2) The asynchronous modulation of multi-beam writing will have an impact on the writing graphics, especially for writing large-scale samples. Multi-beam writing is suitable for writing gratings, but it is powerless for writing arbitrary graphics;

[0010] (3) Due to the limitation of the control system and the output power of the light source, the number of beams is limited, and it is difficult to further increase the speed

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