53 results about "Quasioptics" patented technology

The invention discloses a digital differential interference imaging method, and belongs to the technical field of optical imaging and microscopic imaging. The method comprises the steps that bright field illumination is used, a first image and a second image are collected at defocus positions which are vertically symmetrical on a sample focal plane respectively, and the defocus distance is larger than the physical depth of field of an objective lens; and carrying out pixel-level gray value subtraction on the two images to obtain a digital differential phase image. Digital image processing is adopted to replace optical shearing and interference of a traditional DIC, a polarized optical element and a special DIC prism are not needed, the system cost and complexity are remarkably reduced, the system can be compatible with non-standard optical material sample containers such as a plastic culture dish, and the directional shadow problem of the traditional DIC is solved. Meanwhile, by providing two specific implementation modes, namely accurate positioning acquisition and automatic focusing fusion acquisition, the imaging efficiency and the system robustness are further improved on the basis of ensuring the high contrast and the pseudo three-dimensional relief imaging effect.

A quasi-optical beamformer includes a plurality N>1 of power feeds (PF), each of the i∈[1; N] power feeds (PF) being configured to emit a respective radio-frequency beam denoted Ri, a radio-frequency transmission line (LT) fed at a first end by the power feeds and comprising at a second end a plurality of network ports (PR) that are configured to collect radio-frequency radiation, the transmission line (LT) comprising a radio-frequency waveguide (GO) that comprises at least two metal plates (PM) that are stacked so as to guide the radio-frequency beams Ri, i∈[1; N] towards the network ports (PR), the transmission line (LT) extending along a central main axis denoted axis x, a first reflector (M1) having a first centre (C1) centred on the axis x and a first effective radius of curvature and being configured to reflect the guided radio-frequency beams Ri, i∈[1; N], a second reflector (M2) having a second effective radius of curvature and being configured to reflect the radio-frequency beams (RFi) reflected by the first reflector so as to direct them towards the network ports so as to form output radio-frequency beams (RSi), the first and second effective radii of curvature and an arrangement of the power feeds (PF) with respect to the first reflector being configured so that: each of the output radio-frequency beams (RSi) is a plane wave, and a transverse amplitude distribution Ai, on the network ports (PR), of each output radio-frequency beam (RSi), is substantially identical.

The present disclosure relates generally to systems and methods for laser alignment, and more particularly to systems and methods for aligning optical elements to enable laser transmission. In some embodiments, the cover plate is configured to slide into position on the optics mounting plate. The positioning cover plate is to apply a force to the biasing element to press the optical element against the registration surface of the optical device mounting plate to align the optical element with the optical aperture. The cover plate may be fixed relative to the optic mounting plate to retain the biasing element and the optical element.

This invention relates to the field of image processing technology and discloses a multimodal data fusion method for online quality monitoring of plastics. The method includes: simultaneously acquiring a reference optical image of the plastic surface and a temporal infrared thermal distribution image containing the current frame and the previous frame infrared image; calculating a spatial temperature gradient matrix; correcting the geometric affine matrix based on the displacement vector normal component determined by the dense optical flow field, constructing a spatiotemporal compensation mapping matrix to achieve alignment of heterogeneous pixel coordinate systems, and generating a structure-guided tensor; applying morphological opening operations to remove low-frequency background thermal fluctuations from the structure-guided tensor to obtain a pure-state high-frequency thermal gradient matrix; adjusting the diffusion coefficient using the pure-state high-frequency thermal gradient matrix as a constraint, applying anisotropic diffusion filtering to the reference optical image, and extracting defect regions. This invention achieves physical-level decoupling between optical artifacts and real defects, eliminates feature mapping deviations caused by thermal conduction hysteresis, and improves the signal-to-noise ratio of image feature extraction.

The invention relates to a machine difference control method and a standard optical system. The method comprises the following steps: carrying out flat field correction on a camera under different working distances; shooting an object to be detected under different flat field correction conditions, selecting a plurality of feature points and measuring to obtain corresponding first feature values; measuring feature points of the same picture and the same position of the to-be-detected object, determining measurement data, and selecting a working distance with the minimum deviation as an optimal calibration distance; selecting a first camera which is qualified in calibration as a reference template, shooting the high-uniformity optical integrating sphere and extracting second characteristic values of uniformly distributed point locations; and comparing the third feature value extracted by each camera with the second feature value, and determining that the corresponding camera is calibrated to be qualified under the condition that the maximum difference value in the third feature value and the second feature value conforms to a preset specification, otherwise, performing calibration again. The method can improve the calibration precision, and effectively controls the machine difference.

