The invention discloses a
nitride full-color integrated miniature light-emitting
diode display
chip and a preparation method thereof, a columnar or halfpace-shaped table surface is formed on the surface of a
silicon substrate, and then an AlN buffer layer, an AlGaN stress modulation layer, an n-type GaN layer, an InGaN / GaN composite
quantum well layer and a p-type conductive layer sequentially extend on the table surface of the
silicon substrate to form a miniature light-emitting
diode table surface; through stress release of the side wall of the mesa and stress modulation of the AlGaN layer, tensile
stress distribution which is gradually reduced from the center of the mesa to the outer ring is formed in the n-type GaN layer, so that
indium component distribution in the InGaN / GaN composite
quantum well layer is regulated and controlled, and the micro light-emitting
diode mesa covering three
primary color wavebands of red, green and blue is formed. According to the
chip structure disclosed by the invention, the red, green and blue three-primary-color sub-pixels are integrated, and the difficulty of a
mass transfer process of the full-color micro light-emitting diode display
chip is reduced. According to the invention, the preparation of the red, green and blue three-primary-color sub-pixels can be completed only by implementing an epitaxial process once, and the process flow is simplified.