360 results about "Interference phenomenon" patented technology

An optical multilayer structure has a substrate, a light-absorbing first layer in contact with the substrate, a gap portion having a changeable size capable of causing an optical interference phenomenon, and a second layer. By changing the size of the gap portion, an amount of reflection, transmission, or absorption of incident light can be changed. For example, the substrate is made of carbon (C), the first layer is made of tantalum (Ta), and the second layer is made of silicon nitride (Si₃N₄). Also in a visible light area, high response is realized. Consequently, the optical multilayer structure can be suitably used for an image display. The optical multilayer structure may be obtained by stacking, on a substrate made of a metal such as chromium (Cr), a first transparent layer made of a material having a high refractive index such as TiO₂ (n=2.40), a second transparent layer made of a material having a low refractive index such as MgF₂ (n=1.38), a gap portion having a changeable size capable of causing an optical interference phenomenon, and a third transparent layer made of a material having a high refractive index such as TiO₂.

The invention discloses an ETC (electronic toll collection) communication control method, a multi-beam antenna, a RSU (road side unit) and an ETC system. The method comprises the following steps: a step of position detection and a step of communication area control, wherein in the step of position detection, the position information of an automobile is detected by the RSU; and in the step of communication area control, the communication areas of an antenna array on a lane is switched over by the RSU according to the detected position information of the automobile and referring to a corresponding relationship between preset automobile position information and the communication areas of the antenna array on the lane; wherein at least two communication areas are provided; different communication areas have different distances with the antenna array; the corresponding relationship is preset in the specific mode that the closer the automobile is apart from the RSU, the smaller the distance between the communication areas and the antenna array is. With the adoption of the method, the automobile interference phenomenon during the communication between the RSU and an OBU (on-board unit) can be avoided effectively, and the reliability and the accuracy in communication between the RSU and the OBU are improved.

The invention discloses a pressure contact type spring pressure test device which comprises a base; a top plate is arranged on the base; a pressure plate is arranged between the top plate and the base; one end of the pressure plate is connected with the base, and the other end of the pressure plate penetrates the top plate and is arranged at the outer part of the top plate; and a contact block is fixed on the end surface of the pressure plate. The device can solve the interference phenomenon in providing pressure, is simple in structure, and is more convenient to use, the test result is more accurate, and the working efficiency is improved.

The invention provides a simulation experiment system for staged fracturing or simultaneous fracturing of horizontal wells. The system is used for performing fracturing simulation on a cubic artificial rock sample and comprises fracturing simulation assemblies, stress loading devices and fracture monitoring devices; each fracturing simulation assembly comprises a simulation wellbore, a liquid injection pipe and a position adjusting device; the simulation wellbores are located inside the artificial rock sample; the liquid injection pipes are located in the simulation wellbores; and at least two simulation perforations which are equal in number and different in position are formed in each simulation wellbore and each liquid injection pipe. Positions of the liquid injection pipes are controlled by the position adjusting devices, the communicating sequence of the simulation perforations in different fracturing sections is realized, and the different fracturing sections are fractured respectively. The simultaneous fracturing process of the two horizontal wells can be simulated by the two fracturing simulation assemblies. The simulation experiment system can simulate interference phenomena among fractures during staged fracturing of the horizontal wells or simultaneous fracturing of the two horizontal wells, and an experimental method is provided for understanding of hydraulic fracture propagation rules and fracture shapes.

The invention discloses a method for optimizing plunge milling machining of a slotting of an integral impeller. The method comprises the steps of establishing a plunge milling dynamics model and a milling model of a large filleted corner milling cutter asymmetry milling; substituting a modal parameter obtained from a modal experiment and a dynamic milling force obtained through a milling force model into a dynamics equation so as to further modify the cutting force; establishing an equivalent cutter bar stability analyzing finite element model, introducing a deformation ratio and a cutter bardanger position radial offset so as to obtain an optimized cutting parameter. According to the method, the problem of selection optimization of cutting parameters in the plunge milling machining of the slotting of integral impellers is solved, so that the interference phenomenon between cutters and work pieces is avoided; and the beneficial effects of small impeller deformation and high cutting efficiency are achieved. The method is also applicable for rough milling machining of slotting of similar parts.