This invention discloses a method for comparing the size of multi-party semi-quantum secrets based on two-dimensional single-photon states. First, each participant shares a key and encrypts their own secret, maintaining the numerical relationship. A semi-honest quantum third party (STP) randomly prepares a two-dimensional single-photon sequence using a Z-based or X-based approach and distributes it to each participant. Each participant performs corresponding operations on each pair of adjacent photons according to the encrypted bit values ​​and sends the results back to the STP. The STP receives the returned photons and decodes them to obtain encrypted data strings. After security checks, the STP performs a bitwise XOR operation on each data string to determine the size relationship of the multi-party secrets. This invention uses experimentally easily prepared and manipulated two-dimensional single-photon states instead of high-dimensional or entangled states, requiring only standard optical devices, significantly reducing the implementation difficulty. By combining additive encryption with XOR comparison rules, it achieves size comparison while protecting privacy, solving the problems of difficult physical implementation and reduced security in existing methods. It has economical, efficient, and practical technical advantages.

The present application relates to the field of optical measurement, and provides a lithography machine interferometer light beam calibration device and method. The lithography machine interferometer light beam calibration device is used for calibrating a measurement light beam of an interferometric measurement system in a lithography machine, and comprises a reference optical element configured to establish an absolute angle reference in a calibration environment; a simulation target having at least one reflecting surface and configured to be detachably placed in the optical path of the measurement light beam during calibration; a reference transmission assembly configured to transmit the absolute angle reference defined by the reference optical element to the reflecting surface of the simulation target; and a diagnostic optical module configured to be detachably installed at the light beam outlet of the interferometric measurement system to receive the measurement light beam reflected by the reflecting surface of the simulation target; the diagnostic optical module interferes the received measurement light beam with an internal reference light beam of the diagnostic optical module, and uses the form of the formed interference fringes as a basis for judging the collimation state of the measurement light beam.

The invention discloses an identification method and related equipment for rapidly identifying a multi-modulus seed magnetic island, and relates to the field of magnetic confinement fusion plasma diagnosis. Wherein at least one group is used for switching observed circumferential positions in different time sequence segments through a waveguide switch in the quasi-optical transmission module. The method comprises the following steps: synchronously acquiring electronic temperature signals of two groups of microwave measurement subsystems at the same radial channel in a time sequence segment corresponding to different annular phase differences, carrying out time averaging on the electronic temperature signals, and judging and identifying a seed magnetic island corresponding to an annular modulus based on the same radial temperature difference and normalization, and further extracting a flat region based on the distribution of the electron temperature along with the radial channel to determine the width and the boundary position of the magnetic island. According to the invention, the rapid distinguishing and high-precision positioning of a plurality of annular modulus seed magnetic islands can be realized without adding extra detection channels.

Method for aligning two oppositely arranged optical subsystems (12u,12u',12u'',12o,12o',12o'') of an optical system (11,11',11"), comprising the following steps: - Projection of alignment marks (9l, 9r, 9l', 9r') into an image plane (5u) of the first optical subsystem (12u, 12u', 12u''), - Projection of the alignment marks (9l,9r,9l',9r') from the first image plane (5u) onto a sensitive surface (14so) of the second optical subsystem (12o, 12o', 12o''), - Alignment of the optical subsystems (12u,12u',12u'',12o,12o',12o'') to each other, such that projections (9pl,9pr) of the alignment marks (9l,9r,9l',9r') are imaged at ideal positions (9il,9ir) in a depth of field area of ​​the sensitive surface (14so), characterized in that the alignment marks (9l, 9r) are applied directly to a first sensitive surface (14su) of a first camera chip (2u), wherein the alignment marks (9l, 9r) have a collection of non-functional pixels.

The present application relates to the technical field of spray head adjustment, in particular to a variable focus UV spray head automatic adjustment method based on deep learning, comprising the following steps: collecting a spray medium surface image and dividing the area, constructing a graph neural network node attribute, calculating a structural similarity score to match a focal length value, extracting an edge diffraction fringe to evaluate an error and outputting a preliminary adjustment instruction, combining historical control values to estimate acceleration and compare parameters, and executing backtracking reconstruction to generate displacement step adjustment instructions when exceeding. The present application structures the local area features of the spray medium surface image and introduces a graph structure similarity judgment, combines the mapping relationship between the diffraction fringe and the standard optical features to construct a focal length error inversion path, and introduces historical control quantities and time sequence constraints in the control output stage to correct the adjustment amplitude and direction within the spray head inertia boundary, so that the focal length adjustment process continuously matches the actual state of the spray, and the adjustment stability and adaptability are improved.

