127 results about "Phase mask" patented technology

The invention relates to the technical field of laser micromachining, in particular to a TGV drilling machining system and method based on a space-time modulation Bessel beam, an initial laser beam is output through a laser device, the initial laser beam is modulated into a dynamic pulse sequence through a pulse chirp regulation and control module, axial energy attenuation is compensated, a machining subsystem generates the Bessel beam, and the TGV drilling machining system and method based on the space-time modulation Bessel beam are obtained. The angle is finely adjusted in real time through piezoelectric driving, and a dynamic spatial light modulator loads an exponential decay type phase mask, so that light beam airspace shaping, non-diffraction light beam generation, pulse time sequence and phase parameter synchronous control and high-peak power pulse array are realized, and finally, integrated micro-perforation and channel modification of the glass substrate are realized; and the machining efficiency and precision are obviously improved.

The invention belongs to the crossing field of material science and image recognition, and particularly discloses a titanium alloy microscopic structure detection method and device, and the method comprises the steps: obtaining an electron back scattering diffraction (EBSD) image sample of a titanium alloy; obtaining block-shaped alpha-phase mask information corresponding to the EBSD image sample by analyzing grain characteristics in the EBSD image sample; the first round of training is that an initial deep learning model is trained based on the EBSD image sample and the corresponding block alpha phase mask information, and the deep learning model is used for identifying the block alpha phase of the titanium alloy in the image based on the input image; a second round of training: carrying out data enhancement operation on the EBSD image sample to obtain an enhanced sample, and carrying out continuous training on the model obtained by the first round of training based on the enhanced sample; and a third round of training: based on a metallographic image sample, carrying out migration training on the model obtained by the second round of training. By means of the method and device, efficient and accurate titanium alloy microscopic structure detection can be achieved.

The invention provides a long-depth-of-field integrated imaging display, a long-depth-of-field integrated imaging method and a long-depth-of-field integrated imaging system. The long-depth-of-field integrated imaging display comprises an image processor, a display, a microlens array and a quartic phase mask, the pupil position of each micro lens of the micro lens array is correspondingly integrated with a quartic phase mask; the image processor is used for acquiring a to-be-displayed image and constructing an element image array; performing inverse convolution processing on each element image in the element image array based on a preset phase mask function, and constructing a preprocessed element image array matrix; performing negative value processing on the preprocessed element image array matrix to obtain a preprocessed element image array; and the display is used for displaying the preprocessed element image array, so that the preprocessed element image array generates a long depth-of-field image through the micro-lens array and the quartic phase mask. According to the invention, defocus blurring is effectively suppressed without introducing an extra complex optical structure, a long depth-of-field image is generated on the premise of ensuring the image contrast, and the integrated imaging display quality is improved.

The invention relates to a method for holographic generation of an array of focusing points arranged according to multiple positions of the field of an optical system, which comprises: (S10) detecting images formed by the optical system at a plurality of calibration points arranged according to multiple positions of the field of the optical system; (S20) estimating aberrations introduced by the optical system onto the optical field from the detected images; (S30) applying a phase mask to the optical beam in order to generate a plurality of focusing points arranged according to multiple positions in the field of the optical system; wherein the phase mask is calculated from the estimated aberrations in order to simultaneously compensate for the aberrations at each focusing point. The invention also relates to a holographic generation system which carries out this method.

A method for designing and optimizing a lensless imaging device includes: (a) a method for optimizing the point spread function for various imaging, computer vision and artificial intelligence tasks, (b) a method for computing the optimal phase mask that can realize the desired point spread function, (c) using the optimal phase mask in a lensless camera and (d) a method for calibrating the lensless imaging device using a single captured image.

