421 results about "Numerical aperture" patented technology

The invention discloses a deep ultraviolet spherical catadioptric detection objective lens, and relates to the technical field of optics, the deep ultraviolet spherical catadioptric detection objective lens comprises a first lens group, a second lens group and a diaphragm, one side of the first lens group is arranged to be an object plane, the first lens group is located between the second lens group and the object plane, the first lens group is used for converging light and correcting residual aberration of the second lens group, and the diaphragm is arranged between the second lens group and the object plane. The diaphragm is arranged in the middle of the second lens group, and the second lens group and the diaphragm are used for correcting vertical axis aberrations such as coma of the system. The objective lens adopts a spherical catadioptric structure, can realize deep ultraviolet band application, has a large numerical aperture, the numerical aperture can reach 0.8, the smaller wavelength and the larger numerical aperture have higher resolution, so that smaller defects can be detected, the working distance can be greater than 10mm, and the detection precision is improved on the basis of realizing the large NA design. The length of the system is reduced, the number of original parts is reduced, only five lenses are needed, the structure is simple, and installation and detection are convenient.

The invention provides a preparation method of a barrier type antimonide infrared detector. The preparation method comprises the following steps: selecting a gallium antimonide substrate; a gallium antimonide buffer layer, an indium arsenide heavily-doped layer, a class II superlattice absorption layer and an aluminum-arsenic-antimony barrier layer are sequentially grown on the substrate in an epitaxial mode through a molecular beam epitaxy method; mechanically stripping the hexagonal boron nitride two-dimensional material, and transferring the stripped hexagonal boron nitride to the aluminum-arsenic-antimony barrier layer to form a Van der Waals heterojunction and composite barrier layer structure; depositing electrodes by using an ultraviolet lithography technology and a thermal evaporation mode to form one electrode arranged on the gallium antimonide buffer layer and the other electrode arranged on the boron nitride; a large-numerical-aperture micro-lens array is processed on a substrate, and the micro-lens array is composed of gallium antimonide cylinders with a phase modulation function; therefore, the antimonide medium-wave infrared detector with the composite barrier layer can be formed, the quantum efficiency is improved, the order of magnitude of dark current is reduced, and room-temperature medium-wave infrared detection can be realized.

The application discloses a multi-marked endoscopic imaging lens for digestive tract, and belongs to the field of biomedical microscopic endoscopic imaging. The endoscopic imaging lens comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens; the first lens focuses laser; the second lens is matched with the first lens to limit a light beam in an effective light aperture of the lens; the third lens corrects chromatic aberration; the fourth lens and the fifth lens are combined to correct aberration; the sixth lens adopts an aspheric lens to correct spherical aberration caused in a collimating and focusing system; and the seventh lens is matched with the sixth lens to correct chromatic aberration. The working spectral range of the microscopic objective lens group is 488-860 nm, the effective light aperture is less than 1.8 mm, the mechanical outer diameter is not greater than 2.6 mm, the numerical aperture at the object side or the tissue is 0.55, the imaging field of view is 450 microns, the magnification is 2.14 times, and the working distance is 84 microns. The effect of matching excitation and fluorescence spectrum of a clinically available fluorescence contrast agent is realized.

The invention discloses an optical fiber multi-parameter testing device and method, and aims to realize integrated and efficient testing of optical fiber mode field diameter, attenuation, cut-off wavelength, macrobend loss and geometric parameters. The device comprises a three-dimensional adjusting frame, an image acquisition system, a photoelectric detection system, a light path switching device, an environment compensation module and a control unit, through optical path switching, rapid switching between an image channel and a detection channel can be realized, and full-parameter testing can be completed through one-time focusing of an end face; an objective lens with a large numerical aperture and a long working distance and an auxiliary convergent lens with NA = 0.5 are adopted, so that the mode field measurement precision is improved; the control system coordinates operation of all the modules and performs environment compensation and data processing; the scheme has the advantages of compact structure, quick test, stable result and the like, and is suitable for application scenes of optical fiber manufacturing, quality detection and the like.

Integrated target waveguide devices and optical analytical systems comprising such devices are provided. The target devices include an optical coupler that is optically coupled to an integrated waveguide and that is configured to receive optical input from an optical source through free space, particularly through a low numerical aperture interface. The devices and systems are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The devices provide for the efficient and reliable coupling of optical excitation energy from an optical source to the optical reactions. Optical signals emitted from the reactions can thus be measured with high sensitivity and discrimination. The devices and systems are well suited for miniaturization and high throughput.

