3092 results about "Asymmetry" patented technology

In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.

An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.

Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.

Disclosed is an ultrasonic surgical instrument that combines end-effector geometry to best affect the multiple functions of a shears-type configuration. The shape of the blade is characterized by a radiused cut offset by some distance to form a curved geometry. The cut creates a curved surface with multiple asymmetries causing multiple imbalances within the blade. Imbalance due to the curve of the instrument is corrected by a non-functional asymmetry proximal to the functional asymmetry. Imbalance due to the asymmetric cross-section of the blade is corrected by the appropriate selection of the volume and location of material removed from a functional asymmetry. The shape of the blade in one embodiment of the present invention is characterized by two radiused cuts offset by some distance to form a curved and potentially tapered geometry. These two cuts create curved surfaces including a concave surface and a convex surface. The length of the radiused cuts affects, in part, the acoustic balancing of the transverse motion induced by the curved shape.

Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating or other structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The position of an image of the component structure varies between measurements, and a first type of correction is applied to reduce the influence on the measured intensities, caused by differences in the optical path to and from different positions. A plurality of structures may be imaged simultaneously within the field of view of the optical system, and each corrected for its respective position. The measurements may comprise first and second images of the same target under different modes of illumination and/or imaging, for example in a dark field metrology application. A second type of correction may be applied to reduce the influence of asymmetry between the first and second modes of illumination or imaging, for example to permit a more accurate overly measurement in a semiconductor device manufacturing process.

An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.

Text searching is achieved by techniques including phrase frequency analysis and phrase-co-occurrence analysis. In many cases, factor matrix analysis is also advantageously applied to select high technical content phrases to be analyzed for possible inclusion within a new query. The described techniques may be used to retrieve data, determine levels of emphasis within a collection of data, determine the desirability of conflating search terms, detect symmetry or asymmetry between two text elements within a collection of documents, generate a taxonomy of documents within a collection, and perform literature-based problem solving. (This abstract is intended only to aid those searching patents, and is not intended to limit the disclosure of claims in any manner.)

Alignment accuracy between two or more patterned layers is measured using a metrology target comprising substantially overlapping diffraction gratings formed in a test area of the layers being tested. An optical instrument illuminates all or part of the target area and measures the optical response. The instrument can measure transmission, reflectance, and/or ellipsometric parameters as a function of wavelength, polar angle of incidence, azimuthal angle of incidence, and/or polarization of the illumination and detected light. Overlay error or offset between those layers containing the test gratings is determined by a processor programmed to calculate an optical response for a set of parameters that include overlay error, using a model that accounts for diffraction by the gratings and interaction of the gratings with each others' diffracted field. The model parameters might also take account of manufactured asymmetries. The calculation may involve interpolation of pre-computed entries from a database accessible to the processor. The calculated and measured responses are iteratively compared and the model parameters changed to minimize the difference.

A gate array cell adapted for standard cell design methodology or programmable gate array that incorporates a dual gate FET device to offer a range of performance options within the same unit cell area. The conductivity and drive strength of the dual gate device may be selectively tuned through independent processing of manufacturing parameters to provide an asymmetric circuit response for the device or a symmetric response as dictated by the circuit application.

A micromechanical field asymmetric ion mobility filter for a detection system includes a pair of spaced substrates defining between them a flow path between a sample inlet and an outlet; an ion filter disposed in the path and including a pair of spaced filter electrodes, one electrode associated with each substrate; and an electrical controller for applying a bias voltage and an asymmetric periodic voltage across the ion filter electrodes for controlling the paths of ions through the filter.

An overlay target for spectroscopic measurement includes at least two diffraction gratings, one grating overlying the other. The diffraction gratings may include an asymmetry relative to each other in order to improve resolution of the presence as well as the direction of any mis-registration. For example, the asymmetry between the two diffraction gratings may be a phase offset, a difference in pitch, line width, etc. The overlay target may be spectroscopically measuring, for example, using an optical model and a best fit analysis. Moreover, the overlay target may be optimized by modeling the overlay target and adjusting the variable parameters and calculating the sensitivity of the overlay target to changes in variable parameters.

The specification and drawings present a new apparatus and method for providing a wide field-of-view as well as illumination uniformity in exit pupil expanders (EPE) using stacked EPE substrates (or plates) with non-symmetric exit pupil expansion that use a plurality of diffractive elements for expanding the exit pupil of a display for viewing.

