905 results about "Optical thin film" patented technology

The invention discloses a far-infrared band optical thin film, a preparation method thereof and an optical element, and relates to a far-infrared band optical thin film technology, the far-infrared band optical thin film comprises a substrate, a front band-pass film system and a back cut-off film system; wherein the front band-pass film system is located on one side of the substrate, and the back cut-off film system is located on the other side of the substrate; the far infrared band optical thin film is prepared by alternately depositing lead telluride serving as a high-refractive-index thin film material and cadmium telluride serving as a low-refractive-index thin film material. The far infrared band optical thin film can cut off the band with the wavelength smaller than 4 microns, and the average transmittance is 0.23%; anti-reflection is carried out at the wave band of 5-50 microns; the moisture-resistant performance is excellent.

The invention belongs to the technical field of optical thin films, and particularly relates to an ultraviolet broadband low-reflection thin film and a preparation method thereof. The ultraviolet broadband low-reflection film provided by the invention comprises a low-refractive-index material and a high-refractive-index material which are alternately stacked, the low-refractive-index material comprises one or two of SiO2, Al2O3 and MgF2, and the high-refractive-index material is HfO2. According to the preparation method, proper low-refractive-index materials and high-refractive-index materials are selected, then film system design is carried out on the ultraviolet broadband low-reflection film through film system design software, plating is carried out on the substrate according to the film system design result, and the ultraviolet broadband low-reflection film with the ultraviolet band being 10-400 nm and the average reflectivity being smaller than 0.5% is successfully prepared. And the preparation method is simple and easy to implement, the generation probability of impurities and defects of the film is reduced, and then the mechanical property and the laser damage resistance of the film are improved.

The invention discloses an infrared film absorptivity prediction method and system based on machine learning, and relates to the technical field of optical film design and performance prediction.The infrared film absorptivity prediction method comprises the following steps that feature data of a to-be-measured film material and incident light are obtained, electromagnetic field distribution and local absorption power density are output, and according to power integration and boundary conditions, an infrared film absorptivity prediction result is obtained; obtaining initial absorptivity distribution; performing modal analysis on the initial absorptivity distribution, constructing a low-dimensional absorptivity response model, and outputting absorptivity response data after dimension reduction; constructing a physical constraint neural network by taking energy conservation and Fresnel boundary conditions as constraints; on the basis of a physical constraint neural network, absorptivity prediction is carried out on the infrared thin film under different conditions, thin film structure data are optimized through a multi-objective optimization algorithm, and an optimal structure parameter combination of the infrared thin film is obtained; according to the invention, through multi-physics field modeling and the physical constraint neural network, the problems of low infrared film absorptivity prediction precision and poor optimization efficiency are solved.

The invention relates to the technical field of image processing, in particular to an optical thin film quality detection method based on image processing, which comprises the following steps: S101, acquiring a transient light field image sequence of an optical thin film in a dynamic stress field; s102, performing spectral analysis on the brightness time sequence of each pixel point, extracting a dominant frequency component as a brightness oscillation period, processing time domain fluctuation data by adopting a Fourier transform algorithm, and calculating a local optical path difference variation based on the brightness oscillation period of each pixel point in the image sequence; and S103, projecting the phase distortion field to a preset film elastic modulus distribution model, establishing a phase distortion-stress distribution-defect mapping relation, and identifying a modulus mutation region. A dynamic stress field is generated through the synergistic effect of mechanical vibration and thermal radiation, remarkable stress concentration can be generated at the micro-defect position, the deformation difference of the micro-defect is amplified, and therefore the sensitivity of defect detection is improved.

The invention belongs to the technical field of optical film measurement, and particularly relates to a method and system for measuring the thickness of a quartz substrate optical film. The method comprises the following steps: acquiring a surface coordinate model of a quartz substrate, and dividing a film area into a parallel measurement area and a non-parallel measurement area; performing parallel measurement and non-parallel measurement on the two types of regions respectively to obtain first thickness data and second thickness data which jointly form original thickness data; determining measurement parameters corresponding to the original thickness data acquisition process, wherein each measurement parameter represents the offset of the corresponding measurement point; and correcting the original thickness data based on the measurement parameters to generate corrected thin film thickness data, and taking the corrected thin film thickness data as the thickness of the thin film area. According to the invention, dynamic error correction is carried out on the original thickness data, the accuracy and reliability of the thickness data of the thin film are improved, and meanwhile, comprehensive scanning of the irregular thin film is realized through a partition measurement strategy.

