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731 results about "Optical surface" patented technology

Method and system for detecting and analyzing laminating quality of flexible circuit board

The invention belongs to the technical field of film quality analysis and evaluation, and particularly relates to a flexible circuit board film pressing quality detection and analysis method and system. The method comprises the steps of generating a self-adaptive scanning path based on a design file and surface deformation data; performing multi-modal data acquisition and fusion along a path through optical surface scanning, ultrasonic tomography and an optical coherence tomography imaging assembly; potential defects are positioned, and size, shape, position and defect type probability values are quantized; judging the authenticity of the defect by adopting a three-stage mechanism of cross-modal probability comparison, physical characteristic logic verification and multi-frame time sequence verification; and performing weighted scoring on the real defect matching acceptance standard table, and performing disqualification marking or outputting a process optimization suggestion to the pressing equipment according to a scoring result. According to the invention, the imaging limitation of the transparent coating layer is broken through, the internal interface layering and the precise detection of the microbubbles are realized, and the closed-loop control from detection to production adjustment is formed.
Owner:WEIDI ELECTROMECHANICAL TECH CO LTD

Optical surface defect data detection method based on deep learning

The invention discloses an optical surface defect data detection method based on deep learning, and relates to the technical field of optical defect detection, and the method comprises the following steps: constructing an optical scattering physical model, inputting a collected optical surface image into the optical scattering physical model for multi-modal data synthesis, and generating multi-modal image data; constructing a deep learning feature extraction network, inputting multi-modal image data, and performing multi-scale feature fusion and enhancement through a bidirectional attention feedback mechanism to generate a deep feature map; performing spatial domain analysis on the depth feature map by using a deep learning region generation method, positioning coordinates of potential defect regions, and generating a candidate defect region coordinate set; through multi-modal data synthesis driven by an optical scattering physical model, the limitation of a single imaging mode is broken through, the scattering characteristics of defects under multi-physics field coupling are dynamically analyzed, the recognizable degree of weak defects in a complex scattering environment is enhanced, and the problem of defect missing detection is solved.
Owner:SHANDONG AILIN INTELLIGENT TECH CO LTD

Titanium alloy bar quality detection system and method

The invention relates to the technical field of titanium alloy bar detection, and discloses a titanium alloy bar quality detection system and method. The system comprises a multi-modal data acquisition module, a detection reference dynamic optimization module, a data standardization processing module, a multi-modal feature fusion module, an intelligent defect identification and evaluation module, a quality grade evaluation module and a quality detection report generation module. When the quality of the titanium alloy bar is detected, through a multi-mode nondestructive detection mechanism integrating ultrasonic detection data, optical surface detection data and eddy current electromagnetic detection data, all-dimensional defect information of the interior, the surface and the near surface of the bar is synchronously obtained, and complementation and cross validation of the multi-mode detection data are achieved; the problem of limitation of a single sensor detection visual angle is solved, the missed detection and misjudgment risks are reduced, and the comprehensiveness and reliability of a defect detection result are ensured.
Owner:BAOJI XINBAOTAI METAL MATERIAL PROCESSING CO LTD

Apparatus, measurement method, and manufacturing method

An apparatus includes a first light source for illuminating a chart including an index surface on which an index is provided, an objective lens for guiding index light emitted from the chart to an optical system, a first element for receiving the index light reflected on an optical surface in the optical system, an interferometer configured to include a second light source and a second element, and acquire a wavefront of measurement light, the measurement light being test light reflected on the target surface, and a reduction unit for reducing an intensity of a signal of light reflected on an optical surface other than the target surface, of the test light reflected on the plurality of optical surfaces and received by the second element.
Owner:CANON KK

Ion beam polishing multi-working-condition removal function obtaining method

The invention provides an ion beam polishing multi-working-condition removal function obtaining method which comprises the steps that according to a to-be-machined optical surface shape and a planned movement track of an ion source relative surface shape, the change range of an ion beam incident angle and the change range of a machining distance in a polishing machining task are determined; carrying out limited times of single-point etching experiments, and detecting the surface shape of the workpiece after the single-point etching experiments; calculating a processing amount distribution, and calculating a removal function considering the incident angle of the ion beam and the processing distance based on the processing amount distribution data and the processing time; training an artificial neural network by taking the removal function as training data; and on the basis of the trained neural network, obtaining a removal function fitting parameter pair according to the actual processing task requirement, and performing inverse processing on the removal function fitting parameter pair to obtain a removal function of the actual processing point. According to the removal function obtained through the method, the influence under multiple working conditions is considered, and the current high-precision machining requirement for the high surface slope or various non-planar optical surface shapes can be better met.
Owner:CHONGQING UNIV OF POSTS & TELECOMM +1

