This application belongs to the field of display technology and relates to an optoelectronic device and its fabrication method, as well as a display apparatus. The optoelectronic device includes an
anode, a hole functional layer, an
active layer, an
electron functional layer, and a
cathode. The
electron functional layer is made of a first core-shell material, the core of which includes a first N-type
semiconductor material, and the shell material includes a first carbon material; and / or, a first
interface layer is provided between the
active layer and the hole functional layer, the first
interface layer including a second core-shell material, the core of which includes a first P-type
semiconductor material, and the shell material includes a second carbon material; and / or, a second
interface layer is provided between the
active layer and the
electron functional layer, the second interface layer including a third core-shell material, the core of which includes a second N-type
semiconductor material, and the shell material includes a third carbon material. The above materials have high hole / electron transport performance and a small
contact angle with water, enabling them to absorb water
oxygen and preventing water
oxygen from entering the light-emitting layer for
hydrolysis or oxidation, thereby improving the lifetime and external
quantum efficiency of the optoelectronic device.