58results about How to "Low refractive index" patented technology

The invention belongs to the technical field of films, and relates to an anti-dazzle anti-reflection anti-fingerprint film, which comprises a transparent support body, an anti-dazzle hardening coating and an anti-reflection coating, and the anti-dazzle hardening coating is obtained by coating and curing a coating liquid prepared from the following components in parts by mass: 1 to 40 parts of resin 1, 1.8 to 4.8 parts of resin 2, 0.75 to 3.25 parts of a photoinitiator and 0.3 to 1.75 parts of a thermal curing agent, the anti-glare coating is prepared from the following components in parts by weight: 0.75 to 4.75 parts of anti-glare particles, 0.25 to 1.25 parts of a flatting agent 1, 0.03 to 0.15 part of a flatting agent 2 and 44.05 to 76.12 parts of a solvent, the antireflection coating is obtained by coating and curing a coating liquid prepared from the following components in parts by mass: 0.47 to 1.8 parts of resin 2, 2.4 to 6.0 parts of resin 3, 0.12 to 0.75 part of a photoinitiator, 0.1 to 0.45 part of a thermal curing agent, 0.18 to 1.65 parts of a flatting agent 3, 0.56 to 2.4 parts of modified hollow silicon dioxide, 0.1 to 1.25 parts of a wetting dispersant and 85.7 to 95.74 parts of a solvent. According to the technical scheme provided by the invention, the anti-glare and low-reflection coating has good anti-fingerprint performance, coating adhesive force and friction resistance while having anti-glare and low-reflection performance.

The invention belongs to the field of protective films, and relates to a high-transparency base film for a protective film and a preparation method of the high-transparency base film. The base film for the protective film comprises a support body and a protective film coating layer, wherein the protective film coating layer is coated on at least one surface, in contact with air, of the support body. The protective film coating contains a conductive material, modified acrylic resin, a cross-linking agent and deionized water, so that the protective film coating can be coated on a base material to form a film uniformly. Therefore, by utilizing the synergistic effect of the water-based conductive material and the modified acrylic resin under the online coating process, the surface resistance of the prepared base film coating for the protective film can reach 104-1011 omega, and the protective film has excellent and stable antistatic property and high transparency.

The invention relates to the technical field of optical resin, and particularly discloses a synthesis process of polysiloxane resin with a low refractive index. The synthesis process comprises the following steps: taking amino double-terminated polydimethylsiloxane and isocyanate as main raw materials, feeding the amino double-terminated polydimethylsiloxane and the isocyanate according to a molar ratio of 1: (1-2), and reacting in an inert gas atmosphere to obtain the low-refractive-index polysiloxane resin. A target product can be obtained through direct reaction in a solvent-free state, the refractive index of the target product is controlled to be 1.41-1.44, the elongation at break can reach 200-400%, and the target product has excellent elasticity; the target product can be directly subjected to subsequent melt extrusion, is more environment-friendly compared with a solvent method, and is more suitable for manufacturing an elastomer multilayer optical film.

The invention relates to the technical field of optical thin films, and provides an optical thin film and a preparation method thereof.The preparation method comprises the steps that S100, polyimide, polycarbonate and polymethyl methacrylate are blended and then subjected to melt extrusion, and a base film layer is obtained; and S200, sequentially performing plasma treatment and sputtering treatment on the base film layer to obtain the optical thin film, wherein S200 comprises the following steps: S210, adopting oxygen as plasma gas, performing plasma treatment on the base film layer, and cooling to room temperature to obtain a first intermediate film layer; s220, carrying out first sputtering treatment on the first intermediate film layer by adopting a silicon dioxide target material in an argon atmosphere to obtain a second intermediate film layer; and S230, carrying out second sputtering treatment on the second intermediate film layer by adopting a titanium target material in a mixed gas atmosphere of argon and oxygen to obtain the optical thin film. According to the method, material blending, plasma treatment and sputtering treatment are adopted, and the overall performance of the optical thin film is remarkably improved.

The invention discloses a covering layer structure and an organic electroluminescent device, and relates to the technical field of organic electroluminescence, the covering layer structure comprises a first covering layer and a second covering layer located on the first covering layer, and the refractive index of the second covering layer is larger than that of the first covering layer; wherein the first covering layer comprises a compound shown as a formula I: # imgabs0 #, the compound of the first covering layer adopts a spiro ring as a main body structure, and the outer side of the spiro ring is connected with an alkyl group, so that the glass-transition temperature of the material can be kept at a relatively high level, and the material can have a low refractive index; when the first covering layer and the second covering layer with the high refractive index are used in a matched mode, the device can have excellent luminous efficiency and color purity at the same time.