A system includes a microscope and computer system communicably coupled together. The microscope includes a camera, phase mask, and ultraviolet source. The phase mask is disposed within a view of the camera. The microscope is configured to scatter a light illuminating a tissue by emitting, using the ultraviolet source, an ultraviolet radiation towards the tissue and obtain, using the phase mask and the camera, an image of an illuminated surface of the tissue. The tissue includes at least one diagnostic feature. The image is within a predefined depth of field, inclusive, and includes a manifestation of the at least one diagnostic feature. The computer system is configured to determine a deblurred image from a trained first artificial intelligence model based on the image.

An optical sensor device includes an optical sensor; an optical filter; a phase mask configured to distribute a plurality of light beams associated with a subject in an encoded pattern; a movement component configured to move the phase mask; and one or more processors configured to: obtain, from the optical sensor, a first set of sensor data that indicates information related to first light that originates at the subject and passes through the phase mask when the phase mask is located at a first position; obtain, from the optical sensor, a second set of sensor data that indicates information related to second light that originates at the subject and passes through the phase mask when the phase mask is located at a second position; determine and provide, based on the first set of sensor data and the second set of sensor data, information associated with the subject.

The invention discloses a wavelength division multiplexer device and method compatible with channel monitoring, and relates to the technology of wavelength division multiplexers. According to the integrated wavelength division demultiplexer device with the wavelength division demultiplexing end adopting the waveguide deep etching Bragg grating, the functions of multi-channel network information transmission and network channel state monitoring can be realized at the same time; the wavelength division demultiplexer comprises a wavelength division demultiplexer common end input waveguide, a wavelength division demultiplexer, a wavelength division demultiplexer output waveguide and a Bragg grating which is written in the wavelength division demultiplexer output waveguide area by adopting a phase mask method. The device is high in integration degree and simple in structure. The channel monitoring method provided by the invention is realized based on the integrated wavelength division demultiplexer device, does not need to additionally distribute wavelengths for monitoring channels and independently distribute optical fibers for returning monitoring signals, is low in implementation difficulty compared with a software means for monitoring link node information, and can be applied to a complex optical communication network.

A device for optically imaging a scene has at least one optical detector and an optical arrangement arranged in front of the optical detector, by means of which the scene can be imaged in a focal plane of the optical arrangement. The detector surface of the optical detector is arranged outside the focal plane and the optical arrangement has an amplitude or phase mask which enables improved algorithmic reconstruction of a sharp image of the scene from a blurred image acquired by the detector. In an alternative, the device additionally has an optically nonlinear filter arranged in the region of the focal plane which, when subjected to incident optical radiation with an intensity above a threshold intensity, changes its optical properties such that it blocks or at least attenuates this radiation.This device creates an optical sensor system that has an improved protective effect against interference radiation, in particular incident laser radiation, while maintaining almost unchanged size.

The invention provides a screen information anti-leakage method and system, and relates to the field of information security, and the method comprises the steps: calculating and generating a target moire fringe pattern which can strongly interfere with secret photographing equipment based on preset secret photographing equipment parameters and the energy distribution of original information in a transform domain; the Hash value of the original information content and the dynamic safety parameters are subjected to logical operation and then input into a hyperchaotic system, a chaotic phase mask bound with the content and time is generated, amplitude-frequency information and a mask of moire fringes are combined, a preset imaging light path model is subjected to reverse optimization calculation, and a stable and effective anti-divulging disturbance pattern within a preset range is obtained. And carrying out pixel-level superposition on the anti-leakage disturbance pattern and the original information through a multi-scale fusion algorithm, generating a display frame, outputting the display frame to a screen, and updating the disturbance pattern along with the frame or the period to resist the attack of multi-frame average interference elimination.

