215 results about "Anti-reflective coating" patented technology

Sleep-aiding eyewear that prevents light which inhibits melatonin production from reaching the eye is described. The eyewear that is the object of the present disclosure has improved visibility over other methods of cutting off melatonin-inhibiting wavelengths of light, which enables the user to perform tasks, such as reading and typing, uninhibited. This is achieved in some embodiments using a Bragg grating comprising multiple layers of alternating reflective index material as a surface coating on the lens. This may be combined with lens-tinting, or antireflective coatings, in the eyewear. Furthermore, transition lenses which block melatonin-shifting light when there is a suitable external stimulus, such as blue light from a light emitting diode, are described. The presently described filters are also useful for electronic displays and functional light-transmitting materials.

A coated article including a first antireflective (AR) coating supported by a glass substrate, wherein the first coating may include, moving away from the glass substrate: a dielectric first high index layer; a dielectric first low index layer; a dielectric second high index layer; a dielectric second low index layer comprising an oxide of silicon; a dielectric third high index layer comprising an oxide of niobium; a dielectric first medium index layer, wherein the third high index layer comprising the oxide of niobium is located between and directly contacting the second low index layer comprising the oxide of silicon and the first medium index layer; a dielectric third low index layer; and an overcoat layer; wherein the first coating contains no IR reflecting layer based on silver and / or gold; wherein, from the perspective of a viewer of the coated article, the first coating may be configured so that the coated article has a film side reflective ΔE* value of no greater than 3.0 upon heat treatment of at least about 580 degrees C. The ΔE* value(s) may be measured either with a substantially symmetrical / similar AR coating on the other side of the same glass substrate, or absent any AR coating on the other side of the glass substrate.

Higher modulation speed is achieved for a laser device comprising: an active layer structure between a semiconductor substrate and a grating structure configured for manipulation, comprising a common active layer for generation of laser light; a first facet spatially adjacent to one end of and a second facet spatially adjacent to an opposing end of the active layer structure, the first facet emitting laser light, the second facet being opposite the first, both comprising anti-reflection coating; the grating structure comprising spatially adjacent integral grating sections; a cladding structure for optically confining the laser light and adapted for arranging the grating structure between the active layer and the cladding structure; a DFB structure having a first grating section, at least one DBR structure having a second grating section, the first and second grating sections sharing the common active layer for at least the integral grating sections; the DFB structure comprising a first optical function as lasing function and the at least one DBR structure comprising a second one as optical feedback.

The invention relates to a windshield for a vehicle, having an exposed exterior-side surface (I) and an exposed interior-side surface (i), wherein the windshield has a transmission region (S) which is provided for the optical beam path of a transmitter and / or receiver (4) of electromagnetic radiation, and the interior-side surface (i) is provided with an anti-reflection coating (20) in the transmission region (S), the anti-reflection coating comprising, in the specified order starting from the interior-side surface (i): - a first optically high-refractive layer (21) having a refractive index of at least 1.9 and an optical thickness of 95 nm to 225 nm; - a first optically low-refractive layer (22) having a refractive index of maximally 1.6 and an optical thickness of 40 nm to 135 nm; - a second optically high-refractive layer (23) having a refractive index of at least 1.9 and an optical thickness of 415 nm to 615 nm; and - a second optically low-refractive layer (24) having a refractive index of maximally 1.6 and an optical thickness of 290 nm to 410 nm, the optical thickness being determined as the product of the geometrical thickness and the refractive index at 550 nm.

This invention discloses a patterned solar glass with a neutral colour anti- reflection coating (ARC) designed to enhance light transmission and optical performance The dual-side structured glass features a smoother side coated with a two-layer anti-reflection coating. The bottom layer is formulated from a silane precursor, a hydrolyzing agent, an acid catalyst, porosity-enhancing agents, and a combination of solvents, achieving a refractive index of 1.4 to 1.5. The top layer is a nano-composite-based AR coating with a refractive index of 1.25 to 1.35 is applied on the bottom layer. The layers are chemically bonded via a roll-coating process, with precise thickness control wherein, the bottom layer ranges from 180–210 nm and the top layer ranges from 140–160 nm. This gradient refractive index structure results in a transmission gain of 2.3% and minimizing Fresnel reflection losses. The coating ensures neutral colour appearance and uniform light transmission, improving omnidirectional performance under varying light angles.

