The present disclosure provides a
semiconductor test structure and a preparation method thereof. The
semiconductor test structure comprises a substrate, the substrate comprises a first doped region and a second doped region, a
transistor is arranged on the substrate of the first doped region, and a first conductive layer, a
dielectric layer and a second conductive layer are sequentially arranged on the substrate of the second doped region. The material of the first conductive layer comprises a
metal material, the material of the substrate comprises a
semiconductor material, the first conductive layer is electrically connected with a gate of the
transistor, the first conductive layer forms a Schottky contact with the substrate, and the first conductive layer and the second conductive layer are electrically isolated by the
dielectric layer. The charge on the gate can be discharged through the first conductive layer and the substrate. The first conductive layer, the
dielectric layer and the second conductive layer can jointly form a
capacitor structure, and the
capacitor structure can share the charge on the gate. Therefore, the semiconductor
test structure and the preparation method thereof provided by the present disclosure can more comprehensively reduce or avoid the damage of the
antenna effect to the
transistor, thereby improving the protection effect of the transistor.