The invention relates to a
waveguide grating, in particular to a method for manufacturing a
waveguide grating with continuous gradually-changing groove depth, which comprises the following steps of: accurately measuring and calibrating
ion beam current density distribution of a used
ion beam in a working plane; establishing a cooperative control model associated with a target groove depth curve,
ion beam current density distribution and scanning speed, associating the
etching depth with the
ion beam total dose, and accurately controlling the
ion beam total dose received by each point on the
waveguide grating by dynamically regulating and controlling the scanning speed of the substrate relative to the
ion beam, so as to realize accurate control of the
etching depth. The accurate control on the groove depth distribution is realized; based on the cooperative control model, the scanning speed corresponding to the target groove depth curve is solved by combining the set target groove depth curve and the calibrated ion
beam current density distribution; and performing
ion beam etching based on the solved scanning speed, and finally forming a continuous gradual change groove depth accurately corresponding to the target groove depth curve on the
waveguide grating. The method can effectively overcome the defect that the high-precision
waveguide grating with the continuous gradually-changing groove depth is difficult to manufacture.