This disclosure provides a
semiconductor device and a method for manufacturing the same. The device includes: a
semiconductor layer; a
body region located within the
semiconductor layer; a source region and a drain region located within the
body region and spaced apart from each other; a gate conductor located above the semiconductor layer and between the source and drain regions; a
gate dielectric layer located between the gate conductor and the semiconductor layer; and a
field oxide layer surrounding the source and drain regions, at least on the surface of the semiconductor layer. The
semiconductor device also includes a doped ring located within the semiconductor layer, with the source and drain regions located within the doped ring, and the
field oxide layer surrounding the doped ring. The
body region and the doped ring are of a first
doping type, and the source and drain regions are of a second
doping type, with the first
doping type being the opposite of the second doping type. By providing a doped ring with the opposite doping type to the source / drain regions around the source / drain regions, the source / drain regions are isolated from the
field oxide layer, thereby solving the technical problems of source / drain punch-through induced by positive charge in the field
oxide layer (DIT) and
crosstalk between adjacent devices, as well as the large current problem caused by single-event flip-
flops (SEE).