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36312results about "Special surfaces" patented technology
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Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film
ActiveUS20090152506A1Orientation can be controlledLow costFrom gel stateFrom solid stateOrganic solventDevice material
In a process for producing an oriented inorganic crystalline film, a non-monocrystalline film containing inorganic crystalline particles is formed on a substrate by a liquid phase technique using a raw-material solution which contains a raw material and an organic solvent, where the inorganic crystalline particles have a layered crystal structure and are contained in the raw material. Then, the non-monocrystalline film is crystallized by heating the non-monocrystalline film to a temperature equal to or higher than the crystallization temperature of the non-monocrystalline film so that part of the inorganic crystalline particles act as crystal nuclei.
Owner:FUJIFILM CORP
Color el display and method for producing the same
ActiveUS20080129195A1Quality improvementHigh color purityDischarge tube luminescnet screensLamp detailsDisplay deviceEngineering
One embodiment of the present invention is a color EL display characterized in that at least color filters, a thin film transistor circuit, an organic EL layer, and a common electrode are laminated in this order on a transparent substrate. Another embodiment of the invention is a method for producing a color EL display comprising the steps of forming color filters or a transparent substrate; forming a thin film transistor circuit; forming an organic EL layer; and forming a common electrode, wherein process temperatures of the steps of forming the thin film transistor circuit and subsequent steps are 200° C. or less.
Owner:TOPPAN PRINTING CO LTD
Transparent conductive film and method for manufacturing the same
ActiveUS20080050595A1Improve economyConductive layers on insulating-supportsSynthetic resin layered productsRocking curveFull width at half maximum
A ZnO-based transparent conductive film has practicable moisture resistance, desired characteristics of a transparent conductive film, and excellent economy. The transparent conductive film is produced by growing ZnO doped with a group III element oxide on a substrate and has a region with a crystal structure in which a c-axis grows along a plurality of different directions. The transparent conductive film produced by growing ZnO doped with a group III element oxide on a substrate has a ZnO (002) rocking curve full width at half maximum of about 13.5° or more.ZnO is doped with a group III element oxide so that the ratio of the group III element oxide in the transparent conductive film is about 7% to about 40% by weight.The transparent conductive film is formed on the substrate with a SiNx thin film provided therebetween.The transparent conductive film is formed on the substrate by a thin film formation method with a bias voltage applied to the substrate.
Owner:MURATA MFG CO LTD
Absorbent articles comprising nanoparticles
Owner:NANO MET ZERO
Method of fabricating a slip ring component
Owner:TYCO ELECTRONICS LOGISTICS AG (CH)
Rolled electrode array and its method for manufacture
InactiveUS20050051427A1Long-term robustnessSemiconductor/solid-state device manufacturingEndoradiosondesOptoelectronicsElectrode array
An electrode array for use in an electrochemical device is provided. The electrode array includes at least one electrode material and at least one insulating material arranged in a spiral configuration. The electrode array is manufactured by forming a composite stack of the at least one electrode material and the at least one insulating material, such that the insulating material(s) surrounds the electrode material(s) after which the stack is rolled into a spiral roll. The spiral roll can be cut, sliced, and / or dissected in numerous ways to form the electrode array of the preferred embodiments. Optionally, the sections can be further processed by machining, polishing, etching, or the like, to produce a curvature or stepped configuration.
Owner:DEXCOM
Processes for the production of electrophoretic displays
ActiveUS7339715B2Electric shock equipmentsElectrophoretic coatingsElectrophoresisPotential difference
A coating of an encapsulated electrophoretic medium is formed on a substrate (106) by dispersing in a fluid (104) a plurality of electrophoretic capsules (102), contacting at least a portion of a substrate (106) with the fluid (104); and applying a potential difference between at least a part of the portion of the substrate (106) contacting the fluid (104) and a counter-electrode (110) in electrical contact with the fluid (104), thereby causing capsules (102) to be deposited upon at least part of the portion of the substrate (106) contacting the fluid (102). Patterned coatings of capsules containing different colors may be deposited in registration with electrodes using multiple capsule deposition steps. Alternatively, a patterned coating may be deposited upon a substrate containing a conductive layer by varying the conductivity of the conductive layer by radiation exposure or by coating portions of the conductive layer with an insulating layer, typically a photoresist.
