187results about How to "Low refractive index" patented technology

The embodiment of the invention discloses a microscope objective optical system, a microscope objective and a wafer detection microscope, and relates to the field of optics. The system is sequentially provided with a first lens group, a second lens group and a third lens group along the same optical axis from an image space to an object space; wherein the third lens group has positive focal power and is used for collecting light beams; the second lens group has negative focal power, the first lens group has positive focal power, the second lens group and the third lens group are used for correcting and compensating the optical system, and the second lens group comprises at least two lenses made of materials with different dispersion coefficients. The second lens group and the third lens group with correction and compensation functions are arranged, so that the optical system can meet the microscopic requirement of an ultra-wide working spectrum range, and the imaging quality is ensured.

The invention discloses a bending-resistant, high-rubber and wear-resistant anti-reflection film and a preparation method thereof. The anti-reflection film comprises a base material layer, a hardened layer, a high-refractive-index layer and a low-refractive-index layer which are sequentially stacked, the hardened layer is obtained by coating the base material layer with hardened layer coating liquid and then curing the hardened layer coating liquid; the hardened layer coating liquid is prepared from the following raw materials in parts by weight: 50-80 parts of hardened resin; 10 to 30 parts of flexible resin; 5-20 parts of a modified inorganic nanoparticle dispersion liquid; 3-6 parts of a first photoinitiator; 50 to 100 parts of a first solvent; wherein the flexible resin is flexible vinyl resin which is prepared by modifying epoxy vinyl ester resin through carbamic acid ester. According to the invention, optical design, formula design, thickness design and the like are carried out on a plurality of coatings, so that the requirements of appearance uniformity, hue uniformity and strong bonding force among laminated layers of the three coatings can be met, and the anti-reflection film has excellent antifouling, scratch-resistant, rubber friction-resistant and bending-resistant properties.

The invention relates to a scratch-resistant modified lens resin material and a preparation process thereof. The lens resin material comprises the following components in percentage by mass: 85-95% of CR-39 resin, 1-3% of nano silicon dioxide, 3-7% of a polyurethane cross-linking agent, 0.1-1% of a surfactant and a proper amount of a solvent for preparing nano particle dispersion liquid. Through proportioning and combination of the components, the resin material has excellent scratch resistance and keeps good optical and mechanical properties at the same time. The preparation process comprises the following steps: preparing a nanoparticle dispersion liquid, modifying the CR-39 resin, carrying out injection molding and preliminary curing, taking out and carrying out final curing, polishing the surface of the lens, coating a scratch-resistant coating and carrying out curing. Through the process steps, a firm scratch-resistant coating is formed on the surface of the lens, and the scratch resistance of the lens is further improved.

The invention belongs to the technical field of films, and relates to an anti-dazzle anti-reflection anti-fingerprint film, which comprises a transparent support body, an anti-dazzle hardening coating and an anti-reflection coating, and the anti-dazzle hardening coating is obtained by coating and curing a coating liquid prepared from the following components in parts by mass: 1 to 40 parts of resin 1, 1.8 to 4.8 parts of resin 2, 0.75 to 3.25 parts of a photoinitiator and 0.3 to 1.75 parts of a thermal curing agent, the anti-glare coating is prepared from the following components in parts by weight: 0.75 to 4.75 parts of anti-glare particles, 0.25 to 1.25 parts of a flatting agent 1, 0.03 to 0.15 part of a flatting agent 2 and 44.05 to 76.12 parts of a solvent, the antireflection coating is obtained by coating and curing a coating liquid prepared from the following components in parts by mass: 0.47 to 1.8 parts of resin 2, 2.4 to 6.0 parts of resin 3, 0.12 to 0.75 part of a photoinitiator, 0.1 to 0.45 part of a thermal curing agent, 0.18 to 1.65 parts of a flatting agent 3, 0.56 to 2.4 parts of modified hollow silicon dioxide, 0.1 to 1.25 parts of a wetting dispersant and 85.7 to 95.74 parts of a solvent. According to the technical scheme provided by the invention, the anti-glare and low-reflection coating has good anti-fingerprint performance, coating adhesive force and friction resistance while having anti-glare and low-reflection performance.

