94 results about "Grating pattern" patented technology

The invention provides a mechanical arm motion precision detection system and method based on moire fringes, and relates to the field of image data processing, and the system comprises a grating projection module which is used for determining grating parameters based on motion information of a mechanical arm and projecting a grating pattern to a detection surface of the mechanical arm based on the grating parameters, the grating parameters at least comprise grating density, grating angle and grating type; the image acquisition module is used for acquiring continuous frames of moire fringe images in the movement process of the mechanical arm; and the data processing module is used for carrying out phase calculation on the continuous frames of moire fringe images and resolving the displacement error, the rotation angle error and the vibration error of the mechanical arm, and the motion detection precision of the mechanical arm is improved.

The invention discloses a high-reflective surface defect detection method based on structured light and phase deflection, which belongs to the technical field of visual inspection, and comprises the following steps: generating a multi-frequency sinusoidal grating pattern by using a structured light module, and projecting the multi-frequency sinusoidal grating pattern to the surface of a detected object; multi-frequency phase shift coding is introduced, an absolute phase is calculated through a pilot frequency unwrapping method, a depth map obtained by the structured light is calculated, and a structured light point cloud is reconstructed; a unit normal vector is calculated, a Poisson reconstruction model is adopted to obtain a depth map obtained by phase deflection, and deflection point cloud is obtained; the structured light point cloud data and the deflection point cloud data are registered through an iterative nearest point algorithm and then fused to form a fused depth map; and determining a defect area by adopting the maximum principal curvature and the minimum principal curvature combined mask. By means of the mode, the limitation of a traditional three-dimensional measurement means in high-reflection and complex-curvature surface defect recognition is solved, and submicron-level three-dimensional deformation detection precision is achieved.

The invention discloses a machining method of an integrated code disc and the integrated code disc, and relates to the technical field of servo motor code disc machining.The machining method of the integrated code disc comprises the steps that S100, a metal bottom support which is tested to be qualified is selected; s200, the surface of the metal bottom support is ground and polished; s300, the polished metal bottom support is cleaned; s400, the surface of the cleaned metal bottom support is coated with a film; and S500, etching a grating pattern on the surface of the coated metal bottom support to form the integrated code disc. The machining method of the integrated code disc and the integrated code disc are low in machining cost and high in precision.

The invention discloses a microscopic imaging device and a super-resolution microscopic imaging method, and the device comprises a sample stage which is used for containing a sample; the laser is used for emitting laser; the first digital micromirror is used for receiving the laser and generating diffracted light; the light condensing unit is used for condensing the plurality of diffracted light to form structured light so as to excite fluorescence carrying sample information; the second digital micromirror is used for receiving the fluorescence and converting the fluorescence into a random binary coding image; the image acquisition unit is used for receiving images and transmitting the images to the processing unit; the processing unit is used for reconstructing a microscopic super-resolution image based on the plurality of random binary coding images; the first digital micromirror, the second digital micromirror and the image acquisition unit are in communication connection, and the second digital micromirror controls the grating pattern conversion frequency of the first digital micromirror and controls the image acquisition frequency of the image acquisition unit. The biological cell sample can be protected from being damaged by phototoxicity and photobleaching performance, and super-resolution imaging in the structured illumination obvious microsystem is achieved.

The invention discloses a high-precision large-range pose measurement method and system based on an absolute space coding calibration board, and relates to the technical field of vision measurement, and the method comprises the steps: determining a target mark circle center pixel coordinate, a target grating center point pixel coordinate and a target coding center point pixel coordinate of a target minimum recognition unit in the calibration board; according to the absolute phase distribution of the two-dimensional sinusoidal grating pattern of the target minimum identification unit, the pixel coordinate of the target grating center point and the pixel coordinate of the target coding center point, determining the actual physical distance of the same sight line point of the grating center point and the coding center point; and determining an initial pose through the mark circle center world coordinate of the target minimum recognition unit, the target mark circle center pixel coordinate and the camera internal reference matrix, and performing depth correction on the basis of the target coding center point pixel coordinate, the actual physical distance and the target grating center point world coordinate to output the target pose. And carrying out pose calculation based on the designed absolute type space coding calibration plate so as to realize large-range high-precision space calibration.

