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33results about How to "High sensitivity and resolution" patented technology
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Sulfonium salt-containing polymer, resist composition, and patterning process
ActiveUS20090269696A1Promote divisionHigh sensitivity and resolutionPhotosensitive materialsRadiation applicationsResistAryl
A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8 is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.
Owner:SHIN ETSU CHEM IND CO LTD
Detecting gas compounds for downhole fluid analysis using microfluidics and reagent with optical signature
InactiveUS20100269579A1High sensitivity and resolutionLow costConstructionsBorehole/well accessoriesMicrofluidic channelGas separation
A gas separation and detection tool for performing in situ analysis of borehole fluid is described. The tool operates by introducing a reagent to a test sample and causing the resulting mixture to flow through a microfluidic channel where optical testing is performed. The optical testing detects a change in a characteristic of the reagent in response to expose to one or more particular substances in the test sample. The test sample may be borehole fluid, a mixture of borehole fluid and scrubbing fluid subsequently mixed with reagent, a mixture of reagent and gas separated from borehole fluid, or a mixture of scrubbing fluid and gas separated from borehole fluid which is subsequently mixed with reagent. A membrane may be employed to separate one or more target gasses from the borehole fluid.
Owner:SCHLUMBERGER TECH CORP
Sulfonium salt-containing polymer, resist composition, and patterning process
ActiveUS8048610B2Promote divisionHigh sensitivity and resolutionPhotosensitive materialsRadiation applicationsArylPolymer science
Owner:SHIN ETSU CHEM CO LTD
Information storage apparatus using a magnetic medium coated with a wear-resistant thin film
InactiveUS7027364B2High sensitivityHigh resolutionElectrostatic charge injection carrier recordingNanoinformaticsWear resistantMagnetic media
There is provided an information storage apparatus including recording medium and a head. The recording medium has an electrode layer, a magnetic layer that is stacked on the electrode layer, and a wear-resistant thin film that is stacked on the magnetic layer. The head has a conductive probe for injecting charge to record information and sensing the charge injected into the recording medium to reproduce information in a state that the conductive probe contacts the recording medium. A magnetic medium, which is coated with a wear-resistant thin film, stores charges to record information and reproduce information using an electrostatic force. Thus, it is possible to stably store highly integrated information. Also, a probe contacts a recording medium to record and reproduce information at a high speed. Thus, sensitivity and resolution can be improved.
Owner:SAMSUNG ELECTRONICS CO LTD
Piezoelectric/electrostrictive film-type device
InactiveUS7126255B2High sensitivity and resolutionSharp changePiezoelectric/electrostriction/magnetostriction machinesFlow propertiesAuxiliary electrodeCeramic substrate
A piezoelectric / electrostrictive film-type device is provided which includes a ceramic substrate having a thin diaphragm portion and a peripheral thick portion, a lower electrode, an auxiliary electrode, a piezoelectric / electrostrictive film, and an upper electrode. The lower electrode, the auxiliary electrode, the piezoelectric / electrostrictive film, and the upper electrode are layered in that order on the ceramic substrate. The upper electrode has a length of 30 to 70% relative to the length of the thin diaphragm portion, and preferably has a width of 70% or more relative to the width of the thin diaphragm portion.
Owner:NGK INSULATORS LTD
High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method
InactiveUS6066433AHigh sensitivity and resolutionHigh aspect ratioPhotosensitive materialsRadiation applicationsPolymer scienceOxygen plasma etching
In a silicone polymer having phenolic hydroxyl groups, the hydrogen atoms of some of the phenolic hydroxyl groups are replaced by acid labile groups of at least one type. The silicone polymer is crosslinked at some of the remaining phenolic hydroxyl groups with crosslinking groups having C-O-C linkages within a molecule and / or between molecules. The silicone polymer has a Mw of 5,000 to 50,000. A chemically amplified positive resist composition comprising the silicone polymer as a base resin has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV. Because of improved oxygen plasma etching resistance, the composition is suitable for use in the two-layer resist technique.
Owner:SHIN ETSU CHEM IND CO LTD
Positive resist composition and patterning process using the same
ActiveUS20090202947A1High sensitivity and resolutionGood pattern configurationPhotosensitive materialsRadiation applicationsResistHydrogen atom
The present invention provides a polymer suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance; a positive resist composition using the polymer; and a patterning process.The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).