Provided is an adhesive composition from which an adhesive layer having excellent heat-resistant durability can be formed. This adhesive composition comprises a (meth)acrylic resin, a crosslinking agent, a silane compound, and an ionic compound, wherein: the (meth)acrylic resin contains, as monomer units, an alkyl (meth)acrylate having a homopolymer glass transition temperature of lower than 0ºC, an alkyl (meth)acrylate having a homopolymer glass transition temperature of at least 0ºC, and a monomer having a polar group; and the ionic compound contains a cyano group-containing anion.

The invention discloses a laminated solar cell structure containing a selective reflection / light transmission optical thin film. The laminated solar cell structure comprises a wide-band-gap solar cell, the selective reflection / light transmission optical thin film and a narrow-band-gap solar cell which are sequentially arranged in the light incidence direction. The selective reflecting / light-transmitting optical thin film is at least used for 1) reflecting high-energy photons to be absorbed and utilized by the wide-band-gap solar cell; and 2) low-energy photons are transmitted to be absorbed and utilized by a narrow-band-gap solar cell. According to the invention, the selective reflection / light transmission optical thin film is used to fully reflect the transmitted high-energy photons to the wide-band-gap top cell without influencing the transmission of low-energy photons, so that the absorption and conversion of the wide-band-gap top cell to the high-energy photons can be improved, the photoelectric conversion efficiency of the laminated cell can be effectively improved, and the laminated cell has a good application prospect.

The invention relates to the field of high polymer materials, and discloses a preparation method and application of high-temperature-resistant transparent modified polyester. The preparation method comprises the following steps: 1) blending 9, 9-di-[(4-phenylphenoxy) dibenzoic acid] fluorene with diacid and dihydric alcohol, and carrying out esterification reaction; and 2) carrying out condensation polymerization on the esterification product to obtain the high-temperature-resistant transparent modified polyester with the glass transition temperature of more than 70 DEG C. According to the invention, 9, 9-di-[(4-phenylphenoxy) dibenzoic acid] fluorene is used as a modification monomer, and is copolymerized with other dibasic acids and dihydric alcohols to synthesize the modified polyester, and the modified polyester has high transparency and still has good mechanical properties and dimensional stability at high temperature. Therefore, the high-temperature-resistant transparent modified polyester is applicable to the application fields of optical films, optical lenses, reflective protective films, optical fibers or liquid crystal displays and the like.

The invention discloses an optical thin film thickness monitoring device and an optical thin film coating system, and belongs to the technical field of vacuum coating. A workpiece disc of the optical film thickness monitoring device is provided with a monitoring hole group, the monitoring hole group comprises a first through hole, a second through hole and an interval shielding area, and a film coating monitoring piece is arranged in the first through hole; the irradiation light source is used for emitting light signals to the monitoring hole group; the receiving assembly comprises a light converging element and at least two grating monochromators. The actual physical or optical thickness of the thin film can be calculated by monitoring the transmission or reflectivity of multiple wavelengths and combining the dispersion of the material, and the precision is higher than the precision of monitoring the thickness of the single-wavelength thin film. A plurality of grating monochromaters respectively and correspondingly monitor one wavelength, each grating monochromator can freely select the wavelength, the wavelength selection range is wide, and the problems that the monitoring wavelength is changed and the positioning precision deviation is large in the same grating monochromator are solved. According to the invention, the optical film thickness measurement precision in the online monitoring film coating process can be improved, and the film coating success rate is improved.

To provide a high efficiency light guide element.SOLUTION: A light guide element has a first light guide portion that propagates a light beam incident thereon while reflecting the light beam therein, and a second light guide portion that emits the light beam from the first light guide portion part by part while reflecting the light beam therein. A first optical film 10-i is provided on the first light guide portion, and a second optical film 11-i different in characteristics from the first optical film is provided on the second light guide portion to be adjacent to the first optical film. A first light guide member 1-i constituting the first light guide portion and a second light guide member 1-ii constituting the second light guide portion are closely adhered or joined to each other.SELECTED DRAWING: Figure 1

A housing (185) for an electronic device (170) includes an optical film (100) having an optical transmittance for substantially normally incident light having a band edge separating first and second wavelength ranges, where the first wavelength range extends from about 400 nm to about 700 nm and the second wavelength range is at least about 100 nm wide and disposed between about 800 nm and about 1100 nm. For substantially normally incident light, an average optical reflectance of the optical film is greater than about 90% in the first wavelength range, and an average optical transmittance of the optical film is greater than about 80% in the second wavelength range. For at least one frequency in a range of about 0.1 GHz to about 90 GHz and for substantially normally incident radiation, the optical film transmits at least about 95% of the incident radiation.