The invention relates to the technical field of fiber bragg grating preparation, and provides a femtosecond laser phase mask FBG inscribing system based on an off-axis parabolic cylindrical mirror, which comprises a grating inscribing light path system, an off-axis parabolic cylindrical mirror, a phase mask plate and a glass slide which are sequentially arranged along the light path direction, and is characterized in that the grating inscribing light path system emits laser into one end of the cylindrical surface of the off-axis parabolic cylindrical mirror; one end of the off-axis parabolic cylinder of the off-axis parabolic cylinder mirror focuses the laser and emits the laser into the phase mask plate, and the phase mask plate is arranged above the off-axis parabolic cylinder mirror and can generate interference fringes for inscribing the optical fiber; an optical fiber inscribing area is formed on the upper surface of the glass slide, optical fiber refractive index matching liquid is arranged on the optical fiber inscribing area, an optical fiber to be inscribed is attached to the optical fiber inscribing area of the glass slide and placed in the refractive index matching liquid, and FBG inscribing is conducted on the optical fiber to be inscribed through interference fringes generated by the phase mask plate. According to the invention, the energy density of the focusing light spot is obviously improved, and the laser beam can be accurately focused on the optical fiber core.

A high-power multiplexer / demultiplexer ("mux / demux") and a three-dimensional ("3D") printed phase mask are provided for hollow-core optical fiber applications. The high-power mux / demux includes hollow core optical fiber interfaces configured to couple with free-space optical fiber cables, a diffraction grating, a 3D printed phase mask, and a set of lenses. The diffraction grating is configured, based on different wavelengths, either to at least diffract each optical signal of a plurality of optical signals having different wavelengths into two or more optical signals or to at least diffract a single optical signal having multiple wavelengths into a plurality of optical signals. The phase mask includes reflective features configured to reflect optical signals at different optical path lengths to provide reflected optical signals with different phases. The set of lenses is configured to collimate optical signals onto or from the diffraction grating or to focus optical signals onto or from the phase mask.

Provided are an apparatus for manufacturing a cover window, a method for manufacturing a cover window, and an electronic device including a cover window. The apparatus for manufacturing a cover window includes a light source outputting an original laser beam, a beam splitter splitting the original laser beam into a main beam and at least one sub-beam, a first phase mask diffracting the main beam to convert the main beam into a straight beam, a second phase mask diffracting the sub-beam to convert the sub-beam into a dot-line beam including a plurality of dot beams, a beam combiner combining the main beam and the sub-beam to form a single combined beam, and an objective lens focusing the combined beam onto a focal plane, wherein the beam splitter sets extension directions of polarization axes of the main beam and the sub-beam to be different from each other.

The utility model provides a grating structure manufacturing system comprising a light source assembly used for emitting a first light beam and a second light beam which are propagated along different light paths; the mask assembly is of an integrated structure and comprises a first grating phase mask and a second grating phase mask, the grating period of the first grating phase mask is different from that of the second grating phase mask, the first grating phase mask is located on the propagation light path of the first light beam, and the second grating phase mask is located on the propagation light path of the second light beam. The diffraction module is used for diffracting the first light beam to form a first exposure light beam; the second grating phase mask is positioned on a propagation path of the second light beam and is used for diffracting the second light beam to form a second exposure light beam; the exposure substrate is used for bearing an exposure material, and the first exposure light beam and the second exposure light beam are respectively incident to different positions of the exposure substrate, so that grating structures with different periods are formed at different positions of the exposure material when the exposure material is placed on the exposure substrate.

The application relates to an optimization design method of a polygon-based multi-plane device, comprising the following steps: S1. determining parameters of a polygon-based MPLC device; S2. constructing a topological-mode coupling model to determine a phase compensation amount; S3. generating an initial phase mask according to the phase compensation amount calculated in step S2 and in combination with phase distribution characteristics of a target mode; S4. outputting optimized phase mask parameters based on a genetic optimization algorithm; and S5. simulation verification: building simulation models of different topological structures, inputting the optimized phase mask parameters, simulating a mode evolution process, and analyzing whether a performance threshold value meets a demand. The application solves the problems that a traditional algorithm ignores the influence of a topological structure and the generality of a phase mask is poor, realizes accurate design of different polygon devices, and thus effectively reduces loss and improves shaping effect.