The invention discloses a waveguide grating for realizing diffraction efficiency gradual change, a preparation method and equipment. And the grating depth and the duty ratio are monotonically increased along the etching direction, so that the spatial gradient distribution of the diffraction efficiency is obtained. The method comprises the following steps of: firstly, forming periodic photoresist stripes on a substrate by utilizing an interference photoetching technology to obtain an initial grating pattern; and then, the substrate is placed in a plasma etching system, and the depth and duty ratio of the grating are monotonically increased along the etching direction by regulating and controlling the etching time or etching rate of different areas, so that the spatial gradient distribution of diffraction efficiency is realized. The waveguide grating disclosed by the invention effectively compensates attenuation of light in a waveguide transmission process, and the uniformity and imaging quality of AR display application and the like are remarkably improved. The problem of uneven brightness caused by light energy transmission attenuation of the waveguide grating in the prior art can be effectively solved, the manufacturing cost is low, the process expandability is high, and the waveguide grating is suitable for various waveguide optical display scenes such as mixed reality (MR) and virtual reality (VR).

This invention discloses a three-dimensional contour measurement method and apparatus based on multi-projection gratings, relating to the field of three-dimensional topography measurement technology. The method includes: obtaining intrinsic and extrinsic parameters through calibration; projecting a set of speckle patterns; preliminarily analyzing the surface topography gradient of the object to determine a non-uniform spatial frequency sequence; sequentially projecting and acquiring multiple sets of phase-shifting grating patterns, and calculating the wrapping phase map corresponding to each frequency; for the same pixel, based on its reliability assessment in wrapping phase maps at different frequencies, assigning confidence weights to the phase values ​​of each frequency, and calculating and optimizing the phase map and the corresponding fused confidence map; calculating gradient information and combining it with the fused confidence map to perform region division, and executing a region-guided path consistency verification unfolding algorithm to obtain the absolute phase; converting the absolute phase into three-dimensional point cloud coordinates of the object surface. This application aims to solve the problems of complex topography, discontinuities, and noise easily leading to unfolding path errors and order jumps during phase unfolding.

A method of scanning a substrate includes immobilizing a substrate on a substrate holder within a processing chamber and performing a pass of a parallel raster pattern by synchronously driving a first rotary drive and a second rotary drive to move the substrate relative to a processing apparatus focused on a localized spot on the substrate, the first rotary drive being coupled to a proximal end of a pendulum arm and the second rotary drive being mounted at a distal end of the pendulum arm and to the substrate holder. Driving the first rotary drive during the pass includes moving the pendulum arm in a first arc motion for a first portion of the pass while the localized spot is on the substrate, and then moving the pendulum arm in an opposite second arc motion for a second portion of the pass while the localized spot is on the substrate.

An off-axis illumination grating and a preparation method therefor, and a separable off-axis illumination lithography mask. The preparation method comprises: by means of electron beam lithography and reactive ion etching, preparing a grating master template (1) having a grating pattern (S1); copying the grating pattern on the grating master template (1) to the surface of a working template (2) by means of first nanoimprint, so as to form a working template having the grating pattern (S2); sequentially preparing a grating material layer (4), a transfer layer (5) and an imprint resist layer (6) on a substrate (3), copying, by means of second nanoimprint, the grating pattern of the working template (2) obtained in step (S2) to the imprint resist layer (6), and performing curing (S3); and performing etching transfer on the grating pattern on the imprint resist layer (6) to the transfer layer (5) and the grating material layer (4) in sequence, and removing the residual transfer layer (5), so as to obtain an off-axis illumination grating (S4). The off-axis illumination grating can be separated from a mask, and can be reused.

The application discloses a laser scanning welding system and method for ultrathin high polymer diaphragms, aiming at solving the technical problem that the ultrathin diaphragm is easy to deform during welding. The system comprises an ultrasonic welding module, a laser welding module and a spatial frequency domain imaging module. During welding, the edges of the upper frame of the diaphragm, the ultrathin high polymer diaphragm and the lower frame of the diaphragm are first positioned by preliminary spot welding through the ultrasonic welding module; then, the laser welding module utilizes the characteristics that the upper frame of the diaphragm is transparent and the lower frame of the diaphragm is light-absorbing, so that the laser penetrates the upper frame and performs scanning welding at the contact interface of the diaphragm and the lower frame, realizing fusion; in this process, the spatial frequency domain imaging module projects a grating pattern on the surface of the diaphragm and analyzes the deformation, calculates the welding thermal field distribution in real time, and then feeds back the control of the laser parameters, so that the deformation amount of the diaphragm is always within the controllable range. The application realizes high-precision, low-heat-affected and non-deformation welding of the ultrathin high polymer diaphragm.