Owner:E INK CORPORATION
Polymer membranes for continuous analyte sensors
InactiveUS20100096259A1Machining electrodesMicrobiological testing/measurementContinuous measurementAnalyte
Devices and methods are described for providing continuous measurement of an analyte concentration. In some embodiments, the device has a sensing mechanism and a sensing membrane that includes at least one surface-active group-containing polymer and that is located over the sensing mechanism. The sensing membrane may have a bioprotective layer configured to substantially block the effect and / or influence of non-constant noise-causing species.
Owner:DEXCOM
Method for hydrophilizing materials using hydrophilic polymeric materials with discrete charges
A method of rendering materials having hard and soft surfaces hydrophilic or more hydrophilic is disclosed. The method involves hydrophilizing such materials by applying a high energy treatment and charged particles and / or one or more hydrophilic polymeric materials with discrete charges to such materials.
Owner:THE PROCTER & GAMBLE COMPANY
Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
InactiveUS6428859B1Faster efficient meanSimple methodVacuum evaporation coatingSputtering coatingSequential methodHigh density
The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Owner:NOVELLUS SYSTEMS
Method of making an absorbent composite
In a method of making an absorbent composite, a porous, stabilized structure is formed and impregnated with a flowable superabsorbent precursor. The flowable superabsorbent precursor is cross-linked to form a superabsorbent material within the stabilized structure. The surface area of one of the flowable superabsorbent precursor impregnated with the stabilized structure and the superabsorbent material formed within the structure is increased. In one embodiment, the surface is increased by freeze drying the impregnated structure.
Owner:KIMBERLY-CLARK WORLDWIDE INC
Fabrication of low defectivity electrochromic devices
ActiveUS20100243427A1High level of defectivityVacuum evaporation coatingSputtering coatingArchitectural glassGas phase
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and / or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.
Owner:VIEW INC
Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film
ActiveUS8202365B2Orientation can be controlledLow costFrom gel stateFrom solid stateOrganic solventCrystal structure
Owner:FUJIFILM CORP
Methods of forming a coating for a prosthesis
InactiveUS6503556B2Increase the amount addedIncrease the number ofRadiation applicationsGlovesProsthesisImplanted device
Methods of forming a coating onto an implantable device or endoluminal prosthesis, such as a stent, are provided. The coating may be used for the delivery of an active ingredient. The coating may have a selected pattern of interstices for allowing a fluid to seep through the coating in the direction of the pattern created.
Owner:ABBOTT CARDIOVASCULAR
Method for vapor deposition of a metal compound film
InactiveUS20020172768A1Improve film propertiesEfficiently stackedTransistorSemiconductor/solid-state device detailsLanthanideNitrogen
A method for forming a metal compound film includes alternate irradiation of an organometal compound and oxygen or nitrogen radicals to deposit monoatomic layers of the metal compound. The organometal compound includes zirconium, hafnium, lanthanide compounds. The resultant film includes little residual carbon and has excellent film characteristic with respect to leakage current.
Owner:RENESAS ELECTRONICS CORP
Integration of ALD tantalum nitride and alpha-phase tantalum for copper metallization application
InactiveUS20030082307A1Pretreated surfacesSemiconductor/solid-state device manufacturingMetal interconnectTantalum nitride
A method for forming a metal interconnect on a substrate is provided. The method includes depositing a refractory metal-containing barrier layer having a thickness less than about 20 angstroms on at least a portion of a metal layer by alternately introducing one or more pulses of a metal-containing compound and one or more pulses of a nitrogen-containing compound. The method also includes depositing a seed layer on at least a portion of the barrier layer, and depositing a second metal layer on at least a portion of the seed layer. The barrier layer provides adequate barrier properties and allows the grain growth of the metal layer to continue across the barrier layer into the second metal layer thereby enhancing the electrical performance of the interconnect.