Owner:SHIN ETSU CHEM IND CO LTD
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
ActiveUS20090297979A1High sensitivity and resolutionPattern configurationOrganic chemistryOrganic compound preparationResistSize difference
The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this.The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.
Owner:SHIN ETSU CHEM IND CO LTD
Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device
ActiveUS20110250396A1High sensitivity and resolutionHigh yieldPhotosensitive materialsLayered productsResistSolvent
A positive-type photosensitive resin composition includes (A) a phenol resin modified by a compound having an unsaturated hydrocarbon group having 4 to 100 carbon atoms; (B) a compound that produces an acid by light; (C) a thermal crosslinking agent; and (D) a solvent. The positive-type photosensitive resin composition according to the present invention can be developed by an alkaline aqueous solution, and an effect thereof is that a resist pattern having sufficiently high sensitivity and resolution, excellent adhesion, and good thermal shock resistance can be formed.
Owner:RESONAC CORP
Positive resist composition and patterning process using the same
ActiveUS20090202940A1High sensitivity and resolutionGood pattern configurationPhotosensitive materialsRadiation applicationsResistHydrogen atom
The present invention provides a polymer, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance, suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition; a positive resist composition using the polymer; and a patterning process.The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).
Owner:SHIN ETSU CHEM IND CO LTD
Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
ActiveUS20110254178A1High sensitivityHigh resolutionPhotosensitive materialsSemiconductor/solid-state device detailsAcrylic resinPositive type
The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
Owner:RESONAC CORP
Fiber-optic sensor or modulator using tuning of long period gratings with self-assembled layers
InactiveUS20070025661A1Reliable and repeatable and highly selective tuningEconomical and simpleMaterial nanotechnologyMaterial analysis by optical meansChemistryFiber optic sensor
The provision of an ionic self-assembled multilayer (ISAM) film on a fiber-optic element including a long period grating (LPG) by a simple, room temperature process provides tuning of the LPG and / or high sensitivity to the refractive index of the ambient environment of the fiber-optic element. Inclusion of a final layer or a probe, receptor or affinity ligand in the multi-layer film provides a highly sensitive sensor for specific chemical and biological materials. Use of a turn around point (TAP) LPG allows detection to be performed by detection of light intensity rather than wavelength of attenuation. Use of a material having an electro-optical response to an electrical field by change of dimension or refractive index allows the combination of a LPG or TAP LPG and ISAM film to function as a light modulator.
Owner:VIRGINIA TECH INTPROP INC +1
Spectrometer including vertical stack structure and non-invasive biometric sensor including the spectrometer
ActiveUS20160120410A1Easy to manufactureHigh sensitivity and resolutionRaman/scattering spectroscopyRadiation pyrometryElectricityNon invasive
Provided are a spectrometer that may be easily manufactured while having high resolution and sensitivity due to reduced light loss and a non-invasive biometric sensor including the spectrometer. The spectrometer includes: a stacked light absorbing structure including a plurality of absorbing layers stacked in a vertical direction and having different absorption wavelength bands, and a plurality of tunnel junction layers respectively interposed between the plurality of absorbing layers to electrically connect the plurality of absorbing layers; and an illuminating unit configured to provide the stacked light absorbing structure with an illumination light for saturation of the plurality of absorbing layers.
Owner:SAMSUNG ELECTRONICS CO LTD
Imaging element and imaging apparatus using the same
ActiveUS20110285898A1High sensitivity and resolutionRaise ratioTelevision system detailsOptical filtersPhysicsLow-pass filter
Owner:RICOH KK
High speed sample transportation apparatus in a superconducting magnet and transporting method thereof
ActiveUS20130342209A1Minimizes sample denaturationHigh sensitivity and resolutionElectric/magnetic detectionMeasurements using magnetic resonanceNMR - Nuclear magnetic resonanceSuperconducting Coils
A precision high-speed shuttle device for transporting samples between different positions of a superconducting magnet with different magnetic field strength is provided. The sample equilibrated at the center of the magnet, where the magnetic field is the highest and homogeneous, is shuttled to a higher position above, where the fringe field is lower, for a defined period of time and shuttled back to the center for detection. By shuttling the sample to different positions in the magnet in different experiments one can obtain a field-dependent profile of particular physical parameters. The position and timing of the sample are precisely under the experimental controlled. In this way various magnetic field-dependent nuclear magnetic resonance (NMR) experiments can be conducted in a single high-field NMR spectrometer.
