1062 results about "Optical thin film" patented technology

The invention discloses a far-infrared band optical thin film, a preparation method thereof and an optical element, and relates to a far-infrared band optical thin film technology, the far-infrared band optical thin film comprises a substrate, a front band-pass film system and a back cut-off film system; wherein the front band-pass film system is located on one side of the substrate, and the back cut-off film system is located on the other side of the substrate; the far infrared band optical thin film is prepared by alternately depositing lead telluride serving as a high-refractive-index thin film material and cadmium telluride serving as a low-refractive-index thin film material. The far infrared band optical thin film can cut off the band with the wavelength smaller than 4 microns, and the average transmittance is 0.23%; anti-reflection is carried out at the wave band of 5-50 microns; the moisture-resistant performance is excellent.

The invention belongs to the technical field of optical thin films, and particularly relates to an ultraviolet broadband low-reflection thin film and a preparation method thereof. The ultraviolet broadband low-reflection film provided by the invention comprises a low-refractive-index material and a high-refractive-index material which are alternately stacked, the low-refractive-index material comprises one or two of SiO2, Al2O3 and MgF2, and the high-refractive-index material is HfO2. According to the preparation method, proper low-refractive-index materials and high-refractive-index materials are selected, then film system design is carried out on the ultraviolet broadband low-reflection film through film system design software, plating is carried out on the substrate according to the film system design result, and the ultraviolet broadband low-reflection film with the ultraviolet band being 10-400 nm and the average reflectivity being smaller than 0.5% is successfully prepared. And the preparation method is simple and easy to implement, the generation probability of impurities and defects of the film is reduced, and then the mechanical property and the laser damage resistance of the film are improved.

The invention provides an ultra-wideband low-absorption low-stress high-reflection thin film based on a gradual change chirp structure, and belongs to the technical field of optical thin films. Different from a mode of mutually combining and superposing high and low refractive index materials of a traditional structured film system to control the reflection bandwidth, the invention provides a logarithmic function gradient chirp structure, the reflectivity index is adjusted by adjusting the total number of film layers, and the reflection bandwidth is adjusted by adjusting head and tail optical thickness coefficients. The problem that the reflectivity is suddenly reduced in a multi-reflection-band superposition reflection gap area when the broadband high-reflection dielectric film is designed is effectively avoided, and the problem of surface distortion caused by thin film stress is reduced by adjusting the film thickness ratio of the stress regulation and control layer to the gradual change main reflection layer. From the perspective of membrane system design, the thickness of the membrane layer is reduced, the preparation period and difficulty are reduced, problems and risks caused by stress are reduced, membrane layer absorption is effectively reduced, and the absorption and stress can be controlled within a proper range in combination with a post-treatment means to effectively support safe and stable operation of the system.

The invention discloses an infrared film absorptivity prediction method and system based on machine learning, and relates to the technical field of optical film design and performance prediction.The infrared film absorptivity prediction method comprises the following steps that feature data of a to-be-measured film material and incident light are obtained, electromagnetic field distribution and local absorption power density are output, and according to power integration and boundary conditions, an infrared film absorptivity prediction result is obtained; obtaining initial absorptivity distribution; performing modal analysis on the initial absorptivity distribution, constructing a low-dimensional absorptivity response model, and outputting absorptivity response data after dimension reduction; constructing a physical constraint neural network by taking energy conservation and Fresnel boundary conditions as constraints; on the basis of a physical constraint neural network, absorptivity prediction is carried out on the infrared thin film under different conditions, thin film structure data are optimized through a multi-objective optimization algorithm, and an optimal structure parameter combination of the infrared thin film is obtained; according to the invention, through multi-physics field modeling and the physical constraint neural network, the problems of low infrared film absorptivity prediction precision and poor optimization efficiency are solved.