The present application provides a composition for forming an anti-reflective coating layer and an application thereof. The composition comprises a first polymer containing epoxy groups, a second polymer containing groups reacting with the epoxy groups and a functional molecule, wherein the functional molecule comprises at least two epoxy groups. The composition for forming the anti-reflection coating is a composition material which is strong in acid and alkali cleaning resistance and has wet etching resistance, the size of a pattern can be protected in the cleaning process, and therefore the stability of a semiconductor device is guaranteed; according to the composition, the etching rate can be adjusted by adjusting the structure of the functional molecules, more accurate control can be achieved in the manufacturing process, and it is ensured that the thickness and uniformity of a coating meet the design requirements.

The invention belongs to the technical field of anti-reflection coatings, and particularly relates to an anti-reflection coating for photoresist and a preparation method of the anti-reflection coating. The coating comprises perfluoropolyether-polyhedral oligomeric silsesquioxane, the structural formula of the coating is # imgabs0 #, R is CH2CH (CH3) 2, and n is equal to (3-6). The preparation method of the coating comprises the following steps: dissolving perfluoropolyether-polyhedral oligomeric silsesquioxane in a solvent to prepare a solution, stirring at room temperature for 24 hours, filtering, coating, removing the solvent, crosslinking and curing to form the coating. By introducing an inorganic-organic hybrid skeleton and a rigid cage structure in a POSS structure and a fluorocarbon chain of perfluoropolyether, the thermal stability, hydrophobicity and etching resistance of the coating are improved.

According to a first aspect, the present disclosure relates to a distributed feedback (DFB) laser configured to control a wavelength of emitted light from the DFB laser, the DFB laser comprising a planar substrate, a substantially planar front facet with an anti-reflective coating, the front facet substantially perpendicular to the planar substrate, a substantially planar rear facet with a high reflectivity coating, the rear facet substantially perpendicular to the planar substrate, a laser section positioned between the rear facet and the front facet, the laser section comprising: a first ensemble of substantially planar layers configured to produce, with said planar substrate, a first PIN junction, the first ensemble of substantially planar layers comprising: a first top layer substantially parallel to the planar substrate; an active layer substantially parallel to the planar substrate and configured to emit light through the front facet, the active layer arranged between the planar substrate and the first top layer; a grating layer arranged substantially parallel to the active layer, the grating layer arranged between the planar substrate and the first top layer in proximity to the active layer; a Bragg grating arranged in said grating layer and configured to reflect light towards said front facet; and a phase section positioned between the rear facet and the laser section, the phase section comprising: a second ensemble of substantially planar layers comprising: a second top layer substantially parallel to the planar substrate, the second top layer substantially coplanar with the first top layer; an optical layer arranged between the planar substrate and the second top layer, the optical layer substantially coplanar with the active layer and optically coupled with the active layer; a non-grating layer substantially coplanar with the grating layer; and an element in electrical or thermal contact with the optical layer, the element configured, under application of a current or voltage, to change a refractive index of the optical layer so as to change the wavelength of the emitted light.

When an anti-reflective coating, conventionally applied to glass lenses, is applied to a plastic lens, the difference in thermal expansion between the plastic substrate and the anti-reflective coating causes significant expansion of the plastic substrate in high-temperature environments. This leads to a problem where the anti-reflective coating cannot keep up with the expansion of the substrate and is prone to fracture (cracking). Therefore, we aim to realize a new optical thin film that achieves both the desired optical properties and the suppression of crack formation. [Solution] The optical thin film of this disclosure includes one or more MO mixed layers (11) in which organometallic compounds are mixed within a layer formed by the physical deposition of magnesium fluoride.

