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601 results about "Organic group" patented technology

Organic Groups: As they form organic molecules, elements are commonly arranged in organic groups. There are six common organic groups that for smaller units of organic molecules. These are methyl, hydroxyl, carboxyl, amino, sulfydrl, and phosphate groups. By combing these groups in particular arrangements, common organic molecules are formed.

Hydrocarbon-terminal-group-containing compound, surface treatment agent, cured film, and article

PCT designated stageWO2025253868A1Silicon organic compoundsOther chemical processesAliphatic saturated hydrocarbonOrganic group
A surface treatment agent containing a hydrocarbon-terminal-group-containing compound of the following formula makes it possible to form a cured film that is exceptional in water repellency, slipperiness, dirt removability, and abrasion resistance, particularly steel wool abrasion resistance and wet abrasion resistance. (R1 is a C12-80 monovalent hydrocarbon group that includes a C12 or higher monovalent or divalent linear unsubstituted aliphatic saturated hydrocarbon group and does not contain a hydrocarbon branched structure, R2 is H, a halogen atom, a hydroxyl group, a siloxy group, an -OSi(CH3)3 group, an -OSi(C2H5)3 group, an amino group, an SH group, a monovalent hydrocarbon group, R1, -V-Z-(Y-A)m, or -Y-A, U is a single bond, C, or a trivalent or tetravalent organic group, V is a single bond or a divalent hydrocarbon group, Z is a single bond, C, Si, N, S, or a trivalent to octavalent organic group, Y is a single bond or a divalent hydrocarbon group, A is a monovalent reactive group, k is 0, 1, or 2, and m is 1-7.)
Owner:SHIN ETSU CHEMICAL CO LTD

Sulfonate organic positive alkali metal ion supplement for secondary battery

The invention provides a sulfinate organic positive alkali metal ion supplement for a secondary battery, and relates to the technical field of secondary batteries. The organic positive electrode alkali metal ion supplement has a structure as shown in the following general formula: [R-SO2]-M < + >, wherein M < + > is a metal cation and is selected from at least one of Li < + >, Na < + > and K < + >; [R-SO2]-is a sulfinate anion, and wherein R is an organic group. The supplement compensates irreversible capacity loss by efficiently releasing active ions, so that the energy density of the battery is improved; the oxidation potential is proper, the environmental stability is excellent, and the catalyst is not needed to decompose and easy to process; decomposition products are harmless, an electrode interface can be optimized, and the cycle life of the battery is remarkably prolonged.
Owner:ZHEJIANG YONGTAI NEW ENERGY MATERIALS CO LTD +1

Silica hydrogel, method for removing same, and silica hydrogel film

The invention provides a silica hydrogel, a method for removing the same, and a silica hydrogel film. A silica-based composite material modified by an alkyl amine group NH2L and an organic alkyl group R is prepared by adopting a reversed-phase microemulsion method, and a silica colloid material highly modified by an organic group is obtained by controlling the molar weight of alkyl amine silane and alkyl silane and controlling no use and no contact of any alcohol solvent in the whole preparation process. Adding acetone for demulsification, centrifugally collecting, washing solids, drying to obtain a solid silicon dioxide colloid material, and dissolving the solid silicon dioxide colloid material in deionized water to obtain the silicon dioxide hydrogel. The silica hydrogel has solubility in an alcohol solvent and can be removed by the alcohol solvent. The silicon dioxide hydrogel can be combined on the surface of a membrane material to obtain a silicon dioxide hydrogel membrane.
Owner:NINGBO UNIV

Photosensitive polyimide, negative photoresist and application thereof in preparation of thin film

The invention discloses a photosensitive polyimide, a negative photoresist and an application of the photosensitive polyimide in preparation of a film, the structure of the photosensitive polyimide is shown in the specification, X is a tetravalent organic group and is a residue X of a polyimide polymerization monomer tetracarboxylic dianhydride; y is a divalent organic group and is a residue Y of a polyimide polymerization monomer diamine; r1 and R2 are monovalent organic groups and are residues of primary alcohol forming side chain ester bonds of side chain polyamic acid ester; side chains R1 and R2 at least contain tertiary amine structures, and at least one of the side chains R1 and R2 containing the tertiary amine structures can form ammonium salt with phosphate containing an allyl structure; and n is an integer from 2 to 150. The invention provides a photosensitive polyimide which can be developed by adopting an alkaline aqueous solution, can be cured at low temperature and can form a negative pattern, a preparation method of a photoresist composition of the photosensitive polyimide, and a photoetching curing film, which can be applied to display industry or semiconductor industry as an insulating layer, a passivation layer or an interlayer dielectric layer and the like.
Owner:CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY CHINESE ACADEMY OF SCIENCES