The invention relates to a method for accurately calibrating the quarter-wavelength layer thickness of a DBR (Distributed Bragg Reflector). The distributed Bragg reflector (DBR) is formed by alternately growing two materials with the optical thickness of 1 / 4 wavelength. The deviation of the thickness of the DBR enables the reflectivity of the DBR to be reduced, the bandwidth to be reduced and the reflection phase shift to be deviated. In order to accurately control the optical thickness of each layer of the DBR to be 1 / 4 wavelength, the invention provides two complementary resonant cavity comparison structures. By comparing the relative sizes of the cavity mode wavelengths of the two structures, whether the thickness of each layer of the DBR is 1 / 4 of the standard wavelength or not can be judged, and the thickness of each layer can be corrected to be 1 / 4 of the wavelength. The method makes up the defect that the conventional DBR reflection spectrum cannot accurately measure the thickness of each layer of the DBR, has the advantages of simplicity, accuracy and no damage compared with other thickness detection methods, is not only suitable for accurate calibration of the 1 / 4 layer thickness of the DBR, but also can be used for accurate characterization of the thickness of optical thin films made of other materials.

The invention discloses a non-linear optical structure with perfect phase matching and high second harmonic generation efficiency. The non-linear optical structure comprises a fundamental frequency wave resonance structure, a non-linear optical layer, a second harmonic reflection structure and a substrate, the fundamental frequency wave resonance structure is used for generating electromagnetic field local enhancement at an incident fundamental frequency wavelength and realizing a phase matching condition by optimizing electric field phase distribution; the nonlinear optical layer is used for frequency conversion from fundamental frequency waves to second harmonics and regulating and controlling harmonic radiation capability and phase regulation and control; the second harmonic reflection structure is used for controlling coupling-out of second harmonics; the rotary nonlinear optical layer can adjust the phase characteristic of the radiated second harmonic so as to realize perfect phase matching of a harmonic field; according to the nonlinear optical structure with perfect phase matching and high-efficiency second harmonic generation efficiency, accurate control of phase matching conditions is realized through reasonable optical film stacking and phase matching technologies, and high-efficiency coupling-out and utilization of second harmonics are ensured.

The invention relates to the technical field of image processing, in particular to an optical thin film quality detection method based on image processing, which comprises the following steps: S101, acquiring a transient light field image sequence of an optical thin film in a dynamic stress field; s102, performing spectral analysis on the brightness time sequence of each pixel point, extracting a dominant frequency component as a brightness oscillation period, processing time domain fluctuation data by adopting a Fourier transform algorithm, and calculating a local optical path difference variation based on the brightness oscillation period of each pixel point in the image sequence; and S103, projecting the phase distortion field to a preset film elastic modulus distribution model, establishing a phase distortion-stress distribution-defect mapping relation, and identifying a modulus mutation region. A dynamic stress field is generated through the synergistic effect of mechanical vibration and thermal radiation, remarkable stress concentration can be generated at the micro-defect position, the deformation difference of the micro-defect is amplified, and therefore the sensitivity of defect detection is improved.

The invention belongs to the technical field of optical film measurement, and particularly relates to a method and system for measuring the thickness of a quartz substrate optical film. The method comprises the following steps: acquiring a surface coordinate model of a quartz substrate, and dividing a film area into a parallel measurement area and a non-parallel measurement area; performing parallel measurement and non-parallel measurement on the two types of regions respectively to obtain first thickness data and second thickness data which jointly form original thickness data; determining measurement parameters corresponding to the original thickness data acquisition process, wherein each measurement parameter represents the offset of the corresponding measurement point; and correcting the original thickness data based on the measurement parameters to generate corrected thin film thickness data, and taking the corrected thin film thickness data as the thickness of the thin film area. According to the invention, dynamic error correction is carried out on the original thickness data, the accuracy and reliability of the thickness data of the thin film are improved, and meanwhile, comprehensive scanning of the irregular thin film is realized through a partition measurement strategy.