The invention discloses multifunctional optical thin film detection equipment, and relates to the technical field of optical material detection. Comprising an equipment body, a uniform backlight source, a reflection type brightness enhancement film assembly, a multifunctional measuring jig and a handheld spectrum color illuminometer, the uniform backlight source is arranged on the equipment body and connected with an equipment cover through a hinge, and the multifunctional measuring jig is inserted into the uniform backlight source; a reflection type brightness enhancement film assembly or a standard optical film is arranged above the multifunctional measuring jig, and a containing groove for containing a handheld spectrum color illuminometer is formed in the side edge of the equipment body. According to the birefringence detection device and method, through the multiple polarization circulation effect of the reflection type brightness enhancement film, polarization changes caused by birefringence of the film to be detected are amplified and converted into measurable brightness differences, and low-cost and high-sensitivity detection of the birefringence degree of optical films such as BOPET is achieved. Meanwhile, switching between white light and blue light is supported, various optical film testing requirements are met, and the advantages of integration, damage prevention, easy and convenient operation and the like are achieved.

This invention belongs to the field of dimensional detection technology, specifically a multi-laser-beam coordinated overall dimensional detection device for porcelain insulators. It includes a support frame; a detection component; a U-shaped frame mounted on the support frame; a displacement U-block connected to the side of the U-shaped frame; a displacement U-block equipped with a transposition actuator; and a control clamping assembly on the U-shaped frame. The transposition actuator includes a positioning groove disposed within the U-shaped frame; a positioning slider is fitted within the positioning groove, and the two slide in cooperation; a positioning ring is mounted on the positioning slider; the detection component is located within the positioning ring, with their central axes aligned; and the control clamping assembly includes a drive source mounted on both sides of the U-shaped frame. This invention solves the problem of large-area voids in point cloud data caused by the downward tilting structure of the umbrella skirt, and enables accurate optical calculation of the umbrella skirt area, significantly improving the accuracy of umbrella skirt area calculation and overall dimensional detection.

The invention provides a local oscillation noise suppression device for a superconductive tunnel junction mixer, and belongs to the technical field of terahertz detection. The device comprises a local oscillator signal source, a local oscillator light path, a superconductive tunnel junction mixer and a quasi-optical filter. The local oscillator signal source provides a local oscillator signal to the superconductive tunnel junction mixer through a local oscillator light path; the quasi-optical filter is located between the local oscillator signal source and the local oscillator light path and used for attenuating local oscillator power and reducing reflection of signals in the local oscillator light path. The quasi-optical filter is formed by machining an integrated metal plate, circular grooves are formed in the symmetrical positions of the two sides of the metal plate, and through holes are formed in the centers of the grooves and serve as attenuation windows. The environment adaptability is high, and normal-temperature / low-temperature stable work is supported; signal reflection and sideband noise are effectively suppressed by the composite design of the conical structure and the black body absorbing coating; and realizing accurate power matching based on a Gaussian beam theory.

A method of calibrating an optical detector includes installing a calibration system within at least one sensing volume of the optical detector, filling a chamber of the calibration system with a material to achieve a known obscuration, and measuring an obscuration of the material within the chamber.

A photonic device has a waveguide, such as a ridge waveguide, defined by a waveguide etch, an etched facet defined by a facet etch and having an optical coupling region optically coupled to the waveguide, and a fiducial mark configured for alignment of an optical component, such as a photonic integrated circuit, to the optical coupling region. The fiducial mark has a first portion defined by at least a part of the waveguide etch and a second portion defined by at least a part of the facet etch. The first portion has an elongate broken bar shape that extends lengthwise along a direction parallel to the waveguide's propagation direction at the optical coupling region. The second portion includes an elongate shape that extends lengthwise orthogonally with respect to its etch depth and with respect to the waveguide's propagation direction at the optical coupling region.

The application discloses a kind of single station multi-target space coordinate measurement methods based on photoelectric scanning and absolute ranging, comprising: constructing integrated measurement base station and cooperative target, the relative position of photoelectric scanning module and absolute ranging module on measurement base station is calibrated, the position of photoelectric receiving unit and optical reflection unit on cooperative target is calibrated;The rotation angle and normal vector of scanning light plane are obtained, with the center position of optical reflection unit as target measurement point, the coarse measurement coordinates of target measurement point are calculated;Absolute ranging module is guided ranging light beam according to coarse measurement coordinates and is aligned with the center position of optical reflection unit, the distance between optical reflection unit and absolute ranging module is measured;Establish coordinate measurement model, and calculate the accurate space coordinates of target measurement point.The application realizes the automatic coordinate measurement of single station measurement equipment to space multi-target.

