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74results about How to "Improve anti-reflection ability" patented technology

Crystalline silicon solar cell and preparation method thereof

The invention discloses a crystalline silicon solar cell and a preparation method thereof, and the crystalline silicon solar cell comprises a pn plus junction silicon substrate, wherein a first amorphous alumina layer and an amorphous silicon nitride layer are arranged on the surface of an n plus emitter, a silver electrode penetrates the amorphous silicon nitride layer and the first amorphous alumina layer and is connected with the n plus emitter, a composite passivation medium layer is arranged on the surface of a p type substrate, the p type substrate comprises a silicon oxide layer and a second amorphous alumina layer, and a p type substrate is in contact with a back electrode. The preparation method comprises the special preparation of the composite passivation medium layer, nitric acid and hydrogen peroxide solution are adopted for processing the surface of the p type substrate, the sol-gel process is adopted for preparing the second amorphous alumina layer, and the composite passivation medium layer (4) is formed after annealing. The crystalline silicon solar cell has the advantages of simple process, low equipment investment, good passivation and anti-reflection performances of the front surface, excellent passivation effect of the composite passivation medium layer on the back surface, capability of improving the utilization efficiency of long waves, and the like.
Owner:SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI

Display panel and display device

The invention discloses a display panel and a display device. The display panel comprises a substrate, a plurality of sub-pixels and a color film layer, each sub-pixel comprises an opening area and anon-opening area. The color film layer comprises a plurality of color resistance blocks; the sub-pixels comprise first sub-pixels; the color resistance blocks comprise a first color resistance block;the first color resistance block corresponds to the first sub-pixel; the first color resistance block comprises a first light-transmitting part and a second light-transmitting part; the projection ofthe first light-transmitting part on the plane where the substrate is located is at least partially overlapped with the projection of the opening area of the first sub-pixel on the substrate; the projection of the second light-transmitting part on the plane where the substrate is located is at least partially overlapped with the projection of the non-opening area of the first sub-pixel on the substrate, and the transmittance of the first light-transmitting part to the light of the first color is larger than that of the second light-transmitting part to the light of the first color. According to the display panel and the display device provided by the invention, the reflection of external ambient light is reduced, and the light extraction rate of the display panel is increased.
Owner:SHANGHAI TIANMA MICRO ELECTRONICS CO LTD

Wide-band antireflective film and optical element with the wide-band antireflective film

The invention relates to a broadband anti-reflection film, which comprises a bottom layer, a widened layer and a top layer which are formed on the surface of an optical element in turn, wherein the bottom layer is an intermediate refractive index material layer the film thickness of which is between 0.95 and 1.05 d; the top layer is a low refractive index material layer the film thickness of which is between 0.95 and 1.05 d; the widened layer comprises a first film, a second film, a third film, a fourth film and a fifth film which are formed along the direction from the bottom layer to the top layer in turn; the first film is a high refractive index material layer the film thickness of which is between 0.311 and 0.343 d; the second film is a low refractive index material layer the film thickness of which is between 0.147 and 0.163 d; the third film is a high refractive index material layer the film thickness of which is between 1.561 and 1.725 d; the fourth film is a low refractive index material layer the film thickness of which is between 0.210 and 0.232 d; and the fifth film is a high refractive index material layer the film thickness of which is between 0.321 and 0.355 d, wherein d is equal to lambda / (4n), wherein lambda refers to the wavelength of incident light and n refers to the refractive index of a corresponding film.
Owner:HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1

Antireflective film and production method thereof

It is aimed at finding out a surface pattern and physical properties required for an antireflective film having an excellent antireflective property for light, a light transmissivity, and the like, and at providing an antireflective film having such a specific surface pattern and physical properties, and a production method of the antireflective film; and provided for this object, is an antireflective film, obtained by: processing a surface of an aluminum material, by mechanical polishing, chemical polishing and/or electrolytic polishing; subsequently producing a pattern of mold having taper-shaped pores on the surface of the aluminum material, by combining a formation of an anodic oxide coating based on anodic oxidation of the surface of the aluminum material, with etching of the anodic oxide coating; and transferring the pattern of mold onto an antireflective film-forming material; wherein the antireflective film has, on a surface thereof, convexities having an average height between 100 nm inclusive and 1,000 nm inclusive, or concavities having an average depth between 100 nm inclusive and 1,000 nm inclusive, and the convexities or concavities are present at an average period between 50 nm inclusive and 400 nm inclusive, at least in a certain single direction; and wherein the antireflective film has a haze of 15% or less.
Owner:DNP FINE CHEMICALS CO LTD
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