The embodiment of the invention discloses a reverse design method and system of an optical thin film, electronic equipment and a storage medium, and relates to the technical field of optical thin film design, and the method comprises the steps: determining a target spectrum and a design index; obtaining a target spectrum vector based on the target spectrum and the design index; inputting the target spectrum and the design index into the expert sub-model to obtain an embedded vector output by the expert sub-model; inputting the target spectrum vector and the embedded vector into a backbone network to obtain a candidate film system structure; determining an actual spectrum of the candidate film system structure; and adjusting the candidate film system structure based on a difference value between the actual spectrum and the target spectrum to obtain a target film system structure. According to the embodiment of the invention, the constraint condition of the film system structure and the number of initial film layers to be tried are determined through the expert sub-model, and the search space and the calculation amount are remarkably reduced while the design accuracy is kept.

The invention relates to the field of optical thin films, in particular to a preparation method of an optical diffusion film. A preparation method of an optical diffusion film comprises the following steps: uniformly mixing a curing agent and polydimethylsiloxane, curing, and then carrying out oxygen plasma treatment and room temperature aging treatment to obtain a polydimethylsiloxane flat plate; dissolving PET particles and PMMA particles in a solvent to obtain a polymer solution; and placing a polydimethylsiloxane flat plate above the polymer solution, and standing to obtain the optical diffusion film. According to the application, PMMA is used as a high glass transition temperature component to be blended with PET, so that the overall glass transition temperature of a blending system is improved, and the practicability of the optical diffusion film in a high-temperature environment is improved; strong scattering is provided through the refractive index difference between air holes and a polymer phase, and a refractive index gradient is formed by using the refractive index difference between PET and PMMA, so that a secondary scattering interface is formed, and light absorption is reduced and high transmittance is maintained while high haze is ensured.

The invention discloses a film coating method based on waveband self-adaption wide spectrum film layer thickness monitoring, aims to improve the film coating quality and efficiency of an optical thin film, and aims to evaluate the influence of thickness change on optical performance by designing an optical thin film structure layer by layer and calculating a transmittance spectrum by using film system design software. In the film coating process, the wave band self-adaptive monitoring technology is adopted, according to the characteristics of each layer of film and the performance of a film coating machine, the high-sensitivity monitoring wavelength is selected in a self-adaptive mode, and accurate monitoring of the film layer thickness in the wide spectrum range is achieved. According to the method, the influence degree of the current film layer thickness deviation on the current film layer transmittance is calculated by designing optical thin film layer-by-layer stacking, the sensitivity of the transmittance spectrum on the film layer thickness deviation is obtained layer by layer, the sensitivity threshold value is set, and the high-sensitivity wavelength is selected as the monitoring wavelength, so that the monitoring signal-to-noise ratio is inhibited, and the monitoring accuracy is improved. And the film thickness deposition precision is improved.

The invention relates to the technical field of optical thin films, in particular to a brightness enhancement film center wavelength optimization method based on a genetic algorithm and electronic equipment. The method comprises the steps that preset environment parameters are acquired, and optimization variable parameters are defined; based on the preset environment parameters and the optimization variable parameters, performing parameterized inverse design on the multilayer film model by adopting finite element simulation to obtain a target function; based on the objective function, adopting a genetic algorithm to execute iterative simulation on the multilayer film model, and performing optimization by utilizing a fitness function in an iteration process until an optimization objective is met or the number of iterations reaches a preset number of iterations; and obtaining an optimal solution after iteration is completed, wherein the optimal solution comprises a central wavelength combination and the number of film layers. According to the method and the device, accurate optimization parameters can be obtained, so that the reflectivity performance of the multi-layer film is optimal.