The laser chip and its fabrication method disclosed herein include a first reflective layer, an active region, an oxide layer, and a second reflective layer sequentially disposed on a substrate. The laser chip has a first trench and a second trench for oxidizing and etching the oxide layer. A first connecting portion connects one end of the first trench to one end of the second trench, and a second connecting portion connects the other end of the first trench to the other end of the second trench. Due to the influence of crystal anisotropy on the oxidation rate, and the mutual coordination of the first and second connecting portions on the oxidation rate, the oxide aperture includes a first oxide arc, a second oxide arc, a third oxide arc, and a fourth oxide arc. The first and second oxide arcs are arranged opposite each other, as are the third and fourth oxide arcs. The third and fourth oxide arcs have different radii of curvature, forming a specific irregular morphology. The oxide aperture based on the irregular morphology can effectively suppress transverse multimode lasing of the optical signal and reduce mode degeneracy.

The invention provides a red-light nitride epitaxial wafer, a preparation method thereof and a Micro-LED. The red-light nitride epitaxial wafer comprises a sapphire substrate, an insertion structure, an n-type nitride pattern structure layer, a light-emitting layer and a p-type metal nitride layer, the insertion structure penetrates through the n-type nitride pattern structure layer, the light-emitting layer and part of the p-type metal nitride layer and comprises a composite Si nano-column and a composite regulation and control layer, and the composite Si nano-column comprises a Si nano-column and a semi-ellipsoid structure; the composite regulation and control layer comprises a protection layer and a buffer layer, the protection layer is arranged on the outer wall of the Si nano-column, and the buffer layer is arranged on the area between the adjacent composite Si nano-columns; and an n-type nitride pattern structure layer, a light-emitting layer and a p-type metal nitride layer are laminated on the buffer layer between the adjacent composite Si nano columns. The In component merging and uniformity can be improved, the light-emitting efficiency and brightness of the Micro-LED are improved, the half-peak width of the light-emitting wavelength is reduced, and the color purity of display application is improved.

This disclosure provides a semiconductor laser, comprising: a substrate; an epitaxial assembly disposed on the substrate and configured to generate laser light, wherein a channel is formed by etching downwards at both ends of the epitaxial assembly in a lateral direction; and a ridge waveguide assembly, comprising: two first electrode waveguides respectively disposed within the channel and forming an ohmic contact with an ohmic contact layer of the epitaxial assembly, wherein the refractive index of the first electrode waveguides is lower than the refractive index of the ohmic contact layer to limit the spread of the lateral light field and improve the confinement factor of the fundamental mode; a lower electrode disposed on the substrate on a side opposite to the epitaxial assembly; and an upper electrode disposed on the ridge waveguide assembly and forming an ohmic contact with the ohmic contact layer and the ridge waveguide assembly, adapted to cooperate with the lower electrode to form an electron injection channel.

The present invention provides a low-radiation anti-fouling coated glass and a preparation method thereof, belonging to the technical field of glass preparation; the preparation process thereof comprises the following steps: preparation of a fluorine-tantalum doped zinc oxide film precursor solution; synthesis of a chain transfer agent; preparation of a modified fluorine-containing copolymer; preparation of a functional film mixed solution; cleaning of a glass substrate; and low-radiation anti-fouling coated glass. The present invention adopts a sandwich structure coating of a zinc oxide film doped with fluorine and tantalum, a silver film, and a zinc oxide film doped with fluorine and tantalum. In the sandwich structure, the silver film is located in the middle layer, and the zinc oxide films doped with fluorine and tantalum are located on both sides. The sandwich structure forms a multilayer film system, which greatly improves the reflectivity of the glass to infrared radiation and achieves a better low-radiation effect. Moreover, the functional film is coated to further achieve a low-radiation effect and increase the anti-fouling ability.