The invention discloses a multi-wavelength channel diffraction neural network system based on threshold screening and a processing method, and belongs to the technical field of artificial intelligence and optical computing. Comprising an encoding module used for encoding task information corresponding to different to-be-processed tasks to multiple light beams with different working wavelengths output by a light source module to form multiple task channel light fields; the optical diffraction module comprises a plurality of modulation layers; the optical diffraction module is used for receiving the task channel light fields and realizing diffraction modulation and threshold screening of the task channel light fields by changing the metasurface structures on different modulation layers; each task channel light field shares the same set of diffraction modulation parameters, namely parameters such as phase, mask generation and threshold; threshold screening: comparing the mask generation parameter with a threshold parameter, performing binarization selection on the phase parameter according to a comparison result, and screening out a target phase parameter; the output detection module detects the output light intensity. Task channels are expanded, and the system integration degree is improved.

The optical wave selective switch device comprises a fiber array unit comprising a plurality of input / output ports for sending / receiving laser beam signals having different bandwidths, a switching element for steering laser beams in a switching direction, to specific output ports of the fiber array unit, a dispersing element which disperses laser beam signals which are incident thereon, depending on the wavelength of the laser beam signals. Furthermore, the optical wave selective switch device comprises a diffractive optical element with a two-dimensional phase mask is located adjacent to the switching element and outside of electrodes of the switching element so as to introduce individual phase correction for each wavelength corresponding to respective channels in the optical wave selective switch device.

The application discloses a phase mask plate preparation method for inhibiting a Fabry-Perot effect, and comprises the following steps: a dispersion fiber grating model is established, and reflection spectrum, transmission spectrum and group delay curve of the dispersion fiber grating are obtained through simulation; an ultra-Gaussian cut-off function model is established; according to the reflection spectrum and the transmission spectrum of the dispersion fiber grating and the ultra-Gaussian cut-off function, the reflection spectrum, the transmission spectrum and the group delay curve of the optimized dispersion fiber grating are obtained through simulation, and then a refractive index modulation depth distribution curve of a grating area of the phase mask plate is obtained; the refractive index modulation depth distribution curve of the grating area of the phase mask plate is optimized to obtain an optimized refractive index modulation depth distribution curve; a diffraction efficiency distribution curve and a groove depth of the phase mask plate are calculated; and the phase mask plate is obtained according to the groove depth of the phase mask plate. According to the application, the groove depth distribution of the phase mask plate used for writing is only adjusted, the Fabry-Perot effect can be effectively inhibited, and therefore the reflection spectrum flatness of the dispersion fiber grating is improved.

The invention discloses a color medical image encryption method based on an iris secret key and digital holography, and the method comprises the encryption steps: firstly generating an iris chaotic structure light phase mask through employing an iris feature extraction technology, a chaotic matrix generation program, and a phase modulation technology; then, an FRFCM algorithm, a grating modulation technology, a Fresnel domain double random phase coding technology based on chaotic structured light illumination and a digital holographic coding technology are utilized to encrypt the original color medical plaintext image, so that three amplitude type holographic ciphertext graphs are generated; and a decryption step: firstly, carrying out iris authentication on the decryption user and the encryption user, if the authentication is successful, decrypting the ciphertext hologram by using iris high-order mask data of the encryption user so as to generate a correct decryption result, and otherwise, stopping decryption if the authentication fails. The color medical image encryption method provided by the invention has the advantages of high security, good iris key robustness, high digital key sensitivity, small calculation burden, large key space and high decryption quality.

A design method of a Gibbs-Wulff optical vortex array mask plate, steps are as follows: obtaining an electric field expression of a Gibbs-Wulff optical vortex array, combining the amplitude, phase of the Gibbs-Wulff optical vortex array with a blazed grating, obtaining a complex transmittance function of the Gibbs-Wulff optical vortex array mask plate, and the mask plate described based on the complex transmittance function is the Gibbs-Wulff optical vortex array mask plate. The present application utilizes the principle of computer holography, and obtains the amplitude modulation phase mask plate of the Gibbs-Wulff optical vortex array through computer coding, so that the Gibbs-Wulff optical vortex array with controllable boundary and controllable structure and arrangement mode in the boundary can be generated. Thus, the present application has important application value in the fields of particle manipulation and optical micro-machining.