Owner:APPLIED MATERIALS INC
Method for depositing a nanolaminate film by atomic layer deposition
InactiveUS6930059B2Simple methodQuality improvementTransistorSemiconductor/solid-state device manufacturingGate dielectricHafnium
Owner:SHARP LAB OF AMERICA INC
Continuous analyte sensors and methods of making same
InactiveUS20110027458A1Low production costMinimize changesHot-dipping/immersion processesVacuum evaporation coatingAnalyteSolvent
Owner:DEXCOM
Atomic layer deposition method of depositing an oxide on a substrate
The invention includes atomic layer deposition methods of depositing an oxide on a substrate. In one implementation, a substrate is positioned within a deposition chamber. A first species is chemisorbed onto the substrate to form a first species monolayer within the deposition chamber from a gaseous precursor. The chemisorbed first species is contacted with remote plasma oxygen derived at least in part from at least one of O2 and O3 and with remote plasma nitrogen effective to react with the first species to form a monolayer comprising an oxide of a component of the first species monolayer. The chemisorbing and the contacting with remote plasma oxygen and with remote plasma nitrogen are successively repeated effective to form porous oxide on the substrate. Other aspects and implementations are contemplated.
Owner:MICRON TECH INC
Method And Apparatus For Making Disposable Absorbent Article With Absorbent Particulate Polymer Material And Article Made Therewith
A method for making a disposable absorbent core comprises depositing absorbent particulate polymer material from a plurality of reservoirs in a printing roll onto a substrate disposed on a grid of a support which includes a plurality of cross bars extending substantially parallel to and spaced from one another so as to form channels extending between the plurality of cross bars. The plurality of reservoirs in the first peripheral surface are arranged in an array comprising rows extending substantially parallel to and spaced from one another. The support and printing roll are arranged such that the plurality of cross bars are substantially parallel to the rows of the plurality of reservoirs and the absorbent particulate polymer material is deposited on the substrate in a pattern such that the absorbent particulate polymer material collects in rows on the first substrate formed between the first plurality of cross bars. A thermoplastic adhesive material is deposited on the absorbent particulate polymer material and the substrate to cover the absorbent particulate polymer material on the substrate and form an absorbent layer. A disposable absorbent article and apparatus for making an absorbent article are also disclosed.
Owner:THE PROCTER & GAMBLE COMPANY
Continuous analyte sensors and methods of making same
InactiveUS20110027453A1Low production costMinimize changesHot-dipping/immersion processesPharmaceutical containersAnalyteSolvent
Described here are embodiments of processes and systems for the continuous manufacturing of implantable continuous analyte sensors. In some embodiments, a method is provided for sequentially advancing an elongated conductive body through a plurality of stations, each configured to treat the elongated conductive body. In some of these embodiments, one or more of the stations is configured to coat the elongated conductive body using a meniscus coating process, whereby a solution formed of a polymer and a solvent is prepared, the solution is continuously circulated to provide a meniscus on a top portion of a vessel holding the solution, and the elongated conductive body is advanced through the meniscus. The method may also comprise the step of removing excess coating material from the elongated conductive body by advancing the elongated conductive body through a die orifice. For example, a provided elongated conductive body 510 is advanced through a pre-coating treatment station 520, through a coating station 530, through a thickness control station 540, through a drying or curing station 550, through a thickness measurement station 560, and through a post-coating treatment station 570.
Owner:DEXCOM
Liquid immersion type exposure apparatus
InactiveUS20050233081A1High resolutionLow refractive indexSemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusLiquid mediumCollection system
Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
Owner:CANON KK
Photoluminescent Compositions, Methods of Manufacture and Novel Uses
InactiveUS20120183677A1High strengthImprove durabilityPhotometryBleaching apparatusPhotoluminescenceElectromagnetic radiation
Owner:PERFORMANCE INDICATOR LLC
Reactive site deactivation against vapor deposition
Methods and structures relating to the formation of mixed SAMs for preventing undesirable growth or nucleation on exposed surfaces inside a reactor are described. A mixed SAM can be formed on surfaces for which nucleation is not desired by introducing a first SAM precursor having molecules of a first length and a second SAM precursor having molecules of a second length shorter than the first. Examples of exposed surfaces for which a mixed SAM can be provided over include reactor surfaces and select surfaces of integrated circuit structures, such as insulator and dielectric layers.
