509 results about "Numerical aperture" patented technology

The invention discloses a wafer detection scattered light collection objective lens, and relates to the technical field of optical imaging. The scattered light collecting lens is applied to wafer defect detection, the scattered light collecting lens sequentially comprises a first lens group, a second lens group, a third lens group and a fourth lens group from an object plane to an image plane in the optical axis direction of the lens, twelve lenses and an aperture diaphragm, and the twelve lenses and the aperture diaphragm are coaxially arranged; the first lens group is a catadioptric lens group, has positive focal power, and is used for imaging an object plane to an intermediate image plane through two times of reflection. The numerical aperture of the acquisition objective lens provided by the invention is equal to 0.9, the field of view is equal to 2.6 mm, the acquisition objective lens has the characteristics of large field of view, large numerical aperture and small center shielding, the capability of detecting scattered light of defects can be greatly improved, chromatic aberration is corrected by adopting a refraction and reflection mode, and a wider laser bandwidth can be realized compared with a general refraction mode of combining CaF2 and fused quartz.

The invention provides an optical imaging device, which comprises a lens group, a spacing element group and a lens barrel, the lens group comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a sixth lens which are sequentially arranged at intervals from the object side to the image side of the optical imaging device, and the half Semi-FOV of the maximum half field angle of the optical imaging device and the numerical aperture fno of the optical imaging device meet the following conditions: 1lt; fno / tan (Semi-FOV) < = 1.25; the effective focal length f of the optical imaging device and the effective focal length f1 of the first lens meet the following formula:-2.3 lt; f1 / flt; -1.2,-1.2; the inner diameter d0s of the object side end face of the lens barrel, the inner diameter d1s of the object side face of the first spacing element and the effective focal length f1 of the first lens meet the following condition:-1.45 < = (d0s-d1s) / f1lt; and-0.85. The problem that in the prior art, an ultra-wide-angle and large-aperture optical imaging device is serious in stray light is solved.

The invention discloses a deep ultraviolet spherical catadioptric detection objective lens, and relates to the technical field of optics, the deep ultraviolet spherical catadioptric detection objective lens comprises a first lens group, a second lens group and a diaphragm, one side of the first lens group is arranged to be an object plane, the first lens group is located between the second lens group and the object plane, the first lens group is used for converging light and correcting residual aberration of the second lens group, and the diaphragm is arranged between the second lens group and the object plane. The diaphragm is arranged in the middle of the second lens group, and the second lens group and the diaphragm are used for correcting vertical axis aberrations such as coma of the system. The objective lens adopts a spherical catadioptric structure, can realize deep ultraviolet band application, has a large numerical aperture, the numerical aperture can reach 0.8, the smaller wavelength and the larger numerical aperture have higher resolution, so that smaller defects can be detected, the working distance can be greater than 10mm, and the detection precision is improved on the basis of realizing the large NA design. The length of the system is reduced, the number of original parts is reduced, only five lenses are needed, the structure is simple, and installation and detection are convenient.

The invention provides a preparation method of a barrier type antimonide infrared detector. The preparation method comprises the following steps: selecting a gallium antimonide substrate; a gallium antimonide buffer layer, an indium arsenide heavily-doped layer, a class II superlattice absorption layer and an aluminum-arsenic-antimony barrier layer are sequentially grown on the substrate in an epitaxial mode through a molecular beam epitaxy method; mechanically stripping the hexagonal boron nitride two-dimensional material, and transferring the stripped hexagonal boron nitride to the aluminum-arsenic-antimony barrier layer to form a Van der Waals heterojunction and composite barrier layer structure; depositing electrodes by using an ultraviolet lithography technology and a thermal evaporation mode to form one electrode arranged on the gallium antimonide buffer layer and the other electrode arranged on the boron nitride; a large-numerical-aperture micro-lens array is processed on a substrate, and the micro-lens array is composed of gallium antimonide cylinders with a phase modulation function; therefore, the antimonide medium-wave infrared detector with the composite barrier layer can be formed, the quantum efficiency is improved, the order of magnitude of dark current is reduced, and room-temperature medium-wave infrared detection can be realized.