A shock wave applicator includes a shock wave generator and an asymmetrical reflector portion in a housing. Asymmetry of the reflector portion is combined with one or more wave generators to produce a variety of focal volumes and wave fronts for medical treatment.

A novel asymmetric memory partitioning mechanism for providing resolving and reducing memory limitations when an increase in software image size is required. Two partitions are created in non-volatile memory, one smaller than the other. The smaller partition stores a degenerated version of the full-functionality software comprising only essential program code for booting the device and repeating the download and installation procedures until the full-functionality software image is successfully installed in non-volatile memory. The larger portion stores a full-functionality version of the software comprising both essential and non-essential program code. The mechanism also provides the capability of converting devices already deployed in the field. The legacy symmetrical partitioning of the memory in these devices is removed and replaced with asymmetrical partitioning, wherein the smaller partition stores the degenerated software image and the larger partition stores the full-functionality software image.

An asymmetric field ion mobility spectrometer with an ionization source for ionizing a sample media and creating ions. An ion filter is disposed in the analytical gap downstream from the ionization source for creating an asymmetric electric field to filter the ions. An ion flow generator for creating an electric field in a direction transverse to the asymmetric electric field and which propels the ions through the asymmetric electric field towards a detector.

An compact and rugged antenna system particularly suited to direction finding includes a plurality of antenna arrays for receiving respective frequency bands and colocated on a mast with separation between antenna arrays along the mast. The mast includes a coil wound of an insulator and functioning as a loaded inductor to shift the mast resonance out of the frequency band of the antenna system. A VHF dipole array having elements shaped to reduce scattering to UHF and SHF arrays is supported on movable arms which allow retraction that reduces height and provides mechanical protection to one or more other arrays as well as damping against vibration by contacting the mast with shaped portions of the dipole elements. The bowtie elements of the UHF array are angled at a central region to optimize array diameter at low UHF frequencies. A finned RF electronics housing is preferably provided which reduces solar loading and dissipates heat from antenna electronics. Asymmetrically keyed fittings are provided to permit accurate antenna system, array and element positioning and replaceable components and wiring, both internally and externally of the housing, is held in position to allow field repairs without recalibration.

Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target. In other embodiments, an overlay and/or stepper analysis procedure is then performed based on the systematic error metric and/or the noise metric, as well as the overlay data.

The present invention provides improved unicast routing, multicast routing and unicast load sharing as compared with conventional methods. Preferred implementations of the invention provide improvements to IEEE 802.1Q. According to preferred aspects of the invention, each bridge is the root of its own multiple spanning tree instance (“MSTI”). Preferred implementations of the invention require no learning of media access control (“MAC”) addresses on the backbone of a network. Some methods of the invention can resolve spanning tree asymmetries. Preferred implementations of the invention require a very low computational load for control protocols.

Error correction is tailored for the use of an ECC for correcting asymmetric errors with low magnitude in a data device, with minimal modifications to the conventional data device architecture. The technique permits error correction and data recovery to be performed with reduced-size error correcting code alphabets. For particular cases, the technique can reduce the problem of constructing codes for correcting limited magnitude asymmetric errors to the problem of constructing codes for symmetric errors over small alphabets. Also described are speed up techniques for reaching target data levels more quickly, using more aggressive memory programming operations.

Artificial disc replacement (ADR) systems with intradiscal components feature non anterior-posterior (A-P) or oblique-oriented keels such that the great vessels do not require as much retraction during insertion. The system may further include guides for aligning the ADR prior to insertion, and for cutting an oblique slot into a vertebral endplate to receive the keel. A screw adapted to penetrate a vertebral body may be used in conjunction with the keel. The screw and keel may converge, diverge or intersect. The screw may further include a mechanism providing a locking relationship with the keel. The system may further including a guide to direct drill bits and screws through holes in the keel. ADRs according to the invention may additionally, independently include a non-symmetrical endplate shaped so as to decrease the risk of injuring the great vessels. By virtue of the invention, a second ADR may be installed at a second level having a keel oriented differently from that of the ADR having an orientation other than anterior-to-posterior.

The present invention relates to an improvement of a total internal reflection lens whereby a tilted symmetry axis leads to a net deflection of the output beam away from the surface normal of the exit surface. Linear TIR lenses have a net deflection transverse to their focal strip. Circular TIR lens profiles going beyond 90° are tilted to bring the rim level with the source, the deflected rays exiting the lens to form an off-axis beam.