The invention belongs to the technical field of organic photoelectric materials, and discloses a high-transparency high-refractive-index organic polymer material as well as a preparation method and application thereof. According to the organic polymer material, an acrylic monomer with a spiro structure and a monomer with disulfydryl are subjected to free radical polymerization to obtain a polysulfide polymer with a main chain containing the spiro structure, and the polymer shows high transparency and high refractive index. According to the invention, the monomer with a spiro structure is polymerized with the disulfydryl monomer through sulfydryl-sparse click polymerization at normal temperature or photopolymerization reaction under ultraviolet light, so that the material has high refractive index and high transparency and also has low birefringence. The all-organic polymer material has wide application prospects in the fields of organic light-emitting diodes, micro-lens elements in double charge-coupled devices, high-performance complementary image sensors, all-polymer optoelectronic devices, polymer-based optical waveguides, photovoltaics, storage devices and the like.

The invention discloses a double anti-UV antireflection film and a preparation method thereof. The double anti-UV antireflection film comprises an anti-UV optical thin film, an anti-UV hardened coating formed on the surface of the anti-UV optical thin film and a low-refractive-index anti-UV coating formed on the surface of the anti-UV hardened coating. According to the invention, the problems of coating shedding, mechanical performance reduction and the like caused by too fast aging of the material can be effectively prevented; wherein the ultraviolet absorber can prevent ultraviolet rays from entering the resin polymer to cause degradation in the resin, so that the degradation speed of the resin polymer is greatly slowed down; as a free radical capturing agent, the light stabilizer can cut off an oxidation chain reaction in the photooxidation process, the degradation rate of the resin polymer can be remarkably reduced, and the situation that the appearance and mechanical performance of the material become poor due to degradation of the material is prevented; the inorganic particles added in the coating liquid can also be used as a light shielding agent to absorb or reflect ultraviolet rays, so that the ultraviolet rays cannot penetrate into the coating.

The invention belongs to the field of protective films, and relates to a high-transparency base film for a protective film and a preparation method of the high-transparency base film. The base film for the protective film comprises a support body and a protective film coating layer, wherein the protective film coating layer is coated on at least one surface, in contact with air, of the support body. The protective film coating contains a conductive material, modified acrylic resin, a cross-linking agent and deionized water, so that the protective film coating can be coated on a base material to form a film uniformly. Therefore, by utilizing the synergistic effect of the water-based conductive material and the modified acrylic resin under the online coating process, the surface resistance of the prepared base film coating for the protective film can reach 104-1011 omega, and the protective film has excellent and stable antistatic property and high transparency.

The invention relates to the technical field of optical thin films, and particularly discloses a preparation method of a super-hydrophobic optical thin film capable of being applied to different wavelengths, and the preparation method comprises the following steps: S1, carrying out surface cleaning, surface polishing and surface cleaning on a glass substrate, and then sputtering and depositing a silicon oxide film to obtain deposited glass; s2, performing metal copper fused deposition on the surface of the deposited glass, and then performing annealing treatment and nickel gun purging to obtain a semi-finished product; and finally, performing nano dry etching to obtain a finished product. The film has the advantages of hydrophobic effect, low reflectivity and high transmissivity.

The invention provides an enhanced stress-resistant hollow-core anti-resonance optical fiber, and the optical fiber comprises a plurality of supporting bodies which are arranged between an outer cladding layer and an inner cladding layer in an annular array. The inner wrapping layer comprises a first hollow glass tube, the fiber core area is wrapped by the first hollow glass tube, and the outer side of the first hollow glass tube is tangent to the supporting body. According to the invention, the plurality of supporting bodies are designed, so that mechanical stress applied by the outside can be effectively dispersed, and structural deformation of the inner cladding due to stress concentration is avoided; meanwhile, the first hollow glass tube is designed, so that low-loss transmission of light waves within a specific wavelength range is realized; in combination with the high-strength outer cladding, the optical fiber structure can still keep stable optical performance and structural integrity in severe environments of bearing external pressure, bending, vibration and the like.