The invention relates to the technical field of optical thin films, in particular to a high-transmittance low-haze upper diffusion film and a preparation method thereof. A high-light-transmittance low-haze upper diffusion film comprises a transparent base film and a nano coating coated on the surface of the transparent base film, and the nano coating comprises the following preparation raw materials: 30-40 parts of polyurethane modified acrylate, 20-30 parts of a high refractive index monomer, 10-15 parts of a functional monomer, 1.5-2 parts of nanoparticles and 2-4 parts of a photoinitiator. Wherein the nano particles are modified AlO / SiO nano composite particles. Through nano particle modification, functional monomer compounding and resin matrix optimization, the contradiction between light transmittance and mechanical performance of a traditional light diffusion film is broken through, comprehensive upgrading of optical performance (light transmittance / haze), mechanical strength (hardness / flexibility) and weather resistance (high temperature / aging resistance) is achieved, and the light diffusion film is suitable for high-end scenes such as ultra-thin OLED screens and vehicle-mounted display.

The invention discloses a UV-cured high-weather-resistance optical thin film and a preparation method thereof, and relates to the technical field of optical thin films. The optical film is prepared by taking polyethylene glycol terephthalate as a base material and coating the base material with a UV curing coating, and the UV curing coating comprises the following raw materials in parts by weight: 15-20 parts of aliphatic polyurethane acrylate, 5-8 parts of perfluorobutyl ethyl acrylate, 8-12 parts of hydroxyethyl acrylate, 6-10 parts of 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 1-3 parts of 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 1-3 parts of 1, 2, 4-trimethyl-1, the invention relates to a UV (ultraviolet)-resistant coating which is prepared from the following raw materials in parts by weight: 1-2 parts of 2, 6-hexanediol diacrylate, 5-8 parts of trimethylolpropane triacrylate, 30-40 parts of modified epoxy acrylate, 1-2 parts of a silane coupling agent KH-570, 2-3 parts of a photoinitiator 1173, 0.5-1.2 parts of a modified ultraviolet absorbent UV-327, 0.8-1.5 parts of a hindered amine light stabilizer 540, 0.3-0.8 part of an antioxidant 1010, 0.09-0.12 part of an ultraviolet absorbent Tinuvin400 and 0.2-0.5 part of polyether modified polydimethylsiloxane. According to the UV-cured high-weather-resistance optical thin film, polyethylene glycol terephthalate is used as a base material, key raw materials such as a UV-cured coating with a scientific formula, modified epoxy acrylate and the like are finely prepared, a two-stage curing process is adopted, and the weather resistance is excellent.

The invention provides high-transparency bio-based polyimide as well as a preparation method and application thereof. The high-transparency bio-based polyimide comprises a polymerization product of a diamine monomer and a dicarboxylic anhydride monomer, and the diamine monomer is selected from 2, 5-bis (aminomethyl) furan and / or 2, 5-furandiamine. The high-transparency bio-based polyimide disclosed by the invention has high transparency, good heat resistance, film forming performance and the like, and can replace a traditional optical thin film material.

The present disclosure discloses an optical measurement device and system, the device comprising a light splitting module comprising at least one optical element plated with an optical film, the transmittance and / or reflectance of the optical film monotonically changing with wavelength within a measurement band range; the at least two image sensors are respectively arranged at the downstream of the light path of the light splitting module, at least one of the at least two image sensors is configured to receive the light beam output by the optical thin film and generate image information, and the image information is used for obtaining a two-dimensional wavelength distribution diagram of the to-be-detected sample. According to the embodiment provided by the invention, the wavelength measurement time is effectively shortened through the innovative combination of the optical film of which the transmittance and / or the reflectivity monotonically changes along with the wavelength in the measurement waveband range and the dual-path synchronous imaging architecture.

The invention relates to a bottom alignment grating preparation method and a bottom alignment grating, and the bottom alignment grating preparation method comprises the steps: depositing a grating material on a light-transmitting substrate, so as to form a grating material layer on the light-transmitting substrate; etching the grating material layer to form a plurality of grating areas with different heights on the grating material layer; and respectively etching each grating area to the light-transmitting substrate to form a plurality of groups of gratings with different heights so as to obtain a bottom-aligned grating. The partition structure of each grating area of the bottom-aligned grating is bottom-aligned, so that the optical efficiency of an optical device can be improved, and an optical film interference effect caused by a residual film is reduced. The bottom alignment grating can be prepared through the preparation method of the bottom alignment grating provided by the invention.