Owner:ASM IP HLDG BV
Organic photovoltaic devices
InactiveUS6657378B2Improve efficiencyImprove equipment efficiencyDischarge tube luminescnet screensLamp detailsOrganic solar cellElectron blocking layer
The present invention generally relates to organic photosensitive optoelectronic devices. More specifically, it is directed to organic photovoltaic devices, e.g., organic solar cells. Further, it is directed to an optimized organic solar cell comprising multiple stacked subcells in series. High power conversion efficiency are achieved by fabrication of a photovoltaic cell comprising multiple stacked subcells with thickness optimization and employing an electron blocking layer.
Owner:THE TRUSTEES FOR PRINCETON UNIV
Electrochromic devices
ActiveUS20100245973A1Improve equipment reliabilityImprove performanceVacuum evaporation coatingSputtering coatingElectricityLithium
Prior electrochromic devices frequently suffer from poor reliability and poor performance. Some of the difficulties result from inappropriate design and construction of the devices. In order to improve device reliability two layers of an electrochromic device, the counter electrode layer and the electrochromic layer, can each be fabricated to include defined amounts of lithium. Further, the electrochromic device may be subjected to a multistep thermochemical conditioning operation to improve performance. Additionally, careful choice of the materials and morphology of some components of the electrochromic device provides improvements in performance and reliability. In some devices, all layers of the device are entirely solid and inorganic.
Owner:VIEW INC
Low Temperature Deposition of Silicon-Containing Films
ActiveUS20100304047A1Low deposition temperatureSemiconductor/solid-state device manufacturingSpecial surfacesLow temperature depositionDeposition temperature
This invention discloses the method of forming silicon nitride, silicon oxynitride, silicon oxide, carbon-doped silicon nitride, carbon-doped silicon oxide and carbon-doped oxynitride films at low deposition temperatures. The silicon containing precursors used for the deposition are monochlorosilane (MCS) and monochloroalkylsilanes. The method is preferably carried out by using plasma enhanced atomic layer deposition, plasma enhanced chemical vapor deposition, and plasma enhanced cyclic chemical vapor deposition.
Owner:TOKYO ELECTRON LTD +1
Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectrics
ActiveUS8445075B2Constant ratePrevents undercuts and CD lossVacuum evaporation coatingPretreated surfacesNitrogenThin layer
Methods of processing films on substrates are provided. In one aspect, the methods comprise treating a patterned low dielectric constant film after a photoresist is removed from the film by depositing a thin layer comprising silicon, carbon, and optionally oxygen and / or nitrogen on the film. The thin layer provides a carbon-rich, hydrophobic surface for the patterned low dielectric constant film. The thin layer also protects the low dielectric constant film from subsequent wet cleaning processes and penetration by precursors for layers that are subsequently deposited on the low dielectric constant film.
Owner:APPLIED MATERIALS INC
Compositions for organic electroluminescent device and organic electroluminescent device
InactiveUS20060182993A1Reduce inactivationChange propertiesDischarge tube luminescnet screensDuplicating/marking methodsSolubilityHole injection layer
Disclosed are compositions for an organic electroluminescent device favorably used for forming a hole injection layer and a hole transport layer of the organic electroluminescent device by a wet film forming method. The compositions for the organic electroluminescent device, which are composite solutions prepared by dissolving hole transport materials such as aromatic diamine compounds and an electron acceptor such as tri(pentafluorophenyl)boron in a solvent that contains an ether solvent and / or an ester solvent whose water solubility at 25° C. is 1 weight % or less in the solvent, with a concentration of 10 weight % or higher in the compositions.
Owner:MITSUBISHI CHEM CORP
Methods of making garments having stretchable and conductive ink
InactiveUS20140318699A1Stable and continuous positioningRobust detectionPrinted circuit manufactureResistor manufactureAdhesiveSolvent
Methods of forming garments having one or more stretchable conductive ink patterns. Described herein are method of making garments (including compression garments) having one or more highly stretchable conductive ink pattern formed of a composite of an insulative adhesive, a conductive ink, and an intermediate gradient zone between the adhesive and conductive ink. The conductive ink typically includes between about 40-60% conductive particles, between about 30-50% binder; between about 3-7% solvent; and between about 3-7% thickener. The stretchable conductive ink patterns may be stretched more than twice their length without breaking or rupturing.
Owner:L I F E
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