Galvanometer type laser direct writing photoetching machine

Abstract

A galvanometer type laser direct writing photoetching machine adopts the modular design, and is composed of a laser scanning module, an automatic focusing module, a sample table module, a displacement table module, a sample wafer monitoring module and a control module. By adopting double-galvanometer laser scanning and a wide-range two-dimensional displacement table, the galvanometer type laser direct writing photoetching machine can achieve high-speed wide-range high-precision laser direct writing photolithography, and suitable for rapid and economic manufacture of micronano structures.

Description

Technical field [0001] The invention belongs to the field of micro-nano processing, in particular a galvanometer type laser direct writing lithography machine, which is suitable for processing two-dimensional optical elements, micro-electromechanical systems, high-precision printed circuit boards, semiconductor masks, and the like. Background technique [0002] With the continuous shrinking of feature sizes in the field of micro-nano processing, the manufacturing cost of photolithography masks has continued to rise, resulting in a sharp increase in the cost of micro-nano processing in small batches; the increasing demand for product customization and differentiation has led to small batches The demand for processing continues to grow; laser direct writing technology is a lithography technology that does not require a lithography mask. The small batch processing cost is very low, and it undoubtedly adapts to this trend. [0003] Laser direct writing technology uses a variable-intens...

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Problems solved by technology

[0005] (1) The device does not have a laser scanning system, relying on the sample table to drive the sample to move to form photolithography, the writing speed is too slow, which is not conducive to writing large-scale samples and mass production of samples;

[0006] (2) The control system of the device is a non-real-time computer, and the control and response speed of the whole system is slow, which is also unfavorable for writing large-scale samples and batch production of samples, especially unfavorable for batch production of samples;

[0008] (1) Due to the use of multi-beam writing, the relative posi

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