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1319 results about "Free space" patented technology

Vacuum is space devoid of matter. The word stems from the Latin adjective vacuus for "vacant" or "void". An approximation to such vacuum is a region with a gaseous pressure much less than atmospheric pressure. Physicists often discuss ideal test results that would occur in a perfect vacuum, which they sometimes simply call "vacuum" or free space, and use the term partial vacuum to refer to an actual imperfect vacuum as one might have in a laboratory or in space. In engineering and applied physics on the other hand, vacuum refers to any space in which the pressure is considerably lower than atmospheric pressure. The Latin term in vacuo is used to describe an object that is surrounded by a vacuum.

Analyte test device

An analyte test device is constructed as an integrated, single-use, disposable cartridge which can be releasably installed into a compatible analyte test monitor. In use, the device can be used in conjunction with the monitor to lance the skin of a patient to create a blood sample, express the blood sample from the wound site using vacuum forces and calculate the concentration of a particular analyte in the expressed blood sample. In one embodiment, the device includes a base which includes a top surface and a bottom surface. The base is also shaped to define an aperture which extends transversely through its top and bottom surfaces. An electrochemical test sensor is affixed to the base in such a manner so that a vacuum path is at least partially defined between the base and the test sensor, the vacuum path being in fluid communication with the aperture. A cover is affixed to the top surface of the base over the aperture, the cover comprising a flexible dome-shaped member and a lancet coupled to the member, the lancet being orientated such that its longitudinal axis extends at an approximate right angle relative to the longitudinal axis of the test sensor. The bottom surface of the base is shaped to include a skin receiving surface which at least partially defines the aperture in the base, the skin receiving surface having a steep inward contour to distend the skin of the patient when pressed thereagainst.
Owner:ABBOTT DIABETES CARE INC

Wound dressing with vacuum reservoir

A wound dressing apparatus includes a wound dressing member dimensioned for positioning relative to a wound bed. The wound dressing member including an internal vacuum reservoir and has a port in communication with the vacuum reservoir for applying subatmospheric pressure to the vacuum reservoir to facilitate removal of fluid from the wound bed. The wound dressing member includes a visual pressure indicator associated therewith for indicating a level of pressure within the vacuum reservoir. The visual pressure indicator includes color indicia having a plurality of colors corresponding to a condition of the pressure within the vacuum reservoir. The wound dressing member includes a lower absorbent member positionable adjacent the wound bed and an upper member which at least partially defines the vacuum reservoir. At least one of the top member and the lower absorbent member has the visual pressure indicator mounted thereto. The preferred visual pressure indicator includes an electronic position sensor. The visual pressure indicator further includes circuit means and visible alarm means. The circuit means is adapted to actuate the visible alarm means when the position sensor detects a relative positioning of the top member of the wound dressing member to provide a visual indication of the condition of the subatmospheric pressure within the vacuum reservoir.
Owner:SMITH & NEPHEW INC

Capacitively coupled plasma reactor with magnetic plasma control

A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.
Owner:APPLIED MATERIALS INC
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