Provided is an adhesive composition from which an adhesive layer having excellent heat-resistant durability can be formed. This adhesive composition comprises a (meth)acrylic resin, a crosslinking agent, a silane compound, and an ionic compound, wherein: the (meth)acrylic resin contains, as monomer units, an alkyl (meth)acrylate having a homopolymer glass transition temperature of lower than 0ºC, an alkyl (meth)acrylate having a homopolymer glass transition temperature of at least 0ºC, and a monomer having a polar group; and the ionic compound contains a cyano group-containing anion.

The invention discloses a laminated solar cell structure containing a selective reflection / light transmission optical thin film. The laminated solar cell structure comprises a wide-band-gap solar cell, the selective reflection / light transmission optical thin film and a narrow-band-gap solar cell which are sequentially arranged in the light incidence direction. The selective reflecting / light-transmitting optical thin film is at least used for 1) reflecting high-energy photons to be absorbed and utilized by the wide-band-gap solar cell; and 2) low-energy photons are transmitted to be absorbed and utilized by a narrow-band-gap solar cell. According to the invention, the selective reflection / light transmission optical thin film is used to fully reflect the transmitted high-energy photons to the wide-band-gap top cell without influencing the transmission of low-energy photons, so that the absorption and conversion of the wide-band-gap top cell to the high-energy photons can be improved, the photoelectric conversion efficiency of the laminated cell can be effectively improved, and the laminated cell has a good application prospect.

The invention relates to the field of high polymer materials, and discloses a preparation method and application of high-temperature-resistant transparent modified polyester. The preparation method comprises the following steps: 1) blending 9, 9-di-[(4-phenylphenoxy) dibenzoic acid] fluorene with diacid and dihydric alcohol, and carrying out esterification reaction; and 2) carrying out condensation polymerization on the esterification product to obtain the high-temperature-resistant transparent modified polyester with the glass transition temperature of more than 70 DEG C. According to the invention, 9, 9-di-[(4-phenylphenoxy) dibenzoic acid] fluorene is used as a modification monomer, and is copolymerized with other dibasic acids and dihydric alcohols to synthesize the modified polyester, and the modified polyester has high transparency and still has good mechanical properties and dimensional stability at high temperature. Therefore, the high-temperature-resistant transparent modified polyester is applicable to the application fields of optical films, optical lenses, reflective protective films, optical fibers or liquid crystal displays and the like.

The invention discloses an optical thin film and a preparation method thereof, and relates to the technical field of optical thin films. The optical thin film comprises a base film, and a low-refractive-index layer and a high-refractive-index layer which are sequentially arranged on the surface of the base film, the high refractive index layer is prepared from TiO2, a Y2O3-CeO2 nanowire and graphene oxide; the low refractive index layer is prepared from mesoporous SiO2 aerogel, a MgF2 nanosheet and polysilazane. The preparation method of the optical thin film comprises the following steps: coating the base film with the low-refractive-index layer by a sol-gel spin-coating method, and coating the low-refractive-index layer with the high-refractive-index layer by aerosol-assisted chemical vapor deposition. The surface of the base film is sequentially coated with the low-refractive-index layer and the high-refractive-index layer, so that an antireflection effect is formed, and the surface reflectivity is reduced; the comprehensive performance of high light transmission, low reflection, bending resistance, environmental aging resistance and the like is realized.

The invention discloses an optical thin film thickness monitoring device and an optical thin film coating system, and belongs to the technical field of vacuum coating. A workpiece disc of the optical film thickness monitoring device is provided with a monitoring hole group, the monitoring hole group comprises a first through hole, a second through hole and an interval shielding area, and a film coating monitoring piece is arranged in the first through hole; the irradiation light source is used for emitting light signals to the monitoring hole group; the receiving assembly comprises a light converging element and at least two grating monochromators. The actual physical or optical thickness of the thin film can be calculated by monitoring the transmission or reflectivity of multiple wavelengths and combining the dispersion of the material, and the precision is higher than the precision of monitoring the thickness of the single-wavelength thin film. A plurality of grating monochromaters respectively and correspondingly monitor one wavelength, each grating monochromator can freely select the wavelength, the wavelength selection range is wide, and the problems that the monitoring wavelength is changed and the positioning precision deviation is large in the same grating monochromator are solved. According to the invention, the optical film thickness measurement precision in the online monitoring film coating process can be improved, and the film coating success rate is improved.