Negative-electrode material for secondary battery, and secondary battery

A negative electrode material for secondary battery use includes silicon-containing particles and coating layers covering at least part of the surfaces of the silicon-containing particles. The silicon-containing particles each include an ion conductive phase and silicon phases dispersed in the ion conductive phase. The coating layers contain at least one phosphate compound selected from the group consisting of a phosphate compound, a polyphosphate compound, and a metaphosphate compound, each of which contains an anion represented by general formula (1):In general formula (1), A represents an organic group or an oxygen atom.
Owner:PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD

Method of manufacturing electrophotographic member

A method of manufacturing an electrophotographic member includes performing a surface treatment on a surface layer forming surface of an underlayer to set a surface free energy of the surface layer forming surface of the underlayer to 30 mJ / m2 or more and 120 mJ / m2 or less; and forming a surface layer containing a polysiloxane compound having a T unit represented by Formula: [R1SiO3 / 2]m (here, in the formula, R1 represents an organic group, m represents an integer of 2 or more, and at least one R1 among a plural R1's present in the T unit is a group including at least one of an alkyl group or an aryl group) on the surface layer forming surface of the underlayer.
Owner:FUJIFILM BUSINESS INNOVATION CORP

Thermoplastic resin composition for laser-cut products and its manufacturing method, molded product for laser-cut products, and laser-cut product and its manufacturing method.

PendingJP2026075751APolymer scienceOrganic group
Provided is a thermoplastic resin composition for a laser-cut product, which contains a thermoplastic resin containing a bonded sulfur atom and is capable of reducing an abnormal odor during laser cutting. 【Solution means】The thermoplastic resin composition of the present disclosure contains a thermoplastic resin (T) having a bonded sulfur atom amount of 0.001 to 0.1 mmol / g and a phosphorus-based antioxidant (AO-P) containing a chemical structure represented by formula (1) in one molecule. The content of the phosphorus-based antioxidant (AO-P) is 0.01 to 3.0 parts by mass with respect to 100 parts by mass of the thermoplastic resin (T), and it is for a laser-cut product. P-R 1 (-R 2 )(-R 3 )···(1) (R 1 , R 2 , and R 3 are each independently an organic group, and two or more of these groups may be bonded to form one or more rings.)
Owner:KURARAY CO LTD

Organic thin film for photoelectric conversion element, photoelectric conversion element, imaging element, optical sensor, solid-state imaging device, and solar cell

PCT designated stageWO2026100744A1Organic chemistryOrganic filmAryl
This organic thin film for a photoelectric conversion element contains a compound represented by formula (1), where the content of the compound represented by formula (1) is 60 mass % or more based on the total mass of the organic thin film for a photoelectric conversion element. In formula (1), Ar1 and Ar2 are aryl groups different from each other, and Ar1 is a group represented by formula (2). In formula (2), R1, R2, R3, R4, and R5 are each independently a hydrogen atom, a halogen atom, or a monovalent organic group having a Hammett substituent constant σp of 0 or more. One or more of R1, R2, R3, R4, and R5 are a halogen atom or a monovalent organic group having a Hammett substituent constant σp of 0.230 or more. Any adjacent R1, R2, R3, R4, or R5 may be a part of a condensed aliphatic ring or a condensed aromatic ring. The condensed aliphatic ring and the condensed aromatic ring may contain one or a plurality of atoms other than carbon.
Owner:MITSUBISHI GAS CHEM CO INC

Sealing material, sealing material, and semiconductor device

The present disclosure relates to an encapsulating material including a compound having a structural unit represented by formula (Bb1) (in formula (Bb1), XE represents an organic group including an aromatic ring (wherein the organic group does not include a structure represented by formula (X1) or formula (X2)), each B independently represents a group including a vinyl phenyl group, each R independently represents a substituent, and each R independently represents a substituent. L represents an integer of 1-5, and m represents an integer of 0-10).
Owner:RESONAC CORP