Methods for compensating for optical surface nonuniformity

Systems and methods for compensating for nonuniform surface topography features in accordance with various embodiments of the invention are illustrated. One embodiment includes a method for manufacturing waveguide cells, the method including providing a waveguide including first and second substrates and a layer of optical recording material, and applying a surface forming process to at least one external surface of the first and second substrates. In another embodiment, applying the surface forming process includes applying a forming material coating to the at least one external surface, providing a forming element having a forming surface, bringing the forming element in physical contact with the forming material coating, curing the forming material coating while it is in contact with the forming element, and releasing the forming material coating from the forming element.
Owner:DIGILENS INC

Nanometer single particle reaction rate measuring system and method based on optical surface wave dark field imaging

The invention relates to the technical field of nano particle heterogeneous reaction kinetic research, in particular to a nano single particle reaction rate measuring system and method based on optical surface wave dark field imaging. The method comprises the following steps: preparing a nano single particle sample; the humidity of the environment where the nano single particles are located is adjusted; starting a heterogeneous reaction of the nano single particulate matter, performing in-situ dark field imaging on the nano single particulate matter in the reaction process, and collecting scattering hot spot imaging data under different reaction times and different humidity; and based on the acquired imaging data, the reaction rate of the nano single particulate matter is inversed in combination with a kinetic model. According to the invention, the defects in the existing nano-particle reaction rate measurement technology can be overcome, and the reaction rate of a single particle as low as 50 nanometers in the heterogeneous reaction process can be accurately measured and inverted under the high-humidity standard atmospheric pressure condition.
Owner:HEFEI INSTITUTE OF PHYSICAL SCIENCE CHINESE ACADEMY OF SCIENCES

Light source module and display apparatus

A display apparatus and a light source module thereof including a light guide plate, a first light source and a plurality of optical microstructures are provided. The first light source is disposed on one side of a first light incident surface of the light guide plate, and is adapted to emit a plurality of first light beams toward the first light incident surface. The optical microstructures are disposed on a first surface of the light guide plate, and each has a first optical surface facing the first light source, a first structural surface and a second structural surface. A first included angle provided between the first optical surface and the first surface of each of the optical microstructures gradually changes as a distance from the first surface increases. The first structural surface and the second structural surface of each optical microstructure are perpendicular to the first light incident surface.
Owner:CHAMP VISION DISPLAY INC

Disturbance quantification model and rooting method combined multi-parameter estimation algorithm in interference measurement

The invention relates to a multi-parameter estimation algorithm combining a disturbance quantification model and a rooting method in interference measurement. In order to solve the problems that in the prior art, the disturbance degree of a sequence is difficult to quantify, and harmonic key parameters are influenced by spectrum leakage, the invention provides the following innovative scheme: firstly, a sequence multi-classification measurement entropy quantification model is constructed, and quantitative evaluation of the signal noise degree is realized; secondly, through a Hankel matrix construction and rooting parameter estimation method, realizing accurate estimation of the harmonic frequency of the real-value signal; meanwhile, an amplitude correction algorithm based on window function characteristics is designed, and the signal sampling condition is effectively judged; and finally, through matrix weighting operation of a phase demodulation function, efficient reconstruction of an optical surface shape is realized, the problems of spectrum leakage and disturbance quantification in a traditional method are solved, and the method has relatively high measurement precision.
Owner:HUZHOU UNIVERSITY

Light guide mechanism and display equipment

The invention provides a light guide mechanism, comprising: an optical waveguide for conducting image light; the coupling-out grating is located on the surface of the optical waveguide and used for coupling out the image light from the optical waveguide; the first lens is located on one side of the optical waveguide and located on a light path of ambient light, the first lens is provided with a first optical surface deviating from the optical waveguide, the first optical surface is a free-form surface with asymmetric curvature, and the first optical surface is used for adjusting the focusing position of the ambient light. And the direction in which the ambient light is transmitted by the first lens is consistent with the direction in which the image light is coupled out by the coupling-out grating. The invention further provides a display device.
Owner:INTERFACE ADVANCED TECH (CHENGDU) CO LTD +3