The present invention provides a rare earth-doped optical fiber for suppressing mode instability effects and a preparation method thereof, and relates to the technical field of special optical fiber preparation. The preparation method first deposits a channel region with a low refractive index in a quartz tube, and then sequentially prepares a core passive region and a core active region with different doping components to achieve different thermo-optic coefficients in the local region of the core. The present invention reduces the thermo-optic coefficient of the optical fiber and weakens the nonlinear inter-mode coupling effect by introducing a negative thermo-optic coefficient material, thereby effectively suppressing MI; at the same time, the method of rare earth ion center doping is adopted to reduce the high-order mode gain in the case of a large core, and then suppress the generation of high-order modes through a mode competition mechanism, thereby increasing the proportion of the fundamental mode; the low numerical aperture and channel structure design enable the optical fiber to have a higher high-order mode loss, suppress the fundamental mode-high-order mode coupling effect, further increase the MI threshold, and improve the beam quality.

Disclosed an optical laminate in which at least two or more optical function layers with visible light transmittance are laminated, wherein the optical function layers include a first function layer that includes at least cerium oxide, has a refractive index in a range of 1.8 or more and 2.6 or less at a wavelength of 550 nm, and has a film thickness in a range of 60 nm or more and 130 nm or less, and a second function layer that is formed in contact with an upper surface of the first function layer, has a refractive index in a range of 1.4 or more and 1.6 or less at a wavelength of 550 nm, and has a film thickness in a range of 80 nm or more and 100 nm or less.

This invention belongs to the field of coating technology, specifically relating to a super-reflective photovoltaic enhancement coating, its preparation method, and its application. The coating raw materials include water-based acrylic resin, filler, titanium dioxide, dispersant, defoamer, and leveling agent; wherein the filler includes barium sulfate and / or core-shell particles, and the barium sulfate includes at least one of nano-sized barium sulfate, submicron-sized barium sulfate, micron-sized barium sulfate, and modified barium sulfate. The preparation method involves: adding the filler to deionized water, adding the dispersant, and dispersing; adding the water-based acrylic resin and stirring; adding titanium dioxide, defoamer, and leveling agent to adjust the fineness; adjusting the viscosity; and filtering to obtain the super-reflective photovoltaic enhancement coating. The coating is applied to photovoltaic modules. This invention's coating has the advantages of high reflectivity, full-band coverage, low cost, and stable performance.

This application provides a TOPCon solar cell with improved leakage current and its fabrication method, relating to the photovoltaic field. After phosphorus diffusion, a patterning process is performed on the front edge and central axis of the silicon wafer using a laser, followed by acid washing and alkali washing to obtain an alkali-washed silicon wafer. An Al2O3 thin film is prepared on the front surface of the alkali-washed silicon wafer using plasma ALD, followed by annealing to form an Al2O3 layer. SiO2 is then prepared on the surface of the Al2O3 layer using plasma ALD. x N y Layer; SiH4, CM4 and CH3M gases are introduced, and ALD is used on SiO2. x N y SiN layer surface x M layer; M is a halogen element, SiN x Halogen elements in the M layer move along the path close to SiO₂ x N y One side of the layer to the side away from SiO x N y The content gradient on one side of the layer decreases; electrode printing, sintering, and light injection are performed to obtain TOPCon solar cells with improved leakage current. This can reduce recombination loss and leakage current.

The present invention relates to an enhanced lens that is easy to repair and a preparation method thereof, comprising a lens substrate, a silver layer with a thickness of 2 to 4 nm plated on the outer side of the lens substrate, and an anti-reflection film layer plated on the outer side of the silver layer. The lens substrate is glass with a refractive index range of 1.46-2.1 or a crystal with a refractive index range of 1.38-2.4. The anti-reflection film layer comprises a first H4 film layer with a thickness of 25.1-28.7 nm, a first MgF2 film layer with a thickness of 35.4-33.2 nm, a second H4 film layer with a thickness of 130.4-139.0 nm, and a second MgF2 film layer with a thickness of 87.1-92.2 nm, which are stacked in sequence from the inside to the outside. The reflective enhancement lens uses ultra-thin AG as the transition layer between the substrate and the anti-reflection film AR film layer. The ultra-thin AG layer has low refractive index and low absorption characteristics in the visible light band, which will not weaken the anti-reflection effect of the anti-reflection film. In addition, the AG layer can be removed by chemical immersion when there is a problem with the coating quality, which has the effect of completely stripping off the AR film, and then the anti-reflection film can be re-deposited. This can increase the repair rate of the reflective enhancement lens, reduce production costs, and make outstanding contributions to industrial applications.

