The invention discloses a binary
mask plate design method of a three-dimensional structure, a binary
mask plate and a manufacturing method, and relates to the field of
mask plate production and manufacturing. The method comprises the following steps: S1, designing a graphic unit of which the resolution is smaller than that of an
exposure machine in the
flat panel display industry on a binary mask; s2, according to the parameters of the target three-dimensional structure, the
light transmission amount required by the corresponding plane pattern on the binary mask is inversely calculated; s3, calculating the pattern unit arrangement density of each array
small unit according to the light
transmittance requirement; and S4, generating coordinates corresponding to each pattern unit according to the pattern unit arrangement density, and generating a gds pattern file required by photoetching. According to the invention, a micro three-dimensional structure is formed on the large-size panel display glass by using an
optical diffraction principle. The method is simple, does not need to add special equipment, is compatible with an existing panel display
exposure process, solves the problems that a traditional three-dimensional graph is low in
manufacturing efficiency, high in cost and limited in size, enriches the optical design selection of the panel display industry, and has remarkable practical value and popularization prospects.