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38931results about How to "High selectivity" patented technology

Catalysts for making ethanol from acetic acid

Catalysts and processes for forming catalysts for use in hydrogenating acetic acid to form ethanol. In one embodiment, the catalyst comprises a first metal, a silicaceous support, and at least one metasilicate support modifier. Preferably, the first metal is selected from the group consisting of copper, iron, cobalt, nickel, ruthenium, rhodium, palladium, osmium, iridium, platinum, titanium, zinc, chromium, rhenium, molybdenum, and tungsten. In addition the catalyst may comprise a second metal preferably selected from the group consisting of copper, molybdenum, tin, chromium, iron, cobalt, vanadium, tungsten, palladium, platinum, lanthanum, cerium, manganese, ruthenium, rhenium, gold, and nickel.
Owner:CELANESE INT CORP

Unitized electrode with three-dimensional multi-site, multi-modal capabilities for detection and control of brain state changes

An electrode with three-dimensional capabilities for detection and control of brain state changes of a subject. The electrode includes a disk portion having an upper surface and a lower surface, and a shaft portion secured to and extending perpendicularly outwardly from the lower surface of the disk portion; the shaft portion having an outer surface. The disk portion and shaft portion may include one or more recording or stimulating contact surfaces structured to operatively interact with the brain of a subject. Insulating material isolates each of the recording or stimulating contact surfaces from each other. At least one conductor operatively and separately connect each of the recording or stimulating contact surfaces in communication with external apparatus. The disk portion and shaft portion are structured relative to each other to operatively provide support and anchoring for each other while providing three-dimensional capabilities for detection and control of brain state changes of a subject. Modified embodiments include insertible/retractable electrode wires, both contained in channels and sheathed in axially displaceable cannulae; activating mechanisms for inserting/retracting the electrode wires and/or cannulae; and multiple shaft portions.
Owner:FLINT HILLS SCI L L C

Cleaning of carbon-based contaminants in metal interconnects for interconnect capping applications

Protective caps residing at an interface between copper lines and dielectric diffusion barrier layers are used to improve various performance characteristics of interconnects. The caps, such as cobalt-containing caps or manganese-containing caps, are selectively deposited onto exposed copper lines in a presence of exposed dielectric using CVD or ALD methods. The deposition of the capping material is affected by the presence of carbon-containing contaminants on the surface of copper, which may lead to poor or uneven growth of the capping layer. A method of removing carbon-containing contaminants from the copper surface prior to deposition of caps involves contacting the substrate containing the exposed copper surface with a silylating agent at a first temperature to form a layer of reacted silylating agent on the copper surface, followed by heating the substrate at a higher temperature to release the reacted silylating agent from the copper surface.
Owner:LAM RES CORP

Structure of a micro electro mechanical system and the manufacturing method thereof

A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.
Owner:SNAPTRACK

Plasma processing method and plasma processing apparatus

The present invention provides a plasma processing method and a plasma processing apparatus. The plasma processing method enables consistent processing by realizing a high selectivity and a high etching rate when etching a laminated film using a boron-containing amorphous carbon film, realizes high throughput including prior and post processes by simplifying a mask forming process, and has shape controllability of vertical processing. In the present invention, in a plasma processing method for forming a mask by plasma-etching a laminated film including an amorphous carbon film containing boron, the boron-containing amorphous carbon film is plasma-etched by using a mixed gas of an oxygen gas, a fluorine-containing gas, a halogen gas, and a silicon tetrafluoride gas, or a mixed gas of an oxygen gas, a fluorine-containing gas, a halogen gas, and a silicon tetrachloride gas.
Owner:HITACHI HIGH-TECH CORP
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