To provide a high efficiency light guide element.SOLUTION: A light guide element has a first light guide portion that propagates a light beam incident thereon while reflecting the light beam therein, and a second light guide portion that emits the light beam from the first light guide portion part by part while reflecting the light beam therein. A first optical film 10-i is provided on the first light guide portion, and a second optical film 11-i different in characteristics from the first optical film is provided on the second light guide portion to be adjacent to the first optical film. A first light guide member 1-i constituting the first light guide portion and a second light guide member 1-ii constituting the second light guide portion are closely adhered or joined to each other.SELECTED DRAWING: Figure 1

A housing (185) for an electronic device (170) includes an optical film (100) having an optical transmittance for substantially normally incident light having a band edge separating first and second wavelength ranges, where the first wavelength range extends from about 400 nm to about 700 nm and the second wavelength range is at least about 100 nm wide and disposed between about 800 nm and about 1100 nm. For substantially normally incident light, an average optical reflectance of the optical film is greater than about 90% in the first wavelength range, and an average optical transmittance of the optical film is greater than about 80% in the second wavelength range. For at least one frequency in a range of about 0.1 GHz to about 90 GHz and for substantially normally incident radiation, the optical film transmits at least about 95% of the incident radiation.

The embodiment of the invention discloses a reverse design method and system of an optical thin film, electronic equipment and a storage medium, and relates to the technical field of optical thin film design, and the method comprises the steps: determining a target spectrum and a design index; obtaining a target spectrum vector based on the target spectrum and the design index; inputting the target spectrum and the design index into the expert sub-model to obtain an embedded vector output by the expert sub-model; inputting the target spectrum vector and the embedded vector into a backbone network to obtain a candidate film system structure; determining an actual spectrum of the candidate film system structure; and adjusting the candidate film system structure based on a difference value between the actual spectrum and the target spectrum to obtain a target film system structure. According to the embodiment of the invention, the constraint condition of the film system structure and the number of initial film layers to be tried are determined through the expert sub-model, and the search space and the calculation amount are remarkably reduced while the design accuracy is kept.

The invention relates to the field of optical thin films, in particular to a preparation method of an optical diffusion film. A preparation method of an optical diffusion film comprises the following steps: uniformly mixing a curing agent and polydimethylsiloxane, curing, and then carrying out oxygen plasma treatment and room temperature aging treatment to obtain a polydimethylsiloxane flat plate; dissolving PET particles and PMMA particles in a solvent to obtain a polymer solution; and placing a polydimethylsiloxane flat plate above the polymer solution, and standing to obtain the optical diffusion film. According to the application, PMMA is used as a high glass transition temperature component to be blended with PET, so that the overall glass transition temperature of a blending system is improved, and the practicability of the optical diffusion film in a high-temperature environment is improved; strong scattering is provided through the refractive index difference between air holes and a polymer phase, and a refractive index gradient is formed by using the refractive index difference between PET and PMMA, so that a secondary scattering interface is formed, and light absorption is reduced and high transmittance is maintained while high haze is ensured.

The invention discloses a moth-eye-like bionic form anti-reflection structure and a manufacturing method thereof, and relates to the technical field of display and imaging optical thin films, and the manufacturing method comprises the following steps: determining a bottom layer processing scheme according to different base materials; processing a moth-eye-like bionic micro-nano structure layer on the base material or the bottom layer; a top layer is processed on the moth-eye-like bionic micro-nano structure layer, and the moth-eye-like bionic anti-reflection structure is formed through stacking. The moth-eye-like bionic form anti-reflection structure prepared by the invention not only has the optical characteristics of wide angle, wide wave band, high transmittance and low reflectivity, but also can select the top layer material as required, so that the anti-reflection structure has the mechanical characteristics of superhardness, friction resistance, fingerprint resistance and the like, and the transmittance of the anti-reflection structure is improved and the anti-reflection effect is realized while the reflected light is reduced. The moth-eye-like bionic anti-reflection structure prepared by the invention can be applied to curved surfaces of glass cover plate products, resin lenses, lenses and the like, the arc edges have no obvious chromatic aberration, the visual experience of a user is improved, and the imaging effect of a system can be improved when the moth-eye-like bionic anti-reflection structure is used for the imaging system.