The invention discloses a PINN-based large numerical aperture photoetching objective lens vector diffraction field calculation method, which comprises the following steps: obtaining a three-dimensional vector diffraction light field of a large NA photoetching objective lens through simulation, reconstructing the three-dimensional vector diffraction light field at a sampling point position, and generating corresponding complex electric field distribution matrix data; performing physical purification on the complex electric field distribution matrix data to construct a corresponding data set; constructing a corresponding Helmholtz equation as a constraint equation based on the light field tight focusing characteristic of the large NA photoetching objective lens; constructing an initial model, and training the initial model by using the data set in combination with the constraint equation to obtain a PINN model for predicting complex electric field data; and inputting space coordinates of a to-be-predicted target into the PINN model to obtain complex electric field data. According to the method provided by the invention, the calculation efficiency of the vector diffraction field can be remarkably improved on the premise of keeping relatively high simulation precision, and the method is suitable for rapid modeling and analysis of the three-dimensional vector light field of the large-numerical-aperture photoetching object mirror.

A method having the steps of measuring a geometry of a toothing using an optical measuring system, wherein a numerical aperture of the optical measuring system is adjustable and the numerical aperture of the optical measuring system is adapted depending on at least one geometric parameter of the toothing to be measured and / or is enlarged or reduced.

An imaging optic (10) for projection lithography serves to image an object field (5), in which a reticulum to be imaged can be arranged, onto an image field (11), in which a substrate to be exposed can be arranged. The imaging optic (10) has a plurality of mirrors (M1 to M8) for guiding imaging light (16) along an imaging beam path from the object field (5) to the image field (11). The image-side numerical aperture of the imaging optic (10) is greater than 0.75. The optical conductivity of the imaging optic (10) is greater than 45 mm. 2 The result is an imaging optic whose usability for a projection exposure system is improved.

The invention relates to the technical field of microscopic optical imaging, and discloses a semiconductor conductive particle detection task-oriented differential interference optical system, which comprises an objective lens group and a differential interference module, the objective lens group comprises a front group, a middle group and a rear group which are arranged in sequence; the front group is used for ensuring a large aperture angle and less introduction of spherical aberration and chromatic aberration, the middle group is used for compensating various aberrations introduced by the front group, and the rear group is used for correcting field curvature; the differential interference module comprises a Nomarski prism, a polarizer and an analyzer which are arranged in sequence; the Nomarski prism is used for splitting and combining the linearly polarized light beams; the polarization analyzer is used for converting linearly polarized light which passes through the Nomarski prism and is orthogonal in polarization direction into linearly polarized light with the same polarization direction; the system further comprises a beam splitter and a barrel lens group. According to the invention, long working distance and large numerical aperture can be realized in the visible light wave band, the light path design is optimized so as to reduce aberration introduction, and the anti-interference capability to weak signals is enhanced.

The invention relates to the field of integrated circuit manufacturing, in particular to a joint correction method, device and equipment for a curve graph and a storage medium. According to the target wafer pattern, determining a corresponding curve mask pattern through a pre-trained optical proximity correction model; according to the curve mask pattern, determining a corresponding curve electron beam exposure pattern through a pre-trained mask process correction model; according to the curve electron beam exposure pattern, determining a corresponding Manhattan pattern and a numerical aperture; receiving a plurality of sample plate Manhattan patterns; according to the sample plate Manhattan graph, a corresponding sample plate curve graph is obtained through preset numerical aperture simulation; acquiring a mask scanning pattern corresponding to the sample plate curve graph; and calibrating a mask process calibration model to be trained according to the mask scanning pattern and the sample plate curve graph. According to the invention, the compatibility and the universality of the joint correction method for the curve graph are improved.

The invention provides a confocal microscope objective lens with high optical flux and long working distance, the confocal microscope objective lens comprises a first lens group and a second lens group which are sequentially arranged along the light transmission direction, the first lens group comprises a first lens, a second lens, a third lens and a fourth lens which are sequentially arranged along the light transmission direction, the first lens is a negative lens, and the second lens is a positive lens. The working distance is prolonged; the combination of the second lens, the third lens and the fourth lens has positive focal power and is used for focusing light, so that the objective lens obtains a larger numerical aperture; the second lens group comprises a sixth lens and a seventh lens which are sequentially arranged in the light transmission direction, and the combination of the sixth lens and the seventh lens has negative focal power and is used for enlarging the aperture of the light beam and reducing the angle of the incident light beam at the same time. According to the scheme, a view field of 12 mm is achieved, the numerical aperture reaches 0.5, the working distance reaches 17.7 mm, and excellent imaging performance is achieved while the large view field, the high resolution and the long working distance are considered.