The application belongs to InGaAs infrared focal plane detector, and provides a preparation method of a new type of InGaAs short-wave infrared detector. After growing P electrode, N electrode, P type metal and N type metal to form ohmic contact, growing connecting layer metal, thinning and polishing InP substrate to form a flat mirror surface, corresponding photoetching on a readout circuit wafer, growing lower electrode metal and indium column, and then carrying out metal stripping; InP epitaxial wafer PDA and readout circuit are uniformly glued, protected, and diced to form independent single; PDA and readout circuit are inversely interconnected to form an infrared detector, and secondary polishing treatment and growth of anti-reflection coating are carried out. The indium column is grown at the end of the readout circuit, and one-step photoetching can be completed. The PDA chip end can reduce the growth of the lower electrode, the growth of the indium column, and the growth of the corresponding passivation layer and the opening of the passivation layer. The process steps are reduced, the probability of defects is reduced, the production cost is reduced, and the final yield of the product is further improved.

A thermal processing apparatus is provided. The thermal processing apparatus includes a processing chamber having a chamber wall. The processing chamber includes a workpiece support. The workpiece support is configured to support a workpiece. The thermal processing apparatus includes one or more lamp heat sources configured to emit electromagnetic radiation to heat the workpiece. The thermal processing apparatus includes an anti-reflection coating in a region between the one or more lamp heat sources and the chamber wall of the processing chamber.

A lens includes a lens portion, an anti-reflection (AR) coating layer disposed on a surface of the lens portion, and a water-repellent layer disposed on a surface of the AR coating layer. The water-repellent layer includes an inorganic layer having a plurality of pores and an organic layer at least partially disposed in the plurality of pores. The inorganic layer includes silicon oxynitride (SiOxNy).

The invention relates to two-component coating materials for producing anti-reflective coatings, wherein the binder component contains one or more polymer polyols, black plastic spheres having D50 sphere diameters in the range of 9 to 17 μm, and black pigments, and wherein the hardener component has one or more isocyanates. The invention also relates to methods for producing said anti-reflective coatings and to the use thereof on components and devices having functions that are impaired by the reflection of electromagnetic radiation, in particular by the reflection of light.

The present disclosure addresses the problem of providing a method for producing a spectacle lens, wherein the method makes it possible to produce a spectacle lens having a topcoat layer that can suppress the occurrence of cracks and the like and that has excellent water repellent properties or hydrophilic properties. A method for producing a spectacle lens according to the present disclosure comprises: a step for bringing into contact a laminate including a spectacle lens base material and an antireflective film having an SiO2 layer on the outermost surface thereof with an alkaline solution having a pH of more than 7.0 but less than 9.8; and a step for obtaining a spectacle lens by forming a topcoat layer on the antireflective film.

A device and method for fabricating the same is disclosed. For example, the device includes a sensor having a front side and a back side, a metal interconnect layer formed on the front side of the sensor, an anti-reflective coating formed on the back side of the sensor, a composite etch stop mask layer formed on the anti-reflective coating. wherein the composite etch stop mask layer includes a silicon nitride layer and a stressed layer. A percentage of Si—H bonds in the silicon nitride layer is greater than a percentage of Si—H bonds in the stressed layer.

The invention relates to an exterior trim part (1) of a vehicle, comprising a thin-walled cover element (2) for covering and protecting a device (3) for emitting and / or receiving electromagnetic waves against environmental influences, wherein the cover element (2) has an intended visible side (A) and an inner side (B) opposite the visible side (A) and is configured such that it can be penetrated by electromagnetic waves of at least one electromagnetic wavelength in the range of 100 nm to 1600 nm, wherein the cover element (2) furthermore has at least one carrier layer (4) made of a polymer material which is transparent or partially transparent to the electromagnetic waves, and having at least one layer (5) of an anti-reflection coating and / or anti-reflection structuring, which is designed in such a way that it reduces the reflection of the provided electromagnetic waves off the cover element (2), wherein the layer (5) is arranged at least on the region (X) of the carrier layer (4) through which the electromagnetic waves are to pass, wherein the wall thickness of the cover element (2) is in a range of 1 mm to 8 mm, preferably in the range of 1.5 mm to 5 mm.