The application discloses a multi-marked endoscopic imaging lens for digestive tract, and belongs to the field of biomedical microscopic endoscopic imaging. The endoscopic imaging lens comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens; the first lens focuses laser; the second lens is matched with the first lens to limit a light beam in an effective light aperture of the lens; the third lens corrects chromatic aberration; the fourth lens and the fifth lens are combined to correct aberration; the sixth lens adopts an aspheric lens to correct spherical aberration caused in a collimating and focusing system; and the seventh lens is matched with the sixth lens to correct chromatic aberration. The working spectral range of the microscopic objective lens group is 488-860 nm, the effective light aperture is less than 1.8 mm, the mechanical outer diameter is not greater than 2.6 mm, the numerical aperture at the object side or the tissue is 0.55, the imaging field of view is 450 microns, the magnification is 2.14 times, and the working distance is 84 microns. The effect of matching excitation and fluorescence spectrum of a clinically available fluorescence contrast agent is realized.

The invention discloses an endoscope optical system which is composed of a first lens, a steering prism, a diaphragm, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens and a beam splitter prism from an object plane to an image plane, the focal power of the first lens is negative, the object side is a convex surface, and the image side is a concave surface; the focal power of the second lens is positive, the object side is a plane, and the image side is a convex surface; the object side of the third lens is a convex surface, the focal power of the fourth lens is opposite to that of the third lens, and the image side is a convex surface; the focal power of the fifth lens is positive, and the image side of the fifth lens is a convex surface; the focal power of the sixth lens is negative, the object side is a concave surface, and the image side is a concave surface; the focal power of the seventh lens is positive, the object side is a convex surface, and the image side is a convex surface; the object space numerical aperture NA of the endoscope optical system is more than 0.001 and less than 0.006, and the endoscope optical system has the advantages that lens combinations with different surface shapes and focal powers are used, and the depth of field and the axial resolution capability of an endoscope are improved by reducing the object space numerical aperture.

The invention discloses an optical fiber multi-parameter testing device and method, and aims to realize integrated and efficient testing of optical fiber mode field diameter, attenuation, cut-off wavelength, macrobend loss and geometric parameters. The device comprises a three-dimensional adjusting frame, an image acquisition system, a photoelectric detection system, a light path switching device, an environment compensation module and a control unit, through optical path switching, rapid switching between an image channel and a detection channel can be realized, and full-parameter testing can be completed through one-time focusing of an end face; an objective lens with a large numerical aperture and a long working distance and an auxiliary convergent lens with NA = 0.5 are adopted, so that the mode field measurement precision is improved; the control system coordinates operation of all the modules and performs environment compensation and data processing; the scheme has the advantages of compact structure, quick test, stable result and the like, and is suitable for application scenes of optical fiber manufacturing, quality detection and the like.

Integrated target waveguide devices and optical analytical systems comprising such devices are provided. The target devices include an optical coupler that is optically coupled to an integrated waveguide and that is configured to receive optical input from an optical source through free space, particularly through a low numerical aperture interface. The devices and systems are useful in the analysis of highly multiplexed optical reactions in large numbers at high densities, including biochemical reactions, such as nucleic acid sequencing reactions. The devices provide for the efficient and reliable coupling of optical excitation energy from an optical source to the optical reactions. Optical signals emitted from the reactions can thus be measured with high sensitivity and discrimination. The devices and systems are well suited for miniaturization and high throughput.