The invention provides a compact photoetching simulation system based on a physical model, which relates to the technical field of photoetching simulation tools and physical modeling and comprises a model construction module, a kernel visualization module, a simulation calculation module, a result evaluation and optimization module, a model library management module, a real-time simulation module, an error compensation module and a simulation result verification module. The model building module is used for building a three-dimensional photoetching model according to the light source wavelength, the coherence factor, the numerical aperture and the aberration coefficient of a photoetching machine in the photoetching equipment as well as the photoresist type, the photoetching resolution requirement and the photoetching pattern feature size of the photoetching process. Diffraction of light in a projection objective, interference of light on the surface and inside of photoresist and physical and chemical processes of a photoresist molecule microscopic level are comprehensively considered, and compared with a basic physical model, the complex propagation path of light in photoetching equipment can be accurately simulated.

The invention discloses a super-resolution micro lens and a preparation method thereof. The lens comprises a photoresist spherical micro lens and a mixed substrate plane lens which are sequentially arranged from top to bottom. The specific preparation method comprises the following steps: S1, preparing a photoresist cylinder on a quartz substrate; s2, reflowing the photoresist cylinder into a micron lens by using a photoresist reflowing process; s3, preparing a mixed substrate plane lens on the surface of the to-be-detected sample; and S4, transferring the micron lens to the surface of the mixed substrate plane lens. By changing the thickness of the mixed substrate plane lens, adjustment of the amplification coefficient and the numerical aperture can be realized, and compared with a micro lens without a mixed substrate, the micro lens has higher imaging resolution. The method has a wide prospect in the technical field of optical imaging.

The invention provides a deep ultraviolet infinite imaging detection objective lens, belongs to the technical field of optics, and solves the problem that tiny defects in a semiconductor device are difficult to discover, the objective lens comprises a first lens group, a diaphragm, a second lens group and a third lens group which are sequentially arranged from an object plane in the optical axis direction, the first lens group has positive focal power, and the second lens group has negative focal power. Comprising a first meniscus lens, a second meniscus lens, a third meniscus lens, a fourth meniscus lens, a fifth meniscus lens and a sixth meniscus lens. The second lens group has positive focal power and comprises a seventh meniscus lens, an eighth meniscus lens, a ninth meniscus lens, a first biconvex lens and a second biconvex lens; the third lens group has negative focal power and comprises a first biconcave lens, a tenth meniscus lens, a second biconcave lens and an eleventh meniscus lens, and finally light emitted from the third lens group is parallel light. According to the invention, the change of different multiplying power can be realized, the method is suitable for a deep ultraviolet wave band with a very short wavelength, the numerical aperture is larger, and the resolution is higher.

The present invention discloses a six-group and seven-lens micro immersion objective lens, which includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, and a sixth lens arranged in sequence from the object plane to the image plane. The third lens is a doublet lens; the S11 surface of the first lens is a plane, and the S12 surface bulges towards the image plane. The S21 surface of the second lens bulges towards the object plane, and the S22 surface bulges towards the image plane. The S31 surface of the third lens bulges towards the object plane, the S32 surface bulges towards the object plane, and the S33 surface bulges towards the image plane. The S41 surface and the S42 surface of the fourth lens both bulge towards the object plane. The S51 surface and the S52 surface of the fifth lens are both concave. The S61 surface of the sixth lens bulges towards the object plane, the S62 surface bulges towards the object plane or is a plane. The above composition and layout enable the numerical aperture of the objective lens to reach 0.8. Compared with the objective lens of the existing confocal system, the numerical aperture of the present application is larger, which can further improve the fluorescence collection efficiency, thereby significantly improving the recognition sensitivity for weak fluorescence targets.

The invention relates to the technical field of imaging detection, in particular to a microscopic imaging system for detecting a microlens, which comprises a light source path establishing module, an initial image position acquisition module, a peak coordinate recording module, a stability offset analysis module and an imaging quality judgment module. According to the invention, the numerical aperture normalization processing is carried out on the direction of the light passing through the specific aperture area, so that the precise control of the spatial distribution characteristic of the light beam is realized, the spatial mapping of the focus position is completed on the basis of the light in the unified direction, the direction consistency and the imaging stability in the image forming process are improved, and the imaging quality is improved. By combining continuous peak coordinate search of a light spot focusing position, a light spot change trend can be dynamically obtained, imaging deviation caused by infinitesimal displacement can be effectively distinguished, and an accurate marking mechanism for light spot stability is constructed by means of absolute difference extraction of three-dimensional offset data and Rayleigh criterion tolerance judgment. And the response sensitivity and the analysis reliability of weak instability factors in the imaging performance of the micro lens are improved.

