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149 results about "Substrate type" patented technology

The types of substrate are soil, rock, gravel, clay etc, and will determine the type of foundation that will be used under a building. In retrospect, the age of the home may well determine what type has been used when it was built.

Water-barrier performance of an encapsulating film

A method and apparatus for depositing a material layer onto a substrate is described. The method includes delivering a mixture of precursors for the material layer into a process chamber and depositing the material layer on the substrate at low temperature. The material layer can be used as an encapsulating layer for various display applications which require low temperature deposition process due to thermal instability of underlying materials used. In one aspect, the encapsulating layer includes one or more material layers (multilayer) having one or more barrier layer materials and one or more low-dielectric constant materials. The encapsulating layer thus deposited provides reduced surface roughness, improved water-barrier performance, reduce thermal stress, good step coverage, and can be applied to many substrate types and many substrate sizes. Accordingly, the encapsulating layer thus deposited provides good device lifetime for various display devices, such as OLED devices. In another aspect, a method of depositing an amorphous carbon material on a substrate at low temperature is provided. The amorphous carbon material can be used to reduce thermal stress and prevent the deposited thin film from peeling off the substrate.
Owner:APPLIED MATERIALS INC

Single substrate type capacitive touch screen and manufacture method thereof

InactiveCN103034387AAvoid easy disconnectionSolve the problem that it must be made into a gentle slopeInput/output processes for data processingSubstrate typeConductive materials
The invention belongs to the field of touch technology and particularly relates to a single substrate type capacitive touch screen and a manufacture method of the single substrate type capacitive touch screen. The single substrate type capacitive touch screen comprises a transparent substrate, a transparent conductive electrode, insulation ink, a conductive metal electrode, a conductive material and an insulation material, wherein the transparent conductive electrode is arranged on one side of the transparent substrate, the insulation ink is arranged above the two ends of the transparent conductive electrode, the conductive metal electrode is arranged above the insulation ink, the insulation material is arranged above the conductive metal electrode, an open hole is formed in the insulation ink layer, the conductive material is filled in the open hole, the conductive metal electrode and the transparent conductive electrode are connected through the conductive material specially used in the invention, so that the problem that a transparent conductive electrode at the junction of the insulation ink and a touch effective area of an existing single substrate capacitive touch screen is effectively solved, and the problem that the insulation ink at the junction does not need to be made into a gradual slope shape is also solved.
Owner:深圳市中显微电子有限公司

Water-barrier performance of an encapsulating film

A method and apparatus for depositing a material layer onto a substrate is described. The method includes delivering a mixture of precursors for the material layer into a process chamber and depositing the material layer on the substrate at low temperature. The material layer can be used as an encapsulating layer for various display applications which require low temperature deposition process due to thermal instability of underlying materials used. In one aspect, the encapsulating layer includes one or more material layers (multilayer) having one or more barrier layer materials and one or more low-dielectric constant materials. The encapsulating layer thus deposited provides reduced surface roughness, improved water-barrier performance, reduce thermal stress, good step coverage, and can be applied to many substrate types and many substrate sizes. Accordingly, the encapsulating layer thus deposited provides good device lifetime for various display devices, such as OLED devices. In another aspect, a method of depositing an amorphous carbon material on a substrate at low temperature is provided. The amorphous carbon material can be used to reduce thermal stress and prevent the deposited thin film from peeling off the substrate.
Owner:APPLIED MATERIALS INC

Chip embedded silicon substrate type fan-out type packaging structure and manufacturing method therefor

The invention discloses a chip embedded silicon substrate type fan-out type packaging structure and a manufacturing method therefor. The packaging structure comprises a silicon substrate, wherein the silicon substrate has a first surface and a second surface; at least one groove A which extends to the second surface is formed in the first surface of the silicon substrate; at least one chip with an upward bonding pad surface is arranged in the groove A; the bonding pad surface of the chip is higher than the first surface of the silicon substrate for a certain distance; a thick adhesive layer which exposes the groove A and the chip is paved on the first surface; the sum of the thickness of the thick adhesive layer and the depth of the groove A is close to or equal to the thickness of the chip; and the electric power of the bonding pad of the chip is fan out to the upward side of the thick adhesive layer through a metal wiring layer. The thick adhesive layer is introduced to the surface of the silicon substrate, and the thick adhesive layer and the silicon substrate are jointly used as a chip fan-out carrier, so that requirement on the groove etching depth and the groove bottom etching uniformity in embedding the chip in the silicon substrate can be lowered, and the purposes of shortening etching process time on the silicon substrate, lowering etching and packaging costs and reducing warping degree are achieved.
Owner:HUATIAN TECH KUNSHAN ELECTRONICS

Shallow sea water depth multi-spectral satellite remote sensing inversion method in waterless depth control point area

ActiveCN109059796ARealize deep remote sensing inversionEliminate the effects of depth retrievalUsing optical meansOcean bottomData set
The invention discloses a shallow sea water depth multi-spectral satellite remote sensing inversion method in a waterless depth control point area, and belongs to the technical field of the satelliteocean remote sensing application. Based on a derived dual-band linear shallow sea water depth inversion model, solving an optimal band rotation unit vector through different depths of different submarine types of pixel points dataset, estimating subsea parameters in the model based on a typical substrate type pixel adoption of a position of a land and water boundary line, calculating a blue-greenband diffusion attenuation coefficient ratio and based on deep water area data closest to a shallow sea area through the same type of substrate and different depths of pixel data, and calculating thegreen band attenuation coefficient based on a semi-analytic and diffuse attenuation coefficient algorithm. According to the shallow sea water depth multi-spectral satellite remote sensing inversion method in the waterless depth control point area, the shallow sea water depth remote sensing inversion in the waterless depth control point area is realized through the calculation of the above parameters.
Owner:THIRD INST OF OCEANOGRAPHY MINIST OF NATURAL RESOURCES
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