The invention relates to a small-caliber aspherical composite precise processing method. The method comprises the following steps of: 1. clamping a workpiece (5) on a precise machine tool, wherein axes of a grinding wheel spindle (2) and a grinding head spindle (9) are parallel, separated from a sliding table (4) and intersected with the axis of a workpiece spindle (6); and grinding and processing an inclined shaft of the workpiece (5) by a micropowder grinding wheel (3); 2. carrying out in-place measurement on the workpiece (5) by using a detecting device (7) to generate a compensation processing track, and then processing along the track by the mocropowder grinding wheel (3); and 3. using a grinding head (8) to grind and polish the workpiece (5) to finally obtain a finished product. In the small-caliber aspherical composite precise processing method, precise inclined axis mirror grinding and inclined axis magnetorheological polishing and grinding are integrated into a single machine tool, so that the installation and the tool setting errors are reduced, the working hours are also reduced, the accuracy and the efficiency are improved, the interference phenomenon is prevented, the controllability is good, and continuous processing can be achieved.

The invention discloses a device adopting a physical method to prepare films on substrate material, and a method of observing film growth condition in the preparation process. A plating chamber in the device of the invention is consisted of a plating chamber shell and a bottom plate under the plating chamber shell. A charge valve and an observation window are arranged on a vacuum shell. A resistance heating evaporator, a radiar crucible evaporator, a sputtering target, an interference light source and a webcam are separately arranged on the bottom plate. A rotating tray driven by a rotation axis, a sample annealing heater and a device for fixing a making film sample arranged by the bottom of the sample annealing heater are arranged on a fixing frame. The method of the invention is that an interference phenomenon formed on the film is observed when the film grows.

The invention discloses a fiber laser self-mixing interferometer and a measurement method thereof and belongs to the field of displacement precision measurement. The interferometer comprises a distributed feedback semiconductor laser, a polarization-maintaining fiber coupler, an intra-line polarizer, a single mode fiber, an electrooptical modulator, an fiber Bragg grating, a gradient refractive index lens, a test piece, an photoelectric detector, a data acquisition and processing system, a fiber holder, one-dimensional guide rails, two-dimensional precision translation platform, a microscope, a base, a support and a signal generator. The fiber Bragg grating and the test piece form a reference outer cavity and a measurement outer cavity with the exit end face of the laser respectively for generating a double outer cavity self-mixing interference phenomenon; and the data acquisition and processing system adopts a self-mixing signal obtained by analysis by orthogonal demodulation technology to calculate the displacement of the test piece. The structure of the fiber interferometer is very suitable for measuring the nanometer displacement and vibration of the micro machines and MEMS devices and is more practical.

The invention relates to the technical field of motors, in particular to a high-temperature superconducting motor. The motor comprises an electromotor and an electric generator, wherein an armature winding of the motor is formed by winding high-temperature superconducting wires, current passing the wires has an AC component; and a heat insulated layer of the motor is arranged on the outer part of the motor, and the heat insulated layer is not arranged between a rotor and a stator of the motor or the heat insulated layer with the thickness of less than 10mm is arranged between the rotor and the stator of the motor. In the concentrated winding scheme and the non-concentrated winding scheme provided by the invention, a spatial mutual interference phenomenon does not exist on the end parts of coils; because low frequency AC is used, the loss is lowered; and the safety and stability of the motor can be effectively guaranteed, and the motor is particularly applied to fields such as wind power generation, propulsion of ships and automobiles and the like.

An optical system includes an optical interferometer that generates interference phenomena between optical waves to measure multiple distances, thicknesses, and indices of refraction of a sample. An excitation-emission device allows an electromagnetic excitation and emission to pass through an objective in optical communication with the sample. An electromagnetic detector receives the output of the optical interferometer and the excitation-emission device to render a magnified image of the sample. A digital delay generator synchronizes the optical interferometer and excitation-emission device to operate in substantially unison to generate a noninvasive depth of field of the portion of the sample that corrects a plurality of optical aberrations in real-time.