An optical article comprising a coating system that imparts anti-reflective properties and hydrophobic properties to the optical article. The coating system includes a hard coating layer on a lens substrate, and alternating layers of a low refractive index metal oxide and a high refractive index metal oxide deposited on the hard coating layer as an anti-reflective coating, or alternating layers of a medium refractive index metal oxide and a high refractive index metal oxide deposited on the hard coating layer as an anti-reflective coating. A fluorine-free hydrophobic coating composition is deposited on the anti-reflective coating to reduce the surface free energy of the anti-reflective surface of the optical article and to improve the overall cleaning performance of the lens surface by rendering the lens surface hydrophobic.

A beam combining device, enabled to combine a first beam with a second beam of a different spectrum into a combined beam, where the combination may be obtained through a device comprising two antireflective coating, a dichroic filter coating, and a reflective coating arranged on a substrate.

To provide an anti-reflective coating that is easy to manufacture. [Solution] An anti-reflective film 100 formed on the optical surface of a substrate 200, having first to fourth layers arranged sequentially from the substrate 200 side, wherein the refractive index of the fourth layer 4 decreases as it moves away from the substrate 200, and when the refractive indices of the first to third layers at a wavelength of 550 nm are n1, n2, and n3 respectively, and the maximum refractive index of the fourth layer 4 at a wavelength of 550 nm is n4, then n1 > n2, n2<n3、n3> The condition n4 is satisfied.

An antireflective coating includes a plurality of first layers, each comprising a first material having a relatively high refractive index; and a plurality of second layers, each comprising a second material having a relatively low refractive index. The total thickness of the first layers, composed of the first material, is about 120 nm or less. Furthermore, when light propagates under total internal reflection, the antireflective coating is configured to absorb about 0.25% or less of the light at each wavelength between about 425 nm and about 495 nm to achieve single reflection of the average of the s-polarization and p-polarization of the light.

The invention relates to an emitting module (36) for a unit (10) for processing hollow bodies (22) made of thermoplastic material, the emitting module (36) comprising: - a main body (44); - an assembly (41) of emitting semiconductor components (40) mounted on a front face (38) of the main body (44), each of which is capable of selectively emitting electromagnetic processing radiation having an emission peak of a determined wavelength; - at least one transparent front window (60) mounted on the front face (38) of the main body to hermetically enclose the assembly (41) of emitting semiconductor components (40), the window (60) being intended to be traversed by the electromagnetic processing radiation; characterized in that at least one face (62, 64) of the window (60) is covered with an anti-reflective coating (66) for the wavelengths corresponding to the emission peak. electromagnetic radiation processing.Figure for the abbreviation: Figure 6.

Provide an initial structure comprising a substrate, a hard mask outward of the substrate, a sacrificial organic layer outward of the hard mask, an anti-reflective coating outward of the sacrificial organic layer, and a patterned photoresist outward of the anti-reflective coating. Etch the initial structure to remove portions of the sacrificial organic layer and the anti-reflective coating not protected by the patterned photoresist down to the hard mask, to form sacrificial organic layer pillars under the patterned photoresist. Trim a critical dimension (CD) of the sacrificial organic layer pillars by etching with a gas that is selective to the anti-reflective coating and the hard mask, to trim sidewalls of the sacrificial organic layer pillars.

Optical elements including YbF3 layers with high transmittance in the LWIR spectral range are described. The YbF3 layer is produced by an ion-assisted deposition process under high voltage conditions. Dense, uniform, and nearly defect-free YbF3 layers are formed. The improved material quality of the YbF3 layers leads to low absorption in the LWIR spectral range, especially at wavelengths above 10.0 microns. The extinction coefficient of the YbF3 layers is less than 0.0400 at a wavelength of 13.5 microns.