The invention relates to the technical field of semiconductors, and discloses an electro-optical modulator and a preparation method thereof, and the preparation method comprises the steps: forming a waveguide core and a plurality of electrodes on a part of the surface of one side, opposite to a first substrate, of a first cladding, and dividing the waveguide core into an internal waveguide core and an external waveguide core; at least part of the electrode further goes deep into the first cladding of partial thickness; forming a second wrapping layer wrapping the electrode and the waveguide core on the surface of the first wrapping layer; forming a plurality of metal interconnection lines on the surface of the second cladding, wherein each metal interconnection line also penetrates through the second cladding and is connected with one electrode; forming a bonding groove penetrating into the partial thickness of the second cladding; forming an electro-optical thin film layer comprising an equal-thickness region and a thickness gradient region in the bonding groove; the projection of the equal-thickness area completely covers the internal waveguide core, and the projection of the thickness gradient area at least covers part of the external waveguide core. The CMOS technology compatibility of the device can be improved, the insertion loss of the device is reduced, and the integration level and the space utilization rate of an optical chip are improved.

The invention relates to an optical resin composition and application, and relates to the technical field of nanoimprinting, the optical resin composition comprises the following components: a (methyl) acrylate monomer, a (methyl) acrylate prepolymer with a polyether or polyester chain segment and a photopolymerization initiator; the (meth) acrylate monomer contains a C6-30 aromatic hydrocarbon group. The resin composition for nanoimprint provided by the invention has good optical performance when being used for preparing an optical thin film or an optical device; the composition provided by the invention has good flexibility, and when the composition is used for preparing the nano pattern, the good flexibility is beneficial to resisting the adhesive force and friction force of a mold in the demolding process, so that the deformation and brittle failure of the pattern are avoided, and the integrity and precision of the nano pattern are kept.

The invention discloses a big language model data set construction and model training method for optical thin film design, which comprises the following steps of: S1, generating a specific data set based on a real production condition based on a design layered structure of an optical thin film structure and generated spectral data; s2, training a large film design privatization model matched with an actual production process by adopting the training and fine tuning data set of a large language model; s3, based on the characteristics of large language model input, dividing a thin film design privatization large model training scheme into global design optimization and local design optimization; and S4, carrying out model training on global optimization and local optimization by adopting a mutual combination mode. According to the method, the large film design privatization model matched with the actual production process is trained, accurate association of optical film production process parameters and actual measurement spectral characteristics is achieved, and the practical problem that an existing data structure cannot comprehensively represent real film structure information is solved.

The invention belongs to the technical field of optical thin film design and preparation, and particularly relates to a preparation method of a multilayer composite antireflection film on the surface of an optical lens. The preparation method comprises the step of sequentially performing atomic layer deposition on the surface of the optical lens to form the transition layer, the high-refractive-index layer, the low-refractive-index layer, the high-refractive-index layer and the packaging layer. According to the atomic layer deposition method, uniform coating can be achieved on the surfaces of aspherical lenses with different curvature radiuses, and five layers of oxide films are deposited through alternating pulse in an ALD pulse sequence with the structure of'substrate layer-transition layer-high refractive index layer-low refractive index layer-high refractive index layer-packaging layer '. And an excellent antireflection effect in a visible light wavelength range is realized. The atomic layer deposition is carried out at low temperature (25-150 DEG C), so that the atomic layer deposition can be directly coated on the high-molecular polymer lens, and the deformation of the base material due to high temperature is avoided; the method is especially suitable for different application scenes such as consumer electronics, personal protection and medical assistance.

The invention provides a cesium lead halide perovskite target material and a preparation method and application thereof, and relates to the technical field of magnetron sputtering. The preparation method of the cesium-lead halide perovskite target material comprises the following steps: mixing cesium halide and lead halide, and carrying out ball milling to obtain precursor powder; pressing the precursor powder to obtain a cesium lead halide perovskite target material precursor; and carrying out annealing treatment on the caesium lead halide perovskite target material precursor to obtain the caesium lead halide perovskite target material. The preparation method is simple, no waste is generated in the preparation process, the surface of the target material is smooth, internal components are uniform, and a film prepared from the target material is uniformly distributed on a substrate and can be used for preparing an optical film; and the target material can be recycled after being used, and can be continuously used as a raw material for preparing the cesium lead halide perovskite target material.

A display panel includes a first display module, a first optical film, and a first optical adhesive. The first optical film is disposed on the first display module, and a sidewall of the first optical film is aligned with at least one sidewall of the first display module. The first optical adhesive is disposed along an edge of the first optical film, and the first optical adhesive at the edge covers an upper surface of the first optical film and a sidewall of the first optical film.