The invention relates to a photovoltaic cell and a preparation method thereof, and the method comprises the steps: sequentially forming a plurality of aluminum oxide passivation layers on a substrate through trimethylaluminum, oxygen and water vapor, the ratio of the oxygen flow to the water vapor flow for forming the next aluminum oxide passivation layer is smaller than the ratio of the oxygen flow to the water vapor flow for forming the previous aluminum oxide passivation layer, so that the refractive index of the next formed aluminum oxide passivation layer is smaller than that of the previous formed aluminum oxide passivation layer; the refractive index of the prepared multi-layer aluminum oxide passivation layer is reduced from the side close to the substrate to the side far away from the substrate, so that the prepared multi-layer aluminum oxide passivation layer has a good antireflection effect, and the photoelectric conversion efficiency of the finally prepared photovoltaic cell can be improved.

The invention relates to the technical field of optical resin, and particularly discloses a synthesis process of polysiloxane resin with a low refractive index. The synthesis process comprises the following steps: taking amino double-terminated polydimethylsiloxane and isocyanate as main raw materials, feeding the amino double-terminated polydimethylsiloxane and the isocyanate according to a molar ratio of 1: (1-2), and reacting in an inert gas atmosphere to obtain the low-refractive-index polysiloxane resin. A target product can be obtained through direct reaction in a solvent-free state, the refractive index of the target product is controlled to be 1.41-1.44, the elongation at break can reach 200-400%, and the target product has excellent elasticity; the target product can be directly subjected to subsequent melt extrusion, is more environment-friendly compared with a solvent method, and is more suitable for manufacturing an elastomer multilayer optical film.

The invention relates to the technical field of optical thin films, and provides an optical thin film and a preparation method thereof.The preparation method comprises the steps that S100, polyimide, polycarbonate and polymethyl methacrylate are blended and then subjected to melt extrusion, and a base film layer is obtained; and S200, sequentially performing plasma treatment and sputtering treatment on the base film layer to obtain the optical thin film, wherein S200 comprises the following steps: S210, adopting oxygen as plasma gas, performing plasma treatment on the base film layer, and cooling to room temperature to obtain a first intermediate film layer; s220, carrying out first sputtering treatment on the first intermediate film layer by adopting a silicon dioxide target material in an argon atmosphere to obtain a second intermediate film layer; and S230, carrying out second sputtering treatment on the second intermediate film layer by adopting a titanium target material in a mixed gas atmosphere of argon and oxygen to obtain the optical thin film. According to the method, material blending, plasma treatment and sputtering treatment are adopted, and the overall performance of the optical thin film is remarkably improved.

The invention relates to a high-light-transmittance semi-permeable electroplating ABS (Acrylonitrile Butadiene Styrene) material as well as a preparation method and application thereof. The high-light-transmittance semi-permeable electroplating ABS material is prepared from the following components in parts by weight: 25 to 35 parts of ABS high rubber powder, 40 to 60 parts of MAS copolymer resin, 5 to 10 parts of transparent ABS resin, 5 to 10 parts of dispersing aid, 0.1 to 0.4 part of antioxidant and 0.1 to 0.3 part of lubricant. Compared with the prior art, the prepared electroplating ABS material has high light transmittance performance and is suitable for electroplating workpieces with optical requirements.

