67 results about "Micropatterning" patented technology

Disclosed is a method for stripping a photoresist comprising: (I) providing a photoresist pattern on a substrate where the substrate has at least a copper (Cu) wiring and a low-dielectric layer thereon, and selectively etching the low-dielectric layer by using the photoresist pattern as a mask; (II) contacting the substrate after the step (I), with ozone water and/or aqueous hydrogen peroxide; and (III) contacting the substrate after the step (II), with a photoresist stripping solution that contains at least a quaternary ammonium hydroxide. The present invention provides a method for stripping a photoresist that enables to strip effectively photoresist films and etching residues after etching step even in a process not including an O₂ plasma ashing treatment in micropatterning of a substrate having at least Cu wiring and a low-dielectric layer thereon, as in a dual damascene forming process, and, in addition, the method of the invention does not have any negative influence on the dielectric constant of the low-dielectric layer, and ensures an excellent anti-corrosivity.

A method for surface micropatterning includes forming on a surface containing a first polymer a first coating containing a second polymer having first functionalities capable of being converted to second functionalities by exposure to an acid. A second coating containing a photoacid generator is formed on the first coating. The second coating containing the photoacid generator is selectively irradiated in one or more regions thereof with radiation having a spatially varying internsity pattern to generate an acid in each irradiated region of the second coating. The acid converts the first functionalities of each region of the second polymer underlying a respective irradiated region of the second coating to second functionalities. A first molecular patterned surface having one or more regions of the first functionalities and one or more regions of the second functionalities is formed.

In the method, which is to be carried out on a computer system, firstly design data of a semiconductor substrate are read in and, on the basis thereof, a mask image is generated in the form of a data structure with contact holes and with auxiliary structures on the computer system. Afterwards, contact hole biases are determined by means of an optical proximity correction method and the relevant contact holes are corrected on the basis of these contact hole biases. By means of subsequent imaging simulation of the mask image on the semiconductor substrate, undesired imaging auxiliary structures and contact holes deviating from specified tolerances on the semiconductor substrate are detected and corrected. During the imaging simulation of the mask image, a mask bias is employed in order to compensate for three-dimensional mask effects. A real mask can be produced on the basis of the mask image thus determined.

Adhesive articles containing microtopography, such as microprotrusions, and a coating of adhesive glue, such an adhesive having known toxicity and/or tissue reactive functional groups are described herein. The articles described herein contain a substrate, a plurality of microfeatures, and an adhesive, such as an adhesive glue. The articles described herein exhibit a 90° pull off adhesion of at least about 1.5 N/cm². The articles described herein can contain less adhesive than when the adhesive is used alone without microtopography and yet exhibit equivalent adhesive strength with little or no toxicity or other adverse side effects (e.g., exothermic reaction).

A sulfonium salt comprising (a) a polymerizable substituent, (b) a sulfonium cation, and (c) a sulfonate anion within a common molecule is capable of generating a sulfonic acid in response to high-energy radiation or heat. A resist composition comprising the sulfonium salt as base resin has high resolution and is suited for precise micropatterning by ArF immersion, EB or EUV lithography.

A sensor, in particular for the spatially resolved detection, includes a substrate, at least one micropatterned sensor element having an electric characteristic whose value varies as a function of the temperature, and at least one diaphragm above a cavity, the sensor element being disposed on the underside of the at least one diaphragm, and the sensor element being contacted via connecting lines, which extend within, on top of or underneath the diaphragm. In particular, a plurality of sensor elements may be formed as diode pixels within a monocrystalline layer formed by epitaxy. Suspension springs, which accommodate the individual sensor elements in elastic and insulating fashion, may be formed within the diaphragm.

The invention discloses a micro-patterned wetted surface, a preparation method of the micro-patterned wetted surface, and the micro-patterned wetted surface applicable to a spray cooling device. The surface has metal as the substrate, and has the patterned non-uniform wettability; the patterned non-uniformity is that: hydrophilic areas are uniformly distributed in a hydrophobic area; the thickness is 50-500 nm; the contact angle of pure water on the surface of the hydrophilic part is 0-45 DEG; and the contact angle of a hydrophobic part is 135-175 DEG. The spray cooling device is characterized in that a heat exchange surface is directly contacted with the micro-patterned wetted surface; due to the surface, saturated boiling evaporation of a working medium under the high heat flux density is easy; the thickness of a liquid film is reduced; formation of steam bubbles is easy; the critical heat flux density is increased; and simultaneously, retention and scaling of the working medium are reduced. The micro-patterned wetted surface disclosed by the invention is simple in preparation process, free from pollution, easy to operate, good in surface quality and low in cost, and has wide application prospect and huge market benefits in the aspects, such as heat exchangers and sea water desalination.

Composite structures and methods for generating micropatterned materials suitable for use in cell culture applications are disclosed. The improvement of these compositions and methods over the prior art is based on the unexpected discovery that minor chemical modifications can be introduced to greatly enhance the adherence and/or stability of a cell-adhesive material. The micropatterned materials are inexpensive to manufacture, have long shelf-life, and are stable for prolonged periods of time under cell-culture conditions. Moreover, biologists can use these micropatterned substrates with the same ease as conventional cultureware and without the need for special sample preparation.

A method and apparatus for the fabrication of polymeric microfluidic devices through sequential photolithographic polymerization of micropatterned polymeric layers.

The present invention discloses the formation of a hard mask layer in an organic polymer layer by modifying at least locally the chemical composition of a part of said exposed organic low-k polymer. This modification starts from an exposed surface of the polymer and extends into the polymer thereby increasing the chemical resistance of the modified part of the polymer. As a result, this modified part can be used as a hard mask or an etch stop layer for plasma etching.

The present disclosure describes hydrogels which are micropatterned with a network of wells for cell culture. In a preferred embodiment, the micropatterned hydrogels are embedded with a nanomaterial. Further described are methods of forming the micropatterned hydrogels and methods of culturing cells in the micropatterned hydrogels. The hydrogels can be natural or synthetic.