Cationic poly alpha-1,6-glucan ether and compositions comprising the same

The present disclosure relates to poly alpha-1,6-glucan ether compounds comprising poly alpha-1,6-glucan substituted with at least one positively charged organic group and having a degree of substitution of about 0.001 to about 3.0. The poly alpha-1,6-glucan comprises a backbone of glucose monomer units, wherein greater than or equal to 40% of the glucose monomer units are linked via alpha-1,6 glycosidic bonds, and optionally about 3% of the backbone glucose monomer units have branches via alpha-1,2 and / or alpha-1,3 glycosidic bonds. Compositions comprising poly alpha-1,6-glucan ether compounds can be used in various applications.
Owner:NUTRITION & BIOSCIENCES USA 4 INC

stem cell activator

PendingCN122094695Apromote phosphorylationInhibit dephosphorylationOrganic active ingredientsCosmetic preparationsOrganic groupBULK ACTIVE INGREDIENT
This invention provides novel stem cell activators, topical skin agents containing the aforementioned stem cell activators, and skin cosmetics containing the aforementioned stem cell activators. The stem cell activator of this invention comprises at least one compound selected from compounds (including optically active agents) shown in formula (1), salts of the aforementioned compounds, and hydrates thereof as active ingredients. In the following formula, R... 1 R 2 Represents a hydrogen atom or a hydrocarbon group. R 3 Represents a hydrogen atom or an organic group. n represents an integer greater than or equal to 1. The above hydrocarbon groups may have substituents. [Chemical Formula 1]
Owner:NAHLS CORP CO LTD +1

Optical polymer and lens including same

ActiveUS12534575B2MountingsPhotovoltaic energy generationOptical polymersPolymer
A lens includes an optical polymer represented by:where R1 to R3 are each independently hydrogen, deuterium, halogen, or organic group comprising any one selected from substituted or unsubstituted C1-C60 alkyl group, substituted or unsubstituted C3-C60 cycloalkyl group, substituted or unsubstituted C1-C60 alkoxy group, substituted or unsubstituted C6-C60 aryl group, and substituted or unsubstituted C2-C60 heteroaryl group having at least one hetero atom selected from group consisting of N, O, and S, A1 is a single bond, an oxygen atom, or a sulfur atom, A2 is an oxygen atom or sulfur atom, B1 and B2 are each independently a single bond or an organic group represented by -al-D-al-, and n represents an integer of 5 or more and 500 or less, where al is a C1-C8 alkylene group, and D is —S(═O)2—X—, —X—S(═O)2—, —S(═O)2—X—S(═O)2—, —C(═O)—X—, —X—C(═O)—, —C(═O)—X—C(═O)—, carbonyl, alkenylene, alkynylene, ester, or ether, where X is a C6-C60 arylene group.
Owner:SAMSUNG ELECTRO MECHANICS CO LTD +1

Photosensitive resin composition, resin film having pattern and method for producing same, and semiconductor circuit board

PendingUS20260202742A1PhotosensitizerOrganic group
A photosensitive resin composition contains an alkali-soluble polymer (A), a photosensitizer (B), a crosslinking compound (C) having a crosslinkable group that reacts with a component (D) below by heat, a compound (D) represented by formula (1), and a solvent (E). X11 represents, for example, a nitrogen atom, R11 represents a hydrogen atom or a group represented by formula (2). L21 represents, for example, a single bond, R21 represents, for example, a hydrogen atom, R22 represents a monovalent organic group, and n21 to n23 represent an integer of 0 or more. At least one of three R11's is represented by formula (2), and in at least one group represented by formula (2), n21 is an integer of 1 or more, and at least one R21 is a hydrogen atom.
Owner:JSR CORPORATION

Polycarbonate resin composition, molded article, projector for XR, and film for XR