An angular sensitive time-of-flight position sensor device is provided and includes an array of pixels each comprising: a planar waveguide structure; a collection area with a grating pattern at a specific periodicity to couple incident light into the planar waveguide structure; at least one detector placed outside of the collection area and in a plane different from that of the planar waveguide structure; an output coupler to direct the light from planar waveguide to the at least one detector; a mask to shield the at least one detector from direct illumination; a narrow band light source that illuminates a field-of-view; a first electronics configured to detect the time-of-flight of light retroreflected, scattered, or both incident onto the position sensor and configured to provide distance ranging information; and a second electronics configured to interpret and retain time-of-flight information and configured to communicate with external electronics for system applications.

This application provides a driving method for a silicon-based liquid crystal, a silicon-based liquid crystal, and a wavelength selective switch, relating to the field of optical switching engine technology. This driving method for the silicon-based liquid crystal can reduce the risk of instantaneous excessive power while shortening the switching time. The driving method includes: dividing the area of ​​the silicon-based liquid crystal that receives a single-wavelength optical signal into M sub-regions, where M is a positive integer greater than or equal to 2, and each sub-region includes at least one row of pixels; sequentially refreshing the M sub-regions to form a first grating pattern, wherein at least two sub-regions have different overshoot power outputs of optical signals based on the first grating pattern; sequentially refreshing the M sub-regions to form a second grating pattern, the second grating pattern being determined by the output angle of the single-wavelength optical signal and the steady-state power of the single-wavelength optical signal; the difference between the overshoot power and the steady-state power of the single-wavelength optical signal output from the area covered by the light spot is less than a preset value.

The invention discloses a programmable optical frequency comb light source based on a dispersion reconfigurable microcavity, and the structure of the programmable optical frequency comb light source comprises a grating writing and dispersion detection module, an integrated microcavity module with a photoinduced refraction characteristic, an optical comb pumping and spectrum sensing module, and a feedback control and signal processing module. The working principle is as follows: on a micro-ring resonant cavity with a photorefractive effect, laser is written into a programmable Bragg grating, so that a dispersion curve of the micro-cavity is reconstructed in real time; then, an intelligent feedback closed loop is formed by monitoring the spectrum and repetition frequency of the output optical comb and comparing the spectrum and repetition frequency with a target set by a user, and the grating pattern is automatically adjusted until the output spectrum is matched with the target. The programmable optical frequency comb light source can be dynamically reconstructed or switched according to different application requirements. The programmable optical frequency comb can be used as a light source module of a co-packaging optical technology, bandwidth density is improved, power consumption is reduced, and therefore the programmable optical frequency comb can be widely applied to interconnection of next-generation data centers.

This invention discloses an electronic cigarette with a dynamic grating pattern effect, including a main unit and an atomizer electrically connected to the main unit. The main unit has a panel assembly, which includes a light-transmitting sheet exposed outside the main unit, a grating plate corresponding to the back of the light-transmitting sheet, and a pattern plate pasted on the back of the grating plate. The pattern plate has multiple images corresponding to the grating plate. Rotating the main unit causes the images to diffract through refraction by the grating plate, and the movement or switching of the images can be observed outside the main unit through the light-transmitting sheet. The main unit has a light panel corresponding to the pattern plate, and a power supply assembly for powering the light panel and the atomizer. This invention, through the design of the panel assembly and light panel, allows the images to change dynamically when the main unit is rotated, making the electronic cigarette not only fun and playable but also more aesthetically pleasing. Furthermore, the aesthetic appeal is enhanced at night by the light from the light panel.