The invention provides a deep ultraviolet microscope objective lens and a microscope. The objective lens of the deep ultraviolet microscope comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens and an eighth lens which are sequentially arranged on the same optical axis from an object side to an image side. According to the scheme of the invention, the method is designed according to the wavelength range of 260-262 nm, and the design value of the resolution in the wavelength range is consistent with the theoretical value; independent design is completely achieved, and the problem that an existing 50-time objective lens cannot meet many use requirements in optical detection is solved; specific parameters and structures of all the lenses are set, so that the amplification factor of the objective lens of the deep ultraviolet microscope is 50 times, the object space view field is 0.6 mm, a tube lens with the focal length of 200 mm can be used in a matched mode, the working distance is 13 mm, the numerical aperture is 0.528, the object space view field and the working distance of the objective lens of the deep ultraviolet microscope are improved, and then the overall performance of the microscope is improved.

The invention discloses a PINN-based large numerical aperture photoetching objective lens vector diffraction field calculation method, which comprises the following steps: obtaining a three-dimensional vector diffraction light field of a large NA photoetching objective lens through simulation, reconstructing the three-dimensional vector diffraction light field at a sampling point position, and generating corresponding complex electric field distribution matrix data; performing physical purification on the complex electric field distribution matrix data to construct a corresponding data set; constructing a corresponding Helmholtz equation as a constraint equation based on the light field tight focusing characteristic of the large NA photoetching objective lens; constructing an initial model, and training the initial model by using the data set in combination with the constraint equation to obtain a PINN model for predicting complex electric field data; and inputting space coordinates of a to-be-predicted target into the PINN model to obtain complex electric field data. According to the method provided by the invention, the calculation efficiency of the vector diffraction field can be remarkably improved on the premise of keeping relatively high simulation precision, and the method is suitable for rapid modeling and analysis of the three-dimensional vector light field of the large-numerical-aperture photoetching object mirror.

The invention provides a super-structure lens condenser and a microscopic imaging lighting device, and belongs to the technical field of microscopic imaging. The technical problems that a traditional Kohler illumination collecting lens is large in caliber, thickness and weight, high in price and not beneficial to light weight and miniaturization of a microscopic system are solved, the technical scheme is that the super-structure lens collecting lens achieves abrupt change of a light field phase through interaction of a micro-nano structure and the light field, and the light field phase change is achieved through the super-structure lens collecting lens. Therefore, the light propagation direction is changed, and the micro-nano structures of the plane lens and the super-structure lens condenser for realizing light beam convergence are periodically arranged according to a certain interval. The beneficial effects are that the super-structure lens is utilized to perform light beam deflection and convergence on a plane by utilizing phase mutation, the limitation that a traditional lens needs a convex surface type or a plurality of lenses to realize large numerical aperture condensation is solved, the limitation on the surface curvature and the transverse size during processing is solved, the longitudinal size of the condensing lens is reduced, and the processing efficiency is improved. And miniaturization of a microscopic imaging system is facilitated.

A method having the steps of measuring a geometry of a toothing using an optical measuring system, wherein a numerical aperture of the optical measuring system is adjustable and the numerical aperture of the optical measuring system is adapted depending on at least one geometric parameter of the toothing to be measured and / or is enlarged or reduced.

An imaging optic (10) for projection lithography serves to image an object field (5), in which a reticulum to be imaged can be arranged, onto an image field (11), in which a substrate to be exposed can be arranged. The imaging optic (10) has a plurality of mirrors (M1 to M8) for guiding imaging light (16) along an imaging beam path from the object field (5) to the image field (11). The image-side numerical aperture of the imaging optic (10) is greater than 0.75. The optical conductivity of the imaging optic (10) is greater than 45 mm. 2 The result is an imaging optic whose usability for a projection exposure system is improved.

The invention relates to the field of microscopic imaging, in particular to a flat-field apochromatic large-view-field large-numerical-aperture objective lens. The objective lens is composed of 14 convex lenses and concave lenses made of conventional optical glass, and each lens is coaxial with the center of an object plane. From left to right, the object plane, the first concave lens, the second convex lens, the third concave lens and the fourth convex lens are glued to form a glued lens, the fifth convex lens, the sixth concave lens, the seventh convex lens and the eighth concave lens are glued to form a glued lens, and the ninth convex lens and the tenth concave lens are glued to form a glued lens. And the diaphragm, the thirteenth convex lens and the fourteenth concave lens are imaged at infinity, and a balsaming lens formed by gluing the eleventh convex lens and the twelfth concave lens is formed by gluing the diaphragm, the thirteenth convex lens and the fourteenth concave lens. The working distance WD is larger than 15 mm, the amplification factor beta is equal to 8 *-10 *, the focal length f 'is equal to 20-25 mm, the numerical aperture NA is larger than 0.32, and the object view field phi is equal to 4 mm.