PendingCN122003453AArylPolymer science
A polycarbonate resin composition containing 16-63% by mass of a repeating unit (a) represented by formula (1) and 37-84% by mass of a repeating unit (d) represented by formula (6), the polycarbonate resin composition having a viscosity average molecular weight of 15000 or more, and having a viscosity average molecular weight of 15000 or more. (In formula (1), R1 and R2 each independently represent a hydrogen atom or a methyl group) (in formula (6), R15-R18 each independently represent a hydrogen atom, a C1-10 alkyl group, or a C6-12 group including an aryl group, and W represents at least one selected from the group consisting of a single bond, an oxygen atom, a sulfur atom, a sulfinyl group, a sulfonyl group, and a divalent organic group).
Owner:MITSUBISHI CHEM CORP

Self-crosslinkable polymer and resist underlayer film forming composition

A self-cross-linkable polymer including unit structures A that have an aromatic ring and unit structures B that are organic groups with a connecting carbon atom, wherein: at least one kind of unit structure A is (i) a unit structure in which an —NR— bond connects at least two aromatic rings, (ii) a unit structure including a heterocyclic structure having at least one —NR— bond as a ring structural element, or (iii) a unit structure including an aromatic ring that has at least one —NR2 substituent group; R is a hydrogen atom or alkoxymethyl group; at least some of the Rs in the entire polymer are alkoxymethyl groups; and the connecting carbon atom is a carbon atom in a unit structure B that forms a covalent bond with an aromatic ring in a unit structure A and is a carbon atom that does not form an aromatic ring.
Owner:NISSAN CHEM CORP

Lignin derivative and additive for hydraulic composition containing same

PCT designated stageWO2026134308A1Polymer scienceO-Phosphoric Acid
[Problem] To provide: a lignin derivative which can be produced under industrially reasonable reaction conditions, enables a hydraulic composition to stably exhibits high fluidity by enhancing material uniformity of the hydraulic composition, and can therefore impart high material separation resistance thereto; and an additive for a hydraulic composition containing the same. [Solution] A lignin derivative which is a reaction product of a mixture that contains a lignin sulfonic acid compound, an aromatic compound, and an aldehyde compound, and which has a phosphoric acid esterified (poly)alkyleneoxy group at a terminal, wherein the aromatic compound contains a compound X represented by formula (4). (In the formula, Xa represents a group or atom selected from the group consisting of -SH, -CHO, -COOMx, -SO3Mx, -NH2, -CN, -NO2, -P(O)(OMx)2, and a halogen atom, or an organic group containing one or more of these groups and atoms and having 1 to 10 carbon atoms; Mx represents a hydrogen atom, an alkali metal atom, an alkaline earth metal atom, an ammonium group, an alkyl ammonium group, or an alkanol ammonium group; and Xb represents a group or atom selected from the group consisting of a hydrogen atom, -OH, -NH2, -NH(C6H4NH2), and -NH(CO)CH3 (provided that Xa and Xb are not the same group, and when Xb represents a hydrogen atom, Xa represents -P(O)(OH)2).)
Owner:TOHO CHEM IND

Composition for forming organic film, method for forming organic film, pattern forming method, and polymer

A composition for forming an organic film, containing: (A) a resin or compound for forming an organic film; (B) a polymer having a partial structure repeating unit represented by general formula (1); and (C) a solvent. The composition has excellent film-forming properties and embedding properties on a substrate, suppressing humps during an EBR step, and has excellent process tolerance when used as an organic underlayer film for a multi-layer resist, and provides a method for forming an organic film and pattern forming method using the composition:wherein R1 and R2 are hydrogen atoms or saturated or unsaturated organic groups having 1 to 20 carbon atoms, and have at least one fluorine-containing structure represented by the following general formula (2), at least one of R1 and R2 is an organic group that is not a hydrogen atom, and * represents an attachment point.
Owner:SHIN ETSU CHEMICAL CO LTD

Latent curing accelerator capable of improving bonding strength of epoxy resin as well as preparation method and application of latent curing accelerator