Optical lens

Disclosed is a method implemented by a computer for determining surfacing data to obtain a surface of a lens element, the surface of the lens element including: a refraction area having a first curvature; and multiple optical elements placed on at least part of the finished optical surface, each optical element having at least a second curvature.
Owner:ESSILOR INTERNATIONAL(COMPAGNIE GENERALE D OPTIQUE)

Fixing assembly for installing lens measuring instrument and measuring instrument

The invention relates to the technical field of high-precision optical detection, in particular to a fixing assembly for installing a lens measuring instrument and the measuring instrument, and the fixing assembly comprises a rooting block which is used for being connected to the back surface of a lens in a gluing manner; the base is connected with the rooting block through a fastening assembly, the base is provided with at least three first contacts opposite to the back face of the lens and at least two second contacts opposite to the side face of the lens, and the fastening assembly is configured to be capable of generating first elastic force on the base in the first direction; and a second elastic force in a second direction. The rooting block is adhered to the back surface of the lens, so that a mechanical attachment point is prevented from being found on a vulnerable optical surface; meanwhile, the base is elastically connected with the rooting block through the fastening assembly instead of being rigidly and directly fixed, and the base elastically abuts against the back face and the side face of the lens through the first contact and the second contact respectively, so that self-adaptive accurate positioning of the base with the mirror face as the benchmark is achieved.
Owner:ANHUI JIANXING TECH CO LTD

A method for extracting full-band errors of optical component surface shape based on neural network

The present invention relates to the field of surface shape detection technology, and in particular to a method for extracting full-band errors of optical element surface shape based on a neural network, including S1: collecting surface shape detection results of different optical elements, and extracting corresponding full-band errors from each surface shape detection result, and packaging each surface shape detection result and the corresponding full-band error as a training data set to train three error extraction neural networks; S2: sorting and packaging the surface shape detection results of the optical element to be measured and inputting them into the three error extraction neural networks that have completed the training, and extracting the errors of each frequency band of the surface shape of the optical element to be measured through the three error extraction neural networks. The present invention can realize the automatic extraction of the full-band error of any optical surface shape without manual operation; the error neural network can process a large amount of surface shape data in batches, greatly improving the extraction efficiency of the full-band error, and facilitating subsequent analysis.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Reflector surface shape Zernike coefficient solving and residual analysis method based on MPC unit

The invention relates to the field of space camera reflector analysis, in particular to a reflector surface shape Zernike coefficient solving and residual analysis method based on an MPC unit, and the method comprises the steps: creating a node set in a reflector finite element model; node coordinates on the optical surface of the reflector are extracted; establishing a reference coordinate system, and constructing an optical surface node reference coordinate conversion function; performing normalization processing on the node reference coordinates and the node reference displacement of the optical surface; an optical surface Zernike coefficient solving function is constructed; creating an MPC unit of the Zernike coefficient of the optical surface; a Zernike fitting residual error RMS value solving function is constructed; and the MPC unit and the Zernike fitting residual error RMS value solving function are imported into the finite element model of the reflector to calculate and obtain a Zernike coefficient of the surface shape of the reflector and an RMS value of the Zernike fitting residual error. The optimization design efficiency of the space camera reflector is improved.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Fresnel lens defect detection method based on multi-light-source step-by-step detection

The invention belongs to the technical field of Fresnel lens defect detection, and relates to a Fresnel lens defect detection method based on multi-light-source step-by-step detection, which comprises the following steps: S1, building a Fresnel lens image acquisition platform, and acquiring a Fresnel lens threaded surface image by using an industrial camera in a dust-free environment and a plane backlight source; s2, building a Fresnel lens image acquisition platform, and acquiring a Fresnel lens smooth surface image based on a 60-degree annular backlight source by using an industrial camera in a dust-free environment; s3, processing the collected Fresnel thread surface image and the Fresnel lens smooth surface image by adopting histogram equalization and a median filtering method; and S4, performing defect detection on the collected Fresnel lens threaded surface image and the Fresnel lens smooth surface image by adopting an image segmentation technology based on Res-UNet + + and a BLOB technology. According to the invention, defects can be efficiently and accurately detected and positioned from an optical surface image such as a Fresnel lens.
Owner:SHANDONG YU YING OPTICAL INSTR CO LTD

Space large-aperture reflector flexible support design method and support structure