The invention discloses a thickness detection device for an optical lens, the thickness detection device is composed of a workbench, a positioning mechanism, a second cylinder and a clamping mechanism, a first infrared signal emitter is started to emit an infrared signal, the position of a test head on an X-Y plane is conveniently adjusted through the mutual cooperation between the positioning mechanism and the first infrared signal emitter, and the thickness of the optical lens is detected. A testing head is automatically aligned with the center position of an optical lens, the optical lens is placed in a placing groove, a knob is held by hand to rotate a screw rod, a second moving plate is pushed to approach the optical lens, and the second moving plate moves to drive a first clamping column, a second clamping column and a third clamping column to approach the optical lens, so that the position of the optical lens is conveniently clamped and fixed; when the testing head is in contact with the optical lens, the spring is used for first-stage buffering, and the fourth movable plate, the fifth movable plate, the fourth sliding groove and the sliding block form second-stage buffering, so that the damage of the testing head to the optical lens can be effectively reduced under the action of double buffering.

The present invention relates to a method for aligning an optical element (2) in a holding device (3) for holding the optical element (2), wherein the method comprises at least the following steps: providing the optical element (2), providing the holding device (3) for holding the optical element (2), and aligning the optical element (2) in the holding device (3). The objective of providing a method that enables efficient and time-saving assembly of optical assemblies, while simultaneously reducing the number of individual parts required to decrease production complexity and increase cost efficiency, is achieved by aligning the optical element (2) in the holding device (3) along the z-axis of the holding device (3).The present invention further relates to a device (1) for aligning an optical element (2) in a holding device (3) for holding the optical element (2), in particular for carrying out the method according to the invention, and to a method for manufacturing an optical system (10), in particular an optical system (20) of a semiconductor technology system (200), comprising at least one optical element (2) aligned in a holding device (3).

An optical alignment apparatus and an optical alignment method, used for aligning a first optical axis of a first optical element (01) with a second optical axis of a second optical element (02). The optical alignment apparatus comprises: a first six-axis displacement stage (11), the first six-axis displacement stage (11) being used for carrying the first optical element (01); a light emitting and receiving mechanism (12), the light emitting and receiving mechanism (12) being disposed above the first six-axis displacement stage (11); and a support frame (13), the support frame (13) being used for carrying the second optical element (02), the second optical element (02) being arranged opposite to the first optical element (01), and the second optical element (02) being located between the light emitting and receiving mechanism (12) and the first optical element (01).

In some implementations, an optical element comprises a glass substrate, a dark mirror coating disposed on a first surface of the glass substrate, and a lens disposed on a second surface of the glass substrate. An aperture is formed in the dark mirror coating, and the aperture is aligned with the lens. The optical element is a monolithic optical element.

The application discloses a kind of six-degree-of-freedom error correction three-dimensional motion measurement system and measurement method, including optical air floatation platform, six-degree-of-freedom error correction three-dimensional motion measurement system, two-dimensional motion machine table, reference optical flat, color confocal measurement bridge component, camera measurement bridge component and thin film interference component;Camera measurement bridge frame module in the application acquires the image of concentric circle in the image grid sensor system, the concentric circle image is based on subpixel processing and concentric circle identification to obtain high-precision transverse displacement, based on linear interpolation calculation mode forms two virtual measurement lines in X, Y two directions, the intersection of measurement line is the placement position of color confocal head, the thin film interference component is placed directly below the head, the thin film interference component uses super-precision optical flat as measurement reference, so that the application satisfies three-dimensional zero Abbe error, three-axis zero coupling error, improve the measurement accuracy of three-dimensional motion measurement platform.

Provided are rotating polygonal mirror LiDAR systems that reduce vibration and improve accuracy of the rotating LiDAR optical engine and calibration methods, devices, and systems to calibrate the LiDAR optical engine to improve the mapping accuracy of a generated point cloud of an environment.

The invention provides a spatial light path auxiliary aligner which can be applied to the technical field of optical precision measurement. The method comprises the steps that a light source module is used for generating a reference beam and a measurement beam; the reference light path module comprises a beveled optical fiber assembly and a standard optical lens group, the beveled optical fiber assembly is used for dividing an input reference light beam into an emergent light beam and a reflected light beam, and the standard optical lens group is used for collimating the emergent light beam to form a first indication light beam; the light splitting element is used for transmitting the first indication light beam and reflecting the measurement light beam; the first imaging lens group is used for receiving and collimating the reflected light beam to form a second indication light beam, and is used for collimating the reflected light of one path of measurement light beam; the first detector is used for interfering the second indication light beam with the reflected light to generate a first interference signal; and the second detector is used for enabling the first indication light beam to interfere with the other path of measurement light beam to generate a second interference signal. The invention also provides an alignment method and an optical system.