The invention discloses a high-refractive-index wear-resistant optical coating and a preparation method thereof. The high-refractive-index coating comprises the following components in percentage by weight: 40-65% of a UV oligomer, 15-40% of a high-refractive-index nano inorganic substance, 1-5% of a modified wear-resistant inorganic substance, 0-5% of a high-water-drop-angle additive and 1-6% of a photoinitiator. According to the invention, the common polyurethane acrylate prepolymer is matched with the high-refractive-index nano inorganic substance and the modified wear-resistant inorganic substance to achieve the effects of high refractive index and wear resistance; by modifying the wear-resistant inorganic matter, the surface of the wear-resistant inorganic matter is provided with reactive groups which can react with a polymer, so that the wear resistance can be improved; compared with a common high-refractive-index coating, high-refractive-index resin does not need to be used as a raw material, the refractive index is adjusted through the nanofiller, and the refractive index can be freely designed within a certain range.

The invention relates to the technical field of optical films, in particular to an OCA optical film and a preparation method thereof.The OCA optical film comprises a five-layer structure which sequentially comprises a fluorine-containing special-shaped film layer, a silicon-containing adhesive layer, a modified PET matrix, a silicon-containing adhesive layer and a fluorine-containing special-shaped film layer, and the raw material for preparing the silicon-containing adhesive layer is a silicon-containing adhesive. The OCA optical film provided by the invention has excellent aging and yellowing resistance, high temperature resistance and flexibility, and also has better light transmittance, transmittance and flame retardant property and low refractive index.

The application belongs to the technical field of photovoltaic glass coating, and relates to a low-refractive-index core-shell structure nanoparticle, a coating solution containing the nanoparticle, a coating and a photovoltaic module. The low-refractive-index core-shell structure nanoparticle comprises a core body and a silica shell layer covering the outer surface of the core body, and the core body is a hollow or porous magnesium fluoride core. The hollow or porous magnesium fluoride core contained in the core-shell structure nanoparticle can introduce air phase, has a lower equivalent refractive index, and thus improves the light transmittance of photovoltaic glass. The silica shell layer forms a protective coating on the magnesium fluoride core, reduces the entry of water vapor and adhesive into the cavity or pore structure of the core body, reduces the risk of core body collapse, pore structure filling or structure degradation, improves the durability and mechanical strength of the coating, and thus improves the long-term stability of the coating.

The application discloses a preparation method of a low-refractive composite powder and application thereof. The preparation method of the low-refractive composite powder comprises the following steps: mixing submicron powder with a mixture containing tetraethyl orthosilicate, heating, and reacting under an acidic condition to obtain a first sol slurry; mixing and stirring the first slurry with a binder to obtain a second slurry; and performing spray granulation and calcination on the second slurry to obtain a low-refractive core-shell structure composite powder. According to the technical scheme, the high-refractive or high-absorbance submicron powder, which is not suitable for or cannot be used for 3D printing, is covered with the silicon dioxide nanoparticles formed by the reaction of the mixture containing tetraethyl orthosilicate on the surface of the submicron powder, so that the refractive index or the absorbance of the submicron powder is reduced, the refractive index difference between the ceramic powder material which is difficult to solidify or cannot be solidified and the photosensitive resin is reduced, and the solidification performance of the ceramic material is improved.

A novel compound for a capping layer, and an organic light emitting device containing the same are disclosed.

This invention provides an antireflective coating, comprising: a substrate; and alternatingly stacked high-refractive-index layers and low-refractive-index layers along the thickness direction of the substrate, wherein the high-refractive-index layers are made of titanium pentoxide and the low-refractive-index layers are made of silicon aluminum oxide; the alternatingly stacked high-refractive-index and low-refractive-index layers along the thickness direction of the substrate sequentially include a first low-refractive-index layer, a first high-refractive-index layer, a second low-refractive-index layer, a second high-refractive-index layer, a third low-refractive-index layer, a third high-refractive-index layer, and a fourth low-refractive-index layer; the physical thickness of the second high-refractive-index layer is 143nm-130nm, and the physical thickness of the fourth low-refractive-index layer is 123nm-130nm. This invention improves the adhesion between the deposited antireflective coating and the substrate, and reduces the reflectivity of the antireflective coating in the near-infrared range.