The invention discloses a latent curing accelerator capable of improving the bonding strength of epoxy resin as well as a preparation method and application of the latent curing accelerator. The structural formula of the silicate onium salt latent curing accelerator containing the nitrogen heterocyclic ring structure is shown as a formula I, and Z represents a five-membered nitrogen heterocyclic ring or six-membered nitrogen heterocyclic ring structure containing at least two nitrogen atoms; x1 is selected from an organic group connected with a silicon atom in a silicate onium salt structure and a nitrogen-containing heterocyclic ring structure; ar is selected from aromatic groups; r1, R2, R3 and R4 are independently selected from a hydrogen atom, a phenyl group, a benzyl group and a C1-C6 alkyl group; y is selected from nitrogen atoms or phosphorus atoms. The onium silicate latent curing accelerator containing the nitrogen heterocyclic ring structure can endow epoxy resin with excellent storage property, flowability, curing property, mechanical property and bonding strength while serving as an epoxy resin curing accelerator, and the manufacturability and packaging reliability of an epoxy resin packaging material are improved.
Owner:INST OF CHEM CHINESE ACAD OF SCI

Curable composition, cured product, and method for producing curable composition

PendingJP2026028416APolymer scienceOrganic group
To provide a curable composition from which a cured product having good tensile strength and excellent tear strength is obtained, a cured product of the curable composition, and a method for producing the cured composition.SOLUTION: A curable composition comprising a polymer A and a polymer B, wherein the polymer A has two or more terminal groups in one molecule, and the terminal groups do not have a divalent organic group represented by - C (= O) NH - and have at least one group selected from the group consisting of a reactive silicon group, an unsaturated group, and a hydroxyl group, the polymer A is an oxyalkylene polymer having a silylation ratio of 85 to 100 mol%, and the polymer B is an oxyalkylene polymer having two or more terminal groups per molecule, the terminal groups each having at least one group selected from the group consisting of a reactive silicon group, an unsaturated group, and a hydroxy group, the average total number of reactive silicon groups, unsaturated groups, and hydroxy groups per terminal group being more than 1.0, and the silylation ratio of the polymer B being smaller than the silylation ratio of the polymer A.SELECTED DRAWING: None
Owner:AGC INC

Silicone adhesive composition, adhesive article, and adhesive improver

The present invention is a silicone adhesive composition comprising: a phenyl group-containing silicon compound having a specific structure; and a hydrolyzable silicon compound having an epoxy group-containing organic group having a specific structure. As a result, a silicone adhesive having improved adhesion to a plastic film substrate compared to the prior art is provided.
Owner:SHIN ETSU CHEMICAL CO LTD

Tumor cell killing agent and (tumor cell killing agent)-antibody conjugate

This tumor cell killing agent is represented by general formula (I). In general formula (I), X1 to X8 each independently represent a hydrogen atom or a substituent (excluding a halogen atom), wherein X1 and X2, X3 and X4, X5 and X6, and X7 and X8 may be each independently bound to each other via a substituent to form a benzene ring; Y represents an oxygen atom, or a sulfur atom; and R1 to R8 each independently represent an organic group, wherein, when Y is an oxygen atom, then an option where all of R1 to R8 are phenyl groups is excluded.
Owner:MITSUI CHEMICALS INC +1

Composition for forming organic film, method for forming organic film, patterning process, and compound

A composition for forming an organic film containing (A) a resin or compound for forming an organic film, (B) a compound represented by the general formula (1), and (C) a solvent,wherein R1 is a terminal group represented by the general formula (2), X is an n1-valent organic group having 2 to 50 carbon atoms, and n1 represents an integer of 2 to 8,wherein R2 is a monovalent organic group, wherein the monovalent organic group contains at least any of structures having fluorine atoms represented by the general formula (3), m1 is 1 or 2, wherein when m1 is 1, Z represents a single bond or a divalent organic group optionally containing a heteroatom, and when m1 is 2, Z represents a trivalent organic group optionally containing a heteroatom,
Owner:SHIN ETSU CHEMICAL CO LTD

Photoresponsive material, method for manufacturing a photoresponsive material, and photoresponsive device

To provide a photoresponsive material that solves at least one of the problems of conventional technology. [Solution] The material has a crystalline structure formed by crosslinking at least one lanthanide with an organic group having 1 to 3 carbon atoms, wherein the organic group contains at least carbon atoms which may be partially or entirely substituted with other nonmetallic carbon group elements, and oxygen atoms which may be partially or entirely substituted with other nonmetallic oxygen group elements. A photoresponsive material having a peak component in the range of 533 eV to 534 eV in the O1s spectrum obtained by hard X-ray photoelectron spectroscopy.
Owner:NAT INST FOR MATERIALS SCI +1