The invention discloses a flexible support design method for a spatial large-aperture reflector and a support structure, and relates to the field of quasi-kinematics support design of large-aperture spatial reflectors. According to the method, a titanium alloy material is selected, parameters such as the size of a connecting frame and the total height of a Bipod support are determined according to the quality of a reflector, the size of a glue spot and an installation space, a cross-shaped blade flexible element is designed to serve as a flexible knot, a three-dimensional parameterized model is established and imported into finite element analysis software, and the three-dimensional parameterized model is obtained. And optimizing structural parameters by taking the RMS value of the optical surface deformation of the reflector as a judgment standard, and finally carrying out dynamic verification such as modal analysis and random vibration analysis. According to the supporting structure, rigidity and flexibility are balanced through a flexible joint, thermal stress can be released, rigidity in the optical axis direction is guaranteed, the bending moment and the influence of machining and assembling errors are reduced, the supporting structure is suitable for reliable supporting of the spatial large-aperture silicon carbide reflector, and the positioning precision and the surface shape precision of the reflector during on-orbit work are effectively guaranteed.
Owner:XIAN INST OF OPTICS & PRECISION MECHANICS CHINESE ACAD OF SCI

Method for reducing long-term changes in a pass, optical element and system of semiconductor technology

The invention relates to a method for reducing long-term changes (ΔP) in a pass (P) of an optical surface (25a) of an optical element (Mi), preferably a mirror, in particular an EUV mirror. The method comprises processing the optical element (Mi), preferably a substrate (25) of the optical element (Mi), outside the optical surface (25a) to reduce surface damage, in particular to reduce surface roughness R. a, of the optical element (Mi) outside the optical surface (25a). During processing, material is preferably removed from the substrate (25) of the optical element (Mi) by brushing with at least one brush tool (27). The invention also relates to an optical element (Mi) comprising: an optical surface (25a), preferably for reflecting radiation, in particular for reflecting EUV radiation. The optical element (Mi), preferably a substrate (25) of the optical element (Mi) that is particularly transparent, has a surface roughness R on one or more partial surfaces outside the optical surface (25a). aof 5 µm or less, preferably of 3 µm or less, particularly preferably of 1.5 µm or less, and / or the partial surface or the multiple partial surfaces are transparent. The invention also relates to a semiconductor lithography system comprising at least one such optical element (Mi), which is preferably arranged in a projection optic (10).
Owner:CARL ZEISS SMT GMBH

DR4 silicon optical chip and 400G silicon optical engine

The invention relates to a DR4 silicon optical chip, which is characterized in that one side surface of a chip main body is an optical surface inclined by 8 + / -0.1 degrees, four output waveguides which are perpendicular to and intersect with the optical surface are arranged on the chip main body side by side, and an input waveguide which intersects with the optical surface is arranged on the chip main body. According to the 400G silicon optical engine, the end face of a multi-channel optical fiber array is a 0-degree face, the 0-degree face of the multi-channel optical fiber array is attached to the optical face of a DR4 silicon optical chip, and the multi-channel optical fiber array is coupled with four output waveguides on the DR4 silicon optical chip. The beneficial effects are that the DR4 silicon optical chip is provided with an optical surface with an inclination of 8 + / -0.1 degree, and the output waveguide is perpendicular to and intersects with the optical surface, so when the DR4 silicon optical chip is applied to a 400G silicon optical engine, the end surface of the selected multichannel optical fiber array can be a 0-degree surface, the grinding efficiency of the multichannel optical fiber array is effectively improved, the angle error is reduced, and the grinding precision is improved. The coupling efficiency is improved.
Owner:武汉钧恒科技有限公司

Direct-bonded lamination for improved image clarity in optical devices

Direct-bonded lamination for improved image clarity in optical devices is provided. An example process planarizes and plasma-activates optical surfaces to be laminated together, then forms direct bonds between the two surfaces without an adhesive or adhesive layer. This process provides improved optics with higher image brightness, less light scattering, better resolution, and higher image fidelity. The direct bonds also provide a refractory interface tolerant of much higher temperatures than conventional optical adhesives. The example process can be used to produce many types of improved optical components, such as improved laminated lenses, mirrors, beam splitters, collimators, prism systems, optical conduits, and mirrored waveguides for smartglasses and head-up displays (HUDs), which provide better image quality and elimination of the dark visual lines that are apparent to a human viewer when conventional adhesives are used in conventional lamination.
Owner:ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC

Multi-target adaptive optical tracking method and system for unmanned intelligent turntable