The invention discloses a covering layer structure and an organic electroluminescent device, and relates to the technical field of organic electroluminescence, the covering layer structure comprises a first covering layer and a second covering layer located on the first covering layer, and the refractive index of the second covering layer is larger than that of the first covering layer; wherein the first covering layer comprises a compound shown as a formula I: # imgabs0 #, the compound of the first covering layer adopts a spiro ring as a main body structure, and the outer side of the spiro ring is connected with an alkyl group, so that the glass-transition temperature of the material can be kept at a relatively high level, and the material can have a low refractive index; when the first covering layer and the second covering layer with the high refractive index are used in a matched mode, the device can have excellent luminous efficiency and color purity at the same time.

The invention relates to the field of optical thin films, and particularly discloses a preparation method of an ultra-wide-angle low-reflection composite nanostructure optical thin film, which comprises the following steps: S1, cleaning the surface of a glass substrate, and then carrying out laser etching treatment to obtain etched glass; s2, putting the etched glass into a melamine solution, heating to 780-800 DEG C, treating for 30-40 minutes, and cooling to obtain nitrogen-doped glass; treating the surface with boric acid and ammonia gas to obtain a semi-finished product; s3, coating the surface of the semi-finished product with a rare earth terbium modified silicon dioxide layer to obtain a finished product; the optical thin film has the advantages of ultra-wide angle, low reflectivity and high transmissivity.

The present invention relates to a silicon modulator with a lateral capacitance structure, belonging to the field of semiconductor technology. The silicon modulator comprises, from bottom to top, a substrate, a dielectric layer, a ridge waveguide, a capacitor dielectric layer, a first transparent electrode, a second transparent electrode, a first contact metal, a second contact metal, a third contact metal, a fourth contact metal and an upper cladding layer; the ridge waveguide comprises a P-doped region, an N-doped region, a P+ region, a P++ region, an N+ region and an N++ region. The present invention can improve the bandwidth of the silicon modulator.

The laser chip and its fabrication method disclosed herein include a first reflective layer, an active region, an oxide layer, and a second reflective layer sequentially disposed on a substrate. The laser chip has a first trench and a second trench for oxidizing and etching the oxide layer. A first connecting portion connects one end of the first trench to one end of the second trench, and a second connecting portion connects the other end of the first trench to the other end of the second trench. Due to the influence of crystal anisotropy on the oxidation rate, and the mutual coordination of the first and second connecting portions on the oxidation rate, the oxide aperture includes a first oxide arc, a second oxide arc, a third oxide arc, and a fourth oxide arc. The first and second oxide arcs are arranged opposite each other, as are the third and fourth oxide arcs. The third and fourth oxide arcs have different radii of curvature, forming a specific irregular morphology. The oxide aperture based on the irregular morphology can effectively suppress transverse multimode lasing of the optical signal and reduce mode degeneracy.

The invention provides a red-light nitride epitaxial wafer, a preparation method thereof and a Micro-LED. The red-light nitride epitaxial wafer comprises a sapphire substrate, an insertion structure, an n-type nitride pattern structure layer, a light-emitting layer and a p-type metal nitride layer, the insertion structure penetrates through the n-type nitride pattern structure layer, the light-emitting layer and part of the p-type metal nitride layer and comprises a composite Si nano-column and a composite regulation and control layer, and the composite Si nano-column comprises a Si nano-column and a semi-ellipsoid structure; the composite regulation and control layer comprises a protection layer and a buffer layer, the protection layer is arranged on the outer wall of the Si nano-column, and the buffer layer is arranged on the area between the adjacent composite Si nano-columns; and an n-type nitride pattern structure layer, a light-emitting layer and a p-type metal nitride layer are laminated on the buffer layer between the adjacent composite Si nano columns. The In component merging and uniformity can be improved, the light-emitting efficiency and brightness of the Micro-LED are improved, the half-peak width of the light-emitting wavelength is reduced, and the color purity of display application is improved.