The invention discloses a projection system with double digital micromirror devices, which relates to the technical field of semiconductor vision and comprises a first illumination group, a second illumination group, a light path synthesis group and a projection lens. After light beams emitted by the first illumination group and the second illumination group are modulated by the light path synthesis group, a grating pattern used for detecting a PCB is generated, then the generated grating pattern is projected by the projection lens, and a deformation pattern subjected to PCB height modulation can be obtained. The system utilizes an optical method-birefringence principle to ensure that projected images of the DMD are accurately staggered by half pixel in space, so that the projected images are complementary in space. Under the condition that a projection picture is not changed, the projection resolution and precision are doubled, so that a high-resolution projection system is realized with a low-cost and low-resolution DMD (Digital Micromirror Device).

The invention belongs to the technical field of infrared optical devices, and particularly relates to a long-wave infrared band 8-12 [mu] m narrow-band polarization-independent notch filter and a method. The long-wave infrared band 8-12 [mu] m narrow-band polarization-independent notch filter comprises a polished ZnSe substrate, a Ge zero-contrast grating layer, a ZnSe anti-reflection grating layer and two double-layer grating structures, and the two double-layer grating structures are in orthogonal cascade connection and used for achieving the polarization-independent characteristic. The preparation of the optical filter is completed through the six steps of substrate pretreatment, Ge film deposition through electron beam evaporation, grating pattern formation through laser direct writing gray exposure, Ge grating structure preparation through inductive coupling plasma etching, and ZnSe anti-reflection grating layer and orthogonal cascade double-layer grating structure deposition. The preparation method adopts the processes of laser direct writing, ICP etching, electron beam evaporation coating and the like, solves the problems of time consumption of traditional multilayer film deposition, polarization sensitivity of an existing GMR device and the like, and is suitable for the field of long-wave infrared photon and optoelectronic devices.

The invention discloses a laser scanning welding system and method for an ultra-thin polymer vibrating diaphragm, and aims to solve the technical problem that the ultra-thin vibrating diaphragm is easy to deform during welding. The system comprises an ultrasonic welding module, a laser welding module and a spatial frequency domain imaging module. During welding, firstly, the edges of the vibrating diaphragm upper frame, the ultra-thin polymer vibrating diaphragm and the vibrating diaphragm lower frame are subjected to preliminary spot welding positioning through the ultrasonic welding module; then, the laser welding module enables laser to penetrate through the upper frame according to the characteristics that the upper frame of the vibrating diaphragm is transparent and the lower frame of the vibrating diaphragm absorbs light, scanning welding is conducted on the contact interface of the vibrating diaphragm and the lower frame, and fusion is achieved; in the process, the spatial frequency domain imaging module projects grating patterns to the surface of the vibrating diaphragm and analyzes deformation of the vibrating diaphragm, welding thermal field distribution is calculated in real time, laser parameters are fed back and controlled, and it is ensured that the deformation amount of the vibrating diaphragm is always within a controllable range. According to the invention, high-precision, low-heat-influence and deformation-free welding of the ultrathin high-molecular vibrating diaphragm is realized.

The utility model relates to the technical field of semiconductor thin films, and discloses an optical coating structure of a multi-junction solar cell, which comprises a solar cell chip, an antireflection film connected to the solar cell chip and a fourth material layer connected to the antireflection film, the antireflection film comprises at least one first material layer, at least one second material layer and at least one third material layer which are sequentially stacked on the solar cell chip; wherein the fourth material layer comprises a submicron grating and a grating pattern groove, and the submicron grating is connected to the side, away from the second material layer, of the third material layer; and the grating pattern groove is connected and communicated to the third material layer through one side, deviating from the third material layer, of the submicron grating on the submicron grating. According to the multi-junction solar cell, the photoelectric conversion efficiency of the multi-junction solar cell is improved, and the sunlight reflectivity of the multi-junction solar cell is reduced.

An optical device for coupling light propagating between a waveguide and an optical transmission component is provided. The optical device includes a taper portion and a grating portion. The taper portion is disposed between the grating portion and the waveguide. The grating portion includes rows of grating patterns. A first size of a first grating pattern in a first row of grating patterns is larger than a second size of a second grating pattern in a second row of grating patterns. A first distance between the first row of grating patterns and the waveguide is less than a second distance between the second row of grating patterns and the waveguide.