The invention relates to the technical field of microscopic optical imaging, and discloses a semiconductor conductive particle detection task-oriented differential interference optical system, which comprises an objective lens group and a differential interference module, the objective lens group comprises a front group, a middle group and a rear group which are arranged in sequence; the front group is used for ensuring a large aperture angle and less introduction of spherical aberration and chromatic aberration, the middle group is used for compensating various aberrations introduced by the front group, and the rear group is used for correcting field curvature; the differential interference module comprises a Nomarski prism, a polarizer and an analyzer which are arranged in sequence; the Nomarski prism is used for splitting and combining the linearly polarized light beams; the polarization analyzer is used for converting linearly polarized light which passes through the Nomarski prism and is orthogonal in polarization direction into linearly polarized light with the same polarization direction; the system further comprises a beam splitter and a barrel lens group. According to the invention, long working distance and large numerical aperture can be realized in the visible light wave band, the light path design is optimized so as to reduce aberration introduction, and the anti-interference capability to weak signals is enhanced.

The invention relates to the field of integrated circuit manufacturing, in particular to a joint correction method, device and equipment for a curve graph and a storage medium. According to the target wafer pattern, determining a corresponding curve mask pattern through a pre-trained optical proximity correction model; according to the curve mask pattern, determining a corresponding curve electron beam exposure pattern through a pre-trained mask process correction model; according to the curve electron beam exposure pattern, determining a corresponding Manhattan pattern and a numerical aperture; receiving a plurality of sample plate Manhattan patterns; according to the sample plate Manhattan graph, a corresponding sample plate curve graph is obtained through preset numerical aperture simulation; acquiring a mask scanning pattern corresponding to the sample plate curve graph; and calibrating a mask process calibration model to be trained according to the mask scanning pattern and the sample plate curve graph. According to the invention, the compatibility and the universality of the joint correction method for the curve graph are improved.

The invention provides a confocal microscope objective lens with high optical flux and long working distance, the confocal microscope objective lens comprises a first lens group and a second lens group which are sequentially arranged along the light transmission direction, the first lens group comprises a first lens, a second lens, a third lens and a fourth lens which are sequentially arranged along the light transmission direction, the first lens is a negative lens, and the second lens is a positive lens. The working distance is prolonged; the combination of the second lens, the third lens and the fourth lens has positive focal power and is used for focusing light, so that the objective lens obtains a larger numerical aperture; the second lens group comprises a sixth lens and a seventh lens which are sequentially arranged in the light transmission direction, and the combination of the sixth lens and the seventh lens has negative focal power and is used for enlarging the aperture of the light beam and reducing the angle of the incident light beam at the same time. According to the scheme, a view field of 12 mm is achieved, the numerical aperture reaches 0.5, the working distance reaches 17.7 mm, and excellent imaging performance is achieved while the large view field, the high resolution and the long working distance are considered.

The invention discloses a multiphoton up-conversion super-resolution microscopic imaging method based on microsphere super-lens enhancement, which utilizes the super-resolution advantage of a microsphere super-lens and the nonlinear response advantage of a lanthanide doped rare earth up-conversion nano material to reduce the saturation excitation power of the rare earth nano material. And super-resolution imaging under the condition of a low-magnification and low-numerical-aperture objective lens is realized. An example verifies that under the condition that system complexity is not increased, excitation powers of 455 nm and 808 nm radiation fluorescence of an up-conversion nano material are respectively reduced by 15.40 times and 23.44 times, fluorescence imaging resolutions of 455 nm and 808 nm can be respectively improved by 3.14 times and 3.6 times under a 10x 0.25 NA objective lens, and corresponding transverse resolution limits can respectively reach 358.20 nm and 480.02 nm, so that the fluorescence imaging resolution of the up-conversion nano material can be improved by 3.14 times and 3.6 times under a 10x 0.25 NA objective lens. The method has the advantages of simple imaging system, low cost and good imaging effect, and is of great significance to biological application research.

