The invention provides a method for manufacturing a three-dimensional
DRAM (
Dynamic Random Access Memory) array structure. The method comprises the steps that a plurality of stacked sub-arrays and a plurality of second isolation
layers are sequentially formed on a circuit substrate, the step of forming the stacked sub-arrays comprises the substeps that first isolation
layers and stacked
layers are alternately stacked, and each stacked layer comprises a first conductive layer, a sacrificial layer and a second conductive layer;
bit line holes penetrating through the first
isolation layer and the lamination layer are formed, and the area of each
bit line hole in the lamination layer is larger than that in the first
isolation layer; forming a
gate dielectric layer, a
semiconductor material layer and an isolation medium in each
bit line hole; forming a hole penetrating through the isolation medium, and filling the hole with a first conductive material; forming a common
electrode groove which extends along the first horizontal direction and penetrates through the first
isolation layer and the lamination layer; removing the sacrificial layer and a part of
gate dielectric layer corresponding to the sacrificial layer in the common
electrode groove; and conformally forming a
capacitor dielectric layer on the inner surface of each common
electrode groove, and filling the
residual space of the common electrode groove with a second conductive material.