The application provides a point light source inscription apodized fiber grating system and a method thereof. The system comprises: a laser for outputting inscription laser; a scanning reflection device for reflecting the laser output by the laser to an inscription area of an optical fiber and scanning the inscription area with the laser; an apodized inscription device for attenuating the power of the laser according to a predetermined attenuation curve; a laser focusing device for focusing the laser on the inscription area to form a grating pattern in the core of the inscription area; and a reference platform for mounting the laser, the scanning reflection device, the apodized inscription device and the laser focusing device. The system of the application effectively reduces the sidelobes on both sides of the resonance peak and improves the spectral characteristics of the fiber grating.

Device for measuring a radius of curvature. This device comprises: - an array (16) of Bragg gratings, each Bragg grating being fabricated in the core of a multimode optical fiber (14) and having at least three identical motifs aligned one behind the other, - a spectral analyzer (42) configured to: - emit, into the multimode optical fiber, an optical excitation signal the majority of whose power is within a wavelength range [λmin; λmax], then - establish a value for the radius of curvature from the measured amplitude of a power peak in the measured spectral response of a Bragg grating from the array (16), in which, for each Bragg grating from the array (16), the largest transverse dimension of the motifs of that Bragg grating is less than the wavelength λmin. Fig. 3

The invention discloses an optical imaging film with a grating structure and a preparation method thereof, and the preparation method comprises the following steps: selecting a base material, coating the base material with a liquid material through a first spin coater, and forming a bottom film on the base material after the liquid material is cured; selecting a template, engraving a grating pattern on the template through an electron beam lithography machine, and carrying out surface treatment to obtain an imprinting mold; and after the grating structure is imprinted on the bottom film by using the imprinting mold through the nano-imprinting machine, demolding is carried out, and the imaging film with the grating structure is obtained. According to the optical imaging film with the grating structure and the preparation method of the optical imaging film, a traditional multi-step photoetching and etching process is replaced with a nanoimprint technology, the preparation process of the grating structure is remarkably simplified, meanwhile, pattern transfer is achieved through an imprint mold, the imprint mold can be repeatedly used, mold consumption is reduced, and therefore the production cost is reduced, and in addition, the production efficiency is improved. And the bottom film is also suitable for mass production of optical imaging films, so that the production cost of a single product is effectively lowered.

The utility model provides structured light three-dimensional modeling equipment, which comprises a projection module used for projecting a grating pattern formed based on a DeBruijin coding mode to the surface of an object to be measured, the projection module comprises a transmitting unit and a grating sheet, the grating sheet is provided with a grating stripe sequence formed based on the DeBruijin coding mode, and the transmitting unit is used for transmitting the grating stripe sequence to the surface of the object to be measured. Light emitted by the emitting unit passes through the grating stripe sequence of the grating sheet to form a preset grating pattern; the camera module is used for acquiring a projection image after the projection module projects the grating pattern to the to-be-measured object; and the control module is connected with and controls the projection module and the camera module, and is used for establishing a three-dimensional model of the to-be-measured object according to the projection image acquired by the camera module. According to the technical scheme, the structure is simple, cost is low, precision is high, small-batch production can be achieved, and application in the wide fields of industrial manufacturing, medical cosmetology, cultural relic protection and the like is completely met.

The invention discloses a non-uniform metal polarization grating structure based on equal spacing and a preparation method thereof, and belongs to the field of infrared polarization integrated detection.The preparation method comprises the following steps that firstly, a layer of metal film is evaporated on a super-flat double-polished silicon substrate through the electron beam evaporation technology, then a layer of dielectric film is grown on the super-flat double-polished silicon substrate through PECVD to serve as a hard mask, and then the super-flat double-polished silicon substrate is formed; and then, non-uniform grating patterns with equal intervals and unequal line widths are photoetched by adopting a stepping photolithography technology, the dielectric layer and the metal Al layer are etched by utilizing fluorine-based plasma and chlorine-based plasma respectively, and finally, the preparation of the non-uniform metal polarization grating is completed. According to the invention, by improving the grating structure, on the premise of not additionally arranging special process steps, the consistency and controllability of the exposure energy and the etching rate are realized, the problems of complicated exposure process, non-uniform etching rate and the like of the traditional non-uniform grating are successfully solved, and the quality and the performance of the non-uniform grating are remarkably improved.