According to the flexible waveguide coupling structure for the high-density optical engine and the miniaturized packaging method of the flexible waveguide coupling structure, the polymer optical waveguide is adopted, the waveguide core layer is made of the high-refractive-index material, and the refractive index of the core layer is higher than that of the upper cladding and the lower cladding, so that light beams can reflect light rays on the surface or in the core layer; the light beam is limited in the core layer to be transmitted along the set path; the flexible waveguide is used in high-density optical engine packaging, a traditional ribbon optical fiber array is directly replaced, and the contradiction between space limitation and bending radius is solved; comprising a flexible waveguide, an MT / MPO connector and a microlens array, polymers such as PMMA, BCB, SU-8, FPPE, PSQ, PDMS / M-PDMS and the like are selected as flexible waveguide materials, the thickness is smaller than or equal to 0.2 mm, the bendable radius is smaller than or equal to 2 mm, the core / cladding refractive index difference delta n is larger than or equal to 0.01, the multimode numerical aperture NA is approximately equal to 0.3, the transmission loss in a 850 nm window is smaller than or equal to 0.25 dB / cm, the angle of a coupling end face is 40-50 degrees, and the requirements for low loss and high bandwidth of short-distance parallel optical interconnection are met.

The invention discloses an ultraviolet broadband large-view-field detection objective lens, and belongs to the technical field of optical instruments. In order to solve the problems that in the prior art, balance among short-wavelength, large-numerical-aperture, large-view-field and broadband detection is difficult to obtain, and meanwhile system complexity and manufacturing cost are considered, the invention provides an ultraviolet broadband large-view-field detection objective lens. Comprising a first lens group, a second lens group, a third lens group and a fourth lens group which are sequentially and coaxially arranged from an object plane, each lens group comprises a plurality of lenses, and the first lens group and the fourth lens group are variable lens groups. The method can simultaneously meet high requirements on resolution, detection range and detection efficiency, and is suitable for defect detection and quality control in the field of semiconductor wafer manufacturing.

An OCT system for the retina (4) comprises: an illumination unit (36) providing SS-OCT source radiation, an illumination beam path leading to the object (4) and a measurement beam path coming from the object (4) to a detector (38) having pixels (74), wherein the measurement beam path is coupled out via a splitter element (42), a filter element (48) following the splitter element (42) which makes the numerical aperture of the image larger in a first direction (x) than in a second direction (y) lying transversely thereto, and a coupling device (52, 66) for coupling in the reference radiation (R) in the pupil and outside the optical axis (6), so that the reference radiation (R) is superimposed on the detector (38) with the measurement radiation (M) at an angle, wherein the control device (58) reads out pixels (74) of the detector (38) which correspond to a line-shaped area in the image field (22) correspond,which has a line length along the first direction (x) and a line height along the second direction (y), and the control device (58) realizes an image field (22) that is higher than the line height by moving the line-shaped region over the object (2) along the line height, wherein a depth resolution of the generated 3D image is determined by the spectral range and spectral bandwidth of the tuning, and a lateral resolution of the 3D image is determined by the numerical aperture in the line direction and by the line height.

Provided herein is a solution for measuring the optical power loss of duplex optical-fiber devices under test, and particularly those terminated with a duplex connector interface, which allows for a one-cord testing method whichever the format of the duplex connector interface of the optical-fiber device under test, without disconnecting the optical fibers of the device under test from their duplex native connector interface. Provided is an optical-fiber expansion device used to interconnect and adapt a power meter instrument to a variety of duplex connectors. The optical-fiber expansion device comprises a pair of optical fibers having a core diameter and a numerical aperture greater than the optical fiber in the DUT connector interface, to make it compatible with the one-cord testing method. Interchangeable optical-fiber expansion devices can be used to match the power meter interface on one side, to various duplex connector interfaces under test on the other side.