An imaging lens assembly having an optical axis includes a lens element assembly including a plurality of lens elements. The lens elements are disposed along the optical axis, and include a first lens element and an anti-reflection coating. The first lens element includes a first object-side surface and a first image-side surface, wherein the optical axis passes through the first object-side surface, and the first image-side surface is disposed relative to the first object-side surface along the optical axis. The anti-reflection coating is disposed on at least one surface of the first object-side surface and the first image-side surface. The anti-reflection coating includes a nano structure layer and an intermediate layer. A main material of the nano structure layer is Aluminium Oxide, and the nano structure layer includes a plurality of ridge-like protrusions extending non-directionally, each of the ridge-like protrusions tapers and extends from a bottom to a top.

The invention discloses a method for forming a photoresist pattern. The method for forming the photoresist pattern comprises the following steps: S1, casting a bottom anti-reflection composition on a semiconductor substrate, and roasting to obtain a bottom anti-reflection coating; s2, coating a photoresist on the bottom anti-reflection coating layer; s3, soft roasting; s4, performing exposure; s5, roasting; and S6, developing. The coating prepared from the bottom anti-reflection composition can effectively reduce the light reflection effect, and the etching process of the anti-reflection coating is avoided.

This application provides a method for avoiding slit defects in mask patterns during self-aligned dual-patterning processes, comprising: Step 1, providing a substrate, and sequentially forming an interlayer dielectric layer, an anti-reflection coating, a titanium nitride layer, a TEOS layer, and a patterned sacrificial layer on the substrate; Step 2, forming a mask layer within the gaps between the patterned sacrificial layers; Step 3, after removing the patterned sacrificial layers, performing a first etching using the mask layer as a mask until the exposed TEOS layer is removed, wherein the mask layer is not etched through during the first etching process; Step 4, performing a second etching using the TEOS layer as a mask until the exposed titanium nitride layer is removed, thereby forming the mask pattern. According to this application, the generation of slit defects can be effectively avoided, while simultaneously expanding the CD window (distance between lithographic patterns).

Implementations for optical elements that include tapered meta-atoms are described. An example apparatus includes a substrate, and meta-atoms on the substrate, wherein each of the meta-atoms has a respective top surface and a respective bottom surface, wherein the bottom surface forms an interface with the substrate. The apparatus further includes an anti-reflective coating on the respective top surface of each of the meta-atoms, wherein the top surface forms an interface with the anti-reflective coating. Each of the meta-atoms has one or more tapered sides connecting the top surface of the meta-atom to the bottom surface of the meta-atom.

A coated article comprising a substrate having an antireflective (AR) coating disposed on a first surface of the substrate is disclosed herein. In some embodiments, a second AR coating is disposed on a second surface of the substrate opposite the first surface. An insulated gas unit (IGU) including the coated article is disclosed herein.

An optical lens comprises a substrate (1) and at least one antireflective coating system arranged on an end face (111) of the substrate, comprising an antireflective multi-layer coating with at least six layers (11, 12, 21, 22, 31, 32, 41, 42) forming different layer pairs, each with a first and second layer, wherein for each of these layer pairs the first layer has a higher refractive index than the second layer, and additionally a layer (2) closest to the substrate comprising at least one element from group 11 of the periodic table. The invention also relates to spectacles and a manufacturing method.

A wireless optical power transmission system comprises a transmitter and a receiver, the transmitter comprising a laser emitting a light beam, a scanning mirror for directing the light beam towards the receiver, and a control unit receiving signals from a detection unit on the receiver and controlling the light beam power and the scanning mirror. The receiver has a photovoltaic cell with a bandgap energy of 0.75-1.2 eV, having a plurality of conductors on the light beam receiving surface. A cover layer of a material blocking illumination having a wavelength outside the wavelength of the laser is provided on the photovoltaic cell. The cover layer can have an anti-reflective coating on its top surface and bottom surface. The detection unit thus generates a signal representing the power of the laser beam impinging on the receiver independent of illumination other than the light beam. The control unit can thus maintain the laser power impinging on the receiver.