1626 results about "Photonic integrated circuit" patented technology

Integrated circuits and fabrication methods are provided. The integrated circuit includes: a varying gate structure disposed over a substrate structure, the varying gate structure including a first gate stack in a first region of the substrate structure, and a second gate stack in a second region of the substrate structure; a first field-effect transistor in the first region, the first field-effect transistor including the first gate stack and having a first threshold voltage; and a second field-effect transistor in the second region, the second field-effect transistor including the second gate stack and having a second threshold voltage, where the first threshold voltage is different from the second threshold voltage. The methods include providing the varying gate structure, the providing including: sizing layer(s) of the varying gate structure with different thickness(es) in different region(s).

A photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufactured with the photomask are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region including an antenna ratio less than a first design rule. A feature located in the identified region is moved based on a second design rule from a first position to a second position in the mask layout file to create a space in the identified region. A grounding feature is placed in the space and automatically connected to a gate feature in the mask layout file such that the antenna ratio is increased to greater than or approximately equal to the first design rule.

A method of manufacturing a semiconductor device using a scanner, wherein the scanner is capable of realizing a minimum pitch, wherein the minimum pitch is the smallest possible pitch for the scanner, the method including providing a semiconductor substrate, forming a first layer over the semiconductor substrate, forming a second layer over the first layer, patterning the second layer to form a plurality of second layer patterns, patterning the first layer to form a plurality of first layer patterns, performing a tone reversal to form a reversed tone for the second layer patterns, and etching the first layer patterns using the reversed tone as a mask, wherein the etched first layer patterns have a final pitch size, and wherein the final pitch is smaller than the minimum pitch.

A floating gate memory cell's channel region (104) is at least partially located in a fin-like protrusion (110P) of a semiconductor substrate. The floating gate's top surface may come down along at least two sides of the protrusion to a level below the top (110P-T) of the protrusion. The control gate's bottom surface may also comes down to a level below the top of the protrusion. The floating gate's bottom surface may comes down to a level below the top of the protrusion by at least 50% of the protrusion's height. The dielectric (120) separating the floating gate from the protrusion can be at least as thick at the top of the protrusion as at a level (L2) which is below the top of the protrusion by at least 50% of the protrusion's height. A very narrow fin or other narrow feature in memory and non-memory integrated circuits can be formed by providing a first layer (320) and then forming spacers (330) from a second layer without photolithography on sidewalls of features made from the first layer. The narrow fin or other feature are then formed without further photolithography in areas between the adjacent spacers. More particularly, a third layer (340) is formed in these areas, and the first layer and the spacers are removed selectively to the third layer. The third layer is used as a mask to form the narrow features.

Integrated circuits with dummy contacts and methods for fabricating such integrated circuits are provided. The method includes forming an interlayer dielectric overlying an electronic component and a substrate, wherein the interlayer dielectric has an interlayer dielectric top surface. An active contact is formed through the interlayer dielectric and forms an electrical connection with the electronic component. A dummy contact is formed within the interlayer dielectric where the dummy contact extends to a dummy contact termination point between the interlayer dielectric top surface and the substrate such that an insulator is positioned between the dummy contact termination point and the electronic component.

A method of forming a sensor for detecting gases and biochemical materials that can be fabricated at a temperature in a range from room temperature to 400° C., a metal oxide semiconductor field effect transistor (MOSFET)-based integrated circuit including the sensor, and a method of manufacturing the integrated circuit are provided. The integrated circuit includes a semiconductor substrate. The sensor for detecting gases and biochemical materials includes a pair of electrodes formed on a first region of the semiconductor substrate, and a metal oxide nano structure layer formed on surfaces of the pair electrodes. A heater is formed to perform thermal treatment to re-use the material detected in the metal oxide nano structure layer. Also, a signal processor is formed by a MOSFET to process a predetermined signal obtained from a quantity change of a current flowing through the pair of electrodes of the sensor. To form the sensor, the metal oxide nano structure layer is formed on surfaces of the pair of electrodes at a temperature in a range from room temperature to 400° C.

A stacked package structure of an image sensor for electrically connecting to a printed circuit board includes a substrate, an integrated circuit, an image sensing chip, and a transparent layer. The substrate has a first surface and a second surface opposite to the first surface. The first surface is formed with signal input terminals. The second surface is formed with signal output terminals for electrically connecting the substrate to the printed circuit board. The integrated circuit is mounted on the first surface of the substrate and electrically connected to the signal input terminals of the substrate. The image sensing chip is located above the integrated circuit to form a stacked structure with the integrated circuit for electrically connecting to the signal input terminals of the substrate. The transparent layer covers the image sensing chip. The image sensing chip receives image signals via the transparent layer and converts the image signals into electrical signals that are to be transmitted to the substrate. Thus, the image sensing chip of the image sensing product and the integrated circuit can be integrally packaged.