The invention provides a multi-target adaptive optical tracking method and system for an unmanned intelligent turntable. The method comprises the following steps: acquiring a video stream and turntable attitude data on an unmanned intelligent turntable; carrying out scene understanding operation on the video stream, fusing the dynamic attention area and extracting spatial distribution information of a plurality of moving targets in a rotary table coordinate system; calculating an optical deformation parameter of the liquid lens, and driving the liquid lens to execute non-uniform optical curved surface adjustment, so that a focus area simultaneously covers a plurality of spatially dispersed moving targets; receiving distance data fed back by the distance measuring equipment, carrying out cross validation on the distance data and actual optical parameters of the adjusted liquid lens, and generating a cooperative calibration instruction when the deviation exceeds the tolerance; and synchronously updating the dynamic region of interest identification logic of scene understanding and an optical deformation parameter calculation strategy according to the instruction. According to the invention, the stability and spatial positioning precision of multi-moving-target tracking in a wide-area complex scene are improved.
Owner:LUSTER LIGHTWAVE CO LTD

Interferometric measurement method

PendingDE102024135315A1Using optical meansInterferomeOptical surface
In a method for the interferometric determination of the shape of a freeform optical surface of a test specimen using an interferometer, the specimen is successively positioned in different measurement positions. These positions include a nominal position and a multitude of non-nominal positions that deviate from it, each of which can be described by a change in position relative to the nominal position. An interferogram is recorded in each measurement position, and phase information derived from the interferogram is evaluated to determine the surface shape. An interferometer error tilt sensitivity is determined by means of position changes in the form of tilts. A shear of the surface form error is determined by means of position changes in the form of displacements. Through integration, the surface form error, and consequently the interferometer error, can be determined.
Owner:CARL ZEISS SMT GMBH

Optical component and system of semiconductor technology with heating structures

The invention relates to an optical component, in particular a mirror, comprising: at least one heating structure (25, 25a) that can be subjected to an electric current, in particular a resistance heating structure, for introducing heat into a material of the optical component. In one aspect of the invention, the heating structure (25a) and a further, adjacent heating structure (25b) have interlocking edge structures (30a, 30b), wherein a heating power density (1a) of the edge structures (30a) of the heating structure (25a) on a side (32b) of the edge structures (30a) of the heating structure (25a) facing the further heating structure (25b) is lower than on a side (32a) of the edge structures (30a) of the heating structure (25a) facing away from the further heating structure (25b).In another aspect of the invention, the at least one heating structure (25) extends substantially over the entire optical surface (27) of the optical component and has a locally varying electrical resistance (Ra(x,y)) which preferably approximates a basis function extending substantially over the entire optical surface (27), in particular a Zernike polynomial.
Owner:CARL ZEISS SMT GMBH

Ground large-aperture reflector composite support design method and structure thereof

The invention discloses a ground large-aperture reflector composite support design method and a ground large-aperture reflector composite support structure. The ground large-aperture reflector composite support design method comprises the following steps: S1, determining the position of an adhesive point annular belt of a center support at a center hole of a lightweight primary mirror; s2, determining the position of a distribution circle supported by six points on the back of the primary mirror; s3, designing the size of a force unloading groove at the central support for releasing thermal stress; s4, designing the size and the installation depth of a universal flexible joint supported by six points, and realizing freedom decoupling; and S5, parametric modeling is carried out on the supporting structure, supporting parameters are optimized through finite element analysis, and it is ensured that the optical surface deformation RMS values of the primary mirror at the optical axis level and the 60-degree elevation angle are both not larger than 15 nm. The problem that in the prior art, when a large-aperture reflector is in the environment of large temperature change and large pose change, the optical surface is deformed due to the action of thermal stress and gravity, and the imaging quality is affected is effectively solved.
Owner:XIAN INST OF OPTICS & PRECISION MECHANICS CHINESE ACAD OF SCI

Optical surface defect detection system based on wall poster coating analysis

The invention belongs to the technical field of wall poster coating detection, and particularly relates to an optical surface defect detection system based on wall poster coating analysis, which comprises an optical illumination unit, a wall poster coating imaging unit, a processing identification positioning unit, an operation influence analysis unit, an intelligent control unit and a real-time alarm unit, a detection area is illuminated through the optical illumination unit, the wall poster coating imaging unit collects a wall poster coating surface image in real time, and the processing recognition positioning unit performs defect feature recognition classification based on the wall poster coating surface image and judges whether a defect alarm signal is generated or not, so that the detection efficiency and the detection result accuracy are improved; and the adverse factor influence degree in the wall poster coating defect detection process is analyzed through the operation influence analysis unit and an alarm is given in time, and the process optimization reminding unit carries out process optimization reminding analysis and gives an alarm in time based on defect detection information, so that the wall poster coating production detection supervision difficulty is remarkably reduced.
Owner:JIANGSU HAOLONG NEW MATERIALS CO LTD