A silicone-modified polyimide resin composition and use thereof

Disclosed is a silicone-modified polyimide resin composition comprising a silicone-modified polyimide, a thermal curing agent, wherein the silicone-modified polyimide contains a repeating unit represented by the following general formula (I): in the general formula (I), Ar 1 is a tetravalent organic group having a benzene ring or alicyclic hydrocarbon structure, Ar 2 is a divalent organic group, R is independently selected from a methyl group or a phenyl group, and the thermal curing agent is an epoxy resin, an isocyanate, or a bisoxazoline compound. The silicone-modified polyimide resin composition obtained by the present application has excellent heat resistance, mechanical strength, and light transmittance.
Owner:JIAXING SUPER LIGHTING ELECTRIC APPLIANCE CO LTD

Resin composition

The present invention addresses the problem of providing a resin composition that provides a cured product exhibiting excellent dielectric properties and excellent adhesion. [Solution] A resin composition containing (1A) a polymer having a structural unit represented by formula (A-1) and a structural unit represented by formula (A-2), (B) an epoxy resin, and (C) an inorganic filler. (In formula (A-1) and formula (A-2), R1 each independently represents a monovalent organic group having an atom selected from the group consisting of a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom, a silicon atom, and a sulfur atom as a constituent atom, R1 has a molecular weight of 250 or more, R1 does not have an ethylenically unsaturated group, and R1 does not contain at least one of a triazine skeleton and an optionally hydrogenated bisphenol skeleton. Each A independently represents a divalent organic group having a bisphenol skeleton that may be hydrogenated. )
Owner:AJINOMOTO CO INC

Method for producing organic lithium salt, composition containing organic lithium salt, and polymer

Provided is a production method for a compound (A1) represented by formula (A1), said production method comprising a step for reacting a compound (D) represented by formula (D) with a compound (E1) represented by formula (E1) in the presence of at least two lithium salts. (In formula (A1), R1 is a hydrogen atom or a monovalent substituent, R3 is a hydrogen atom or a monovalent substituent, Y is a halogen atom or a monovalent organic group having 1-20 carbon atoms, and X and R2 satisfy the following (1) or (2): (1) X is a divalent organic group having 1-20 carbon atoms, and R2 is a monovalent organic group, and (2) R2 and X together form a trivalent group). .
Owner:SUMITOMO CHEM CO LTD

Tin compounds and resist solutions using the same, pattern forming method, thin film, patterned thin film, and method for producing tin compounds

Provided is a tin compound that is a high-performance resist material capable of having high purity and uniform solubility. A tin compound having a tin atom, an organic group R, and an oxygen ligand and / or a hydroxyl ligand, wherein the diffraction angle 2θ (°) of the peak of the maximum intensity in X-ray diffraction measurement is present in the range of 5.00° to 15.00°, the half-value width of the peak of the maximum intensity is in the range of 1.00° to 4.00°, and the aforementioned organic group R has 1 to 30 carbon atoms.
Owner:MITSUBISHI CHEM CORP +1

Fuel additive composition and method for controlling carbon deposits in internal combustion engines

A method for controlling carbon deposits in an internal combustion engine using a nitrogen-containing surfactant is disclosed. The nitrogen-containing surfactant is 【Chemical 1】 JPEG2026511712000032.jpg1961 defined as or its acceptable salts, [wherein X 1 and X 2 are independently H, C, N, O, or S, and X 1 or X 2 independently contains one or more C2-C 20 alkyl groups or one or more aromatic rings, and each A, B, and D is selected from hydrogen, a monovalent organic group, and a monovalent heterocyclic organic group in the form of a group or moiety bonded through a carbon atom, and any two or more of A, B, and D may optionally be bonded together to form a cyclic structure, and X 1 and X 2 may optionally be bonded together to form a cyclic structure], or one or more nitrogen-containing surfactants selected from aliphatic hydrocarbyl-substituted amines or hydrocarbyl-substituted poly(oxyalkylene)amines. Fuel compositions and concentrate compositions containing the nitrogen-containing surfactant are also disclosed.
Owner:CHEVRON ORONITE CO LLC +1