A coolerless photonic integrated circuit (PIC), such as a semiconductor electro-absorption modulator/laser (EML) or a coolerless optical transmitter photonic integrated circuit (TxPIC), may be operated over a wide temperature range at temperatures higher then room temperature without the need for ambient cooling or hermetic packaging. Since there is large scale integration of N optical transmission signal WDM channels on a TxPIC chip, a new DWDM system approach with novel sensing schemes and adaptive algorithms provides intelligent control of the PIC to optimize its performance and to allow optical transmitter and receiver modules in DWDM systems to operate uncooled. Moreover, the wavelength grid of the on-chip channel laser sources may thermally float within a WDM wavelength band where the individual emission wavelengths of the laser sources are not fixed to wavelength peaks along a standardized wavelength grid but rather may move about with changes in ambient temperature. However, control is maintained such that the channel spectral spacing between channels across multiple signal channels, whether such spacing is periodic or aperiodic, between adjacent laser sources in the thermally floating wavelength grid are maintained in a fixed relationship. Means are then provided at an optical receiver to discover and lock onto floating wavelength grid of transmitted WDM signals and thereafter demultiplex the transmitted WDM signals for OE conversion.

An isolation structure for electromagnetic interference includes a semiconductor substrate, a first integrated circuit in the semiconductor substrate, a second integrated circuit in the semiconductor substrate, and an isolation structure in a direct path between the first and the second integrated circuits, wherein the isolation structure comprises a through-silicon via.

A variable inductor can be formed on an integrated circuit with a primary conductor, a secondary conductor, and a switch. The primary conductor implements an inductor and may be formed in various patterns (e.g., a spiral). The secondary conductor forms a loop in proximity to (e.g., on the outside of) the primary conductor. The switch couples in series with the secondary conductor and opens or closes the loop. The inductance of the inductor is varied by closing and opening the loop with the switch. A current source may also be coupled in series with the secondary conductor and used to control the current flow in the secondary conductor to either increase or decrease the inductance. Multiple loops may be formed to change the inductance in more than two discrete steps. The variable inductor may be used for various applications such as filters, VCOs, and impedance matching networks.

The present disclosure relates to a secure device having a physical unclonable function. The device includes an integrated circuit having a semiconducting material in at least one via in a backend of the integrated circuit. The present disclosure also relates to a method for manufacturing a secure device having a physical unclonable function. The method includes providing an integrated circuit and adding a semiconducting material to at least one via in a backend of the integrated circuit. In some instances a property of the semiconducting material in the at least one via is measured to derive a signature.

A photonic integrated circuit (PIC) chip comprising an array of modulated sources, each providing a modulated signal output at a channel wavelength different from the channel wavelength of other modulated sources and a wavelength selective combiner having an input optically coupled to received all the signal outputs from the modulated sources and provide a combined output signal on an output waveguide from the chip. The modulated sources, combiner and output waveguide are all integrated on the same chip.

Photonic integrated circuits on silicon are disclosed. By bonding a wafer of compound semiconductor material as an active region to silicon and removing the substrate, the lasers, amplifiers, modulators, and other devices can be processed using standard photolithographic techniques on the silicon substrate. A silicon laser intermixed integrated device in accordance with one or more embodiments of the present invention comprises a silicon-on-insulator substrate, comprising at least one waveguide in a top surface, and a compound semiconductor substrate comprising a gain layer, the compound semiconductor substrate being subjected to a quantum well intermixing process, wherein the upper surface of the compound semiconductor substrate is bonded to the top surface of the silicon-on-insulator substrate.

A via for connecting metallization layers of chips bonded in a face-to-face configuration is provided, as well as methods of fabricating the via. The via may function as an interconnection of metallization layers in three-dimensional, stacked, integrated circuits, and may enable high density, low-resistance interconnection formation.

A hybrid laser for generating radiation includes an optical passive material and an optical active material. The laser includes a first optical waveguide and optical laser components with reflectors in the optical passive material. The first optical waveguide is adapted for coupling out radiation from the hybrid laser. The laser also includes a second optical waveguide defined in the optical active material. The optical laser components include reflectors defining a cavity and furthermore are adapted for providing laser cavity confinement in the first optical waveguide and the second optical waveguide. The second optical waveguide thereby is positioned at least partly over the first optical waveguide so that an evanescent coupling interface is defined between the second optical waveguide and the first optical waveguide and the evanescent coupling interface is positioned within the laser cavity.

An imaging apparatus appropriately captures a large dynamic range image of even a scene including a backlit person with a blue sky background in a manner that the person's face has an appropriate luminance level without saturating the background sky. In the imaging apparatus, an imaging unit obtains analogue image signals through exposure control that prevents a highlight from being saturated, an A/D converter converts the analogue image signals to digital image signals, and a signal processing unit linearly increases the dynamic range of the digital image signals. The image signals with the increased dynamic range are nonlinearly compressed to have a dynamic range of 100% or less through nonlinear dynamic range compression that intensively compresses a highlight portion. The imaging apparatus with this structure first increases the dynamic range of an image and efficiently compresses the increased large dynamic range of the image.

A sensor is described for sensing a substance such as for example glucose. The sensor is implantable in the body of a living creature. The sensor comprises a photonic integrated circuit, e.g. silicon-photonics, based radiation processor for spectrally processing radiation interacting with the sample. A continuous monitoring system also is described using such a sensor.