Owner:ACAD SINIC
Resist composition and patterning process
ActiveUS20060188809A1High contrastHigh sensitivity and resolutionMaterial nanotechnologyPhotomechanical apparatusPHENOL LIQUIDResist
Owner:SHIN ETSU CHEM IND CO LTD
High speed sample transportation apparatus in a superconducting magnet and transporting method thereof
ActiveUS9696391B2High sensitivity and resolutionMinimize denaturationElectric/magnetic detectionMeasurements using NMRNMR - Nuclear magnetic resonanceSuperconducting Coils
A precision high-speed shuttle device for transporting samples between different positions of a superconducting magnet with different magnetic field strength is provided. The sample equilibrated at the center of the magnet, where the magnetic field is the highest and homogeneous, is shuttled to a higher position above, where the fringe field is lower, for a defined period of time and shuttled back to the center for detection. By shuttling the sample to different positions in the magnet in different experiments one can obtain a field-dependent profile of particular physical parameters. The position and timing of the sample are precisely under the experimental controlled. In this way various magnetic field-dependent nuclear magnetic resonance (NMR) experiments can be conducted in a single high-field NMR spectrometer.
Owner:ACAD SINIC
Piezoelectric/electrostrictive film-type device
InactiveUS20050218757A1High sensitivity and resolutionSharp changePiezoelectric/electrostriction/magnetostriction machinesFlow propertiesAuxiliary electrodeMaterials science
The present piezoelectric / electrostrictive film-type device comprises a ceramic substrate having a thin diaphragm portion and a peripheral thick portion, a lower electrode, an auxiliary electrode, a piezoelectric / electrostrictive film, and an upper electrode; the lower electrode, the auxiliary electrode, the piezoelectric / electrostrictive film, and the upper electrode having been layered in that order on the ceramic substrate. The upper electrode has a length of 30 to 70% in relative to the length of the thin diaphragm portion, and preferably has a width of 70% or more in relative to the width of the thin diaphragm portion.
Owner:NGK INSULATORS LTD
Positive resist composition and patterning process using the same
ActiveUS7887991B2High sensitivity and resolutionGood pattern configurationPhotosensitive materialsRadiation applicationsResistHydrogen atom
Owner:SHIN ETSU CHEM CO LTD
Polymerizable compound, polymer, positive resist composition, and patterning process using the same
ActiveUS8129086B2High sensitivity and resolutionPattern configurationOrganic chemistryOrganic compound preparationSize differenceResist
A polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist. A positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain the polymer. A polymer has a hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.
Owner:SHIN ETSU CHEM IND CO LTD
Ester compounds, polymers, resist compositions and patterning process
InactiveUS7132215B2High sensitivity and resolutionMinimized line densityOrganic chemistryPhotosensitive materialsResistHydrogen
Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R3 is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays.
Owner:SHIN ETSU CHEM CO LTD
Novel ester compounds, polymers, resist compositions and patterning process
InactiveUS20060234160A1High sensitivity and resolutionMinimized line densityOrganic chemistryPhotosensitive materialsResistHydrogen
Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R3 is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays.
Owner:HASEGAWA +2
Optical waveguide, forming material and making method
ActiveUS7031591B2Practical and economical and easy to processSatisfactory performance in patterningPhotomechanical apparatusOriginals for photomechanical treatmentPolystyrenePhotoacid generator
An optical waveguide-forming material is comprised of a photocurable organopolysiloxane composition comprising an alkali-soluble organopolysiloxane and a photoacid generator, wherein the organopolysiloxane is obtained by (co)hydrolytic condensation of a triorganoxysilane having hydrolyzable epoxide and has an average molecular weight of 500–50,000 as determined by GPC using polystyrene standards. The optical waveguide-forming material, when subjected to pattern formation by photolithography, can be resolved with an alkaline aqueous solution, has a high sensitivity and resolution, and offers a cured film having improved light transmittance, heat resistance and humidity resistance.