The invention provides a long-focal-depth Bessel beam volume microscopic imaging system, and belongs to the technical field of optical microscopic imaging. The system comprises a non-diffraction light beam generation module, a scanning and focusing module, a sample control module, a fluorescence signal detection module and a microscopic imaging processing terminal. According to the invention, laser is used as an excitation light source, the non-diffraction beam generation module generates a long-focal-depth Bessel beam with a non-diffraction distance n times that of a traditional Bessel beam, the transmission distance is controllable, the limitation of an effective numerical aperture can be broken through, and under the condition of a certain transverse resolution, an ultra-large imaging depth of field is provided. Volume imaging is realized by using the characteristic of long focal depth and no diffraction, more axial information stacks are obtained, and the imaging speed and the imaging resolution are relatively high.

The present invention discloses a multimodal super-resolution quantitative phase microscopy method. The present invention uses a programmable LED array as an illumination light source, employs an objective lens with a low numerical aperture to obtain a stack of collected light intensity maps in multiple modalities, and uses the calculated light intensity maps as intensity constraints to perform multiple iterative updates, thereby achieving super-resolution quantitative phase microscopy. By virtue of the low numerical aperture objective lens and the programmable LED array, the present invention reduces the requirement for high-coherence illumination of the imaging system, and uses the idea of iterative reconstruction to complete phase recovery, thereby achieving super-resolution quantitative phase microscopy, which has the advantages of high resolution, high signal-to-noise ratio, and large field of view.

The present invention relates to an inspection apparatus and an inspection method which selectively adjust a numerical aperture of illuminating light in the form of collimated light when inspecting a target object, such as a wafer or the like, using a spectrum, thereby preventing a diffraction phenomenon caused by the illuminating light. The inspection apparatus may include: a camera unit disposed above a target object; an illumination unit configured to illuminate the target object with illuminating light; and a light detection unit configured to detect reflection light of the target object illuminated with the illuminating light, wherein the illumination unit comprises a numerical aperture adjustment device which has a first optical member having a first numerical aperture that is replaceable with a second optical member having a second numerical aperture different from the first numerical aperture so as to reduce a diffraction phenomenon caused by the illuminating light.

The application provides a continuous zoom optical system and a stereomicroscope for the stereomicroscope, and the optical lens unit comprises, in sequence along a main optical axis, an upper fixed lens group, a compensation lens group, a middle fixed lens group, a zoom lens group and a lower fixed lens group; a variable diaphragm is arranged between the middle fixed lens group and the zoom lens group along the main optical axis; the upper fixed lens group, the compensation lens group, the zoom lens group and the lower fixed lens group are all configured as double lens combinations, the focal length values of the upper fixed lens group and the zoom lens group are negative, and the focal length values of the compensation lens group and the lower fixed lens group are positive; the middle fixed lens group is configured as a double-concave single lens; the compensation lens group and the zoom lens group are axially moved along the main optical axis based on a first zoom fitting curve and a second zoom fitting curve respectively; and the advantages are that the system has smooth magnification, suppresses vignetting phenomenon, and dynamically adjusts the numerical aperture, the depth of field and the light throughput to adapt to different scene requirements.

Examples relate to a microscope system, such as a surgical microscope system, and to a corresponding method. The microscope system (100) comprises a microscope (120) with a first optical imaging sensor (122) for generating first imaging sensor data based on light having a first wavelength spectrum, a second optical imaging sensor (124) for generating second imaging sensor data based on light having a second wavelength spectrum, and a multispectral iris (130), configured to provide an opening with a first numerical aperture for the light having the first wavelength spectrum and an opening with a second numerical aperture for the light having the second wavelength spectrum, with the first numerical aperture being different from the second numerical aperture. The microscope system comprises one or more processors (114), configured to generate a composite image based on the first imaging sensor data and based on the second imaging sensor data.

The application discloses a hard mirror optical system of a hard tube endoscope, which comprises an objective lens and a rod lens in sequence from an object side to an image side, and is characterized in that the rod lens comprises n groups of rod lens units, n is a positive odd number, and the rod lens unit is composed of symmetrically arranged object-side rod lens units and image-side rod lens units, and the advantage lies in that through systematic optical design, the focal length, entrance pupil diameter, numerical aperture of the objective lens and the rod lens, and the length of the rod lens unit and other performance parameters are reasonably set, so that the high-definition imaging requirement of the endoscope under the visible light and fluorescence double modes can be met.