The invention discloses an object space telecentric lens with a long working distance and a large numerical aperture. The object space telecentric lens comprises a front lens group, an aperture diaphragm and a rear lens group which are sequentially arranged from an object space to an image space along an optical axis of the lens. The front lens group comprises a first lens with positive focal power, a second lens with positive focal power, a fourth lens with positive focal power, a sixth lens with positive focal power, an eighth lens with negative focal power, a third lens with negative focal power, a fifth lens with negative focal power, a seventh lens with negative focal power and a ninth lens with negative focal power, the eighth lens and the ninth lens form a second group of doublet lenses, and the fifth lens, the sixth lens and the seventh lens form a first group of triplet lenses. The rear lens group includes a tenth lens and a twelfth lens having positive refractive power, and an eleventh lens and a thirteenth lens having negative refractive power. According to the invention, the thirteen spherical glass lenses are adopted, and the focal power of each lens is reasonably distributed, so that the lens has the advantages of long working distance, large numerical aperture, ultrahigh resolution, high relative illumination, wide spectral range, high telecentricity and the like, and the problem of low resolution of a long-working-distance object space telecentric lens is solved. The measurement precision of the detection lens is improved, and the requirements of some application scenes for higher-performance lenses are met.

The invention provides a compact photoetching simulation system based on a physical model, which relates to the technical field of photoetching simulation tools and physical modeling and comprises a model construction module, a kernel visualization module, a simulation calculation module, a result evaluation and optimization module, a model library management module, a real-time simulation module, an error compensation module and a simulation result verification module. The model building module is used for building a three-dimensional photoetching model according to the light source wavelength, the coherence factor, the numerical aperture and the aberration coefficient of a photoetching machine in the photoetching equipment as well as the photoresist type, the photoetching resolution requirement and the photoetching pattern feature size of the photoetching process. Diffraction of light in a projection objective, interference of light on the surface and inside of photoresist and physical and chemical processes of a photoresist molecule microscopic level are comprehensively considered, and compared with a basic physical model, the complex propagation path of light in photoetching equipment can be accurately simulated.

An optical measurement system, the optical measurement system comprises optics, wherein the optics include a collection path and an illumination path and an objective lens. The optics is configured to acquire Raman spectrums of one or more structural elements located at a measurement site of the sample while being set-up to apply one or more optics parameters that comprise an illumination angle out of a set of multiple illumination angles that correspond to a numerical aperture of the objective lens. Each of the one or more structural elements has a dimension that ranges between one tenth of nanometer to one hundred microns; an optical spectrometer; a Raman detector that is downstream to the optical spectrometer; and a control unit that is configured to determine an expected radiation pattern to be detected by the Raman detector when the optics are set-up to apply the one or more optics parameters.

The invention discloses a super-resolution micro lens and a preparation method thereof. The lens comprises a photoresist spherical micro lens and a mixed substrate plane lens which are sequentially arranged from top to bottom. The specific preparation method comprises the following steps: S1, preparing a photoresist cylinder on a quartz substrate; s2, reflowing the photoresist cylinder into a micron lens by using a photoresist reflowing process; s3, preparing a mixed substrate plane lens on the surface of the to-be-detected sample; and S4, transferring the micron lens to the surface of the mixed substrate plane lens. By changing the thickness of the mixed substrate plane lens, adjustment of the amplification coefficient and the numerical aperture can be realized, and compared with a micro lens without a mixed substrate, the micro lens has higher imaging resolution. The method has a wide prospect in the technical field of optical imaging.