The invention discloses an image anti-counterfeiting method based on vector quantization and a phase mask, and the method comprises the steps: firstly, selecting a two-dimensional code which is simple in structure and only has transverse and longitudinal black and white change characteristics as an information medium, and simplifying a subsequent phase modulation structure while keeping the recognition characteristics clear; a vector quantization image compression technology is utilized to effectively code a high-definition image with rich content into a simplified graphic expression in which a two-dimensional code can be embedded, and effective mapping and compression from image complexity to a barcode structure are realized; and finally, a low-order pure-phase optical mask is generated based on the two-dimensional code, embedding and optical reconstruction of a high-definition image are realized under the condition that the phase quantization order is relatively low, and both the image identification degree and the mask preparation feasibility are considered. Therefore, the innovative image-level anti-counterfeiting coding method which integrates physical anti-counterfeiting and digital anti-counterfeiting advantages and has high information bearing capacity and strong physical anti-counterfeiting performance is constructed. The invention provides a feasible, efficient and low-cost new path for physical anti-counterfeiting of high-definition images.

The invention belongs to the technical field of optical detection, and particularly relates to a dark-field microscope wafer defect extended depth-of-field detection system. According to the system, a 4f system comprising a phase mask is integrated behind a traditional dark field wafer defect detection system, so that a point spread function of an optical system is modified, and the phase mask is designed by limiting the variation trend of gradient variance of an intensity image of the point spread function of the optical system along with defocusing amount; the depth of field of the detection system is expanded. According to the invention, larger out-of-focus tolerance is provided for a dark-field pattern-free wafer defect detection system, so that wrong detection or missing detection caused by out-of-focus of the detection system due to wafer warping or mechanical vibration is avoided, and thus the dependence on a mechanical real-time automatic focusing system which is high in cost, complex in structure and difficult to manufacture is reduced; the method is especially suitable for related applications in optical detection fields such as wafer defect detection.

The invention relates to a laser processing apparatus and a method of cutting a substrate. According to an embodiment, a laser processing apparatus includes: a laser generating unit that generates a base laser beam; a Gaussian beam conversion unit that converts the base laser beam into an initial Gaussian beam; a phase mask part which converts the initial Gaussian beam into a primary mixed beam; and an objective lens unit that converts the primary mixed light beam into a final mixed light beam including a first light beam continuously applied as a Bessel-like light beam to form a cutting line on the mother substrate and a second light beam continuously applied as a Bessel-like light beam to form a cutting line on the mother substrate, and supplies the final mixed light beam to the mother substrate. The second beam forms a processing line as a Gaussian beam which is located on the surface of the mother substrate and is not located on the whole of the mother substrate.

The invention discloses a phase shift grating inscribing method of a DFB single-polarization single-frequency fiber laser. The phase shift grating inscribing method comprises the following steps: step (a), carrying out hydrogen carrying treatment on a gain fiber; (b) welding passive optical fibers at the two ends of the gain optical fiber to form inscribing optical fibers; (c) adjusting the relative positions of the amplitude template and the phase mask plate to align the centers of the amplitude template and the phase mask plate, and adjusting the inscribing optical fiber to be positioned near the focal length of the cylindrical lens; (d) setting the repetition frequency and the output power of the ultraviolet laser; (e) straightening the inscribing optical fiber, clamping the inscribing optical fiber on an optical fiber clamping platform, connecting the inscribing optical fiber with an ASE light source and a spectrograph, and monitoring a grating transmission spectrum; and (f) turning on the ultraviolet laser, observing the spectrograph, and completing inscribing when proper grating parameters are achieved. The phase shift grating inscribing method of the DFB single-polarization single-frequency fiber laser is simple, direct, stable, reliable and high in repeatability, and a high-quality light source is provided for the fields of nonlinear frequency conversion, gravitational wave detection, coherent polarization beam combination and the like.

