Thin film thickness and refractivity optical measurement method and its device
A technology of film thickness and optical measurement, which is applied in the direction of measuring device, optical device, phase influence characteristic measurement, etc., can solve the problems of complex principle and operation, impossibility of real-time detection, etc., and achieve the effect of simple information processing method and high precision
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[0028] The present invention will be described in further detail below in conjunction with the accompanying drawings and examples.
[0029] like figure 2 As shown, the device of the present invention includes a broadband light source 9 , an interference component 10 , a frequency domain detection device 11 and a data processor 12 .
[0030] The interference component 10 can adopt various existing interference structures. The current interference structures mainly include Michelson interference structures and Mach-Zeder interference structures. like image 3 As shown, the Michelson interference structure includes a light source 17 , a beam splitting element 13 , mirrors 14 , 15 and a detector 16 . If this interference structure is adopted, the interference component 10 includes a first light splitting element 13 , and first and second reflecting mirrors 14 and 15 . The reflecting surfaces of the first and second reflecting mirrors 14 and 15 are respectively perpendicular t...
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