The application discloses a kind of based on style migration multi-source remote sensing image light uniformity color method, belong to computer vision and remote sensing science and technology field. Including: based on standard optical model, make remote sensing satellite cloud image dataset;Through category semantic label, construct positive and negative prompt word, and the degraded cloud image is introduced into noise estimation network as condition to estimate conditional noise distribution, train conditional diffusion model;Convolution network and the remote sensing image semantic extraction model of the combination of Transformer are constructed, and the semantic extraction of multi-source remote sensing image is carried out, and the ground object category label of each pixel point is output;For the content and style information of multi-source remote sensing image, construct the style migration model based on Transformer, reference radiation characteristic suitable benchmark image, realize the light uniformity color of remote sensing image. It can be applied to realize the color coordination between adjacent images, contrast is moderate, make color image approach natural real color.

The application discloses a multi-party semi-quantum secret size comparison method based on two-dimensional single-photon states, first, each participant shares a key and encrypts the respective secret, keeping the numerical size relationship unchanged; a semi-honest quantum third party (STP) randomly prepares two-dimensional single-photon sequences with Z bases or X bases and distributes the two-dimensional single-photon sequences to each participant; the participant sends back the STP after performing corresponding operations on each pair of adjacent photons according to the encrypted bit value; the STP receives the returned photons and decodes to obtain encrypted data strings; after security detection, the STP performs an exclusive or operation on each data string bit by bit to determine the size relationship of the multi-party secret. The application uses two-dimensional single-photon states which are easy to prepare and manipulate to replace high-dimensional states or entangled states, only needs standard optical devices, and significantly reduces the implementation difficulty; in combination with the addition encryption and exclusive or comparison rules, the size comparison is realized while the privacy is protected, and the problems of physical implementation difficulty and security reduction of the existing method are solved, and the application has the technical effects of economy, high efficiency and landing.

The invention relates to an optical assembly (50) comprising: an optical fiber (200), a support (51), a fiber positioning substrate (52), a beam splitter element (60), an optical component (100) forming a resonant array, and a cover plate. The substrate (52) rests on the support and has a housing for receiving the beam splitter element and the optical component. A groove (80), formed in the substrate (52) and the support (51) and opening into the housing, receives the optical fiber so that it is aligned with the beam splitter element. The arrangement of the constituent elements of the optical assembly relative to each other allows bidirectional transmission of signals with a light source / photodetector assembly arranged in a direction orthogonal to an optical axis of the optical fiber without requiring dynamic alignment of the elements. Figure 1

The purpose of this invention is to provide a method for testing the surface resistivity of metals based on a quasi-optical resonant cavity, belonging to the field of electromagnetic parameter testing technology for microwave and millimeter-wave materials. This method measures the cavity quality factor of the dual-spherical cavity, the quality factor of the plano-concave cavity formed by the sample surface and the left quasi-optical cavity spherical surface, and the quality factor of the plano-concave cavity formed by the sample surface and the right quasi-optical cavity spherical surface. Based on the measurement results of these three quality factors, the mirror loss of the two spherical surfaces of the dual-spherical cavity is deducted. Using this testing method, high-precision testing of metal surface resistivity can be achieved, with improved accuracy at high frequencies. Tests were conducted on two typical metals, copper and stainless steel, at 360 GHz and 460 GHz respectively, and the measurement results show that the overall measurement error is less than 15%.

This invention discloses an online measurement device and method for polishing pad thickness and flatness. The measurement device includes a laser rangefinder, n eddy current rangefinders, n measuring wafer units, and a feed unit. This invention uses the laser rangefinder to obtain the distance between the laser rangefinder probe and the upper and lower surfaces of the measuring wafer in real time. The distance between the laser rangefinder probe and the lower surface of the measuring wafer reflects the height of various points on the polishing pad surface, and the flatness of the polishing pad can be calculated. The difference between the distance between the laser rangefinder probe and the upper and lower surfaces of the measuring wafer is the measuring wafer thickness. This invention uses an indirect measurement method, eliminating the influence of measurement on the polishing process, avoiding probe wear, and the measurement process is not affected by the polishing fluid. It overcomes the problem of low measurement accuracy caused by the porous material and slotted design of the polishing pad. This invention uses standard optical flat calibration to compensate for motion errors and assembly errors. The measuring wafer unit uses a weight loading method, which is simple, reliable, and has high loading accuracy.