This disclosure provides a semiconductor laser, comprising: a substrate; an epitaxial assembly disposed on the substrate and configured to generate laser light, wherein a channel is formed by etching downwards at both ends of the epitaxial assembly in a lateral direction; and a ridge waveguide assembly, comprising: two first electrode waveguides respectively disposed within the channel and forming an ohmic contact with an ohmic contact layer of the epitaxial assembly, wherein the refractive index of the first electrode waveguides is lower than the refractive index of the ohmic contact layer to limit the spread of the lateral light field and improve the confinement factor of the fundamental mode; a lower electrode disposed on the substrate on a side opposite to the epitaxial assembly; and an upper electrode disposed on the ridge waveguide assembly and forming an ohmic contact with the ohmic contact layer and the ridge waveguide assembly, adapted to cooperate with the lower electrode to form an electron injection channel.

The present invention provides a low-radiation anti-fouling coated glass and a preparation method thereof, belonging to the technical field of glass preparation; the preparation process thereof comprises the following steps: preparation of a fluorine-tantalum doped zinc oxide film precursor solution; synthesis of a chain transfer agent; preparation of a modified fluorine-containing copolymer; preparation of a functional film mixed solution; cleaning of a glass substrate; and low-radiation anti-fouling coated glass. The present invention adopts a sandwich structure coating of a zinc oxide film doped with fluorine and tantalum, a silver film, and a zinc oxide film doped with fluorine and tantalum. In the sandwich structure, the silver film is located in the middle layer, and the zinc oxide films doped with fluorine and tantalum are located on both sides. The sandwich structure forms a multilayer film system, which greatly improves the reflectivity of the glass to infrared radiation and achieves a better low-radiation effect. Moreover, the functional film is coated to further achieve a low-radiation effect and increase the anti-fouling ability.

The present invention provides a rare earth-doped optical fiber for suppressing mode instability effects and a preparation method thereof, and relates to the technical field of special optical fiber preparation. The preparation method first deposits a channel region with a low refractive index in a quartz tube, and then sequentially prepares a core passive region and a core active region with different doping components to achieve different thermo-optic coefficients in the local region of the core. The present invention reduces the thermo-optic coefficient of the optical fiber and weakens the nonlinear inter-mode coupling effect by introducing a negative thermo-optic coefficient material, thereby effectively suppressing MI; at the same time, the method of rare earth ion center doping is adopted to reduce the high-order mode gain in the case of a large core, and then suppress the generation of high-order modes through a mode competition mechanism, thereby increasing the proportion of the fundamental mode; the low numerical aperture and channel structure design enable the optical fiber to have a higher high-order mode loss, suppress the fundamental mode-high-order mode coupling effect, further increase the MI threshold, and improve the beam quality.

Disclosed an optical laminate in which at least two or more optical function layers with visible light transmittance are laminated, wherein the optical function layers include a first function layer that includes at least cerium oxide, has a refractive index in a range of 1.8 or more and 2.6 or less at a wavelength of 550 nm, and has a film thickness in a range of 60 nm or more and 130 nm or less, and a second function layer that is formed in contact with an upper surface of the first function layer, has a refractive index in a range of 1.4 or more and 1.6 or less at a wavelength of 550 nm, and has a film thickness in a range of 80 nm or more and 100 nm or less.

The invention relates to the technical field of coating liquids, and discloses an AR coating liquid based on silica sol and a preparation method thereof. The AR coating liquid is prepared by mixing boron-crosslinked silica sol as a main raw material and nano-scale organic emulsion and leveling agent as auxiliary materials. The silica sol supported by boron crosslinking not only has a higher crosslinking density, so that a coating formed after the coating liquid is cured has a very dense three-dimensional grid microstructure and a higher surface density, but also the presence of boron can make the coating produce a self-repairing effect during the tempering process, so that the coating exhibits a higher mechanical hardness. In addition, the nano-scale organic emulsions have electrostatic repulsion with each other, so they can be evenly and orderly arranged in the silica sol, which promotes the formation of orderly arranged pores in the finally formed coating structure, forms a proper pore structure, and then reduces the refractive index, thereby effectively improving the light transmittance of the coating.