Device for measuring a radius of curvature. This device comprises: - an array (16) of Bragg gratings, each Bragg grating being fabricated in the core of a multimode optical fiber (14) and having at least three identical motifs aligned one behind the other, - a spectral analyzer (42) configured to: - emit, into the multimode optical fiber, an optical excitation signal the majority of whose power lies within a wavelength range [λmin; λmax], then - establish a value for the radius of curvature from the measured amplitude of a power peak in the measured spectral response of a Bragg grating from the array (16), in which, for each Bragg grating from the array (16), the largest transverse dimension of the motifs of that Bragg grating is less than the wavelength λmin. Fig. 3

According to an embodiment of the present invention, the light guide device comprises an input diffraction element, a transfer diffraction element, and a substrate on which the input diffraction element and the transfer diffraction element are disposed. The transfer diffraction element includes two separately formed regions (a first region and a second region). The first region includes a first grating pattern. The height of the first grating pattern gradually decreases in a direction away from the input diffraction element. The second region includes a second grating pattern. The height of the second grating pattern may also decrease and then increase in a direction away from the input diffraction element.

A light guide device according to an embodiment of the present invention comprises: an input diffraction element; a transmission diffraction element; and a substrate on which the input diffraction element and the transmission diffraction element are disposed, wherein the transmission diffraction element includes a first region and a second region formed by dividing the transmission diffraction element in two, the first region includes a first grating pattern, the height of the first grating pattern changes with distance from the input diffraction element, the second region includes a second grating pattern, the height of the second grating pattern also changes with distance from the input diffraction element, and the height of the first grating pattern and the height of the second grating pattern may be different from each other.

The invention relates to a flexible three-dimensional point cloud splicing method based on structured light projection, and the method comprises the steps: setting the initial position and parameters of equipment, and adjusting the focal length and exposure time of a camera; selecting a grating pattern, and adjusting the brightness and the projection angle of the projector; a multi-view collection path is planned, and equipment clock synchronization is ensured; performing preliminary testing, and optimizing equipment setting to ensure an optimal acquisition effect; moving the equipment according to a preset path, gradually collecting scene data, and recording the position and posture of the equipment; transmitting and storing the acquired data in real time; generating an initial point cloud and carrying out noise filtering and sparse processing; point cloud registration is carried out by adopting a beam adjustment method, and errors between visual angles are eliminated; and fusing the multi-view point clouds to generate a complete three-dimensional model, and performing quality inspection on the three-dimensional model. The three-dimensional point cloud splicing method provided by the invention is efficient and flexible, is particularly suitable for high-precision three-dimensional data acquisition and modeling of a large complex scene, and has a remarkable precision advantage and operation convenience.

The application discloses a kind of microscopic imaging device and super-resolution microscopic imaging method, comprising: sample table, for containing sample;Laser, for emitting laser;First digital micro mirror, for receiving laser, produce diffraction light;Light collection unit, for converging multiple diffraction light, form structured light, to excite the fluorescence carrying sample information;Second digital micro mirror, receive fluorescence and convert fluorescence into random binary encoding image;Image acquisition unit, for receiving image and transmission to processing unit;Processing unit, based on complex random binary encoding image reconstruction microscopic super-resolution image;First digital micro mirror, second digital micro mirror and image acquisition unit communication connection, second digital micro mirror controls the grating pattern conversion frequency of first digital micro mirror, and controls the image acquisition frequency of image acquisition unit.The application can protect biological cell sample from the invasion of phototoxicity and photobleaching, realize super-resolution imaging in structured light illumination microscopic system.

The application discloses a lens defect detection system and method using structured light, a structured light generation method and an image processing method thereof. The structured light projection scheme is adopted, the projected grating pattern is realized by programming, the fineness of the grating stripe can be adjusted according to the actual lens condition, and the defects of the lens surface in different conditions can be more clearly reflected. The designed structured light projection lens can effectively correct various aberrations and has good imaging quality. The projection lens is a zoom system, the focal length range of the system is 11mm-22mm, has a two-fold zoom effect, and can adapt to most lens sizes. The structured light projection system and the collection system adopt a symmetrical structure, can effectively eliminate system distortion and reduce errors. The image processing algorithm of the application can accurately obtain the lens surface defect information.