The present disclosure provides a three-dimensional
DRAM array structure including L
layers, M rows, and N columns of
DRAM cell structures, each
DRAM cell structure including first and second gate transistors having a tubular channel, disposed in a vertical direction and electrically connected in parallel, and a storage
capacitor of a tubular structure disposed between the first and second gate transistors in the vertical direction, an inner
electrode of the second
transistor is connected to the first source / drain of the first and second gate-all-around transistors, and an outer
electrode is connected to a source line; the M * N bit lines respectively extend in a tubular structure jointly formed by the first and second gate-all-around transistors and the storage
capacitor in the M-row and N-column DRAM
unit structure along the vertical direction, and are respectively connected to
second source / drain electrodes of the first and second gate-all-around transistors; the L * M first word lines and the L * M second word lines extend in the first horizontal direction and are connected to grid electrodes of the first fence transistors and the second fence transistors in the L
layers of DRAM unit structures respectively, and the M rows of DRAM unit structures are divided into M / s row groups.