This invention belongs to the field of coating technology, specifically relating to a super-reflective photovoltaic enhancement coating, its preparation method, and its application. The coating raw materials include water-based acrylic resin, filler, titanium dioxide, dispersant, defoamer, and leveling agent; wherein the filler includes barium sulfate and / or core-shell particles, and the barium sulfate includes at least one of nano-sized barium sulfate, submicron-sized barium sulfate, micron-sized barium sulfate, and modified barium sulfate. The preparation method involves: adding the filler to deionized water, adding the dispersant, and dispersing; adding the water-based acrylic resin and stirring; adding titanium dioxide, defoamer, and leveling agent to adjust the fineness; adjusting the viscosity; and filtering to obtain the super-reflective photovoltaic enhancement coating. The coating is applied to photovoltaic modules. This invention's coating has the advantages of high reflectivity, full-band coverage, low cost, and stable performance.

This application provides a TOPCon solar cell with improved leakage current and its fabrication method, relating to the photovoltaic field. After phosphorus diffusion, a patterning process is performed on the front edge and central axis of the silicon wafer using a laser, followed by acid washing and alkali washing to obtain an alkali-washed silicon wafer. An Al2O3 thin film is prepared on the front surface of the alkali-washed silicon wafer using plasma ALD, followed by annealing to form an Al2O3 layer. SiO2 is then prepared on the surface of the Al2O3 layer using plasma ALD. x N y Layer; SiH4, CM4 and CH3M gases are introduced, and ALD is used on SiO2. x N y SiN layer surface x M layer; M is a halogen element, SiN x Halogen elements in the M layer move along the path close to SiO₂ x N y One side of the layer to the side away from SiO x N y The content gradient on one side of the layer decreases; electrode printing, sintering, and light injection are performed to obtain TOPCon solar cells with improved leakage current. This can reduce recombination loss and leakage current.

The present invention relates to an enhanced lens that is easy to repair and a preparation method thereof, comprising a lens substrate, a silver layer with a thickness of 2 to 4 nm plated on the outer side of the lens substrate, and an anti-reflection film layer plated on the outer side of the silver layer. The lens substrate is glass with a refractive index range of 1.46-2.1 or a crystal with a refractive index range of 1.38-2.4. The anti-reflection film layer comprises a first H4 film layer with a thickness of 25.1-28.7 nm, a first MgF2 film layer with a thickness of 35.4-33.2 nm, a second H4 film layer with a thickness of 130.4-139.0 nm, and a second MgF2 film layer with a thickness of 87.1-92.2 nm, which are stacked in sequence from the inside to the outside. The reflective enhancement lens uses ultra-thin AG as the transition layer between the substrate and the anti-reflection film AR film layer. The ultra-thin AG layer has low refractive index and low absorption characteristics in the visible light band, which will not weaken the anti-reflection effect of the anti-reflection film. In addition, the AG layer can be removed by chemical immersion when there is a problem with the coating quality, which has the effect of completely stripping off the AR film, and then the anti-reflection film can be re-deposited. This can increase the repair rate of the reflective enhancement lens, reduce production costs, and make outstanding contributions to industrial applications.

The invention discloses a high-refractive-index wear-resistant optical coating and a preparation method thereof. The high-refractive-index coating comprises the following components in percentage by weight: 40-65% of a UV oligomer, 15-40% of a high-refractive-index nano inorganic substance, 1-5% of a modified wear-resistant inorganic substance, 0-5% of a high-water-drop-angle additive and 1-6% of a photoinitiator. According to the invention, the common polyurethane acrylate prepolymer is matched with the high-refractive-index nano inorganic substance and the modified wear-resistant inorganic substance to achieve the effects of high refractive index and wear resistance; by modifying the wear-resistant inorganic matter, the surface of the wear-resistant inorganic matter is provided with reactive groups which can react with a polymer, so that the wear resistance can be improved; compared with a common high-refractive-index coating, high-refractive-index resin does not need to be used as a raw material, the refractive index is adjusted through the nanofiller, and the refractive index can be freely designed within a certain range.