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2385 results about "Photomask" patented technology

A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography.

Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web

<heading lvl="0">Abstract of Disclosure</heading> This invention relates to an electrophoretic display or a liquid crystal display and novel processes for its manufacture. The electrophoretic display (EPD) of the present invention comprises microcups of well-defined shape, size and aspect ratio and the microcups are filled with charged pigment particles dispersed in an optically contrasting dielectric solvent. The liquid crystal display (LCD) of this invention comprises well-defined microcups filled with at least a liquid crystal composition having its ordinary refractive index matched to that of the isotropic cup material. A novel roll-to-roll process and apparatus of the invention permits the display manufacture to be carried out continuously by a synchronized photo-lithographic process. The synchronized roll-to-roll process and apparatus permits a pre-patterned photomask, formed as a continuous loop, to be rolled in a synchronized motion in close parallel alignment to a web which has been pre-coated with a radiation sensitive material, so as to maintain image alignment during exposure to a radiation source. The radiation sensitive material may be a radiation curable material, in which the exposed and cured portions form the microcup structure. In an additional process step, the radiation sensitive material may be a positively working photoresist which temporarily seals the microcups. Exposure of a selected subset of the microcups via the photomask image permits selective re-opening, filling and sealing of the microcup subset. Repetition with additional colors permits the continuous assembly of a multicolor EPD or LCD display.

Display device, manufacturing method thereof, and television set

A manufacturing method of a display device having TFTs capable of high-speed operation with few variations of threshold voltage is provided, in which materials are used with high efficiency and a small number of photomasks is required. The display device of the invention comprises a gate electrode layer and a pixel electrode layer formed over an insulating surface, a gate insulating layer formed over the gate electrode layer, a crystalline semiconductor layer formed over the gate insulating layer, a semiconductor layer having one conductivity type formed in contact with the crystalline semiconductor layer, a source electrode layer and a drain electrode layer formed in contact with the semiconductor layer having one conductivity type, an insulating later formed over the source electrode layer, the drain electrode layer, and the pixel electrode layer, a first opening formed in the insulating layer to reach the source electrode layer or the drain electrode layer, a second opening formed in the gate insulating layer and the insulating layer to reach the pixel electrode layer, and a wiring layer formed in the first opening and the second opening to electrically connect the source electrode layer or the drain electrode layer to the pixel electrode layer.

Method and apparatus for the determination of mask rules using scatterometry

A method and apparatus for determining optical mask corrections for photolithography. A plurality of grating patterns is printed onto a wafer utilizing a photomask having at least one grating. Each grating pattern within the plurality of grating patterns is associated with known photolithographic settings. Each grating pattern is illuminated independently with a light source, so that light is diffracted off each grating pattern. The diffracted light is measured utilizing scatterometry techniques to determine measured diffracted values. The measured diffracted values are compared to values in a library to determine a profile match. A 2-dimensional profile description is assigned to each grating pattern based on the profile match. A database is compiled of the profile descriptions for the plurality of grating patterns. Photomask design rules are then generated by accessing the database containing the 2-dimensional profile descriptions. In preferred embodiments, the design rules are used to create and correct masks containing OPC corrections, phase-shifting mask corrections and binary masks. In a preferred embodiment the at least one grating is a bi-periodic grating. In a preferred embodiment, the scatterometry technique is optical digital profilometry utilizing a reflectometer or ellipsometer.
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