The invention relates to the technical field of vacuum coating machines, and particularly discloses an optical thin film coating temperature control method and system fused with infrared temperature measurement. The method comprises the following steps: selecting a temperature monitoring strategy according to target film system process requirements and substrate geometrical characteristics, calling a substrate quality mapping model, and measuring an angle set and an angle-region mapping table; traversing the measurement angle set to collect temperature in the coating process to form a time sequence temperature sequence; calculating a strategic local state vector based on the current strategy, and obtaining a comprehensive quality index through a quality transfer model; and performing system health degree diagnosis based on the time sequence temperature sequence and the comprehensive quality index, switching a normal control mode or a fault-tolerant control mode according to a diagnosis result, and executing a corresponding control instruction. According to the invention, the spanning from single-point temperature measurement to global quality perception and from temperature tracking to quality optimization control is realized, and the film layer quality consistency and the production process robustness are effectively improved.

The invention relates to a grating partition type diffraction optical waveguide and a preparation method thereof. The grating partition type diffraction optical waveguide comprises an optical waveguide sheet, three grating structures arranged on the optical waveguide sheet and optical thin films arranged on the grating structures. Wherein a coupling-in area, a transition area and a coupling-out area are sequentially arranged on the optical waveguide sheet along a light beam transmission path, and the transition area and the coupling-out area are divided into a plurality of grating subareas along a grating vector direction; the three grating structures are respectively arranged on the coupling-in region, the transition region and the coupling-out region; in the coupling-in area, the refractive indexes of the grating structure and the optical thin film are different. In the transition area and the coupling-out area, the grating structure and the optical thin film of the same grating subarea are different in refractive index, and the optical thin films of two adjacent grating subareas are different in thickness and / or refractive index. The grating structures of the coupling-in area, the transition area and the coupling-out area are covered with the optical thin film, the thickness and the refractive index of the optical thin film are modulated, the energy utilization rate of the diffraction optical waveguide can be improved, and the template cost is saved and the mass production yield is improved while waveguide uniformity modulation is not affected.

The invention relates to the technical field of optical thin films, and particularly discloses a high-birefringence laminated reflecting film and a preparation method thereof. According to the laminated reflecting film, 4, 4 '-biphenyl dicarboxylate modified PET is used as a raw material of an A layer, PMMA or PETG is used as a raw material of a B layer, the difference value of the glass transition temperatures Tg of the raw material of the A layer and the raw material of the B layer is controlled to be smaller than or equal to 5 DEG C, and the laminated reflecting film formed by alternately laminating the raw material of the A layer and the raw material of the B layer is subjected to synchronous two-way stretching and heat setting treatment; according to the application, PET is modified by the BB monomer, and a biaxial stretching process and the content of the BB monomer are regulated and controlled for the first time, so that Tg difference values of the raw materials of the layer A and the raw materials of the layer B are close, meanwhile, a refractive index difference value is increased, the reflecting film with excellent optical performance and mechanical performance can be obtained with a small number of lamination layers, and the reflecting film has high in-plane birefringence, high in-plane birefringence, high in-plane birefringence, high in-plane birefringence, high in-plane birefringence and high in-plane birefringence. And the reflectivity reaches 74% or above.

The application discloses a vertical micro-mirror structure optical computing chip and a wafer-level intelligent manufacturing method thereof, and relates to the field of optical computing chips.The optical computing chip comprises a plurality of optical modulators and a plurality of quantum logic gates, and the optical modulators are provided with interference light paths based on vertical micro-mirrors, so that optical modulation is realized; the quantum logic gates construct stable light paths through the mirrors provided by the vertical micro-mirrors, realize interference by means of a beam splitter, and perform Hadamard transformation by a wave plate at the entrance or exit of a target light path, so that optical computing is realized; a deep-groove beam splitter or a deep-wall beam splitter is used as the beam splitter, the silicon walls in the deep-wall beam splitter are provided with a predetermined included angle perpendicular to the two side walls of the substrate, and the deep-groove beam splitter is manufactured in the following manner: a deep groove pattern is photoetched on the surface of a single-crystal silicon wafer; the deep groove with the predetermined angle is etched by deep etching and the side walls are smoothed; an optical thin film is deposited in the deep groove; the shape of the deep-groove beam splitter is photoetched and etched by deep etching, and the side walls are smoothed; and an optical antireflection film is grown on the vertical side walls.