The invention relates to a variable-focus metamaterial lens system. The system comprises a first metasurface and a second metasurface. A first metasurface and a second metasurface are sequentially arranged on the same optical axis, and a preset distance is reserved between the first metasurface and the second metasurface. A group of sub-wavelength structure units are constructed on the surface of the first metasurface; a group of sub-wavelength structure units are constructed on the second metasurface, and the second metasurface rotates by an angle theta around the normal direction relative to the first metasurface; the equivalent phase distribution of the composite device can be adjusted through the relative rotation between the first metasurface and the second metasurface, and the continuous regulation and control of the focal length are realized along with the change of the numerical aperture. Therefore, the complexity is reduced, and the response speed is improved.

The invention relates to the technical field of imaging optical system and device design, and discloses a long-working-distance 10-time large NA telecentric microscope lens and an optical system thereof. The optical system comprises a front group S1 with positive focal power, a diaphragm T and a rear group S2 with negative focal power which are sequentially arranged from an object side to an image side, and the diaphragm T is placed at the focal point of the front group S1 to form an object side telecentric framework; the maximum outer diameters of all the lenses in the front group S1 are the same, and the maximum outer diameters of all the lenses in the rear group S2 are the same; the working distance WD and the numerical aperture NA of the optical system meet the relational expression that NA * WD is smaller than or equal to 17. According to the optical system provided by the invention, the amplification factor is 10 times, and the microscope-level resolution ratio of 1.5 microns can be realized; the outer diameters of the front and rear groups of lenses are the same, so that the coaxiality is ensured after assembling and forming, and the imaging quality of the lens is improved.

Optical coherence tomograph for examining an eye (3) which features: - a lighting device (4, 5) for providing source radiation, - an illumination and measurement beam path (7) comprising a splitting element (6) for splitting the source radiation into illumination radiation (B) and reference radiation (R), with the illumination radiation (B) illuminating an illumination field in the eye (3) and collecting backscattered illumination radiation in the eye (3) as measurement radiation (M), wherein the illumination and measurement beam path (7) comprises a scanner (13) for adjusting the lateral position of the illumination field in the eye (3) and a front optic (12), - a reference beam path (8) which provides for the reference radiation (R) an optical path length (21) corresponding to an optical path length from the splitting element (6) to the illumination field and back to a superposition point (71), - a detection beam path (14, 15, 17) which receives the measuring radiation (M) from the illumination and measuring beam path (7) and the reference radiation (R) from the reference beam path (8) and superimposes them at the superposition point (71) and directs them onto a detector (19), - the illumination and measuring beam path (7) further exhibits - a beam splitter (11) for separating the measuring radiation (M) collected by the eye (3) from the illumination radiation (B) directed to the eye (3), wherein the beam splitter (11) directs the separated measuring radiation (M) to the detection beam path (14, 15, 17), and - a light splitting element (32, 34) that splits the illumination radiation (B) into spots in order to illuminate the retina (2) with a multi-spot pattern, characterized in that - the lighting device (4, 5) is tunable with respect to the wavelength of the source radiation, - the detector is an area detector (19), - the detection beam path further - an optical element (14) acting only on the measuring radiation (M), which interacts with the front optics (12) and adjusts the numerical aperture with which measuring radiation (M) is collected in the eye (3), and - an aperture (15) which is arranged in front of the area detector (19), in or near an intermediate image plane and which defines the size of an object field from which the measuring radiation (M) reaches the area detector (19), and - wherein the aperture prior to the area detector is designed as a first multi-hole aperture (15) and a first multi-lens array (36) is arranged between this multi-hole aperture and the area detector (19), which focuses the radiation emanating from each hole of the first multi-hole aperture (15, 15a, 15b) onto a pixel area of ​​the area detector (19) which has a spatial resolution of 4 to 100 pixels in one direction, preferably as a 2D pixel area with 5 to 50 pixels or 5 to 40 pixels per direction.

The utility model provides an optical imaging device, which comprises a lens group, a spacing element group and a lens barrel, the lens group from the object side to the image side of the optical imaging device comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a sixth lens which are sequentially arranged at intervals, and the half Semi-FOV of the maximum half field angle of the optical imaging device and the numerical aperture fno of the optical imaging device meet the following conditions: 1lt; fno / tan (Semi-FOV) < = 1.25; the effective focal length f of the optical imaging device and the effective focal length f1 of the first lens meet the following formula:-2.3 lt; f1 / flt; -1.2,-1.2; the inner diameter d0s of the object side end face of the lens barrel, the inner diameter d1s of the object side face of the first spacing element and the effective focal length f1 of the first lens meet the following condition:-1.45 < = (d0s-d1s) / f1lt; and-0.85. The problem that in the prior art, an ultra-wide-angle and large-aperture optical imaging device is serious in stray light is solved.