The present invention discloses a low-refractive adhesive composition, a tape product and a preparation method thereof, wherein the low-refractive adhesive composition comprises the following components by weight: 40-85 parts of a long-chain acrylate monomer (containing 7 or more C atoms on the main chain), 5-15 parts of a hydroxyl- or carboxyl-containing propionate functional monomer, 10-50 parts of a fluorine-containing acrylate monomer, 50-200 parts of a solvent and 0.2-2 parts of an initiator. The present invention prepares an optically transparent low-refractive adhesive composition, the refractive index of which can reach less than 1.4, the bonding strength of which can reach more than 10N, and the tape product also has high transmittance and low haze; the tape product prepared based on the low-refractive adhesive composition has excellent optical properties, step filling properties, bonding properties and low refractive index, can be used for bonding of equipment materials such as VR and AR, and has good application prospects.

The invention relates to a glass substrate (10) with a multilayer coating comprising a protective layer (P) of a boron-doped silicon oxide, the boron-doped silicon oxide comprising Si, O, B, and OH groups, and the boron content being between 4 at% and 12 at%. The invention further comprises a method for depositing a boron-doped silicon oxide layer on a glass substrate by means of PECVD of the linear hollow cathode type, said boron-doped silicon oxide layer comprising Si, O, B, and OH groups, and wherein the boron content is between 4 at% and 12 at%.

The utility model belongs to the technical field of optical fiber light guide bars, and particularly relates to an optical fiber assembly for dental diagnosis and treatment, which comprises a light guide component and a connector fixed on the light guide component and used for connecting the light guide component with a dental curing machine, a convex block for extruding and expanding the rubber ring outwards is arranged in the plug head in a sliding manner, and the expansion action is realized by the thrust of the tail end in the inserting process of the plug head and the curing machine; it can be understood that the inner cladding of the optical fiber uses polytetrafluoroethylene to realize low-refractive-index total reflection, reduce light leakage and have high chemical stability; the middle layer reduces interface scattering and refractive index through silicon resin so as to inhibit light loss; an outer cladding layer is aluminized to reflect lateral light leakage and resist high temperature; and meanwhile, a linkage mechanism of the convex block and the rubber ring is arranged, and the plugging action of the connector and the expansion of the rubber ring are synchronously controlled through a linkage ring, so that the plugging convenience and the connection stability are realized.

The embodiment of the invention provides a lens system, a fingerprint identification device and terminal equipment. The lens system comprises a first lens and a second lens which are sequentially arranged from an object side to an image side; the first lens is a lens with negative focal power, and the surface, facing the object side, of the first lens is the surface with the largest size in the lens system; the second lens is a lens with positive focal power; the maximum effective size D11 of the surface, facing the object side, of the first lens and the maximum effective size D21 of the surface, facing the object side, of the second lens meet the following conditions: 0.2 lt; (D11-D21) / THlt; tH is the distance from the surface, facing the object side, of the first lens to the surface, facing the object side, of the second lens in the optical axis direction; the maximum image height Y ', the focal length f and the optical length CTL of the lens system on an imaging surface meet the following conditions: 0.5 lt; y ' / (f * CTL) lt; 1.24, the optical length CTL represents the distance from the surface, facing the object side, of the first lens to the imaging surface. According to the technical scheme, the lens system has a small horizontal direction size and good imaging performance.

This application relates to the field of optical thin film technology, and more particularly to a diffusion film, its preparation method, and its application. A diffusion film is provided, comprising a substrate and a diffusion film disposed on any surface of the substrate. The diffusion film is prepared from components with the following mass percentages: 0.5%–10% diffusion particles and 90–99.5% solvent. The resulting diffusion film exhibits high haze, high clarity, and high light transmittance. The provided formula is simple, reduces the use of other components, is low in cost, facilitates the dispersion of diffusion particles, achieves ideal light diffusion effects, and is suitable for widespread use.

The invention discloses a hollow silicon dioxide nanoparticle, a preparation method thereof and an obtained product, the hollow silicon dioxide nanoparticle provided by the invention has an average hollow rate of 50%-70%, an average particle size of 20-80nm and a hydroxyl content of 16%-25% on the surface, the hollow silicon dioxide nanoparticle provided by the invention can exist stably, and the hollow silicon dioxide nanoparticle can be used as a hollow silicon dioxide nanoparticle. The hollow silicon dioxide nanoparticles are not easy to generate hard agglomeration or soft agglomeration and are dispersed in an organic system without generating precipitates, and in addition, the hollow silicon dioxide nanoparticles have a high cavity rate and a proper content of silicon hydroxyl, so that the refractive index of the particles is reduced, and the anti-reflection performance of the anti-reflection film is improved.