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9results about "Photosensitive materials" patented technology

Photohardenable compositions and methods of forming an object

PendingEP4738003A2Additive manufacturing apparatusPhotosensitive materials
The present invention relates to photohardenable compositions for use in forming an object. The photohardenable compositions include a photohardenable resin component, a first photoinitiator that is activatable by exposure to light at a first wavelength and light at a second wavelength, and a second photoinitiator that is activatable by exposure to light at a third wavelength, wherein the first, second, and third wavelengths are not the same, and the third wavelength is shorter than the first wavelength and the second wavelength.
Owner:QUADRATIC 3D INC

Flexographic printing mask with laser thermal imaging film

PendingEP4515333A4Photosensitive materialsSynthetic resin layered products
A mask element for flexographic printing is provided. The mask element can be used for preparing a mask that has a mask image. The mask element can include: a transparent polymeric carrier sheet; a barrier layer on the transparent polymeric carrier sheet, wherein the barrier layer comprises non-crosslinked nitrocellulose; and an imaging layer on the barrier layer, wherein the imaging layer includes a non-silver halide thermally-ablatable material comprising non-crosslinked nitrocellulose, carbon black, and an infrared (IR) dye. In some aspects, the mask element further includes a transparent overcoat layer on the imaging layer. The mask can include: imaged regions in the imaging layer, wherein the imaged regions have optical apertures that are substantially devoid of the carbon black and non-crosslinked nitrocellulose thereof; and non-imaged regions in the imaging layer, wherein the non-imaged regions have the non-crosslinked nitrocellulose, carbon black, and infrared dye.
Owner:MIRACLON CORP

Method of forming an object

ActiveEP4508098B1Additive manufacturing apparatusPhotosensitive materials
The present invention relates to photohardenable compositions and methods of forming an object, the method preferably including a photohardenable composition described herein. Preferred photohardenable compositions and methods include a photohardenable resin component, a first photoinitiator that is activatable by exposure to light at a first wavelength and light at a second wavelength, and a second photoinitiator that is activatable by exposure to light at a third wavelength, wherein the first, second, and third wavelengths are not the same, and the third wavelength is shorter than the first wavelength and the second wavelength. Preferred first photoinitators include photoswitchable photoinitiators. Preferably the second light- activated photoinitiator comprises a free-radical photoinitiator. Hardenable resin compositions and methods of forming an object including the hardenable resin composition are also disclosed.
Owner:QUADRATIC 3D INC

Compound, photosensitive surface treatment agent, method for producing laminate, and method for producing transistor

PendingCN121889402ASilicon organic compoundsPhotosensitive materialsCarbon numberPolymer science
A compound represented by formula (1). [In formula (1), R represents an alkyl group having 1-5 carbon atoms, X represents a halogen element or an alkoxy group, n1 represents an integer of 0-5, and n2 represents an integer of 1 or more]
Owner:NIKON CORP

METHOD FOR MANUFACTURING AN OBJECT

ActiveDE602023017029T2Photosensitive materials
Owner:QUADRATIC 3D INC CHARLESTOWN

Carbon black, a process for its production and its use

ActiveDE102009045060B4Pigmenting treatmentPhotosensitive materials
Carbon black, characterized in that the content of polycondensed aromatic hydrocarbons, measured according to the PAH method, is less than 5 ppm and the STSA surface area is < 90 m² 2 / g, the toluene extract is less than 0.04%.
Owner:EVONIK CARBON BLACK GMBH

Phenylethynylnaphthalene dyes and methods for their use

ActiveEP3262022B1Styryl dyesMethine/polymethine dyes
Compounds useful as fluorescent or colored dyes are disclosed. The compounds have the following structure (I), including salts thereof, wherein R1a, R1b, R1c, R1d, R1e, R1f, R2a, R2b, R2c, R2d, R2e, R2f, R2g, R2h, R2i, R2j, x and y are as defined herein. Methods associated with preparation and use of such compounds are also provided.
Owner:SONY GROUP CORP