The invention provides a deep ultraviolet infinite imaging detection objective lens, belongs to the technical field of optics, and solves the problem that tiny defects in a semiconductor device are difficult to discover, the objective lens comprises a first lens group, a diaphragm, a second lens group and a third lens group which are sequentially arranged from an object plane in the optical axis direction, the first lens group has positive focal power, and the second lens group has negative focal power. Comprising a first meniscus lens, a second meniscus lens, a third meniscus lens, a fourth meniscus lens, a fifth meniscus lens and a sixth meniscus lens. The second lens group has positive focal power and comprises a seventh meniscus lens, an eighth meniscus lens, a ninth meniscus lens, a first biconvex lens and a second biconvex lens; the third lens group has negative focal power and comprises a first biconcave lens, a tenth meniscus lens, a second biconcave lens and an eleventh meniscus lens, and finally light emitted from the third lens group is parallel light. According to the invention, the change of different multiplying power can be realized, the method is suitable for a deep ultraviolet wave band with a very short wavelength, the numerical aperture is larger, and the resolution is higher.

The present invention discloses a six-group and seven-lens micro immersion objective lens, which includes a first lens, a second lens, a third lens, a fourth lens, a fifth lens, and a sixth lens arranged in sequence from the object plane to the image plane. The third lens is a doublet lens; the S11 surface of the first lens is a plane, and the S12 surface bulges towards the image plane. The S21 surface of the second lens bulges towards the object plane, and the S22 surface bulges towards the image plane. The S31 surface of the third lens bulges towards the object plane, the S32 surface bulges towards the object plane, and the S33 surface bulges towards the image plane. The S41 surface and the S42 surface of the fourth lens both bulge towards the object plane. The S51 surface and the S52 surface of the fifth lens are both concave. The S61 surface of the sixth lens bulges towards the object plane, the S62 surface bulges towards the object plane or is a plane. The above composition and layout enable the numerical aperture of the objective lens to reach 0.8. Compared with the objective lens of the existing confocal system, the numerical aperture of the present application is larger, which can further improve the fluorescence collection efficiency, thereby significantly improving the recognition sensitivity for weak fluorescence targets.

The invention relates to the technical field of imaging detection, in particular to a microscopic imaging system for detecting a microlens, which comprises a light source path establishing module, an initial image position acquisition module, a peak coordinate recording module, a stability offset analysis module and an imaging quality judgment module. According to the invention, the numerical aperture normalization processing is carried out on the direction of the light passing through the specific aperture area, so that the precise control of the spatial distribution characteristic of the light beam is realized, the spatial mapping of the focus position is completed on the basis of the light in the unified direction, the direction consistency and the imaging stability in the image forming process are improved, and the imaging quality is improved. By combining continuous peak coordinate search of a light spot focusing position, a light spot change trend can be dynamically obtained, imaging deviation caused by infinitesimal displacement can be effectively distinguished, and an accurate marking mechanism for light spot stability is constructed by means of absolute difference extraction of three-dimensional offset data and Rayleigh criterion tolerance judgment. And the response sensitivity and the analysis reliability of weak instability factors in the imaging performance of the micro lens are improved.

The invention relates to a microscope objective lens, which comprises three lens groups which are sequentially arranged from an object space to an image space, the first lens group comprises a first lens group and a second lens group which are sequentially arranged from the object space to the image space, the focal power of the first lens group is negative, and the focal power of the second lens group is negative; the second part of lens group comprises a third lens group and a fourth lens group which are sequentially arranged from the object to the image, the focal power of the third lens group is positive, and the focal power of the fourth lens group is positive; the third part of lens group comprises a fifth lens group and a sixth lens group which are sequentially arranged from the object to the image, the focal power of the fifth lens group is positive, and the focal power of the sixth lens group is positive; the microscope objective lens satisfies: 3lt; d / fobjlt; 5, carrying out fobjgt; 15, 0.2 lt; nAlt; 0.3 part; wherein D is the distance from the object plane to the image side surface of the sixth lens group; fobj is the focal length of the microscope objective lens; nA is the object space numerical aperture of the microscope objective lens. The microscope objective lens has a large field of view, a large numerical aperture and good image quality.