The invention relates to the technical field of extreme ultraviolet lithography masks, in particular to an extreme ultraviolet lithography mask multilayer film defect detection method based on a photoelectron image, which comprises the following steps: S1, simulating to generate m phase type mask multilayer film defect structures with different morphological characteristics; s2, using an interpolation approximation method to extract electric field intensity distribution near the surface layer of the mask multilayer film defect structure, and establishing a simulation photoelectron image data set; s3, constructing a neural network model for defect detection, training the network, and obtaining an optimal network weight parameter; and S4, detecting the type and morphology parameters of the defect structure of the multi-layer film of the mask. The method has the characteristics that the photoelectron image is easy to obtain, the neural network training data set is small, and the detection efficiency is high, and high-precision nondestructive detection of the extreme ultraviolet lithography mask multilayer film defects can be realized.

The invention relates to a method (200) for determining relative lateral data of features of a semiconductor substrate, the method (200) being implemented by a device comprising: - an imaging system (11, 13, 14, 16) having a depth of field, - a spatial phase mask (17) positioned in the aperture stop of the imaging system or in a conjugate plane of the aperture stop and configured to modulate the optical transfer function of the imaging system, and - an image sensor (12), wherein the modulated optical transfer function is adapted to extend the depth of field of the imaging system, the method (200) comprising the following steps: - acquiring (202) an image of a scene comprising at least a first feature of the semiconductor substrate in a first plane and a second feature of the semiconductor substrate in a second plane, the planes being perpendicular to an optical axis of the imaging system and separated by a distance greater than the depth of field of the imaging system; - detecting (204) the first feature of the semiconductor substrate and the second feature of the semiconductor substrate; - determining (206) relative lateral data of the first feature and the second feature. The invention also relates to a device implementing such a method.

A system for high-contrast, real-time analysis of a sample includes: a first radiation source configured to emit a first radiation beam onto the sample, wherein the first radiation beam comprises pulsed infrared (IR) light; a second radiation source configured to emit a second radiation beam onto the sample, wherein the second radiation beam comprises ultraviolet (UV) light, visible-spectrum light, or near-IR light; an imager configured to split the second radiation beam into a test field and a reference field; a pixelated phase mask (PPM) configured to introduce a predetermined phase shift between the test field and the reference field; an imaging sensor configured to detect the test field and the reference field and output an electrical signal indicating optical intensities of the test field and the reference field; and processing circuitry configured to generate imagery of the sample based on the electrical signal and the predetermined phase shift.

An apparatus for checking a component with a periodic structure having substructures arranged on a lattice, the apparatus comprising a measurement radiation source for creating measurement radiation, an optics system, and a camera device. The apparatus further comprises a phase mask device for influencing a phase angle of the measurement radiation and / or an amplitude of the measurement radiation. The phase mask device comprises a dual lattice which is reciprocal to a target shape of the lattice.

This invention discloses a multi-image encryption method based on 3D face keys and multiplexed digital holography. The encryption steps include: using 3D face high-order data acquisition technology, chaotic face structured light phase mask generation technology, grating modulation technology, multiplexed digital holographic coding technology, and watermark embedding technology based on discrete wavelet domain singular value decomposition, multiple plaintext information images can be encrypted into an amplitude-type holographic ciphertext and embedded into a host image; the decryption steps include: the user must first calculate the face similarity using a 3D face multilayer perceptron neural network. If the similarity exceeds a preset threshold, authentication is successful. Then, the final decryption result is generated using watermark image extraction technology based on discrete wavelet transform, image decryption technology based on the Cramer-Kroni relation, and spectral filtering technology; otherwise, authentication fails. This method has advantages such as a large key space, high sensitivity, strong robustness of the 3D face key, and low decryption crosstalk.