The invention provides an
overlay alignment optical measurement
system and
overlay alignment detection equipment, and belongs to the
semiconductor overlay alignment amount detection technology, the overlay alignment optical measurement
system comprises an illumination module, an
image acquisition module, an automatic focusing module, a
coupling light path module and a pre-alignment module; the overlay alignment detection equipment comprises a
machine table, a movable carrying table, a measuring frame, a Z-axis driving module and an optical
machine module. According to the invention, the pre-alignment light path is integrated on the basis of the self-focusing imaging light path, the overall measurement efficiency is improved, and the space occupation is reduced through the
layout that the automatic focusing module is inclined and the light path side is offset; the measuring head is integrally arranged on the Z-axis driving module, so that the overall stability of the equipment is improved; and the two
wafer fork grooves with different lengths are formed in the tray body, so that a
wafer taking
manipulator with fork handles with different lengths can be conveniently and quickly inserted, and the
wafer replacement efficiency is improved. The method is convenient to popularize and apply in
semiconductor overlay alignment, CD, defect and other nanoscale quantity detection scenes.