The invention discloses a film coating method based on waveband self-adaption wide spectrum film layer thickness monitoring, aims to improve the film coating quality and efficiency of an optical thin film, and aims to evaluate the influence of thickness change on optical performance by designing an optical thin film structure layer by layer and calculating a transmittance spectrum by using film system design software. In the film coating process, the wave band self-adaptive monitoring technology is adopted, according to the characteristics of each layer of film and the performance of a film coating machine, the high-sensitivity monitoring wavelength is selected in a self-adaptive mode, and accurate monitoring of the film layer thickness in the wide spectrum range is achieved. According to the method, the influence degree of the current film layer thickness deviation on the current film layer transmittance is calculated by designing optical thin film layer-by-layer stacking, the sensitivity of the transmittance spectrum on the film layer thickness deviation is obtained layer by layer, the sensitivity threshold value is set, and the high-sensitivity wavelength is selected as the monitoring wavelength, so that the monitoring signal-to-noise ratio is inhibited, and the monitoring accuracy is improved. And the film thickness deposition precision is improved.

The invention relates to the technical field of optical thin films, in particular to a brightness enhancement film center wavelength optimization method based on a genetic algorithm and electronic equipment. The method comprises the steps that preset environment parameters are acquired, and optimization variable parameters are defined; based on the preset environment parameters and the optimization variable parameters, performing parameterized inverse design on the multilayer film model by adopting finite element simulation to obtain a target function; based on the objective function, adopting a genetic algorithm to execute iterative simulation on the multilayer film model, and performing optimization by utilizing a fitness function in an iteration process until an optimization objective is met or the number of iterations reaches a preset number of iterations; and obtaining an optimal solution after iteration is completed, wherein the optimal solution comprises a central wavelength combination and the number of film layers. According to the method and the device, accurate optimization parameters can be obtained, so that the reflectivity performance of the multi-layer film is optimal.

The invention relates to the technical field of optical thin films, in particular to a high-transmittance low-haze upper diffusion film and a preparation method thereof. A high-light-transmittance low-haze upper diffusion film comprises a transparent base film and a nano coating coated on the surface of the transparent base film, and the nano coating comprises the following preparation raw materials: 30-40 parts of polyurethane modified acrylate, 20-30 parts of a high refractive index monomer, 10-15 parts of a functional monomer, 1.5-2 parts of nanoparticles and 2-4 parts of a photoinitiator. Wherein the nano particles are modified AlO / SiO nano composite particles. Through nano particle modification, functional monomer compounding and resin matrix optimization, the contradiction between light transmittance and mechanical performance of a traditional light diffusion film is broken through, comprehensive upgrading of optical performance (light transmittance / haze), mechanical strength (hardness / flexibility) and weather resistance (high temperature / aging resistance) is achieved, and the light diffusion film is suitable for high-end scenes such as ultra-thin OLED screens and vehicle-mounted display.