Owner:SHIN ETSU CHEM IND CO LTD
Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
ActiveUS8461699B2High sensitivity and resolutionGood adhesivenessPhotosensitive materialsSemiconductor/solid-state device detailsAcrylic resinImage resolution
The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
Owner:RESONAC CORPORATION
Fiber-optic sensor or modulator using tuning of long period gratings with self-assembled layers
InactiveUS7336861B2Reliable and repeatable and highly selective tuningEconomical and simpleMaterial nanotechnologyMaterial analysis by optical meansGratingRefractive index
The provision of an ionic self-assembled multilayer (ISAM) film on a fiber-optic element including a long period grating (LPG) by a simple, room temperature process provides tuning of the LPG and / or high sensitivity to the refractive index of the ambient environment of the fiber-optic element. Inclusion of a final layer or a probe, receptor or affinity ligand in the multi-layer film provides a highly sensitive sensor for specific chemical and biological materials. Use of a turn around point (TAP) LPG allows detection to be performed by detection of light intensity rather than wavelength of attenuation. Use of a material having an electro-optical response to an electrical field by change of dimension or refractive index allows the combination of a LPG or TAP LPG and ISAM film to function as a light modulator.
Owner:VIRGINIA TECH INTPROP INC +1
Positive resist composition and patterning process using the same
ActiveUS7923195B2High sensitivity and resolutionGood pattern configurationPhotosensitive materialsRadiation applicationsResistHydrogen atom
The present invention provides a polymer suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance; a positive resist composition using the polymer; and a patterning process.The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).
Owner:SHIN ETSU CHEM IND CO LTD
Spectrometer including vertical stack structure and non-invasive biometric sensor including the spectrometer
ActiveUS9867544B2Easy to manufactureHigh sensitivity and resolutionRadiation pyrometryRaman/scattering spectroscopyElectricityNon invasive
Provided are a spectrometer that may be easily manufactured while having high resolution and sensitivity due to reduced light loss and a non-invasive biometric sensor including the spectrometer. The spectrometer includes: a stacked light absorbing structure including a plurality of absorbing layers stacked in a vertical direction and having different absorption wavelength bands, and a plurality of tunnel junction layers respectively interposed between the plurality of absorbing layers to electrically connect the plurality of absorbing layers; and an illuminating unit configured to provide the stacked light absorbing structure with an illumination light for saturation of the plurality of absorbing layers.
Owner:SAMSUNG ELECTRONICS CO LTD
Particle counting method and system
ActiveUS20200049615A1Improve universalityImprove overall utilizationIndividual particle analysisICT adaptationParticle physicsOptical density
The present disclosure relates to a particle counting method and system. The particle counting method, comprises: obtaining distances between positions closest to a centers of a light channel in paths along which particles pass through the light channel and the centers of the light channel; according to an optical density distribution of the light channel, compensating amplitudes of the pulse signals of the particles when passing through the positions closest to the centers of the light channel in the path along which the particles pass through the light channel such that the compensated amplitudes of the pulse signals of the particles are equal to amplitudes of pulse signals of the particles with the same particle diameters when passing through the centers of the light channel; screening and counting the particles according to the compensated amplitudes of the pulse signals to realize counting of particles with respective particle sizes.
Owner:JIANGSU SUJING GROUP +1
Single-layer electrophotographic photoreceptor and image forming apparatus provided with the same
ActiveUS8227157B2High sensitivityHigh resolutionElectrographic process apparatusCorona dischargeEnamineLength wave
Owner:SHARP KK
Particle counting method and system
ActiveUS10768091B2Improve universalityHigh sensitivity and resolutionIndividual particle analysisICT adaptationParticle physicsOptical density
The present disclosure relates to a particle counting method and system. The particle counting method, comprises: obtaining distances between positions closest to a centers of a light channel in paths along which particles pass through the light channel and the centers of the light channel; according to an optical density distribution of the light channel, compensating amplitudes of the pulse signals of the particles when passing through the positions closest to the centers of the light channel in the path along which the particles pass through the light channel such that the compensated amplitudes of the pulse signals of the particles are equal to amplitudes of pulse signals of the particles with the same particle diameters when passing through the centers of the light channel; screening and counting the particles according to the compensated amplitudes of the pulse signals to realize counting of particles with respective particle sizes.
Owner:JIANGSU SUJING GROUP +1
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