11467results about "Computer aided design" patented technology

A method for performing design rule checking on OPC corrected or otherwise corrected designs is described. This method comprises accessing a corrected design and generating a simulated image. The simulated image corresponds to a simulation of an image which would be printed on a wafer if the wafer were exposed to an illumination source directed through the corrected design. The characteristics of the illumination source are determined by a set of lithography parameters. In creating the image, additional characteristics can be used to simulate portions of the fabrication process. However, what is important is that a resulting simulated image is created. The simulated image can then be used by the design rule checker. Importantly, the simulated image can be processed to reduce the number of vertices in the simulated image, relative to the number of vertices in the OPC corrected design layout. Also, the simulated image can be compared with an idea layout image, the results of which can then be used to reduce the amount of information that is needed to perform the design rule checking.

Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

Systems and methods for creating fully custom products from scratch without exclusive use of off-the-shelf or pre-specified components. A system for creating custom products includes an image capture device for capturing image data and/or measurement data of a user. A computer is communicatively coupled with the image capture device and configured to construct an anatomic model of the user based on the captured image data and/or measurement data. The computer provides a configurable product model and enables preview and automatic or user-guided customization of the product model. A display is communicatively coupled with the computer and displays the custom product model superimposed on the anatomic model or image data of the user. The computer is further configured to provide the customized product model to a manufacturer for manufacturing eyewear for the user in accordance with the customized product model. The manufacturing system is configured to interpret the product model and prepare instructions and control equipment for the manufacturing of the customized product.

Smart graphic elements are provided for use as portions or components of one or more graphic displays, which may be executed in a process plant to display information to users about the process plant environment, such as the current state of devices within the process plant. Each of the graphic elements is an executable object that includes a property or a variable that may be bound to an associated process entity, like a field device, and that includes multiple visualizations, each of which may be used to graphically depict the associated process entity on a user interface when the graphic element is executed as part of the graphic display. Any of the graphic element visualizations may be used in any particular graphic display and the same graphic display may use different ones of the visualizations at different times. The different visualizations associated with a graphic element make the graphic element more versatile, at they allow the same graphic element to be used in different displays using different graphical styles or norms. These visualizations also enable the same graphic element to be used in displays designed for different types of display devices, such as display devices having large display screens, standard computer screens and very small display screens, such as PDA and telephone display screens.

Various examples are provided for dynamically updating or adapting predictive modeling for prediction of outcomes of interest for operating systems and processes. Embodiments of the disclosure may provide systems, apparatus, processes, and methods for generating and deploying dynamically updated predictive models. In some embodiments, the predictive model may be deployed for the purpose of predicting operational outcomes of interests in operating systems, hardware devices, machines and/or processes associated therewith prior to the operational outcomes of interest occurring. The predictions can, for example, provide sufficient time for maintenance or repairs to be scheduled and carried out to avoid the predicted operational outcome. Autonomous evaluation of features allows the predictive models to be dynamically updated in response to changes in the environment or monitored data.

A system for virtually planning a size and position of a prosthetic implant for a bone on a patient includes a database containing pre-defined form factor information for a plurality of different implants and a circuit for obtaining surface shape information of the bone. The system further includes a circuit for defining baseline location parameters for an implant location in relation to a virtual representation of the bone based on the surface shape information and a circuit for assessing a fit calculation of each implant in relation to the virtual representation of the bone based on the form factor in formation and a plurality of fit factors at each of a plurality of incremental positions in relation to the bone. Still further, the system includes a circuit for selecting a best fit implant size and position from all of the fit calculations.

A photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufactured with the photomask are disclosed. The photomask includes a substrate and a patterned layer formed on at least a portion of the substrate. The patterned layer may be formed using a mask pattern file created by analyzing a pattern in a mask layout file to identify a region including an antenna ratio less than a first design rule. A feature located in the identified region is moved based on a second design rule from a first position to a second position in the mask layout file to create a space in the identified region. A grounding feature is placed in the space and automatically connected to a gate feature in the mask layout file such that the antenna ratio is increased to greater than or approximately equal to the first design rule.

A method and apparatus for mask optimization is provided. Mask design and production is optimized by providing proper weighting parameters for critical features. The parameters may include information such as parametric information, functional information, and hot spots determination.

A method for programming a routing layout design through one via layer includes forming a plurality of metal traces on a first routing layer and a second routing layer, and positioning a plurality of vias within a via layer disposed between the first and second routing layers for connecting the metal traces on the first and second routing layers according to a first current route defined by a predetermined circuit layout design to connect a first node and a second node so as to establish a second current route equivalent to the first current route.

One embodiment of the present invention provides a system that applies resolution enhancement techniques (RETs) selectively to a layout of an integrated circuit. Upon receiving the layout of the integrated circuit, the system identifies a plurality of critical regions within the layout based on an analysis of one or more of, timing, dynamic power, and off-state leakage current. The system then performs a first set of aggressive RET operations on the plurality of critical regions. The system also performs a second set of less aggressive RET operations on other non-critical regions of the layout.

A method and system is disclosed to improve the turnaround time to provide adequate time to meet project schedules in the event that adjustments or modifications to the design are necessary. A method for improving a turnaround time for design verification of a process database representing a semiconductor design includes the steps of (a) deriving a timing database and a (DNE) database from the process database; (b) performing, using the timing database, one or more design changes and one or more timing verifications and corrections to generate a modified timing database; (c) initiating, using the process database, physical validation of the semiconductor design prior to completion of step (b) to generate a modified DNE database; (d) merging the modified timing database with the modified DNE database to form a modified process database; and (e) performing, using the modified process database, one or more design verification checks of the semiconductor design.

A Digital Design Method which may be automated is for obtaining timing closure in the design of large, complex, high-performance digital integrated circuits. The methodincludes the use of a tuner on random logic macros that adjusts transistor sizes in a continuous domain. To accommodate this tuning, logic gates are mapped to parameterized cells for the tuning and then back to fixed gates after the tuning. Tuning is constrained in such a way as to minimize “binning errors” when the design is mapped back to fixed cells. Further, the critical sections of the circuit are marked in order to make the optimization more effective and to fit within the problem-size constraints of the tuner. A specially formulated objective function is employed during the tuning to promote faster global timing convergence, despite possibly incorrect initial timing budgets. The specially formulated objective function targets all paths that are failing timing, with appropriate weighting, rather than just targeting the most critical path. Finally, the addition of multiple threshold voltage gates allows for increased performance while limiting leakage power.

Disclosed is an improved method, system, and computer program product for electronic designs with supplant design rules. According to some embodiments of the invention, the foundry-imposed design rules are replaced by one or more supplant design requirements which define absolute or relative threshold(s) for a design feature characteristic. Some other embodiments of the invention, the foundry-imposed design rules are replaced by one or more supplant design requirements which define one or more ranges of absolute or relative values for a design feature characteristic. Some other embodiments of the invention further provide an EDA tool which takes into account a model for the electronic design, the processing, metrological, lithographic, or imaging processing processes or techniques, and the supplant design requirements to determine whether the features of an electronic design meet the design requirements.