The invention discloses a UV-cured high-weather-resistance optical thin film and a preparation method thereof, and relates to the technical field of optical thin films. The optical film is prepared by taking polyethylene glycol terephthalate as a base material and coating the base material with a UV curing coating, and the UV curing coating comprises the following raw materials in parts by weight: 15-20 parts of aliphatic polyurethane acrylate, 5-8 parts of perfluorobutyl ethyl acrylate, 8-12 parts of hydroxyethyl acrylate, 6-10 parts of 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 1-3 parts of 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 1-3 parts of 1, 2, 4-trimethyl-1, the invention relates to a UV (ultraviolet)-resistant coating which is prepared from the following raw materials in parts by weight: 1-2 parts of 2, 6-hexanediol diacrylate, 5-8 parts of trimethylolpropane triacrylate, 30-40 parts of modified epoxy acrylate, 1-2 parts of a silane coupling agent KH-570, 2-3 parts of a photoinitiator 1173, 0.5-1.2 parts of a modified ultraviolet absorbent UV-327, 0.8-1.5 parts of a hindered amine light stabilizer 540, 0.3-0.8 part of an antioxidant 1010, 0.09-0.12 part of an ultraviolet absorbent Tinuvin400 and 0.2-0.5 part of polyether modified polydimethylsiloxane. According to the UV-cured high-weather-resistance optical thin film, polyethylene glycol terephthalate is used as a base material, key raw materials such as a UV-cured coating with a scientific formula, modified epoxy acrylate and the like are finely prepared, a two-stage curing process is adopted, and the weather resistance is excellent.

The invention provides an optical thin film surface defect detection system which is particularly suitable for optical thin film, wafer and sensor detection. The system integrates an illumination module, a confocal positioning module, a differential microscopic interference module, a phase shift module, an imaging module and a data processing module. A double-light-path imaging mode is adopted, wherein a differential interference microscopic light path recorded by a CCD and a microscopic dark field imaging light path are adopted. The differential interference microscopic light path obtains the microstructure and phase distribution information of the surface of the thin film with high sensitivity by using interference and phase shift technologies; the microscopic dark field imaging light path highlights film surface defects, particles and micro-nano structure characteristics by enhancing surface scattering signals. The device has the characteristics of simple structure, large single measurement range, high resolution, excellent precision and the like, effectively overcomes the defects of three-dimensional information loss, low efficiency, narrow application range, difficulty in positioning and the like in the traditional technology, and remarkably improves the detection efficiency and applicability.

The invention relates to the technical field of optical films with high damage thresholds, in particular to a tantalum oxide film with a high laser damage threshold under near-infrared long waves and a preparation method thereof, and the preparation method comprises the following steps: cleaning a substrate material by using a strong oxidation inorganic solvent, cleaning by using an organic solvent after cleaning by using deionized water, drying by blowing nitrogen, and drying to obtain the tantalum oxide film with the high laser damage threshold under near-infrared long waves. A clean substrate is obtained; depositing tantalum oxide on a clean substrate to obtain a tantalum oxide deposited substrate; and carrying out rapid annealing on the substrate deposited with tantalum oxide to obtain a substrate plated with tantalum oxide. According to the tantalum oxide thin film with the high laser damage threshold value under the near-infrared long wave and the preparation method of the tantalum oxide thin film, the laser damage threshold value of the tantalum oxide thin film at the near-infrared long wave is effectively improved through rapid annealing, the laser damage threshold value is improved by about 190% compared with an unannealed film layer, and the preparation time is greatly shortened.

The invention provides high-transparency bio-based polyimide as well as a preparation method and application thereof. The high-transparency bio-based polyimide comprises a polymerization product of a diamine monomer and a dicarboxylic anhydride monomer, and the diamine monomer is selected from 2, 5-bis (aminomethyl) furan and / or 2, 5-furandiamine. The high-transparency bio-based polyimide disclosed by the invention has high transparency, good heat resistance, film forming performance and the like, and can replace a traditional optical thin film material.