The invention relates to a design method of a large-size and large-numerical-aperture discrete achromatic superlens insensitive to middle-infrared band polarization. The invention relates to the technical field of micro-nano photon metasurfaces. Phase delay and dispersion required by an achromatic lens at different positions of the lens are obtained according to the diameter, the numerical aperture and the working frequency band of the metasurface; constructing a corresponding unit library insensitive to polarization; and screening required units in the unit library according to the phase and group delay required by each position, and arranging the units in a square manner by taking the center of the super lens as an original point and taking a period P as an interval in x and y directions, so as to obtain the designed super lens. The achromatic superlens provided by the invention has the characteristic of polarization insensitivity, and has a wider application scene compared with a PB phase type lens only sensitive to circular polarization.

According to the flexible waveguide coupling structure for the high-density optical engine and the miniaturized packaging method of the flexible waveguide coupling structure, the polymer optical waveguide is adopted, the waveguide core layer is made of the high-refractive-index material, and the refractive index of the core layer is higher than that of the upper cladding and the lower cladding, so that light beams can reflect light rays on the surface or in the core layer; the light beam is limited in the core layer to be transmitted along the set path; the flexible waveguide is used in high-density optical engine packaging, a traditional ribbon optical fiber array is directly replaced, and the contradiction between space limitation and bending radius is solved; comprising a flexible waveguide, an MT / MPO connector and a microlens array, polymers such as PMMA, BCB, SU-8, FPPE, PSQ, PDMS / M-PDMS and the like are selected as flexible waveguide materials, the thickness is smaller than or equal to 0.2 mm, the bendable radius is smaller than or equal to 2 mm, the core / cladding refractive index difference delta n is larger than or equal to 0.01, the multimode numerical aperture NA is approximately equal to 0.3, the transmission loss in a 850 nm window is smaller than or equal to 0.25 dB / cm, the angle of a coupling end face is 40-50 degrees, and the requirements for low loss and high bandwidth of short-distance parallel optical interconnection are met.

The invention discloses an ultraviolet broadband large-view-field detection objective lens, and belongs to the technical field of optical instruments. In order to solve the problems that in the prior art, balance among short-wavelength, large-numerical-aperture, large-view-field and broadband detection is difficult to obtain, and meanwhile system complexity and manufacturing cost are considered, the invention provides an ultraviolet broadband large-view-field detection objective lens. Comprising a first lens group, a second lens group, a third lens group and a fourth lens group which are sequentially and coaxially arranged from an object plane, each lens group comprises a plurality of lenses, and the first lens group and the fourth lens group are variable lens groups. The method can simultaneously meet high requirements on resolution, detection range and detection efficiency, and is suitable for defect detection and quality control in the field of semiconductor wafer manufacturing.

The invention discloses a multi-label endoscopic imaging lens for a digestive tract, and belongs to the field of biomedical microscopic endoscopic images. The endoscopic imaging lens comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens. The first lens focuses laser, and the second lens is matched with the first lens to limit a light beam in an effective clear aperture of the lens; the third lens corrects chromatic aberration; a fourth lens and a fifth lens are combined to correct aberration; the sixth lens is an aspheric lens and corrects spherical aberration brought in collimation and focusing systems, and the seventh lens is matched with the sixth lens to correct chromatic aberration. The working spectral range of the microscope objective set is 488-860 nm, the effective clear aperture is smaller than 1.8 mm, the mechanical outer diameter is not larger than 2.6 mm, the numerical aperture at the object space or the tissue is 0.55, the imaging view field is 450 microns, the magnification factor is 2.14 times, and the working distance is 84 microns. And the effect of matching excitation and fluorescence spectrum of a clinically available fluorescence contrast agent is realized.