Method for producing an EUV mirror component, intermediate product of an EUV mirror component

A method for producing an EUV mirror component (M1-M6, 40), in which a multilayer coating system (31) is applied to a surface of a mirror body substrate (30, 37) in order to form an optical surface that is highly reflective for EUV radiation. A temporary protective coating structure (36) is produced on the multilayer coating system (31). The protective coating structure (36) comprises a protective layer (35) and a sacrificial layer (34) arranged between the protective layer (35) and the multilayer coating system (31). The temporary protective coating structure (36) is removed before the EUV mirror component is put into operation. The invention also relates to an intermediate product of an EUV mirror component.
Owner:CARL ZEISS SMT GMBH

Multi-user occupant location determination and gaze tracking in a vehicle space using optical surface reflections

Methods, systems, and storage media for performing multi-user gaze tracking in a vehicle space using multi-surface optical reflections are disclosed. Implementations may: acquire face and eye region image data of a plurality of occupants within a field of view of at least one camera associated with a vehicle; evaluate reflected image quality thresholds; locate and match occupants within the vehicle space; and perform eye tracking for multiple occupants independently via reflected multi-view images provided to a deep learning model.
Owner:BLINK TECH LTD +1

Method for manufacturing an optical test element for determining a fit defect of an optical surface

Method for producing an optical test element (19) for determining a fit defect of an optical surface (20). The method comprises the following steps: - Determining a CGH design (24) suitable for measuring the optical surface (20), - Generating a CGH auxiliary structure (25) corresponding to the CGH design (24) on an auxiliary substrate (30) using a direct-write lithography process, - Generating an image of the CGH auxiliary structure (25) on a final substrate (40) using a transfer lithography process, - Generating a CGH structure (50) corresponding to the CGH design (24) based on the generated image. The method offers the advantage that the auxiliary substrate can be produced with high precision using a standardized direct-write lithography system, regardless of the size of the optical test element.
Owner:CARL ZEISS SMT GMBH

Spectacle lens and spectacles

Provided are a spectacle lens 1 and related features, wherein the spectacle lens 1 is provided with a lens base material with an optical surface and an anti-reflective film coating the optical surface of the lens base material, the anti-reflective film has a multilayer structure including a low refractive index layer and a high refractive index layer layered on each other, the anti-reflective film is provided with a reactive layer that has relatively higher reactivity to ultrashort pulse laser irradiation than the other layers included in the anti-reflective film, and a marking 2M is applied in a cut lens-like shape in a material removal area formed by at least partially removing one or more specific layers including a topmost layer of the multilayer structure, wherein in the marking, the material removal area is visible due to visible light as a result of exposure of the high refractive index layer below the reactive layer or exposure of the reactive layer having partially remained.
Owner:HOYA LENS THAILAND LTD

Adaptive optical module for a microlithographic projection exposure system

An adaptive optical module (38A) for a microlithographic projection exposure system (10; 210) is provided, comprising an optical surface (32) for interacting with an exposure radiation (14) of the projection exposure system and several actuators (36n-1, 36n, 36n+1) for changing the shape of the optical surface. The adaptive optical module has a dielectric medium (48) that can be deformed by applying an electrical voltage (68), and each of the actuators includes a separate control electrode (62n-1, 62n, 62n+1), each of which is arranged to generate a respective electric field in a layer of the dielectric medium.The control electrodes are connected to each other by means of a weakly conductive structure (60) with an electrical conductivity of at least 0.1 mS / m and for measuring an impedance (86n-1, 86n, 86n+1) at least one of the actuators is arranged between the control electrode of the actuator being measured and the dielectric medium a measuring electrode (58n-1, 58n, 58n+1).
Owner:CARL ZEISS SMT GMBH

Optical element and equipment

An optical element includes a mirror array and an optical surface opposed to the mirror array. The mirror array includes a mirror group including a plurality of retroreflective mirrors arranged in an X direction, and a mirror group including a plurality of retroreflective mirrors arranged in the X direction. The mirror group and the mirror group are juxtaposed in a Y direction. The plurality of retroreflective mirrors of the mirror group extends along a W1 direction oblique to the optical surface. The plurality of retroreflective mirror of the mirror group extends along a W2 direction oblique to the optical surface. The mirror group and the mirror group overlap in part in a V1 direction.
Owner:CANON KK