The invention provides a design method and a preparation method of a 1.8-4 [mu] m silicon-based lens anti-reflection film. The design method of the 1.8-4 [mu] m silicon-based lens anti-reflection film comprises the steps that Sa, a film system is designed with 550 nm as the reference wavelength of optical film design, a film stack formula Sub / 0.3 M 0.8 N (HL) 3K / AIR is used, the two faces of Sub are plated with the same film system, Sub is a silicon substrate, AIR represents air, in the film stack formula, H represents a high-refractive-index material ZnS with the 1 / 4 wavelength thickness, L represents a low-refractive-index material YbF3 with the 1 / 4 wavelength thickness, and in the film stack formula, Z represents a high-refractive-index material ZnS with the 1 / 4 wavelength thickness; m represents a base layer material SiO with the thickness of 1 / 4 wavelength, N represents a connecting layer material Ge with the thickness of 1 / 4 wavelength, K represents protective layer materials Al2O3 (aluminum oxide) and Sb with the thickness of 1 / 4 wavelength, and a film layer structure of Sub / SiO / Ge / ZnS / YbF3 / Al2O3 / Air is generated through an input film stack formula; sc, the thickness of the film layer is optimized through thin film design software, the optimal thickness of the film layer is obtained, and the transmittance of the 1.8-4-micron wave band of the optimized film layer structure meets the requirement; and Sd, the optimized film layer thickness is input into a control computer of the coating machine.

The invention discloses a colored radiation refrigeration optical thin film, which comprises a structure: MDM 'DM (A1A2) s which are sequentially stacked from bottom to top, the structure of the thin film is an asymmetric structure, A1 represents a first absorption layer, A2 represents a second absorption layer, s represents the number of stacking cycles, s is a positive integer, M represents a first metal layer, D represents a dielectric layer, and M' represents a second metal layer; m (A1A2) s is used as an atmospheric window radiation film layer, and MDM 'DM is used as a visible light and near-infrared band regulation and control film layer. The invention further discloses a preparation method of the colored radiation refrigeration optical thin film, and the colored radiation refrigeration optical thin film has the advantages of wide color gamut range adjustability, high saturation, low sunlight absorption and high emissivity of an atmospheric transparent window.

The present disclosure discloses an optical measurement device and system, the device comprising a light splitting module comprising at least one optical element plated with an optical film, the transmittance and / or reflectance of the optical film monotonically changing with wavelength within a measurement band range; the at least two image sensors are respectively arranged at the downstream of the light path of the light splitting module, at least one of the at least two image sensors is configured to receive the light beam output by the optical thin film and generate image information, and the image information is used for obtaining a two-dimensional wavelength distribution diagram of the to-be-detected sample. According to the embodiment provided by the invention, the wavelength measurement time is effectively shortened through the innovative combination of the optical film of which the transmittance and / or the reflectivity monotonically changes along with the wavelength in the measurement waveband range and the dual-path synchronous imaging architecture.

The invention relates to a bottom alignment grating preparation method and a bottom alignment grating, and the bottom alignment grating preparation method comprises the steps: depositing a grating material on a light-transmitting substrate, so as to form a grating material layer on the light-transmitting substrate; etching the grating material layer to form a plurality of grating areas with different heights on the grating material layer; and respectively etching each grating area to the light-transmitting substrate to form a plurality of groups of gratings with different heights so as to obtain a bottom-aligned grating. The partition structure of each grating area of the bottom-aligned grating is bottom-aligned, so that the optical efficiency of an optical device can be improved, and an optical film interference effect caused by a residual film is reduced. The bottom alignment grating can be prepared through the preparation method of the bottom alignment grating provided by the invention.

The invention discloses a preparation method and application of an anti-blue-light eye-protecting car window film, relates to the technical field of optical thin films, and discloses a window film which can effectively cut off harmful short-wave blue light with the wavelength range of 415-455nm. According to the invention, a multi-layer coating structure is constructed by utilizing alternate deposition of a high-refractive-index material titanium dioxide and a low-refractive-index material silicon dioxide. The optical thickness of the coating film meets the Bragg reflection condition, reflection of the wavelength of 435 nm can be enhanced, and the effect of preventing blue light is achieved. According to the invention, tannic acid is adopted to prepare silicon dioxide, and tannic acid can be used as a pore-forming agent, so that the prepared silicon dioxide has a larger surface area and can be grafted with more octadecylamine. Secondly, tannic acid and gallic acid are used for modifying silicon dioxide, tannic acid and gallic acid can cooperate with octadecylamine to conduct hydrophobic modification on silicon dioxide, and the hydrophobic performance of the car window film is enhanced.