33results about How to "High sensitivity and resolution" patented technology

A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8 is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.

A piezoelectric / electrostrictive film-type device is provided which includes a ceramic substrate having a thin diaphragm portion and a peripheral thick portion, a lower electrode, an auxiliary electrode, a piezoelectric / electrostrictive film, and an upper electrode. The lower electrode, the auxiliary electrode, the piezoelectric / electrostrictive film, and the upper electrode are layered in that order on the ceramic substrate. The upper electrode has a length of 30 to 70% relative to the length of the thin diaphragm portion, and preferably has a width of 70% or more relative to the width of the thin diaphragm portion.

An imaging element includes a light receiving surface having pixels, and a low-pass filter device configured to focus predetermined light on a predetermined pixel of the pixels of the light-receiving surface.

A precision high-speed shuttle device for transporting samples between different positions of a superconducting magnet with different magnetic field strength is provided. The sample equilibrated at the center of the magnet, where the magnetic field is the highest and homogeneous, is shuttled to a higher position above, where the fringe field is lower, for a defined period of time and shuttled back to the center for detection. By shuttling the sample to different positions in the magnet in different experiments one can obtain a field-dependent profile of particular physical parameters. The position and timing of the sample are precisely under the experimental controlled. In this way various magnetic field-dependent nuclear magnetic resonance (NMR) experiments can be conducted in a single high-field NMR spectrometer.

The present invention provides a polymer, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance, suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition; a positive resist composition using the polymer; and a patterning process.The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).

A polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist. A positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain the polymer. A polymer has a hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R3 is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays.

The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.

The provision of an ionic self-assembled multilayer (ISAM) film on a fiber-optic element including a long period grating (LPG) by a simple, room temperature process provides tuning of the LPG and / or high sensitivity to the refractive index of the ambient environment of the fiber-optic element. Inclusion of a final layer or a probe, receptor or affinity ligand in the multi-layer film provides a highly sensitive sensor for specific chemical and biological materials. Use of a turn around point (TAP) LPG allows detection to be performed by detection of light intensity rather than wavelength of attenuation. Use of a material having an electro-optical response to an electrical field by change of dimension or refractive index allows the combination of a LPG or TAP LPG and ISAM film to function as a light modulator.

The present invention provides a polymer suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance; a positive resist composition using the polymer; and a patterning process.The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).

Provided are a spectrometer that may be easily manufactured while having high resolution and sensitivity due to reduced light loss and a non-invasive biometric sensor including the spectrometer. The spectrometer includes: a stacked light absorbing structure including a plurality of absorbing layers stacked in a vertical direction and having different absorption wavelength bands, and a plurality of tunnel junction layers respectively interposed between the plurality of absorbing layers to electrically connect the plurality of absorbing layers; and an illuminating unit configured to provide the stacked light absorbing structure with an illumination light for saturation of the plurality of absorbing layers.

The present invention provides a single-layer electrophotographic photoreceptor provided with a single-layer photosensitive layer that adapts to an exposing source emitting a laser beam with wavelengths of from 400 nm to 450 nm inclusive and is laminated on a conductive substrate, the single-layer photosensitive layer comprising: an enamine-type compound that functions as both a charge generation material and a charge transport material and is represented by the following general formula (1); and a perylene-type compound that functions as both an electron-transport material and a sensitizer and is represented by the following general formula (2):

The present disclosure relates to a particle counting method and system. The particle counting method, comprises: obtaining distances between positions closest to a centers of a light channel in paths along which particles pass through the light channel and the centers of the light channel; according to an optical density distribution of the light channel, compensating amplitudes of the pulse signals of the particles when passing through the positions closest to the centers of the light channel in the path along which the particles pass through the light channel such that the compensated amplitudes of the pulse signals of the particles are equal to amplitudes of pulse signals of the particles with the same particle diameters when passing through the centers of the light channel; screening and counting the particles according to the compensated amplitudes of the pulse signals to realize counting of particles with respective particle sizes.