The invention discloses a Michelson interferometer based optical-fiber refraction index sensor and a measuring method thereof. The sensor comprises a broadband light source (1), an optical fiber coupler (2), a measuring sensing head (3), a reference sensing head (4), a spectrometer (5) and a computer (6), wherein the broadband light source (1) is connected to a first input port of the optical fiber coupler (2), a first output port of the optical fiber coupler is connected to the measuring sensing head (3) by an optical fiber, a second output port of the optical fiber coupler is connected to the reference sensing head (4) by an optical fiber, and a second input port of the optical fiber coupler is connected with the spectrometer. In the measuring method disclosed by the invention, interference phenomenon happens when light reflected by the reference sensing head and the measuring sensing head passes through the optical fiber coupler, wherein the contrast of interference fringes is changed with the refraction index of a to-be-measured matter in which the measuring sensing head is located; the contrast of interference fringes is measured by the spectrometer and the computer; then, the refraction index of the to-be-measured matter is calculated by using the computer. The sensor and the method disclosed by the invention can realize high-precision and large-range refraction index measurement; and the sensor is simple in structure, and easy to operate.

A method of compensating for channel interference of a display apparatus and a device for controlling driving of a data signal are provided. The method of compensating for the channel interference of the display apparatus includes: receiving pixel data of a scan line selected from an external screen memory; summing up the received pixel data and detecting a compensation time for compensating for channel interference which occurs in the selected scan line by using the sum of the pixel data; and adjusting at least one of a discharge time and a peak boost time of a driving current that is output to each data line according to the detected compensation time. Accordingly, it is possible to solve problems such as an increase of the circuit size caused by the existing compensation for the channel interference by controlling the discharge period or peak boost period with respect to each scan line and compensating for the channel interference phenomenon.

A cylindrical measuring head and measuring method for small gear measurement are provided. Technical points are that joint control of three coordinate axes X, Y, [phi] is achieved along the meshing line direction of a gear and simultaneous motion is achieved according to a proportional relation formed by the principle of meshing line. The measuring method comprises: firstly installing the gear on a gear measuring center rotary shaft, and then enabling the measuring rod mounting direction of the measuring head to be parallel with the Y-axis direction of the gear measuring center, wherein the measurement starting position of a measuring needle is a gear root measurement starting point; in accordance with the generation principle of gear meshing line, controlling the measuring head to synchronously move along the X, Y axes, and at the same time, revolving the gear around the [phi] axis, and enabling the measuring needle to move to a measurement finish position along the meshing line direction of a tooth crest along with the tooth surface of the gear. The sensing error of the tangential measuring head is the tooth profile error of the gear. The method avoids a case that in a traditional measurement method, because the gear tooth groove is small, the measuring head cannot enter the gear root measurement starting point and the measuring rod and the tooth surface have an unnecessary interference phenomenon in a measurement process.

The invention belongs to the field of image recognition, and particularly relates to a collimating film, a preparation method thereof, an interference-reducing collimating film and a preparation method thereof. In order to solve the problem that two layers of collimating diaphragms in a traditional rigid collimating sheet are difficult to align, the invention provides a collimating film and a preparation method thereof. The collimating film sequentially comprises a collimating lens layer, a flexible substrate layer and a collimating hole layer. The collimating lens layer includes a microlens array and a lens layer. The collimating hole layer comprises a collimating hole array. The micro-lens array of the collimating lens layer is arranged in a disordered manner. The collimating film provided by the invention only comprises one collimating hole layer, so that the problem that two collimating diaphragms are difficult to align is solved. Compared with an ordered collimating film, the interference-reducing collimating film can reduce the light interference phenomenon and improve the image recognition accuracy.

A method of manufacturing a flash memory device. According to the invention, a floating gate can be formed and a distance between cells can be secured sufficiently by using one conductive layer without using a SA-STI process that cannot be applied to the manufacture process of high-integrated semiconductor devices. It is therefore possible to minimize an interference phenomenon between neighboring cells. Furthermore, an isolation film is etched after a photoresist film covering only a high-voltage transistor region is formed, or a gate oxide film is formed after a semiconductor substrate is etched at a thickness, which is the same as that of the gate oxide film of the high-voltage transistor region, so that a step between the cell region and the high-voltage transistor region is the same. Accordingly, the coupling ratio can be increased even by the gate oxide film of the high-voltage transistor region, which is thicker than the tunnel oxide film of the cell region. In addition, damage to a tunnel oxide film, a semiconductor substrate or a floating gate while an isolation film is etched at a predetermined depth in order to control the EFH can be prevented by controlling the EFH in such a manner than conductive layer spacers are formed on sidewalls of the floating gate and the isolation film is further etched.